Alignment or registration features

Industry

CPC
G03F1/42

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/42Alignment or registration features

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor device structure with overla...
- Patent number 12,243,832
- Issue date Mar 4, 2025
- NANYA TECHNOLOGY CORPORATION
- Chun-Yen Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithography alignment process for bonded wafers
- Patent number 12,230,585
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yeong-Jyh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facilitating alignment of stacked chiplets
- Patent number 12,191,297
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Robert Clark
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask, display device, and manufacturing method thereof
- Patent number 12,170,295
- Issue date Dec 17, 2024
- Samsung Display Co., Ltd.
- Dong Hee Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target design for improved target placement accuracy
- Patent number 12,140,859
- Issue date Nov 12, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 12,140,878
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask reticle
- Patent number 12,111,568
- Issue date Oct 8, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yunsheng Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Template, method of forming a template, apparatus and method of man...
- Patent number 12,085,852
- Issue date Sep 10, 2024
- Canon Kabushiki Kaisha
- Amir Tavakkoli Kermani Ghariehali
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle image velocimetry of extreme ultraviolet lithography systems
- Patent number 12,085,585
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- En Hao Lai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Template, workpiece, and alignment method
- Patent number 12,078,922
- Issue date Sep 3, 2024
- Kioxia Corporation
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-function overlay marks for reducing noise and extracting focu...
- Patent number 12,055,860
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Ching Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
- Patent number 12,055,850
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, exposure method and touch panel
- Patent number 12,050,397
- Issue date Jul 30, 2024
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Jie Lei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multiple-mask multiple-exposure lithography and masks
- Patent number 12,044,977
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective structure, reflective mask blank, reflective mask and me...
- Patent number 12,025,911
- Issue date Jul 2, 2024
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark forming Moire pattern, overlay measurement method usin...
- Patent number 12,021,040
- Issue date Jun 25, 2024
- AUROS TECHNOLOGY, INC.
- Hyun Chul Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 12,007,686
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate measuring device and a method of using the same
- Patent number 12,007,691
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Min-Cheng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Marks for overlay measurement and overlay error correction
- Patent number 12,002,765
- Issue date Jun 4, 2024
- NANYA TECHNOLOGY CORPORATION
- Shih-Yuan Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment mark, mask and display substrate motherboard
- Patent number 11,994,810
- Issue date May 28, 2024
- BOE Technology Group Co., Ltd.
- Li Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask orientation
- Patent number 11,977,246
- Issue date May 7, 2024
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and display device manufactured by using the same
- Patent number 11,947,223
- Issue date Apr 2, 2024
- Samsung Display Co., Ltd.
- Dong Hee Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
- Patent number 11,927,879
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Moosong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, display device, and manufacturing method thereof
- Patent number 11,923,383
- Issue date Mar 5, 2024
- Samsung Display Co., Ltd.
- Dong Hee Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement system, substrate processing system, and device manufac...
- Patent number 11,915,961
- Issue date Feb 27, 2024
- Nikon Corporation
- Go Ichinose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithography alignment process for bonded wafers
- Patent number 11,916,022
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yeong-Jyh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diagonal via pattern and method
- Patent number 11,901,286
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,852,964
- Issue date Dec 26, 2023
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF
- Publication number 20250096146
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hao Chu Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY MASK HAVING OVERLAY MARK AND RELATED METHOD
- Publication number 20250060660
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Yeh LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...
- Publication number 20240411221
- Publication date Dec 12, 2024
- United Microelectronics Corp.
- Chun-Yi Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS
- Publication number 20240411223
- Publication date Dec 12, 2024
- Carl Zeiss SMT GMBH
- Jens Oster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20240377755
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240369919
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS
- Publication number 20240361350
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- En Hao LAI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MASK, EXPOSURE METHOD AND TOUCH PANEL
- Publication number 20240345470
- Publication date Oct 17, 2024
- HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Jie LEI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT
- Publication number 20240310722
- Publication date Sep 19, 2024
- Carl Zeiss SMT GMBH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED U...
- Publication number 20240241451
- Publication date Jul 18, 2024
- Samsung Electronics Co., Ltd.
- Daehee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
- Publication number 20240219848
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240203796
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Byeong Seon PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY ALIGNMENT PROCESS FOR BONDED WAFERS
- Publication number 20240186258
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yeong-Jyh Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK, DISPLAY DEVICE, AND MANUFACTURING METHOD THEREOF
- Publication number 20240170504
- Publication date May 23, 2024
- SAMSUNG DISPLAY CO., LTD.
- Dong Hee SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGONAL VIA MANUFACTURING METHOD
- Publication number 20240162142
- Publication date May 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD...
- Publication number 20240094624
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Masaki MITSUYASU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
- Publication number 20240094625
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY MASK AND PHOTOLITHOGRAPHY SYSTEM COMPRISING SAID P...
- Publication number 20240085776
- Publication date Mar 14, 2024
- TECHNOLOGIES DIGITHO INC.
- Richard BEAUDRY
- G01 - MEASURING TESTING
Information Patent Application
PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...
- Publication number 20240085778
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Byungje Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20240069446
- Publication date Feb 29, 2024
- Samsung Electronics Co., Ltd.
- SeungKyo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD OF SIGNAL ENHANCEMENT FOR ALIGNMENT PATTERNS
- Publication number 20240053673
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chieh CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...
- Publication number 20240027890
- Publication date Jan 25, 2024
- Samsung Electronics Co., Ltd.
- Hyungjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...
- Publication number 20240027921
- Publication date Jan 25, 2024
- Canon Kabushiki Kaisha
- TOSHIKI IWAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-Function Overlay Marks for Reducing Noise and Extracting Focu...
- Publication number 20240012340
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Ching Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIAGONAL VIA STRUCTURE
- Publication number 20230387002
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUB-RESOLUTION ASSIST FEATURES
- Publication number 20230384665
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY MARK
- Publication number 20230378082
- Publication date Nov 23, 2023
- WINBOND ELECTRONICS CORP.
- Kuang-Chung Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURI...
- Publication number 20230375914
- Publication date Nov 23, 2023
- WINBOND ELECTRONICS CORP.
- Kazuhiro Segawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20230367229
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...
- Publication number 20230359134
- Publication date Nov 9, 2023
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING

Alignment or registration features

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for manufacturing semiconductor device structure with overla...

Photolithography alignment process for bonded wafers

Facilitating alignment of stacked chiplets

Photomask, display device, and manufacturing method thereof

System and method for aligned stitching

Overlay target design for improved target placement accuracy

Processing system, processing method, measurement apparatus, substr...

Mask reticle

Template, method of forming a template, apparatus and method of man...

Particle image velocimetry of extreme ultraviolet lithography systems

Template, workpiece, and alignment method

Multi-function overlay marks for reducing noise and extracting focu...

Fabricating method of photomask, photomask structure thereof, and s...

Mask, exposure method and touch panel

Multiple-mask multiple-exposure lithography and masks

Reflective structure, reflective mask blank, reflective mask and me...

Overlay mark forming Moire pattern, overlay measurement method usin...

Etch processing system having reflective endpoint detection

Substrate measuring device and a method of using the same

Marks for overlay measurement and overlay error correction

Alignment mark, mask and display substrate motherboard

Mask orientation

Exposure mask and display device manufactured by using the same

Extreme ultraviolet (EUV) photomask and method of manufacturing sem...

Photomask, display device, and manufacturing method thereof

Measurement system, substrate processing system, and device manufac...

Photolithography alignment process for bonded wafers

Diagonal via pattern and method

Photomask including fiducial mark and method of making a semiconduc...

Method for manufacturing reflective mask blank, reflective mask bla...

Patents Applicationslast 30 patents

PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF

LITHOGRAPHY MASK HAVING OVERLAY MARK AND RELATED METHOD

PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...

METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD

PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS

MASK, EXPOSURE METHOD AND TOUCH PANEL

METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT

METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED U...

EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PHOTOLITHOGRAPHY ALIGNMENT PROCESS FOR BONDED WAFERS

PHOTOMASK, DISPLAY DEVICE, AND MANUFACTURING METHOD THEREOF

DIAGONAL VIA MANUFACTURING METHOD

PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD...

PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK

PHOTOLITHOGRAPHY MASK AND PHOTOLITHOGRAPHY SYSTEM COMPRISING SAID P...

PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

STRUCTURE AND METHOD OF SIGNAL ENHANCEMENT FOR ALIGNMENT PATTERNS

REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...

DETECTION DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...

Multi-Function Overlay Marks for Reducing Noise and Extracting Focu...

DIAGONAL VIA STRUCTURE

SUB-RESOLUTION ASSIST FEATURES

OVERLAY MARK

SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURI...

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...