by discharge lamps

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CPC
G03F7/70016

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70016by discharge lamps

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist-free deposition and patterning with vacuum ultraviolet...
- Patent number 12,174,544
- Issue date Dec 24, 2024
- The Board of Trustees of the University of Illinois
- J. Gary Eden
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light source apparatus, exposure apparatus, and article manufacturi...
- Patent number 12,066,759
- Issue date Aug 20, 2024
- Canon Kabushiki Kaisha
- Hiroyuki Tomita
- F21 - LIGHTING
Information Patent Grant
Lamp, light source device, exposure apparatus, and article manufact...
- Patent number 11,586,117
- Issue date Feb 21, 2023
- Canon Kabushiki Kaisha
- Hiroyuki Tomita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle source module
- Patent number 11,557,455
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Laura Dinu-Gurtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lamp device, exposure apparatus, and method of manufacturing article
- Patent number 11,521,845
- Issue date Dec 6, 2022
- Canon Kabushiki Kaisha
- Hideki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 11,402,758
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Keiichi Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and article manufacturing method
- Patent number 11,335,548
- Issue date May 17, 2022
- Canon Kabushiki Kaisha
- Kohei Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multibeamlet charged particle device and method
- Patent number 11,309,163
- Issue date Apr 19, 2022
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure equipment and exposure method
- Patent number 11,119,412
- Issue date Sep 14, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Jun Qian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming light-transmissive member, method for producing...
- Patent number 10,978,625
- Issue date Apr 13, 2021
- Nichia Corporation
- Naoki Musashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection lens, projection exposure apparatus and projection expos...
- Patent number 10,969,694
- Issue date Apr 6, 2021
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to improve adhesion of photoresist on silicon substrate for...
- Patent number 10,964,541
- Issue date Mar 30, 2021
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam device
- Patent number 10,854,424
- Issue date Dec 1, 2020
- Kabushiki Kaisha Toshiba
- Hideto Furuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure device
- Patent number 10,824,077
- Issue date Nov 3, 2020
- Advantest Corporation
- Youichi Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-configuration digital lithography system
- Patent number 10,459,341
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Chien-Hua Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source, lighting device and method of lighting the same
- Patent number 10,438,789
- Issue date Oct 8, 2019
- Phoenix Electric Co., Ltd.
- Tomihiko Ikeda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Exposure apparatus and prevention method and system for image offse...
- Patent number 10,359,709
- Issue date Jul 23, 2019
- HKC CORPORATION LIMITED
- Chun-bin Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to improve adhesion of photoresist on silicon substrate for...
- Patent number 10,096,477
- Issue date Oct 9, 2018
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrodeless single low power CW laser driven plasma lamp
- Patent number 10,057,973
- Issue date Aug 21, 2018
- Excelitas Technologies Corp.
- Rudi Blondia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cooling apparatus, illumination optical system, exposure apparatus,...
- Patent number 9,966,245
- Issue date May 8, 2018
- Canon Kabushiki Kaisha
- Kentaro Hiruma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, and method of manu...
- Patent number 9,946,056
- Issue date Apr 17, 2018
- Canon Kabushiki Kaisha
- Hiromi Suda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source, metrology apparatus, lithographic system and devi...
- Patent number 9,913,357
- Issue date Mar 6, 2018
- ASML Netherlands B.V.
- Martijn Petrus Christianus Van Heumen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photon source, metrology apparatus, lithographic system and device...
- Patent number 9,814,126
- Issue date Nov 7, 2017
- ASML Netherlands B.V.
- Martijn Petrus Christianus Van Heumen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrodeless single CW laser driven xenon lamp
- Patent number 9,576,785
- Issue date Feb 21, 2017
- Excelitas Technologies Corp.
- Rudi Blondia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas refraction compensation for laser-sustained plasma bulbs
- Patent number 9,232,622
- Issue date Jan 5, 2016
- KLA-Tencor Corporation
- Ilya Bezel
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Discharge lamp, light source apparatus, exposure apparatus, and exp...
- Patent number 8,704,431
- Issue date Apr 22, 2014
- Nikon Corporation
- Hiroshi Shirasu
- F21 - LIGHTING
Information Patent Grant
Discharge lamp, light source apparatus, exposure apparatus, and exp...
- Patent number 8,531,093
- Issue date Sep 10, 2013
- Nikon Corporation
- Hiroshi Shirasu
- F21 - LIGHTING

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...
- Publication number 20240402610
- Publication date Dec 5, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EDGE EXPOSURE APPARATUS, METHOD OF MAKING AND USING THE SAME
- Publication number 20230418164
- Publication date Dec 28, 2023
- Merritt Conner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE SOURCE MODULE
- Publication number 20230154719
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Laura DINU-GURTLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230056463
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST-FREE DEPOSITION AND PATTERNING WITH VACUUM ULTRAVIOLET...
- Publication number 20220221799
- Publication date Jul 14, 2022
- The Board of Tristees of th University of Illinois
- J. Gary Eden
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURI...
- Publication number 20220107485
- Publication date Apr 7, 2022
- Canon Kabushiki Kaisha
- Hiroyuki Tomita
- F21 - LIGHTING
Information Patent Application
MULTIBEAMLET CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20210142976
- Publication date May 13, 2021
- Applied Materials, Inc.
- Mehdi VAEZ-IRAVANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAMP DEVICE, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20210082682
- Publication date Mar 18, 2021
- Canon Kabushiki Kaisha
- Hideki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20210063882
- Publication date Mar 4, 2021
- TOKYO ELECTRON LIMITED
- Keiichi TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE EQUIPMENT AND EXPOSURE METHOD
- Publication number 20210011388
- Publication date Jan 14, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Jun QIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-ELECTRON BEAM DEVICE
- Publication number 20200279717
- Publication date Sep 3, 2020
- Kabushiki Kaisha Toshiba
- Hideto FURUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIRROR FOR EXTREME ULTRAVIOLET LIGHT AND EXTREME ULTRAVIOLET LIGHT...
- Publication number 20200209759
- Publication date Jul 2, 2020
- Gigaphoton Inc.
- Osamu WAKABAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20200135428
- Publication date Apr 30, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20200064743
- Publication date Feb 27, 2020
- Advantest Corporation
- Youichi SHIMIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE SOURCE MODULE
- Publication number 20200043693
- Publication date Feb 6, 2020
- ASML NETHERLANDS B.V.
- Laura DINU-GURTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOS...
- Publication number 20200026199
- Publication date Jan 23, 2020
- Carl Zeiss SMT GMBH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING LIGHT-TRANSMISSIVE MEMBER, METHOD FOR PRODUCING...
- Publication number 20190363226
- Publication date Nov 28, 2019
- Nichia Corporation.
- Naoki Musashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CONFIGURATION DIGITAL LITHOGRAPHY SYSTEM
- Publication number 20190235389
- Publication date Aug 1, 2019
- Applied Materials, Inc.
- Chien-Hua Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE, LIGHTING DEVICE AND METHOD OF LIGHTING THE SAME
- Publication number 20190080898
- Publication date Mar 14, 2019
- Phoenix Electric Co., Ltd.
- Tomihiko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND PREVENTION METHOD AND SYSTEM FOR IMAGE OFFSE...
- Publication number 20190064681
- Publication date Feb 28, 2019
- HKC Corporation Limited
- Chun-bin WEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20180337048
- Publication date Nov 22, 2018
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20180233362
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20180233363
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-Beam Lithography Method and System
- Publication number 20180149980
- Publication date May 31, 2018
- National Taiwan University
- Chieh-Hsiung KUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS REFRACTION COMPENSATION FOR LASER-SUSTAINED PLASMA BULBS
- Publication number 20140367592
- Publication date Dec 18, 2014
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHARGE LAMP, LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND EXP...
- Publication number 20120248960
- Publication date Oct 4, 2012
- NIKON CORPORATION
- Hiroshi SHIRASU
- F21 - LIGHTING
Information Patent Application
Lighting method of light source apparatus
- Publication number 20100225232
- Publication date Sep 9, 2010
- Ushio Denki Kabushiki Kaisha
- Taku Sumitomo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE
- Publication number 20100165656
- Publication date Jul 1, 2010
- Ushio Denki Kabushiki Kaisha
- Yukio YASUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Discharge lamp, light source apparatus, exposure apparatus, and exp...
- Publication number 20080218049
- Publication date Sep 11, 2008
- Hiroshi Shirasu
- F21 - LIGHTING
Information Patent Application
Light source apparatus
- Publication number 20080180644
- Publication date Jul 31, 2008
- Hamamatsu Photonics K.K.
- Ryotaro Matui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

by discharge lamps

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoresist-free deposition and patterning with vacuum ultraviolet...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Light source apparatus, exposure apparatus, and article manufacturi...

Lamp, light source device, exposure apparatus, and article manufact...

Charged particle source module

Multi-charged particle beam writing apparatus, and multi-charged pa...

Lamp device, exposure apparatus, and method of manufacturing article

Multi-charged particle beam writing apparatus, and multi-charged pa...

Substrate processing apparatus, substrate processing method, and st...

Exposure apparatus and article manufacturing method

Multibeamlet charged particle device and method

Exposure equipment and exposure method

Method for forming light-transmissive member, method for producing...

Projection lens, projection exposure apparatus and projection expos...

Method to improve adhesion of photoresist on silicon substrate for...

Multi-electron beam device

Exposure device

Multi-configuration digital lithography system

Light source, lighting device and method of lighting the same

Exposure apparatus and prevention method and system for image offse...

Method to improve adhesion of photoresist on silicon substrate for...

Electrodeless single low power CW laser driven plasma lamp

Cooling apparatus, illumination optical system, exposure apparatus,...

Illumination optical system, exposure apparatus, and method of manu...

Radiation source, metrology apparatus, lithographic system and devi...

Photon source, metrology apparatus, lithographic system and device...

Electrodeless single CW laser driven xenon lamp

Gas refraction compensation for laser-sustained plasma bulbs

Discharge lamp, light source apparatus, exposure apparatus, and exp...

Discharge lamp, light source apparatus, exposure apparatus, and exp...

Patents Applicationslast 30 patents

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...

EDGE EXPOSURE APPARATUS, METHOD OF MAKING AND USING THE SAME

CHARGED PARTICLE SOURCE MODULE

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

PHOTORESIST-FREE DEPOSITION AND PATTERNING WITH VACUUM ULTRAVIOLET...

LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURI...

MULTIBEAMLET CHARGED PARTICLE DEVICE AND METHOD

LAMP DEVICE, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

EXPOSURE EQUIPMENT AND EXPOSURE METHOD

MULTI-ELECTRON BEAM DEVICE

MIRROR FOR EXTREME ULTRAVIOLET LIGHT AND EXTREME ULTRAVIOLET LIGHT...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

EXPOSURE DEVICE

CHARGED PARTICLE SOURCE MODULE

PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOS...

METHOD FOR FORMING LIGHT-TRANSMISSIVE MEMBER, METHOD FOR PRODUCING...

MULTI-CONFIGURATION DIGITAL LITHOGRAPHY SYSTEM

LIGHT SOURCE, LIGHTING DEVICE AND METHOD OF LIGHTING THE SAME

EXPOSURE APPARATUS AND PREVENTION METHOD AND SYSTEM FOR IMAGE OFFSE...

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

Electron-Beam Lithography Method and System

GAS REFRACTION COMPENSATION FOR LASER-SUSTAINED PLASMA BULBS

DISCHARGE LAMP, LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND EXP...

Lighting method of light source apparatus

LIGHT SOURCE

Discharge lamp, light source apparatus, exposure apparatus, and exp...

Light source apparatus