Addressable array sources specially adapted to produce patterns

Industry

CPC
G03F7/70391

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70391Addressable array sources specially adapted to produce patterns

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for direct writing photoetching by parallel in...
- Patent number 12,130,554
- Issue date Oct 29, 2024
- ZHEJIANG LAB
- Cuifang Kuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical maskless
- Patent number 11,448,971
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid masks for microfabrication processes
- Patent number 11,415,877
- Issue date Aug 16, 2022
- Northwestern University
- Chad A. Mirkin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic cooling control for thermal stabilization for lithography s...
- Patent number 11,009,801
- Issue date May 18, 2021
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods of using solid state emitter arrays
- Patent number 10,983,444
- Issue date Apr 20, 2021
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image exposure device
- Patent number 10,969,696
- Issue date Apr 6, 2021
- FUJIFILM Corporation
- Yoshihisa Usami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for direct write maskless lithography
- Patent number 10,928,736
- Issue date Feb 23, 2021
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reserving spatial light modulator sections to address field non-uni...
- Patent number 10,921,714
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micro LED array illumination source
- Patent number 10,908,507
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic cooling control for thermal stabilization for lithography s...
- Patent number 10,788,762
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for direct write maskless lithography
- Patent number 10,712,669
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Erwin Paul Smakman
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Spatial light modulator with variable intensity diodes
- Patent number 10,684,555
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Joseph R. Johnson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for direct write maskless lithography
- Patent number 10,527,946
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Apparatus for direct write maskless lithography
- Patent number 10,527,950
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Erwin Paul Smakman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source arrangement for a photolithography exposure system and...
- Patent number 10,241,415
- Issue date Mar 26, 2019
- Suss MicroTec Lithography GmbH
- Paul Kaiser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure head, exposure apparatus and method of operating an exposu...
- Patent number 10,114,289
- Issue date Oct 30, 2018
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Jacobus Hubertus Theodoor Jamar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam exposure device
- Patent number 9,964,857
- Issue date May 8, 2018
- V Technology Co., Ltd.
- Koichi Kajiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless exposure method and a maskless exposure device for perform...
- Patent number 9,921,488
- Issue date Mar 20, 2018
- Samsung Display Co., Ltd.
- Jun-Ho Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless lithographic apparatus measuring accumulated amount of light
- Patent number 9,891,537
- Issue date Feb 13, 2018
- Samsung Electronics, Co., Ltd.
- Ji Young Chu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for regulating a light source of a photolithography exposure...
- Patent number 9,864,277
- Issue date Jan 9, 2018
- SUSS MicroTec Lithography GmbH
- Paul Kaiser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optical transmission of a structure into a recording medium
- Patent number 9,798,237
- Issue date Oct 24, 2017
- Forschungszentrum Juelich GmbH
- Hilde Hardtdegen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device, lithographic apparatus, method for guiding radiation and de...
- Patent number 9,715,183
- Issue date Jul 25, 2017
- ASML Netherlands B.V.
- Wouter Dick Koek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and computer pr...
- Patent number 9,696,636
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate handling apparatus and lithographic apparatus
- Patent number 9,696,633
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus, a device manufacturing method, a method of m...
- Patent number 9,594,304
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Martinus Hendricus Henricus Hoeks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,568,831
- Issue date Feb 14, 2017
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, method for maintaining a lithographic appar...
- Patent number 9,513,561
- Issue date Dec 6, 2016
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for manufacturing multiple light emitting diodes...
- Patent number 9,507,271
- Issue date Nov 29, 2016
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,494,869
- Issue date Nov 15, 2016
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus, an apparatus for providing setpoint data, a...
- Patent number 9,488,921
- Issue date Nov 8, 2016
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...
- Publication number 20240329541
- Publication date Oct 3, 2024
- National Cheng Kung University
- YUNG-CHUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONVEYANCE APPARATUS, CONVEYANCE METHOD, LITHOGRAPHY APPARATUS, AND...
- Publication number 20240242994
- Publication date Jul 18, 2024
- Canon Kabushiki Kaisha
- Osamu Yasunobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM
- Publication number 20240184217
- Publication date Jun 6, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DIRECT WRITING PHOTOETCHING BY PARALLEL IN...
- Publication number 20240176244
- Publication date May 30, 2024
- ZHEJIANG LAB
- Cuifang KUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DISPLAY DEVICE USING...
- Publication number 20210325787
- Publication date Oct 21, 2021
- SAMSUNG DISPLAY CO., LTD.
- Sung Soon IM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL MASKLESS
- Publication number 20210157245
- Publication date May 27, 2021
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC COOLING CONTROL FOR THERMAL STABILIZATION FOR LITHOGRAPHY S...
- Publication number 20210011390
- Publication date Jan 14, 2021
- Applied Materials, Inc.
- Benjamin M. JOHNSTON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID MASKS FOR MICROFABRICATION PROCESSES
- Publication number 20190384161
- Publication date Dec 19, 2019
- Northwestern University
- Chad A. Mirkin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY
- Publication number 20190004435
- Publication date Jan 3, 2019
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY
- Publication number 20180373159
- Publication date Dec 27, 2018
- ASML Netherlands B.V.
- Erwin Paul SMAKMAN
- B82 - NANO-TECHNOLOGY
Information Patent Application
Light source arrangement for a photolithography exposure system and...
- Publication number 20180017877
- Publication date Jan 18, 2018
- SUSS MICROTEC LITHOGRAPHY GMBH
- Paul Kaiser
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140354970
- Publication date Dec 4, 2014
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DE...
- Publication number 20140347641
- Publication date Nov 27, 2014
- ASML NETHERLANDS B.V.
- Wouter Dick Koek
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140340666
- Publication date Nov 20, 2014
- ASML NETHERLANDS B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND COMPUTER PR...
- Publication number 20140285785
- Publication date Sep 25, 2014
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140285782
- Publication date Sep 25, 2014
- ASML NETHERLANDS B.V.
- Antonius Johannes Josephus Van Dijsseldonk
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY APPARATUS, AN APPARATUS FOR PROVIDING SETPOINT DATA, A...
- Publication number 20140285786
- Publication date Sep 25, 2014
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARAT...
- Publication number 20140192337
- Publication date Jul 10, 2014
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GANTRY APPARATUS
- Publication number 20140076105
- Publication date Mar 20, 2014
- Samsung Electronics Co., Ltd.
- Sang Joon HONG
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20140055764
- Publication date Feb 27, 2014
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LED-based photolithographic illuminator with high collection effici...
- Publication number 20140049978
- Publication date Feb 20, 2014
- David G. Stites
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS, METHOD FOR MAINTAINING A LITHOGRAPHIC APPAR...
- Publication number 20140009746
- Publication date Jan 9, 2014
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY
- Publication number 20130335721
- Publication date Dec 19, 2013
- ASML NETHERLANDS B.V.
- Felix Godfried Peter Peeters
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE USING ROTATING PRINTING ARM TO PROJECT OR VIEW IM...
- Publication number 20130250030
- Publication date Sep 26, 2013
- Micronic Mydata AB
- Torbjorn Sandstrom
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20130250267
- Publication date Sep 26, 2013
- ASML NETHERLANDS B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20130107238
- Publication date May 2, 2013
- ASML NETHERLANDS B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HANDLING APPARATUS AND LITHOGRAPHIC APPARATUS
- Publication number 20130021593
- Publication date Jan 24, 2013
- ASML NETHERLANDS B.V.
- Johannes Onvlee
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
MULTIBEAM EXPOSURE SCANNING METHOD AND APPARATUS, AND METHOD OF MAN...
- Publication number 20120325099
- Publication date Dec 27, 2012
- FUJIFILM CORPORATION
- Ichirou Miyagawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
MULTIBEAM EXPOSURE SCANNING METHOD AND APPARATUS, AND METHOD OF MAN...
- Publication number 20120320352
- Publication date Dec 20, 2012
- Ichirou Miyagawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20120320359
- Publication date Dec 20, 2012
- ASML NETHERLANDS B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Addressable array sources specially adapted to produce patterns

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for direct writing photoetching by parallel in...

Optical maskless

Liquid masks for microfabrication processes

Dynamic cooling control for thermal stabilization for lithography s...

Systems and methods of using solid state emitter arrays

Image exposure device

Method and apparatus for direct write maskless lithography

Reserving spatial light modulator sections to address field non-uni...

Micro LED array illumination source

Dynamic cooling control for thermal stabilization for lithography s...

Method and apparatus for direct write maskless lithography

Spatial light modulator with variable intensity diodes

Method and apparatus for direct write maskless lithography

Apparatus for direct write maskless lithography

Light source arrangement for a photolithography exposure system and...

Exposure head, exposure apparatus and method of operating an exposu...

Beam exposure device

Maskless exposure method and a maskless exposure device for perform...

Maskless lithographic apparatus measuring accumulated amount of light

Method for regulating a light source of a photolithography exposure...

Method for optical transmission of a structure into a recording medium

Device, lithographic apparatus, method for guiding radiation and de...

Lithographic apparatus, device manufacturing method and computer pr...

Substrate handling apparatus and lithographic apparatus

Lithography apparatus, a device manufacturing method, a method of m...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, method for maintaining a lithographic appar...

System and method for manufacturing multiple light emitting diodes...

Lithographic apparatus and device manufacturing method

Lithography apparatus, an apparatus for providing setpoint data, a...

Patents Applicationslast 30 patents

CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...

CONVEYANCE APPARATUS, CONVEYANCE METHOD, LITHOGRAPHY APPARATUS, AND...

METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM

METHOD AND APPARATUS FOR DIRECT WRITING PHOTOETCHING BY PARALLEL IN...

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DISPLAY DEVICE USING...

OPTICAL MASKLESS

DYNAMIC COOLING CONTROL FOR THERMAL STABILIZATION FOR LITHOGRAPHY S...

LIQUID MASKS FOR MICROFABRICATION PROCESSES

METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY

METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY

Light source arrangement for a photolithography exposure system and...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DE...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND COMPUTER PR...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHY APPARATUS, AN APPARATUS FOR PROVIDING SETPOINT DATA, A...

LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARAT...

GANTRY APPARATUS

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

LED-based photolithographic illuminator with high collection effici...

LITHOGRAPHIC APPARATUS, METHOD FOR MAINTAINING A LITHOGRAPHIC APPAR...

MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY

METHOD AND DEVICE USING ROTATING PRINTING ARM TO PROJECT OR VIEW IM...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

SUBSTRATE HANDLING APPARATUS AND LITHOGRAPHIC APPARATUS

MULTIBEAM EXPOSURE SCANNING METHOD AND APPARATUS, AND METHOD OF MAN...

MULTIBEAM EXPOSURE SCANNING METHOD AND APPARATUS, AND METHOD OF MAN...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD