characterised by the non-macromolecular additives

Industry

CPC
G03F7/0226

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0226characterised by the non-macromolecular additives

Industries

Patents Grantslast 30 patents

Information Patent Grant
Resin, positive photosensitive resin composition and use
- Patent number 11,886,115
- Issue date Jan 30, 2024
- YANTAI SUNERA LLC
- Zhiguo Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesion promoter and photosensitive resin composition containing same
- Patent number 11,886,117
- Issue date Jan 30, 2024
- SHANDONG SHENGQUAN NEW MATERIALS CO LTD.
- Diyuan Tang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photosensitive siloxane composition and cured film fo...
- Patent number 11,860,537
- Issue date Jan 2, 2024
- Merck Patent GmbH
- Naofumi Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, resin sheet, cured film, organic...
- Patent number 11,852,973
- Issue date Dec 26, 2023
- Toray Industries, Inc.
- Yusuke Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
DNQ-type photoresist composition including alkali-soluble acrylic r...
- Patent number 11,822,242
- Issue date Nov 21, 2023
- Merck Patent GmbH
- Weihong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive resin composition, cured film therefrom, an...
- Patent number 11,789,363
- Issue date Oct 17, 2023
- Toray Industries, Inc.
- Yoshinori Matoba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, method for preparing the same, and pattern...
- Patent number 11,762,290
- Issue date Sep 19, 2023
- Beijing Asahi Electronic Materials Co., Ltd
- Teng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, method for producing heat-resistant resin film,...
- Patent number 11,640,110
- Issue date May 2, 2023
- Toray Industries, Inc.
- Keika Hashimoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive-type photosensitive resin composition
- Patent number 11,592,743
- Issue date Feb 28, 2023
- HD MICROSYSTEMS, LTD.
- Tadamitsu Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,572,430
- Issue date Feb 7, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, polyimide resin and method of producing the same, photose...
- Patent number 11,572,442
- Issue date Feb 7, 2023
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-type photosensitive resin composition and cured film prepa...
- Patent number 11,573,490
- Issue date Feb 7, 2023
- Rohm and Haas Electronic Materials Korea Ltd.
- Ji Ung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition, via-forming method, display subst...
- Patent number 11,526,077
- Issue date Dec 13, 2022
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Wei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive-type photosensitive resin composition and cured film prepa...
- Patent number 11,487,200
- Issue date Nov 1, 2022
- Rohm and Haas Electronic Materials Korea Ltd.
- Jung-Hwa Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type photosensitive siloxane composition and cured film fo...
- Patent number 11,392,032
- Issue date Jul 19, 2022
- Merck Patent GmbH
- Naofumi Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition
- Patent number 11,347,146
- Issue date May 31, 2022
- Toray Industries, Inc.
- Yuki Masuda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer, photosensitive resin composition, patterning method, metho...
- Patent number 11,333,975
- Issue date May 17, 2022
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,243,467
- Issue date Feb 8, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin composition
- Patent number 11,199,776
- Issue date Dec 14, 2021
- Toray Industries, Inc.
- Yusuke Komori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive resin composition and cured film prepared therefrom
- Patent number 11,137,682
- Issue date Oct 5, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Kahee Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, patterned cured film pro...
- Patent number 11,048,167
- Issue date Jun 29, 2021
- HD MICROSYSTEMS, LTD.
- Daisaku Matsukawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive polyimide composition and photoresist film made thereof
- Patent number 11,029,598
- Issue date Jun 8, 2021
- ECHEM SOLUTIONS CORP.
- Tz Jin Yang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, cured product of same, interlayer...
- Patent number 11,021,572
- Issue date Jun 1, 2021
- HD MICROSYSTEMS, LTD.
- Ayaka Azuma
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and cured film prepared therefrom
- Patent number 10,942,449
- Issue date Mar 9, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Yeonok Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions, color filter and microlens derived the...
- Patent number 10,915,019
- Issue date Feb 9, 2021
- PROMERUS, LLC
- Pramod F Kandanarachch
- G02 - OPTICS
Information Patent Grant
Cured film and method for producing same
- Patent number 10,908,500
- Issue date Feb 2, 2021
- Toray Industries, Inc.
- Yu Shoji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Cured film and positive photosensitive resin composition
- Patent number 10,895,807
- Issue date Jan 19, 2021
- Toray Industries, Inc.
- Yuta Shuto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and cured film prepared therefrom
- Patent number 10,890,846
- Issue date Jan 12, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Jong-Ho Na
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, method for manufacturing cured re...
- Patent number 10,831,101
- Issue date Nov 10, 2020
- Asahi Kasei Kabushiki Kaisha
