Arrangements of electrodes and associated parts for generating or controlling the discharge

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CPC
H01J37/04

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus and deflector
- Patent number 12,009,174
- Issue date Jun 11, 2024
- NuFlare Technology, Inc.
- Kazuhiro Kishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam probing techniques and related structures
- Patent number 11,996,336
- Issue date May 28, 2024
- Micron Technology, Inc.
- Amitava Majumdar
- G11 - INFORMATION STORAGE
Information Patent Grant
Plasma micronozzle adapter
- Patent number 11,993,011
- Issue date May 28, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Eric Langlois
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of etching and apparatus for plasma processing
- Patent number 11,955,342
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle flooding to enhance voltag...
- Patent number 11,929,232
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Frank Nan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two piece electrode assembly with gap for plasma control
- Patent number 11,915,911
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Tien Fak Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-contact angle measuring apparatus
- Patent number 11,903,755
- Issue date Feb 20, 2024
- Weng-Dah Ken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron diffraction holography
- Patent number 11,906,450
- Issue date Feb 20, 2024
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,908,659
- Issue date Feb 20, 2024
- NuFlare Technology, Inc.
- Toshiki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of controlling an energy spread of a charg...
- Patent number 11,881,374
- Issue date Jan 23, 2024
- ASML Netherlands B.V.
- Shakeeb Bin Hasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array unit
- Patent number 11,837,429
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Shuji Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,830,704
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Time-resolved cathodoluminescence sample probing
- Patent number 11,798,778
- Issue date Oct 24, 2023
- ATTOLIGHT AG
- Christian Monachon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 11,756,766
- Issue date Sep 12, 2023
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle source
- Patent number 11,735,391
- Issue date Aug 22, 2023
- IMS Nanofabrication GmbH
- Stefan Gerhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 11,728,123
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, multi-charged-particle beam writing apparatus...
- Patent number 11,721,520
- Issue date Aug 8, 2023
- NuFlare Technology, Inc.
- Kei Obara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for reducing the charging effect in a transmissio...
- Patent number 11,715,618
- Issue date Aug 1, 2023
- FEI Company
- Yuchen Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,688,580
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,676,796
- Issue date Jun 13, 2023
- Jeol Ltd.
- Kazuki Yagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam irradiation apparatus and electron beam irradiation m...
- Patent number 11,664,191
- Issue date May 30, 2023
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for scanning a sample by a charged particle beam system
- Patent number 11,658,004
- Issue date May 23, 2023
- ASML Netherlands B.V.
- Adam Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple electron beam writing apparatus and multiple electron beam...
- Patent number 11,621,140
- Issue date Apr 4, 2023
- NuFlare Technology, Inc.
- Kota Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optical system and multi-beam image acquiring apparatus
- Patent number 11,621,144
- Issue date Apr 4, 2023
- NuFlare Technology, Inc.
- John Hartley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fill pattern to enhance ebeam process margin
- Patent number 11,581,162
- Issue date Feb 14, 2023
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,574,798
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-charged particle-beam irradiation apparatus and multiple-c...
- Patent number 11,574,797
- Issue date Feb 7, 2023
- NuFlare Technology, Inc.
- Mitsuhiro Okazawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS
- Publication number 20240395493
- Publication date Nov 28, 2024
- NuFlare Technology, Inc.
- Toshiki KUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...
- Publication number 20240363304
- Publication date Oct 31, 2024
- FEI Company
- Jaroslav Velcovský
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM PROBING TECHNIQUES AND RELATED STRUCTURES
- Publication number 20240355685
- Publication date Oct 24, 2024
- Micron Technology, Inc.
- Amitava Majumdar
- G11 - INFORMATION STORAGE
Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
- Publication number 20240297010
- Publication date Sep 5, 2024
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIFOCAL ELECTRON MICROSCOPE
- Publication number 20240272100
- Publication date Aug 15, 2024
- FEI Company
- Alexander Henstra
- G01 - MEASURING TESTING
Information Patent Application
Ion Milling Apparatus
- Publication number 20240258062
- Publication date Aug 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR NARROWING ZERO LOSS PEAKS IN MONOCHROMATED CHARGED P...
- Publication number 20240249905
- Publication date Jul 25, 2024
- FEI Company
- Alexander HENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242933
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242919
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242920
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242922
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF GENERATING TEM SADP IMAGE WITH HIGH DISCERNMENT
- Publication number 20240234082
- Publication date Jul 11, 2024
- LightVision Inc.
- Jin Ha JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...
- Publication number 20240203684
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- David Disterheft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240186100
- Publication date Jun 6, 2024
- NuFlare Technology, Inc.
- Shuji YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PIXEL ELEMENTS, PARTICLE BEAM MICROSCOPES INCLUDING THE SAME, AND A...
- Publication number 20240153735
- Publication date May 9, 2024
- FEI Company
- Gerrit Cornelis van Hoften
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF CLEANING ION GENERATOR DEVICE
- Publication number 20240123472
- Publication date Apr 18, 2024
- Global Plasma Solutions, Inc.
- Charles Houston WADDELL
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...
- Publication number 20240128045
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-PRECISION TIMING CLOCK METHOD AND APPARATUS
- Publication number 20240115222
- Publication date Apr 11, 2024
- Weng-Dah Ken
- G04 - HOROLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240055218
- Publication date Feb 15, 2024
- NuFlare Technology, Inc.
- Yasuo SENGOKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240029999
- Publication date Jan 25, 2024
- NuFlare Technology, Inc.
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE...
- Publication number 20240013999
- Publication date Jan 11, 2024
- NuFlare Technology, Inc.
- Toshiki KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...
- Publication number 20230402253
- Publication date Dec 14, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD,...
- Publication number 20230369015
- Publication date Nov 16, 2023
- NuFlare Technology, Inc.
- Kenichi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...
- Publication number 20230335366
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20230317399
- Publication date Oct 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Toshimasa KAMEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230268158
- Publication date Aug 24, 2023
- Hitachi High-Tech Corporation
- Hideki TSUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20230260741
- Publication date Aug 17, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tetsuya Kudo
- H01 - BASIC ELECTRIC ELEMENTS

Arrangements of electrodes and associated parts for generating or controlling the discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-charged-particle-beam writing method, multi-charged-particle-...

Drawing apparatus and deflector

Electron beam probing techniques and related structures

Plasma micronozzle adapter

Method of etching and apparatus for plasma processing

Systems and methods for charged particle flooding to enhance voltag...

Two piece electrode assembly with gap for plasma control

Non-contact angle measuring apparatus

Electron diffraction holography

Multi charged particle beam writing apparatus

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Apparatus for and method of controlling an energy spread of a charg...

Blanking aperture array unit

Plasma processing apparatus and control method

Multi charged particle beam adjustment method, multi charged partic...

Time-resolved cathodoluminescence sample probing

Charged particle beam writing apparatus and charged particle beam w...

Charged-particle source

Charged particle blocking element, exposure apparatus comprising su...

Semiconductor device, multi-charged-particle beam writing apparatus...

System and method for reducing the charging effect in a transmissio...

Apparatus of plural charged-particle beams

Charged particle beam device

Electron beam irradiation apparatus and electron beam irradiation m...

Method for scanning a sample by a charged particle beam system

Multiple electron beam writing apparatus and multiple electron beam...

Electron optical system and multi-beam image acquiring apparatus

Fill pattern to enhance ebeam process margin

Plasma processing apparatus and control method

Multiple-charged particle-beam irradiation apparatus and multiple-c...

Patents Applicationslast 30 patents

BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...

ELECTRON BEAM PROBING TECHNIQUES AND RELATED STRUCTURES

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

BIFOCAL ELECTRON MICROSCOPE

Ion Milling Apparatus

TECHNIQUES FOR NARROWING ZERO LOSS PEAKS IN MONOCHROMATED CHARGED P...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

SYSTEM AND METHOD OF GENERATING TEM SADP IMAGE WITH HIGH DISCERNMENT

METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

PIXEL ELEMENTS, PARTICLE BEAM MICROSCOPES INCLUDING THE SAME, AND A...

SELF CLEANING ION GENERATOR DEVICE

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...

ULTRA-PRECISION TIMING CLOCK METHOD AND APPARATUS

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE...

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...

COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD,...

Multi-Beam Pattern Definition Device

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...

Charged Particle Beam Device

Charged Particle Beam Apparatus

ION IMPLANTER AND ION IMPLANTATION METHOD