Alignment other than original with workpiece

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CPC
G03F9/7007

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7007Alignment other than original with workpiece

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for alignment of anisotropic inclusions in addi...
- Patent number 11,599,033
- Issue date Mar 7, 2023
- 3DFortify, Inc.
- Daniel T. Shores
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Pattern formation method, lithography apparatus, lithography system...
- Patent number 11,460,768
- Issue date Oct 4, 2022
- Canon Kabushiki Kaisha
- Hiroshi Sato
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for aligning two optical subsystems
- Patent number 11,209,739
- Issue date Dec 28, 2021
- EV Group E. Thallner GmbH
- Boris Povazay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Additive manufacturing systems and methods for non-planar interface...
- Patent number 10,928,742
- Issue date Feb 23, 2021
- 3DFortify, Inc.
- Daniel T. Shores
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Exposure apparatus, exposure method, and semiconductor device manuf...
- Patent number 10,921,722
- Issue date Feb 16, 2021
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for alignment of anisotropic inclusions in addi...
- Patent number 10,732,521
- Issue date Aug 4, 2020
- 3DFortify, Inc.
- Daniel T. Shores
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Performance monitoring of design-based alignment
- Patent number 10,698,325
- Issue date Jun 30, 2020
- KLA-Tencor Corporation
- Bjorn Brauer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self aligning systems and methods for lithography systems
- Patent number 10,599,055
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for wafer alignment
- Patent number 10,600,667
- Issue date Mar 24, 2020
- Micron Technology, Inc.
- Yang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and inspection apparatus
- Patent number 10,540,561
- Issue date Jan 21, 2020
- NuFlare Technology, Inc.
- Makoto Yabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Relative position measurement based alignment system, double workpi...
- Patent number 10,359,712
- Issue date Jul 23, 2019
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Yunfeng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for wafer alignment
- Patent number 10,347,519
- Issue date Jul 9, 2019
- Micron Technology, Inc.
- Yang Chao
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Optical system for producing lithographic structures
- Patent number 10,310,385
- Issue date Jun 4, 2019
- Carl Zeiss AG
- Philipp Huebner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for wafer alignment
- Patent number 10,242,901
- Issue date Mar 26, 2019
- Micron Technology, Inc.
- Yang Chao
- G01 - MEASURING TESTING
Information Patent Grant
Inspection of microelectronic devices using near-infrared light
- Patent number 10,066,927
- Issue date Sep 4, 2018
- Intel Corporation
- Liang W. Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for wafer alignment
- Patent number 10,062,595
- Issue date Aug 28, 2018
- Micron Technology, Inc.
- Yang Chao
- G01 - MEASURING TESTING
Information Patent Grant
Optical system for producing lithographic structures
- Patent number 9,989,862
- Issue date Jun 5, 2018
- Carl Zeiss AG
- Philipp Huebner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a distance between two objects, inspection a...
- Patent number 9,982,991
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and method of forming patterns using the same
- Patent number 9,977,324
- Issue date May 22, 2018
- Samsung Display Co., Ltd.
- DongEon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 9,879,988
- Issue date Jan 30, 2018
- ASML Netherlands B.V.
- Xing Lan Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for determining a reference point of an orientati...
- Patent number 9,863,760
- Issue date Jan 9, 2018
- Carl Zeiss SMT GmbH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge-dominant alignment method in exposure scanner system
- Patent number 9,766,559
- Issue date Sep 19, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yung-Yao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for wafer alignment
- Patent number 9,748,128
- Issue date Aug 29, 2017
- Micron Technology, Inc.
- Yang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, alignment method, and device manufacturing method
- Patent number 9,594,314
- Issue date Mar 14, 2017
- Canon Kabushiki Kaisha
- Takashi Ogura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmission balancing for phase shift mask with a trim mask
- Patent number 9,482,965
- Issue date Nov 1, 2016
- Seagate Technology LLC
- Dan Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical image capturing module, aligning method, and observing method
- Patent number 9,459,460
- Issue date Oct 4, 2016
- Metal Industries Research & Development Centre
- Shi-Wei Lin
- G02 - OPTICS
Information Patent Grant
Alignment sensor and height sensor
- Patent number 9,366,524
- Issue date Jun 14, 2016
- KLA-Tencor Corporation
- Mark A. McCord
- G01 - MEASURING TESTING
Information Patent Grant
Interference exposure device and method
- Patent number 9,195,146
- Issue date Nov 24, 2015
- Shanghai Micro Electronics Equipment Co., Ltd.
- Qixin Xu
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
- Publication number 20250036032
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- FUMA KIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-ALIGNED RIDGE WAVEGUIDE LASER STRUCTURE, METHOD FOR FABRICATIO...
- Publication number 20230130757
- Publication date Apr 27, 2023
- POET Technologies, Inc.
- Suresh Venkatesan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR ALIGNMENT OF ANISOTROPIC INCLUSIONS IN ADDI...
- Publication number 20210141314
- Publication date May 13, 2021
- 3DFortify, Inc.
- Daniel T. Shores
- G02 - OPTICS
Information Patent Application
ADDITIVE MANUFACTURING SYSTEMS AND METHODS FOR NON-PLANAR INTERFACE...
- Publication number 20200326639
- Publication date Oct 15, 2020
- 3DFortify, Inc.
- Daniel T. Shores
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SYSTEMS AND METHODS FOR ALIGNMENT OF ANISOTROPIC INCLUSIONS IN ADDI...
- Publication number 20200050119
- Publication date Feb 13, 2020
- 3DFortify, Inc.
- Daniel T. Shores
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PERFORMANCE MONITORING OF DESIGN-BASED ALIGNMENT
- Publication number 20190361363
- Publication date Nov 28, 2019
- KLA-Tencor Corporation
- Bjorn Brauer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR WAFER ALIGNMENT
- Publication number 20190279892
- Publication date Sep 12, 2019
- Micron Technology, Inc.
- Yang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20190271922
- Publication date Sep 5, 2019
- Toshiba Memory Corporation
- Manabu TAKAKUWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR WAFER ALIGNMENT
- Publication number 20190148202
- Publication date May 16, 2019
- Micron Technology, Inc.
- Yang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR WAFER ALIGNMENT
- Publication number 20180330976
- Publication date Nov 15, 2018
- Micron Technology, Inc.
- Yang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR PRODUCING LITHOGRAPHIC STRUCTURES
- Publication number 20180275528
- Publication date Sep 27, 2018
- Carl-Zeiss AG
- Philipp Huebner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RELATIVE POSITION MEASUREMENT BASED ALIGNMENT SYSTEM, DOUBLE WORKPI...
- Publication number 20180253020
- Publication date Sep 6, 2018
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Yunfeng LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR WAFER ALIGNMENT
- Publication number 20170352563
- Publication date Dec 7, 2017
- Micron Technology, Inc.
- Yang Chao
- G01 - MEASURING TESTING
Information Patent Application
PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME
- Publication number 20170192348
- Publication date Jul 6, 2017
- SAMSUNG DISPLAY CO., LTD.
- DongEon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFERENCE EXPOSURE DEVICE AND METHOD
- Publication number 20140176925
- Publication date Jun 26, 2014
- SHANGHAI MICRO ELECTRONICS EQUIPMENT Co., LTD.
- Qixin Xu
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR SUBSTRATE HAVING DOT MARKS AND METHOD OF MANUFACTURIN...
- Publication number 20130193560
- Publication date Aug 1, 2013
- PANASONIC CORPORATION
- Yukiya Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining the Position of a Structure Within an Image...
- Publication number 20120081712
- Publication date Apr 5, 2012
- Carl Zeiss SMS GmbH
- Mario Laengle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTROL METHOD AND CONTROL SYSTEM FOR EXPOSURE APPARATUS
- Publication number 20120028192
- Publication date Feb 2, 2012
- Kabushiki Kaisha Toshiba
- Kenichi TSUJISAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Auto-focusing device and method for maskless exposure apparatus
- Publication number 20110181856
- Publication date Jul 28, 2011
- Samsung Electronics Co., Ltd.
- Sang Min Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and methods for manufacturing semiconductor device
- Publication number 20100231878
- Publication date Sep 16, 2010
- Hyesoo Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining the centrality of masks
- Publication number 20090097041
- Publication date Apr 16, 2009
- Vistec Semiconductor Systems GmbH
- Michael Heiden
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Stage apparatus and exposure apparatus
- Publication number 20080316446
- Publication date Dec 25, 2008
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Alignment other than original with workpiece