- Tomohiro Yorisue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 10,816,898
- Issue date Oct 27, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
- Publication number 20240329525
- Publication date Oct 3, 2024
- Asahi Kasei Kabushiki Kaisha
- Tomohiro YORISUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
XANTHENE COMPOUND, RESIN COMPOSITION, CURED OBJECT, METHOD FOR PROD...
- Publication number 20240248396
- Publication date Jul 25, 2024
- TORAY INDUSTRIES, INC.
- Yusuke KOMORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
- Publication number 20240210827
- Publication date Jun 27, 2024
- Asahi Kasei Kabushiki Kaisha
- Tomohiro YORISUE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTORESIST COMPOSITION FOR EXTREME ULTRAVIOLET, AND METHOD OF MANU...
- Publication number 20240168381
- Publication date May 23, 2024
- Samsung Electronics Co., Ltd.
- Jincheol PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDE PRECURSOR RESIN COMPOSITION AND METHOD FOR MANUFACTURING...
- Publication number 20240101761
- Publication date Mar 28, 2024
- Asahi Kasei Kabushiki Kaisha
- Kohei MURAKAMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADHESION PROMOTER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME
- Publication number 20220373887
- Publication date Nov 24, 2022
- SHANDONG SHENGQUAN NEW MATERIALS CO LTD.
- Diyuan TANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND DISPLAY DEVICE
- Publication number 20220350244
- Publication date Nov 3, 2022
- TORAY INDUSTRIES, INC.
- Hideyuki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIALS
- Publication number 20220342308
- Publication date Oct 27, 2022
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST
- Publication number 20210382390
- Publication date Dec 9, 2021
- Merck Patent GmbH
- Medhat A. Toukhy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...
- Publication number 20200409261
- Publication date Dec 31, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
- Publication number 20200409263
- Publication date Dec 31, 2020
- Asahi Kasei Kabushiki Kaisha
- Tomohiro YORISUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFIC...
- Publication number 20200247739
- Publication date Aug 6, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Yasushi MIKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE SILOXANE COMPOSITION
- Publication number 20200201179
- Publication date Jun 25, 2020
- MERCK PERFORMANCE MATERIALS MANUFACTURING G.K.
- MEGUMI TAKAHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM,...
- Publication number 20200192227
- Publication date Jun 18, 2020
- TORAY INDUSTRIES, INC.
- Keika HASHIMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20200117088
- Publication date Apr 16, 2020
- Rohm and Haas Electronic Materials Korea Ltd.
- Kahee Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FO...
- Publication number 20200073241
- Publication date Mar 5, 2020
- Merck Patent GmbH
- Naofumi YOSHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...
- Publication number 20190369493
- Publication date Dec 5, 2019
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Jung-Hwa LEE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20190278176
- Publication date Sep 12, 2019
- Samsung SDI Co., Ltd.
- Taek-Jin BAEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20190163062
- Publication date May 30, 2019
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Jong-Ho NA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
- Publication number 20190113845
- Publication date Apr 18, 2019
- Asahi Kasei Kabushiki Kaisha
- Tomohiro YORISUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTO-IMAGEABLE THIN FILMS WITH HIGH DIELECTRIC STRENGTH
- Publication number 20190056661
- Publication date Feb 21, 2019
- DOW GLOBAL TECHNOLOGIES LLC
- Caroline Woelfle-Gupta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING MEMS DEVICES USING MULTIPLE PHOTOACID GENE...
- Publication number 20190056659
- Publication date Feb 21, 2019
- Funai Electric Co., Ltd.
- Christopher A. CRAFT
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD FOR MANUFACTURING MEMS DEVICES AND NANO DEVICES WITH VARYING...
- Publication number 20190056660
- Publication date Feb 21, 2019
- Funai Electric Co., Ltd.
- David L. BERNARD
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
CURED FILM AND METHOD FOR PRODUCING SAME
- Publication number 20190004423
- Publication date Jan 3, 2019
- TORAY INDUSTRIES, INC.
- Yu SHOJI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CURED FILM AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20180356727
- Publication date Dec 13, 2018
- TORAY INDUSTRIES, INC.
- Yuta SHUTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20180314153
- Publication date Nov 1, 2018
- Rohm and Haas Electronic Materials Korea Ltd.
- Jong-Ho Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERNED CURED FILM, PHOTOSENSITIVE COMPOSITION...
- Publication number 20180259850
- Publication date Sep 13, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko IRIE
- B82 - NANO-TECHNOLOGY
Information Patent Application
NOVEL COMPOUND AND METHOD FOR PRODUCING SAME
- Publication number 20180201570
- Publication date Jul 19, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20180095365
- Publication date Apr 5, 2018
- Rohm and Haas Electronic Materials Korea Ltd.
- Yeonok Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20180074404
- Publication date Mar 15, 2018
- Masatoshi ECHIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

characterised by the non-macromolecular additives

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resin, positive photosensitive resin composition and use

Adhesion promoter and photosensitive resin composition containing same

Positive type photosensitive siloxane composition and cured film fo...

Photosensitive resin composition, resin sheet, cured film, organic...

DNQ-type photoresist composition including alkali-soluble acrylic r...

Positive photosensitive resin composition, cured film therefrom, an...

Photoresist composition, method for preparing the same, and pattern...

Resin composition, method for producing heat-resistant resin film,...

Positive-type photosensitive resin composition

Compound, resin, resist composition or radiation-sensitive composit...

Compound, polyimide resin and method of producing the same, photose...

Positive-type photosensitive resin composition and cured film prepa...

Positive photoresist composition, via-forming method, display subst...

Positive-type photosensitive resin composition and cured film prepa...

Positive type photosensitive siloxane composition and cured film fo...

Resin composition

Polymer, photosensitive resin composition, patterning method, metho...

Compound, resin, resist composition or radiation-sensitive composit...

Resin composition

Photosensitive resin composition and cured film prepared therefrom

Positive photosensitive resin composition, patterned cured film pro...

Photosensitive polyimide composition and photoresist film made thereof

Photosensitive resin composition, cured product of same, interlayer...

Photosensitive resin composition and cured film prepared therefrom

Photosensitive compositions, color filter and microlens derived the...

Cured film and method for producing same

Cured film and positive photosensitive resin composition

Photosensitive resin composition and cured film prepared therefrom

Photosensitive resin composition, method for manufacturing cured re...

Compound, resin, resist composition or radiation-sensitive composit...

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...

XANTHENE COMPOUND, RESIN COMPOSITION, CURED OBJECT, METHOD FOR PROD...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...

PHOTORESIST COMPOSITION FOR EXTREME ULTRAVIOLET, AND METHOD OF MANU...

POLYIMIDE PRECURSOR RESIN COMPOSITION AND METHOD FOR MANUFACTURING...

ADHESION PROMOTER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND DISPLAY DEVICE

POSITIVE WORKING PHOTOSENSITIVE MATERIALS

NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST

COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...

COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFIC...

PHOTOSENSITIVE SILOXANE COMPOSITION

RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM,...

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FO...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...

PHOTO-IMAGEABLE THIN FILMS WITH HIGH DIELECTRIC STRENGTH

METHOD FOR MANUFACTURING MEMS DEVICES USING MULTIPLE PHOTOACID GENE...

METHOD FOR MANUFACTURING MEMS DEVICES AND NANO DEVICES WITH VARYING...

CURED FILM AND METHOD FOR PRODUCING SAME

CURED FILM AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

METHOD FOR FORMING PATTERNED CURED FILM, PHOTOSENSITIVE COMPOSITION...

NOVEL COMPOUND AND METHOD FOR PRODUCING SAME

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN