Arrangements for generating the plasma

Industry

CPC
H01J2237/327

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/327Arrangements for generating the plasma

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
RF generating device and semiconductor manufacturing apparatus incl...
- Patent number 12,368,022
- Issue date Jul 22, 2025
- Samsung Electronics Co., Ltd.
- Sungyong Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed voltage source for plasma processing applications
- Patent number 12,368,020
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- A N M Wasekul Azad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for controlling source frequ...
- Patent number 12,362,144
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active gas generation apparatus
- Patent number 12,354,845
- Issue date Jul 8, 2025
- TMEIC Corporation
- Kensuke Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma excitation with ion energy control
- Patent number 12,347,647
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped showerhead for edge plasma modulation
- Patent number 12,338,530
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Saketh Pemmasani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF impedance matching network
- Patent number 12,334,306
- Issue date Jun 17, 2025
- ASM America, Inc.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for producing a waveform
- Patent number 12,334,303
- Issue date Jun 17, 2025
- Advanced Energy Industries, Inc.
- Hien Minh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsing assembly and power supply arrangement
- Patent number 12,322,570
- Issue date Jun 3, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and ceiling wall
- Patent number 12,315,700
- Issue date May 27, 2025
- Tokyo Electron Limited
- Satoshi Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,278,091
- Issue date Apr 15, 2025
- PSK Inc.
- Kwang Sung Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for delay and amplitude correction
- Patent number 12,272,536
- Issue date Apr 8, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 12,230,479
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Topographic selective deposition
- Patent number 12,224,160
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna structure and plasma generating device using same
- Patent number 12,205,794
- Issue date Jan 21, 2025
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
HTCC antenna for generation of microplasma
- Patent number 12,198,897
- Issue date Jan 14, 2025
- Inficon, Inc.
- Shawn Briglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor
- Patent number 12,183,545
- Issue date Dec 31, 2024
- New Power Plasma Co., Ltd.
- Soon Im Wi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and method for operating same
- Patent number 12,159,766
- Issue date Dec 3, 2024
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,131,891
- Issue date Oct 29, 2024
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving deposition process
- Patent number 12,112,930
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Tang Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual reverse pulse sputtering system
- Patent number 12,112,931
- Issue date Oct 8, 2024
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma apparatus and methods for processing feed material utilizing...
- Patent number 12,094,688
- Issue date Sep 17, 2024
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ignition method and plasma processing apparatus
- Patent number 12,080,517
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level parameter and frequency pulsing with a low angular spread
- Patent number 12,068,131
- Issue date Aug 20, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 12,027,344
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shinya Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching of Ru metal
- Patent number 12,020,908
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Yung-chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device and output control method therefor
- Patent number 12,014,899
- Issue date Jun 18, 2024
- Kyosan Electric Mfg. Co., Ltd.
- Takeshi Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method fabricating semiconductor device
- Patent number 12,014,905
- Issue date Jun 18, 2024
- Samsung Electronics Co., Ltd.
- Nam Kyun Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SWITCHING CIRCUIT FOR MULTILEVEL PLASMA IMPEDANCE MATCHING
- Publication number 20250239435
- Publication date Jul 24, 2025
- Applied Materials, Inc.
- Anm Wasekul AZAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DELAY AND AMPLITUDE CORRECTION
- Publication number 20250232969
- Publication date Jul 17, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING C...
- Publication number 20250210319
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...
- Publication number 20250201540
- Publication date Jun 19, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian A. Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250201533
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...
- Publication number 20250183006
- Publication date Jun 5, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source Tuning With Pulsed DC Bias
- Publication number 20250174436
- Publication date May 29, 2025
- MKS Instruments, Inc.
- Aaron RADOMSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR PLASMA PROCESS
- Publication number 20250166972
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Evrim Solmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250166975
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250104967
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- CHANGBAE PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...
- Publication number 20250104980
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Changbae PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE USING THE SAME
- Publication number 20250104968
- Publication date Mar 27, 2025
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
- Publication number 20250095967
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS
- Publication number 20250079128
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PLASMA PROCESSING
- Publication number 20250069852
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS TO IMPROVE PROCESS NON-UNIFORMITY FOR SEMICONDUCTOR DIREC...
- Publication number 20250069859
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Edric H. TONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME
- Publication number 20250046571
- Publication date Feb 6, 2025
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH NETWORK DESIGN FOR USE WITH FREQUENCY SWEEPING
- Publication number 20250037972
- Publication date Jan 30, 2025
- Advanced Energy Industries, Inc.
- Masahiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR INJECTION SYSTEM FOR A PLASMA REACTOR AND METHOD OF USE THEREOF
- Publication number 20250022687
- Publication date Jan 16, 2025
- Nox Box Technologies LLC
- Joseph E. Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING T...
- Publication number 20250022693
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Iksu BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250014864
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTU...
- Publication number 20250006488
- Publication date Jan 2, 2025
- NANYA TECHNOLOGY CORPORATION
- Chao-Hsiu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Remote Plasma Source and Plasma Processing Chamber Having Same
- Publication number 20250006465
- Publication date Jan 2, 2025
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240429028
- Publication date Dec 26, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Kensuke WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Topographic Selective Deposition
- Publication number 20240395507
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
- Publication number 20240395501
- Publication date Nov 28, 2024
- Samsung Electronics Co., Ltd.
- Hyojin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Improving Deposition Process
- Publication number 20240387155
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jung-Tang Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA POWER SUPPLY SYSTEM AND METHOD
- Publication number 20240371616
- Publication date Nov 7, 2024
- TRUMPF Huettinger GmbH + Co. KG
- Wojciech Gajewski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
- Publication number 20240371610
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS