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for alignment of anisotropic inclusions in addi...

Pattern formation method, lithography apparatus, lithography system...

Metrology method, patterning device, apparatus and computer program

Method and apparatus for aligning two optical subsystems

Metrology method, patterning device, apparatus and computer program

Additive manufacturing systems and methods for non-planar interface...

Exposure apparatus, exposure method, and semiconductor device manuf...

Systems and methods for alignment of anisotropic inclusions in addi...

Performance monitoring of design-based alignment

Self aligning systems and methods for lithography systems

Systems and methods for wafer alignment

Inspection method and inspection apparatus

Relative position measurement based alignment system, double workpi...

Systems and methods for wafer alignment

Optical system for producing lithographic structures

Systems and methods for wafer alignment

Inspection of microelectronic devices using near-infrared light

Systems and methods for wafer alignment

Optical system for producing lithographic structures

Method for controlling a distance between two objects, inspection a...

Phase shift mask and method of forming patterns using the same

Metrology method and apparatus, computer program and lithographic s...

Method and device for determining a reference point of an orientati...

Edge-dominant alignment method in exposure scanner system

Systems and methods for wafer alignment

Exposure apparatus, alignment method, and device manufacturing method

Transmission balancing for phase shift mask with a trim mask

Optical image capturing module, aligning method, and observing method

Alignment sensor and height sensor

Interference exposure device and method

Patents Applicationslast 30 patents

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...

SELF-ALIGNED RIDGE WAVEGUIDE LASER STRUCTURE, METHOD FOR FABRICATIO...

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

SYSTEMS AND METHODS FOR ALIGNMENT OF ANISOTROPIC INCLUSIONS IN ADDI...

ADDITIVE MANUFACTURING SYSTEMS AND METHODS FOR NON-PLANAR INTERFACE...

SYSTEMS AND METHODS FOR ALIGNMENT OF ANISOTROPIC INCLUSIONS IN ADDI...

PERFORMANCE MONITORING OF DESIGN-BASED ALIGNMENT

SYSTEMS AND METHODS FOR WAFER ALIGNMENT

EXPOSURE APPARATUS, EXPOSURE METHOD, AND SEMICONDUCTOR DEVICE MANUF...

SYSTEMS AND METHODS FOR WAFER ALIGNMENT

SYSTEMS AND METHODS FOR WAFER ALIGNMENT

OPTICAL SYSTEM FOR PRODUCING LITHOGRAPHIC STRUCTURES

RELATIVE POSITION MEASUREMENT BASED ALIGNMENT SYSTEM, DOUBLE WORKPI...

SYSTEMS AND METHODS FOR WAFER ALIGNMENT

PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME

INTERFERENCE EXPOSURE DEVICE AND METHOD

SEMICONDUCTOR SUBSTRATE HAVING DOT MARKS AND METHOD OF MANUFACTURIN...

Method for Determining the Position of a Structure Within an Image...

CONTROL METHOD AND CONTROL SYSTEM FOR EXPOSURE APPARATUS

Auto-focusing device and method for maskless exposure apparatus

Systems and methods for manufacturing semiconductor device

Method for determining the centrality of masks

Stage apparatus and exposure apparatus