Capillary or channel elements

Industry

CPC
G03F7/70166

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70166Capillary or channel elements

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Mirror for an illumination optical unit of a projection exposure ap...
- Patent number 12,111,578
- Issue date Oct 8, 2024
- Carl Zeiss SMT GmbH
- Christof Jalics
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 12,055,865
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-brightness laser produced plasma source and method of generati...
- Patent number 12,028,958
- Issue date Jul 2, 2024
- Isteq B.V.
- Samir Ellwi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Task completion in a tracking device environment
- Patent number 11,968,321
- Issue date Apr 23, 2024
- Tile, Inc.
- Felipe Knorr Kuhn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical objective for operation in EUV spectral region
- Patent number 11,934,105
- Issue date Mar 19, 2024
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Optical objective for operation in EUV spectral region
- Patent number 11,899,371
- Issue date Feb 13, 2024
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 11,768,437
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for generating extreme ultraviolet light and lithography...
- Patent number 11,720,027
- Issue date Aug 8, 2023
- Samsung Electronics Co., Ltd.
- Injae Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Task completion in a tracking device environment
- Patent number 11,683,410
- Issue date Jun 20, 2023
- Tile, Inc.
- Felipe Knorr Kuhn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tunable illuminator for lithography systems
- Patent number 11,543,753
- Issue date Jan 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ken-Hsien Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal controlling method in lithography system
- Patent number 11,506,986
- Issue date Nov 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi Yang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 11,392,040
- Issue date Jul 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Task completion in a tracking device environment
- Patent number 11,316,970
- Issue date Apr 26, 2022
- Tile, Inc.
- Felipe Knorr Kuhn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Extreme ultraviolet light source systems
- Patent number 11,304,287
- Issue date Apr 12, 2022
- Samsung Electronics Co., Ltd.
- Sunghyup Kim
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Reflective optical element for EUV lithography and method for adapt...
- Patent number 11,199,780
- Issue date Dec 14, 2021
- Carl Zeiss SMT GmbH
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical diffraction component for suppressing at least one target w...
- Patent number 11,194,256
- Issue date Dec 7, 2021
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Method, measuring system and lithography apparatus
- Patent number 11,163,239
- Issue date Nov 2, 2021
- Carl Zeiss SMT GmbH
- Frank Treubel
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet chamber apparatus, extreme ultraviolet light ge...
- Patent number 11,145,429
- Issue date Oct 12, 2021
- Gigaphoton Inc.
- Atsushi Ueda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV vessel inspection method and related system
- Patent number 11,092,555
- Issue date Aug 17, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Lin Louis Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 11,086,237
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light generation device and electronic device m...
- Patent number 11,042,102
- Issue date Jun 22, 2021
- Gigaphoton Inc.
- Shinji Nagai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Extreme ultraviolet light generation apparatus and maintenance method
- Patent number 11,036,150
- Issue date Jun 15, 2021
- Gigaphoton Inc.
- Katsuhiko Wakana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System, method and apparatus for target material debris cleaning of...
- Patent number 11,013,096
- Issue date May 18, 2021
- ASML Nettherlands B.V.
- Jonghoon Baek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical diffraction component for suppressing at least one target w...
- Patent number 10,852,640
- Issue date Dec 1, 2020
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
EUV vessel inspection method and related system
- Patent number 10,718,718
- Issue date Jul 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target supply apparatus
- Patent number 10,555,409
- Issue date Feb 4, 2020
- Gigaphoton Inc.
- Masaki Nakano
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
EUV vessel inspection method and related system
- Patent number 10,429,314
- Issue date Oct 1, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis Chang
- G01 - MEASURING TESTING
Information Patent Grant
Lithography apparatus
- Patent number 10,338,477
- Issue date Jul 2, 2019
- Samsung Electronics Co., Ltd.
- Do Hyung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20240353766
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLLOW-CORE OPTICAL FIBER BASED RADIATION SOURCE
- Publication number 20240152024
- Publication date May 9, 2024
- ASML NETHERLANDS B.V.
- Willem Richard PONGERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING
- Publication number 20240077803
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Laurentius Johannes Adrianus VAN BOKHOVEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATI...
- Publication number 20230375939
- Publication date Nov 23, 2023
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAP...
- Publication number 20230367225
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230305290
- Publication date Sep 28, 2023
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
WELDING METHOD FOR CREATING AN UPSCALED MASTER
- Publication number 20230280649
- Publication date Sep 7, 2023
- Morphotonics Holding B.V.
- Leon Willem VELDHUIZEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TASK COMPLETION IN A TRACKING DEVICE ENVIRONMENT
- Publication number 20230275987
- Publication date Aug 31, 2023
- Tile, Inc.
- Felipe Knorr Kuhn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, METHOD OF MANUF...
- Publication number 20230244138
- Publication date Aug 3, 2023
- Mitsui Chemicals, Inc.
- Yousuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...
- Publication number 20230161262
- Publication date May 25, 2023
- Gigaphoton Inc.
- Gouta NIIMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV COLLECTOR
- Publication number 20230146235
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR SYSTEM INSPECTION TOOL AND METHODS OF OPERATION
- Publication number 20220408538
- Publication date Dec 22, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jou-Hsuan LU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIATION CONDUIT
- Publication number 20220390852
- Publication date Dec 8, 2022
- ASML NETHERLANDS B.V.
- Remco Johannes Elisa HEIJMANS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAP...
- Publication number 20220350257
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TASK COMPLETION IN A TRACKING DEVICE ENVIRONMENT
- Publication number 20220217231
- Publication date Jul 7, 2022
- Tile, Inc.
- Felipe Knorr Kuhn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME
- Publication number 20220187516
- Publication date Jun 16, 2022
- Carl Zeiss SMT GMBH
- Alexandra PAZIDIS
- G02 - OPTICS
Information Patent Application
HIGH-BRIGHTNESS LASER PRODUCED PLASMA SOURCE AND METHOD OF GENERATI...
- Publication number 20220132647
- Publication date Apr 28, 2022
- Isteq B.V.
- Samir ELLWI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEMS
- Publication number 20220104336
- Publication date Mar 31, 2022
- Samsung Electronics Co., Ltd.
- SUNGHYUP KIM
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR GENERATING EXTREME ULTRAVIOLET LIGHT AND LITHOGRAPHY...
- Publication number 20220082946
- Publication date Mar 17, 2022
- Samsung Electronics Co., Ltd.
- Injae Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20210364934
- Publication date Nov 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAP...
- Publication number 20210349396
- Publication date Nov 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMAL CONTROLLING METHOD IN LITHOGRAPHY SYSTEM
- Publication number 20210318625
- Publication date Oct 14, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...
- Publication number 20210318622
- Publication date Oct 14, 2021
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE AP...
- Publication number 20210263423
- Publication date Aug 26, 2021
- Carl Zeiss SMT GMBH
- Christof Jalics
- G02 - OPTICS
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20210033983
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL METHOD AND APPARATUS FOR FABRICATION OF VERY LARGE SCALE INTE...
- Publication number 20210026234
- Publication date Jan 28, 2021
- Intel Corporation
- John MAGANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Capillary or channel elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mirror for an illumination optical unit of a projection exposure ap...

Extreme ultraviolet lithography system

High-brightness laser produced plasma source and method of generati...

Task completion in a tracking device environment

Optical objective for operation in EUV spectral region

Optical objective for operation in EUV spectral region

Prolonging optical element lifetime in an EUV lithography system

System and method for performing extreme ultraviolet photolithograp...

Apparatus for generating extreme ultraviolet light and lithography...

Task completion in a tracking device environment

Tunable illuminator for lithography systems

Thermal controlling method in lithography system

System and method for performing extreme ultraviolet photolithograp...

Prolonging optical element lifetime in an EUV lithography system

Task completion in a tracking device environment

Extreme ultraviolet light source systems

Reflective optical element for EUV lithography and method for adapt...

Optical diffraction component for suppressing at least one target w...

Method, measuring system and lithography apparatus

Extreme ultraviolet chamber apparatus, extreme ultraviolet light ge...

EUV vessel inspection method and related system

Extreme ultraviolet lithography system

Extreme ultraviolet light generation device and electronic device m...

Extreme ultraviolet light generation apparatus and maintenance method

System, method and apparatus for target material debris cleaning of...

Optical diffraction component for suppressing at least one target w...

EUV vessel inspection method and related system

Target supply apparatus

EUV vessel inspection method and related system

Lithography apparatus

Patents Applicationslast 30 patents

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

HOLLOW-CORE OPTICAL FIBER BASED RADIATION SOURCE

MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING

METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATI...

SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAP...

MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM

WELDING METHOD FOR CREATING AN UPSCALED MASTER

TASK COMPLETION IN A TRACKING DEVICE ENVIRONMENT

PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, METHOD OF MANUF...

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...

EUV COLLECTOR

SEMICONDUCTOR SYSTEM INSPECTION TOOL AND METHODS OF OPERATION

RADIATION CONDUIT

SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAP...

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

TASK COMPLETION IN A TRACKING DEVICE ENVIRONMENT

MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME

HIGH-BRIGHTNESS LASER PRODUCED PLASMA SOURCE AND METHOD OF GENERATI...

EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEMS

APPARATUS FOR GENERATING EXTREME ULTRAVIOLET LIGHT AND LITHOGRAPHY...

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAP...

THERMAL CONTROLLING METHOD IN LITHOGRAPHY SYSTEM

OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...

MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE AP...

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

NOVEL METHOD AND APPARATUS FOR FABRICATION OF VERY LARGE SCALE INTE...