Arrangements for generating the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

RF generating device and semiconductor manufacturing apparatus incl...

Pulsed voltage source for plasma processing applications

Plasma processing apparatus and method for controlling source frequ...

Active gas generation apparatus

Plasma excitation with ion energy control

Shaped showerhead for edge plasma modulation

RF impedance matching network

Apparatus for producing a waveform

Pulsing assembly and power supply arrangement

Plasma processing apparatus and ceiling wall

Substrate processing apparatus and substrate processing method

Systems and methods for delay and amplitude correction

Processing chamber with multiple plasma units

Topographic selective deposition

Antenna structure and plasma generating device using same

HTCC antenna for generation of microplasma

Plasma reactor

Plasma generating apparatus and method for operating same

Plasma processing system and method using radio frequency and micro...

Wafer placement table

Apparatus for plasma processing

Method for improving deposition process

Dual reverse pulse sputtering system

Plasma apparatus and methods for processing feed material utilizing...

Ignition method and plasma processing apparatus

Multi-level parameter and frequency pulsing with a low angular spread

Film forming apparatus

Atomic layer etching of Ru metal

High-frequency power supply device and output control method therefor

Apparatus and method fabricating semiconductor device

Patents Applicationslast 30 patents

SWITCHING CIRCUIT FOR MULTILEVEL PLASMA IMPEDANCE MATCHING

SYSTEMS AND METHODS FOR DELAY AND AMPLITUDE CORRECTION

ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING C...

PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCH...

PLASMA PROCESSING APPARATUS

MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...

Source Tuning With Pulsed DC Bias

METHOD AND SYSTEM FOR PLASMA PROCESS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...

ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE USING THE SAME

PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES

PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS

METHOD FOR PLASMA PROCESSING

APPARATUS TO IMPROVE PROCESS NON-UNIFORMITY FOR SEMICONDUCTOR DIREC...

PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME

MATCH NETWORK DESIGN FOR USE WITH FREQUENCY SWEEPING

VAPOR INJECTION SYSTEM FOR A PLASMA REACTOR AND METHOD OF USE THEREOF

ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING T...

APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS

DEPOSITION DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTU...

Remote Plasma Source and Plasma Processing Chamber Having Same

ACTIVE GAS GENERATION APPARATUS

Topographic Selective Deposition

INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

Method for Improving Deposition Process

PLASMA POWER SUPPLY SYSTEM AND METHOD

FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME