Birefringence

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CPC
G03F7/70966

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70966Birefringence

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Hydroxide-catalysis bonding of optical components used in DUV optic...
- Patent number 11,340,383
- Issue date May 24, 2022
- Corning Incorporated
- Michael Morgan Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element and optical system for EUV lithography h...
- Patent number 11,073,766
- Issue date Jul 27, 2021
- Carl Zeiss SMT GmbH
- Christoph Nottbohm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 10,151,982
- Issue date Dec 11, 2018
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,760,014
- Issue date Sep 12, 2017
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, in particular of a microlithographic projection exp...
- Patent number 9,588,433
- Issue date Mar 7, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization-modulating optical element
- Patent number 9,581,911
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization-modulating optical element
- Patent number 9,470,982
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,423,698
- Issue date Aug 23, 2016
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,423,697
- Issue date Aug 23, 2016
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Polarization-influencing optical arrangement, in particular in a mi...
- Patent number 9,411,245
- Issue date Aug 9, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,244,359
- Issue date Jan 26, 2016
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,207,542
- Issue date Dec 8, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 9,182,677
- Issue date Nov 10, 2015
- Carl Zeiss SMT GmbH
- Frank Schlesener
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,146,476
- Issue date Sep 29, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,140,992
- Issue date Sep 22, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,140,993
- Issue date Sep 22, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Immersion catadioptric projection objective having two intermediate...
- Patent number 8,908,269
- Issue date Dec 9, 2014
- Carl Zeiss SMT GmbH
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Synthesized silica glass for optical component
- Patent number 8,498,056
- Issue date Jul 30, 2013
- Asahi Glass Company, Limited
- Masaaki Takata
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Polarization-modulating optical element
- Patent number 8,482,717
- Issue date Jul 9, 2013
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Optical system, exposure system, and exposure method
- Patent number 8,436,983
- Issue date May 7, 2013
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 8,416,490
- Issue date Apr 9, 2013
- Carl Zeiss SMT GmbH
- David Shafer
- G02 - OPTICS
Information Patent Grant
Optical system
- Patent number 8,379,188
- Issue date Feb 19, 2013
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 8,355,201
- Issue date Jan 15, 2013
- Carl Zeiss SMT GmbH
- David Shafer
- G02 - OPTICS
Information Patent Grant
Optical system, exposure system, and exposure method
- Patent number 8,351,021
- Issue date Jan 8, 2013
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,339,574
- Issue date Dec 25, 2012
- ASML Netherlands B.V.
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, exposure system, and exposure method
- Patent number 8,339,578
- Issue date Dec 25, 2012
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Halide free glasses having low OH, OD concentrations
- Patent number 8,268,740
- Issue date Sep 18, 2012
- Corning Incorporated
- Richard Michael Fiacco
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Polarization-modulating optical element and method for manufacturin...
- Patent number 8,213,079
- Issue date Jul 3, 2012
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 8,208,199
- Issue date Jun 26, 2012
- Carl Zeiss SMT GmbH
- David Shafer
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,208,123
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT
- Publication number 20190094704
- Publication date Mar 28, 2019
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY
- Publication number 20180329308
- Publication date Nov 15, 2018
- Carl Zeiss SMT GMBH
- Christoph Nottbohm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT, IN PARTICULAR IN A MI...
- Publication number 20140313498
- Publication date Oct 23, 2014
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20140111787
- Publication date Apr 24, 2014
- David R. Shafer
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT
- Publication number 20130293862
- Publication date Nov 7, 2013
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20130250268
- Publication date Sep 26, 2013
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20130242280
- Publication date Sep 19, 2013
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20120250147
- Publication date Oct 4, 2012
- David Shafer
- G02 - OPTICS
Information Patent Application
SYNTHESIZED SILICA GLASS FOR OPTICAL COMPONENT
- Publication number 20120182622
- Publication date Jul 19, 2012
- ASAHI GLASS COMPANY, LIMITED
- Masaaki TAKATA
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...
- Publication number 20110228246
- Publication date Sep 22, 2011
- Carl Zeiss SMT AG
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20110211252
- Publication date Sep 1, 2011
- David Shafer
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT
- Publication number 20110188019
- Publication date Aug 4, 2011
- Carl Zeiss SMT AG
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURIN...
- Publication number 20110109894
- Publication date May 12, 2011
- Carl Zeiss SMT GMBH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20100265572
- Publication date Oct 21, 2010
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM
- Publication number 20100231888
- Publication date Sep 16, 2010
- Carl Zeiss SMT AG
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
Optical system, exposure system, and exposure method
- Publication number 20100141921
- Publication date Jun 10, 2010
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Optical system,exposure system, and exposure method
- Publication number 20100141926
- Publication date Jun 10, 2010
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Optical system, exposure system, and exposure method
- Publication number 20100142051
- Publication date Jun 10, 2010
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20100026978
- Publication date Feb 4, 2010
- Carl Zeiss SMT AG
- Johannes Ruoff
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20100014153
- Publication date Jan 21, 2010
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
Illumination optical apparatus and projection exposure apparatus
- Publication number 20090284729
- Publication date Nov 19, 2009
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
Optical component quartz glass
- Publication number 20090239732
- Publication date Sep 24, 2009
- Heraeus Quarzglas GmbH & Co. KG
- Bodo Kuhn
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND...
- Publication number 20090225298
- Publication date Sep 10, 2009
- Canon Kabushiki Kaisha
- Takumi Tokimitsu
- G02 - OPTICS
Information Patent Application
HALIDE FREE GLASSES HAVING LOW OH, OD CONCENTRATIONS
- Publication number 20090203512
- Publication date Aug 13, 2009
- Richard Michael Fiacco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DESCRIBING A RETARDATION DISTRIBUTION IN A MICROLITHOGRA...
- Publication number 20090195876
- Publication date Aug 6, 2009
- Carl Zeiss SMT AG
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20090190208
- Publication date Jul 30, 2009
- Carl Zeiss SMT AG
- David Shafer
- G02 - OPTICS
Information Patent Application
Illumination optical apparatus and projection exposure apparatus
- Publication number 20090122292
- Publication date May 14, 2009
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
Structures and methods for reducing aberration in optical systems
- Publication number 20090103180
- Publication date Apr 23, 2009
- ASML NETHERLANDS B.V.
- James P. McGuire, JR.
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFA...
- Publication number 20090097134
- Publication date Apr 16, 2009
- Canon Kabushiki Kaisha
- Noboru Osaka
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE FABRICATI...
- Publication number 20090027781
- Publication date Jan 29, 2009
- Canon Kabushiki Kaisha
- Hiroyuki Yuuki
- G02 - OPTICS

Birefringence

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Hydroxide-catalysis bonding of optical components used in DUV optic...

Reflective optical element and optical system for EUV lithography h...

Illumination system of a microlithographic projection exposure appa...

Illumination optical apparatus and projection exposure apparatus

Optical system, in particular of a microlithographic projection exp...

Polarization-modulating optical element

Polarization-modulating optical element

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Polarization-influencing optical arrangement, in particular in a mi...

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Optical system of a microlithographic projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Immersion catadioptric projection objective having two intermediate...

Synthesized silica glass for optical component

Polarization-modulating optical element

Optical system, exposure system, and exposure method

Catadioptric projection objective

Optical system

Catadioptric projection objective

Optical system, exposure system, and exposure method

Lithographic apparatus and device manufacturing method

Optical system, exposure system, and exposure method

Halide free glasses having low OH, OD concentrations

Polarization-modulating optical element and method for manufacturin...

Catadioptric projection objective

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

POLARIZATION-MODULATING OPTICAL ELEMENT

REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY

POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT, IN PARTICULAR IN A MI...

CATADIOPTRIC PROJECTION OBJECTIVE

POLARIZATION-MODULATING OPTICAL ELEMENT

ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS

ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS

CATADIOPTRIC PROJECTION OBJECTIVE

SYNTHESIZED SILICA GLASS FOR OPTICAL COMPONENT

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...

CATADIOPTRIC PROJECTION OBJECTIVE

POLARIZATION-MODULATING OPTICAL ELEMENT

POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURIN...

CATADIOPTRIC PROJECTION OBJECTIVE

OPTICAL SYSTEM

Optical system, exposure system, and exposure method

Optical system,exposure system, and exposure method

Optical system, exposure system, and exposure method

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

CATADIOPTRIC PROJECTION OBJECTIVE

Illumination optical apparatus and projection exposure apparatus

Optical component quartz glass

OPTICAL ELEMENT, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND...

HALIDE FREE GLASSES HAVING LOW OH, OD CONCENTRATIONS

METHOD FOR DESCRIBING A RETARDATION DISTRIBUTION IN A MICROLITHOGRA...

CATADIOPTRIC PROJECTION OBJECTIVE

Illumination optical apparatus and projection exposure apparatus

Structures and methods for reducing aberration in optical systems

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFA...

PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE FABRICATI...