Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Industry

CPC
H01J2237/022

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/022Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for precleaning and treating wafer surfaces
- Patent number 11,939,666
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Xiangjin Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for metal contamination control in an ion impl...
- Patent number 11,923,169
- Issue date Mar 5, 2024
- Axcelis Technologies, Inc.
- Causon Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cold-field-emitter electron gun with self-cleaning extractor using...
- Patent number 11,830,699
- Issue date Nov 28, 2023
- KLA Corporation
- Luca Grella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Germanium tetraflouride and hydrogen mixtures for an ion implantati...
- Patent number 11,827,973
- Issue date Nov 28, 2023
- Entegris, Inc.
- Oleg Byl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion gun and vacuum processing apparatus
- Patent number 11,810,748
- Issue date Nov 7, 2023
- Canon Anelva Corporation
- Tsutomu Hiroishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for directional processing
- Patent number 11,791,126
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for residual gas analysis
- Patent number 11,791,141
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
System and tool for cleaning a glass surface of an accelerator column
- Patent number 11,691,184
- Issue date Jul 4, 2023
- Varian Semiconductor Equipment Associates, Inc.
- Michael J. Blanchard
- B08 - CLEANING
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 11,651,931
- Issue date May 16, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for examining and/or processing a sample
- Patent number 11,592,461
- Issue date Feb 28, 2023
- Carl Zeiss SMT GmbH
- Christof Baur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low profile deposition ring for enhanced life
- Patent number 11,581,166
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Kirankumar Neelasandra Savandaiah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chamber and methods for cleaning the same
- Patent number 11,532,463
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- B08 - CLEANING
Information Patent Grant
Ion gun and vacuum processing apparatus
- Patent number 11,521,822
- Issue date Dec 6, 2022
- Canon Anelva Corporation
- Tsutomu Hiroishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Plasma density control on substrate edge
- Patent number 11,495,440
- Issue date Nov 8, 2022
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional (3D) imaging system and method for nanostructure
- Patent number 11,488,801
- Issue date Nov 1, 2022
- INSTITUTE OF GEOLOGY AND GEOPHYSICS, CHINESE ACADEMY OF SCIENCES
- Zhongming Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transparent halo assembly for reduced particle generation
- Patent number 11,424,112
- Issue date Aug 23, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Ernest E. Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process apparatus with low particle contamination and method...
- Patent number 11,371,141
- Issue date Jun 28, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Drawing apparatus and control method thereof
- Patent number 11,352,694
- Issue date Jun 7, 2022
- NuFlare Technology, Inc.
- Satoshi Nakahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 11,355,314
- Issue date Jun 7, 2022
- Canon Anelva Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for the reduction of contaminants in a plasma rea...
- Patent number 11,322,344
- Issue date May 3, 2022
- Plasma Investment Sp. z o.o.
- Ihar Yelkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Germanium tetraflouride and hydrogen mixtures for an ion implantati...
- Patent number 11,299,802
- Issue date Apr 12, 2022
- Entegris, Inc.
- Oleg Byl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen generator for an ion implanter
- Patent number 11,276,543
- Issue date Mar 15, 2022
- Axcelis Technologies, Inc.
- Neil K Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for examining and/or processing a sample
- Patent number 11,262,378
- Issue date Mar 1, 2022
- Carl Zeiss SMT GmbH
- Christof Baur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning device
- Patent number 11,244,806
- Issue date Feb 8, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryuju Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 11,239,060
- Issue date Feb 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 11,222,805
- Issue date Jan 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 11,170,975
- Issue date Nov 9, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Heung-Woo Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method in processing apparatus using halogen-based gas
- Patent number 11,158,490
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Tomohito Matsuo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PIPING, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD FOR MANUF...
- Publication number 20240068094
- Publication date Feb 29, 2024
- KIOXIA Corporation
- Yuya MATSUBARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386807
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE
- Publication number 20230386786
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386808
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM N...
- Publication number 20230307214
- Publication date Sep 28, 2023
- Korea Institute of Science and Technology
- Ho Joong JUNG
- B08 - CLEANING
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20230260738
- Publication date Aug 17, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE DEVICE, CHARGED PARTICLE BEAM APPARATUS, AND VACUUM APPARATUS
- Publication number 20230260740
- Publication date Aug 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Motohiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...
- Publication number 20230241650
- Publication date Aug 3, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND PARTICLE REMOVAL METHOD
- Publication number 20230245871
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Hiroshi NAGAIKE
- B08 - CLEANING
Information Patent Application
HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED L...
- Publication number 20230235449
- Publication date Jul 27, 2023
- Axcelis Technologies, Inc.
- David M. Burtner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERMITTENT STAGNANT FLOW
- Publication number 20230230820
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Douglas L. KEIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE FOR REDUCING ICE CONTAMINATION OF A SAMPLE, FOCUSED ION BEAM...
- Publication number 20230215681
- Publication date Jul 6, 2023
- Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
- Sebastian TACKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING CHAMBER
- Publication number 20230178345
- Publication date Jun 8, 2023
- Kyoungran Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20230154730
- Publication date May 18, 2023
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GUN AND VACUUM PROCESSING APPARATUS
- Publication number 20230154721
- Publication date May 18, 2023
- CANON ANELVA CORPORATION
- Tsutomu Hiroishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cold-Field-Emitter Electron Gun with Self-Cleaning Extractor Using...
- Publication number 20230010176
- Publication date Jan 12, 2023
- KLA Corporation
- Luca Grella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20230005700
- Publication date Jan 5, 2023
- Hitachi High-Tech Corporation
- Takafumi MIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope and Specimen Contamination Prevention Method
- Publication number 20220328280
- Publication date Oct 13, 2022
- JEOL Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS
- Publication number 20220319814
- Publication date Oct 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hsing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING SYSTEM
- Publication number 20220319816
- Publication date Oct 6, 2022
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GUN AND VACUUM PROCESSING APPARATUS
- Publication number 20220301807
- Publication date Sep 22, 2022
- Canon ANELVA Corporation
- Tsutomu Hiroishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20220285122
- Publication date Sep 8, 2022
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20220262598
- Publication date Aug 18, 2022
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATI...
- Publication number 20220186358
- Publication date Jun 16, 2022
- Entegris, Inc.
- Oleg Byl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process Kit Conditioning Chamber
- Publication number 20220189749
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Ribhu Gautam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR EXAMINING AND/OR PROCESSING A SAMPLE
- Publication number 20220178965
- Publication date Jun 9, 2022
- Carl Zeiss SMT GMBH
- Christof Baur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20220130706
- Publication date Apr 28, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO ELIMINATE CONTAMINANT PARTICLES FROM AN ACC...
- Publication number 20220115236
- Publication date Apr 14, 2022
- Exogenesis Corporation
- Allen R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN...
- Publication number 20220044908
- Publication date Feb 10, 2022
- Entegris, Inc.
- Barry Lewis CHAMBERS
- H01 - BASIC ELECTRIC ELEMENTS

Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and apparatus for precleaning and treating wafer surfaces

Apparatus and method for metal contamination control in an ion impl...

Cold-field-emitter electron gun with self-cleaning extractor using...

Germanium tetraflouride and hydrogen mixtures for an ion implantati...

Ion gun and vacuum processing apparatus

Apparatus for directional processing

System and method for residual gas analysis

Method and system for the removal and/or avoidance of contamination...

System and tool for cleaning a glass surface of an accelerator column

Refillable ion chamber with automated purging system

Apparatus and method for examining and/or processing a sample

Low profile deposition ring for enhanced life

Semiconductor processing chamber and methods for cleaning the same

Ion gun and vacuum processing apparatus

In-situ plasma cleaning of process chamber components

Plasma density control on substrate edge

Three-dimensional (3D) imaging system and method for nanostructure

Transparent halo assembly for reduced particle generation

Plasma process apparatus with low particle contamination and method...

Drawing apparatus and control method thereof

Ion beam processing apparatus, electrode assembly, and method of cl...

Method and device for the reduction of contaminants in a plasma rea...

Germanium tetraflouride and hydrogen mixtures for an ion implantati...

Hydrogen generator for an ion implanter

Apparatus and method for examining and/or processing a sample

Cleaning device

Ion beam etching chamber with etching by-product redistributor

Etching apparatus and methods of cleaning thereof

Ion implantation apparatus

Processing method in processing apparatus using halogen-based gas

Patents Applicationslast 30 patents

PIPING, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD FOR MANUF...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM N...

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM

STAGE DEVICE, CHARGED PARTICLE BEAM APPARATUS, AND VACUUM APPARATUS

GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...

SUBSTRATE PROCESSING SYSTEM AND PARTICLE REMOVAL METHOD

HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED L...

INTERMITTENT STAGNANT FLOW

DEVICE FOR REDUCING ICE CONTAMINATION OF A SAMPLE, FOCUSED ION BEAM...

METHOD OF CLEANING CHAMBER

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

ION GUN AND VACUUM PROCESSING APPARATUS

Cold-Field-Emitter Electron Gun with Self-Cleaning Extractor Using...

Charged Particle Beam Device

Electron Microscope and Specimen Contamination Prevention Method

METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS

PLASMA ETCHING SYSTEM

ION GUN AND VACUUM PROCESSING APPARATUS

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATI...

Process Kit Conditioning Chamber

APPARATUS AND METHOD FOR EXAMINING AND/OR PROCESSING A SAMPLE

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

METHOD AND APPARATUS TO ELIMINATE CONTAMINANT PARTICLES FROM AN ACC...

FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN...