Patent Application
20190056659
The disclosure relates to MEMS and nano devices, and in particular to improved methods for making three-dimensional photoimaged structures from a composite photoresist film containing multiple photoacid generators.
Micro-electromechanical systems (“MEMS”) and nano-devices typically include three-dimensional (“3D”) structures made from photoimaged materials. Examples of MEMS and nano-devices, include, but are not limited to fluid ejection heads, micro-filters, micro-separators, micro-sieves and other micro and nano scale fluid handling structures. Such structures may handle a wide variety of fluids. For example, fluid ejection heads are 3D nano devices that are useful for ejecting a variety of fluids including inks, cooling fluids, pharmaceuticals, lubricants and the like. A widely used fluid ejection head is in an ink jet printer. However, fluid ejection heads may also be used in vaporization devices for vapor therapy, E-cigarettes and the like. New techniques are constantly being developed to provide low cost, highly reliable fluid ejection heads for such devices.
The fluid ejection head is a seemingly simple device that has a relatively complicated structure containing electrical circuits, ink passageways and a variety of tiny parts assembled with precision to provide a powerful, yet versatile fluid ejection head. The components of the ejection head must cooperate with each other and be useful for a variety of fluids and fluid formulations. Accordingly, it is important to match the ejection head components to the fluid being ejected. Slight variations in production quality can have a tremendous influence on the product yield and resulting ejection head performance.
The primary components of a fluid ejection head are a semiconductor substrate, a flow feature layer, a nozzle plate layer, and a flexible circuit attached to the substrate. The semiconductor substrate is preferably made of silicon and contains various passivation layers, conductive metal layers, resistive layers, insulative layers and protective layers deposited on a device surface thereof. Fluid ejection actuators formed on a device surface of the substrate may be thermal actuators or piezoelectric actuators. For thermal actuators, individual heater resistors are defined in the resistive layers and each heater resistor corresponds to a nozzle hole in the nozzle plate for heating and ejecting fluid from the ejection head toward a desired substrate or target.
Current methods used to make the fluid flow layer and nozzle plate layer involve the use the combination of spin on photoresist or dry film photoresist with multiple image, develop, and bake steps for each layer. For example, in a conventional process, a first adhesion promotion layer is applied to a semiconductor substrate, a fluid flow layer of photoimageable material is spin coated onto the adhesion layer. The fluid flow layer is a negative photo resist layer that is imaged, cured, and developed. A second adhesion promotion layer is applied to the fluid flow layer before applying a nozzle layer. Next the photoimageable layer nozzle layer is laminated as a dry film to the fluid flow layer by means of the secondary adhesion promotion layer. The nozzle layer is imaged, cured and developed. The semiconductor substrate is then deep reactive ion etched (DRIE) to form vias through the substrate. Since the fluid flow layer and nozzle layer are already attached to the substrate, the process latitude for the DRIE process is limited.
In an alternative process, the semiconductor substrate is first etched to form vias using the DRIE process before or after an adhesion promotion layer is applied to the substrate. Then the fluid flow layer and nozzle layer are applied to the substrate as dry films that are each imaged and developed. Each dry film requires a separate adhesion promotion layer. There is a risk of adhesion loss between layers with the application of each additional adhesion promotion layer.
In a variation of the alternative process, the DRIE process is conducted after the fluid flow layer is applied to the substrate and is imaged and developed. Subsequent to the DRIE process, the nozzle layer is laminated to the fluid flow layer and is imaged and developed.
Regardless of the process used, the use of multiple layers requiring multiple adhesion promotors increases the process time for making the fluid ejection heads and increases the risk of loss due to adhesion layer failure. Accordingly, what is needed is a simplified photoimageable process that reduces production time and the risk of adhesion layer failure.
The disclosure provides a three-dimensional (“3D”) structure for handling fluids, a fluid handling device containing the 3D structure, and a method of making the 3D structure. In one embodiment, there is provided a three-dimensional (“3D”) structure made from a composite photoresist material. The composite photoresist material includes: (a) a first layer having a first photoacid generator therein having at least a first radiation exposure wavelength and (b) at least a second layer having a second photoacid generator therein having a second radiation exposure wavelength that is different from the first radiation exposure wavelength, and wherein the composite photoresist material is devoid of an adhesion promotion layer between layers of the composite photoresist material.
In another embodiment, there is provided a method for making a three-dimensional (“3D”) structure from a composite photoresist film. The method includes the steps of: (1) applying a first layer of photoresist material to a carrier film, the first layer containing a first photoacid generator having at least a first radiation exposure wavelength; (2) drying the first layer to provide a dried first layer; (3) applying a second layer of photoresist material to the dried first layer, the second layer containing a second photoacid generator having a second radiation exposure wavelength that is different from the first radiation exposure wavelength; (4) drying the second layer to provide a composite photoresist material devoid of intermediate adhesion layer(s); (5) applying an adhesion layer to a substrate surface; (6) laminating the composite photoresist material to the adhesion layer; (7) exposing the composite photoresist material to a first radiation exposure wavelength selected from e-line, g-line, h-line, i-line, mid ultraviolet (UV), and deep UV radiation; (8) exposing the composite photoresist material to at least a second radiation exposure wavelength selected from e-line, g-line, h-line, i-line, mid ultraviolet (UV), and deep UV radiation; (9) simultaneously developing the composite photoresist material to provide the 3D structure.
Another embodiment of the disclosure provides a fluid ejection device having a fluid ejection head that includes a semiconductor substrate containing a plurality fluid ejection actuators on a device surface thereof and one or more fluid supply vias etched therethrough. An adhesion promotion layer is applied to the device surface of the semiconductor substrate. A composite photoresist material is applied to the adhesion promotion layer wherein the composite photoresist material contains (a) a first layer having a first photoacid generator therein having at least a first radiation exposure wavelength and (b) at least a second layer having a second photoacid generator therein having a second radiation exposure wavelength that is different from the first radiation exposure wavelength. The composite photoresist material is devoid of an adhesion promotion layer between layers of the composite photoresist material. A controller for activating the fluid ejection head is also provided.
In some embodiments, the composite photoresist material includes at least a third layer of photoresist material, wherein the third layer of photoresist material has a third photoacid generator therein having a third radiation exposure wavelength that is different from the first and second radiation exposure wavelengths.
In other embodiments, the third layer of photoresist material has the first photoacid generator therein having a third radiation exposure wavelength that is different from the first and second radiation exposure wavelengths.
In some embodiments, the composite photoresist material has a thickness ranging from about 6 to about 150 μm.
In some embodiments, the first radiation exposure wavelength may selected from e-line, g-line, h-line, i-line, mid ultraviolet (UV), or deep UV radiation and the second radiation exposure wavelength may be selected from e-line, g-line, K-line, i-line, mid UV, and deep UV radiation having a wavelength that is different from the first radiation exposure wavelength.
In some embodiments, the third or subsequent exposure radiation wavelengths are selected from e-line, g-line, h-line, i-line, mid UV, and deep UV radiation that have wavelengths that are different from the first and second radiation exposure wavelengths.
An advantage of the embodiments described herein is that the process steps for making 3D MEMS or nano devices are greatly simplified as described in more detail below and provides 3D MEMS or nano devices in higher yields due to a decrease in lamination adhesion failures.
Further features and advantages of the disclosed embodiments will become apparent by reference to the detailed description when considered in conjunction with the figures, which are not to scale, wherein like reference numbers indicate like elements through the several views, and wherein:
With regard to embodiments of the disclosure, various MEMS and nano devices may be made having the desired composite film structure. An example of such a device is a fluid ejection head. Accordingly, for simplification purposes, the description is directed specifically to fluid ejection heads. However, the embodiments described herein may be adapted for use in making a wide variety of 3D MEMS and nano devices as referenced above.
The primary differences between flow diagram 10 and flow diagram 50 is that in flow diagram 10, the DRIE process to form vias in the semiconductor substrate is conducted before any of the flow layers are applied to the substrate, whereas in diagram 50, the DRIE process is conducted after the fluid flow layer is applied to the substrate, exposed to radiation and developed. Since the semiconductor substrate does not already contain fluid vias, the fluid flow layer may can be spin-coated onto the substrate in step 52 rather than laminated to the adhesion layer. Otherwise, the process steps are similar to those described with reference to
A simplified process 60 according to an embodiment of the disclosure is shown in
A portion of an ejection head 100 made by the foregoing process is illustrated in
The semiconductor substrate 110 is relatively small in size and typically has overall dimensions ranging from about 2 to about 8 millimeters wide by about 10 to about 20 millimeters long and from about 0.4 to about 0.8 mm thick. In conventional semiconductor substrates 110, the fluid supply slots 116 are grit-blasted in the semiconductor substrates 110. Such slots 116 typically have dimensions of about 9.7 millimeters long and from about 50 to about 400 microns wide. Fluid may be provided to the fluid ejection actuators by a single one of the slots 116 or by a plurality of openings in the substrate 110 made by a dry etch process selected from reactive ion etching (RIE) or deep reactive ion etching (DRIE), inductively coupled plasma etching, and the like. The composite film layer 124 may be formed from one or more layers of negative photoresist material as described in more detail below. The composite film layer 124 may have a thickness ranging from about 6 to about 150 μm or more, such as from about 10 to about 80 μm.
The fluid supply slot 116 directs fluid from a fluid reservoir to which the ejection head 100 is attached through the fluid supply slot 116 to the device side 114 of the substrate 110 containing heater resistors 112. The device side 114 of the substrate 110 also preferably contains electrical tracing from the heater resistors 112 to contact pads used for connecting the substrate 110 to a flexible circuit or a tape automated bonding (TAB) circuit for supplying electrical impulses from a fluid ejection controller to activate one or more heater resistors 112 on the substrate 110.
With reference to
The composite film layer 200 may also contain a second layer 214 that is formulated to contain a second photoacid generator having a second radiation exposure wavelength that is different from the first radiation exposure wavelength. The second radiation exposure wavelength may be selected from e-line, g-line, h-line, i-line, mid UV, and deep UV radiation. In some embodiments, the second radiation exposure wavelength may be less than 350 nm. The second layer 214 may have a thickness ranging from about 3 to about 100 μm.
The wavelengths provided by the radiations sources that may be used according to embodiments of the disclosure are as follows:
e-line=546 nm
g-line=435 nm
h-line=405 nm
i-line=365 nm
mid UV=310 nm
deep UV=254 nm.
The photoresist materials that contain the photoacid generators may be formulated to include one or more of a multi-functional epoxy compound, a di-functional epoxy compound, a relatively high molecular weight polyhydroxy ether, an adhesion enhancer, and an aliphatic ketone solvent. For purposes of the disclosure, “difunctional epoxy” means epoxy compounds and materials having only two epoxy functional groups in the molecule. “Multifunctional epoxy” means epoxy compounds and materials having more than two epoxy functional groups in the molecule.
A suitable multifunctional epoxy component for making a photoresist formulation used for the composite film layer 200 or 240 (
The multi-functional epoxy component of the photoresist formulation may have a weight average molecular weight of about 3,000 to about 5,000 Daltons as determined by gel permeation chromatography, and an average epoxide group functionality of greater than 3, preferably from about 6 to about 10. The amount of multifunctional epoxy resin in an exemplary photoresist formulation may range from about 30 to about 50 percent by weight based on the weight of the cured thick film layer 80.
The di-functional epoxy component may be selected from di-functional epoxy compounds which include diglycidyl ethers of bisphenol-A, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclo-hexene carboxylate, 3,4-epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcy-clohexene carboxylate, bis(3,4-epoxy-6-methylcyclohexylmethyl) adipate, and bis(2,3-epoxycyclopentyl) ether.
An exemplary di-functional epoxy component is a bisphenol-A/epichlorohydrin epoxy resin having an epoxide equivalent of greater than about 1000. An “epoxide equivalent” is the number of grams of resin containing 1 gram-equivalent of epoxide. The weight average molecular weight of the first di-functional epoxy component is typically above 2500 Daltons, e.g., from about 2800 to about 3500 weight average molecular weight. The amount of the first di-functional epoxy component in the photoresist formulation may range from about 30 to about 50 percent by weight based on the weight of the cured resin.
Exemplary photoacid generators include compounds or mixture of compounds capable of generating a cation such as an aromatic complex salt which may be selected from onium salts of a Group VA element, onium salts of a Group VIA element, and aromatic halonium salts. Aromatic complex salts, upon being exposed to ultraviolet radiation or electron beam irradiation, are capable of generating acid moieties which initiate reactions with epoxides. The photoacid generator may be present in the photoresist formulation in an amount ranging from about 5 to about 15 weight percent based on the weight of the cured resin.
Compounds that generate a protic acid when irradiated by active rays, may be used as the photoacid generator, including, but are not limited to, aromatic iodonium complex salts and aromatic sulfonium complex salts. Examples include di-(t-butylphenyl)iodonium triflate, diphenyliodonium tetrakis(pentafluorophenyl)borate, diphenyliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, di(4-nonylphenyl)iodonium hexafluorophosphate, [4-(octyloxy)phenyl]phenyliodonium hexafluoroantimonate, triphenylsulfonium triflate, triphenylsulfonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate, triphenylsulfonium tetrakis(pentafluorophenyl)borate, 4,4′-bis[diphenylsulfonium]diphenylsulfide, bis-hexafluorophosphate, 4,4′-bis[di([beta]-hydroxyethoxy)phenylsulfonium]diphenylsulfide bis-hexafluoroantimonate, 4,4′-bis[di([beta]-hydroxyethoxy)phenylsulfonium]diphenylsulfide-bishexafluorophosphate 7-[di(p-tolyl)sulfonium]-2-isopropylthioxanthone hexafluorophosphate, 7-[di(p-tolyl)sulfonium]-2-isopropylthioxanthone hexafluoroantimonate, 7-[di(p-tolyl)sulfonium]-2-isopropyl tetrakis(pentafluorophenyl)borate, phenylcarbonyl-4′-diphenylsulfonium diphenylsulfide hexafluorophosphate, phenylcarbonyl-4′-diphenylsulfonium diphenylsulfide hexafluoroantimonate, 4-tert-butyl phenylcarbonyl-4′-diphenylsulfonium diphenylsulfide hexafluorophosphate, 4-tert-butylphenylcarbonyl-4′-diphenylsulfonium diphenylsulfide hexafluoroantimonate, 4-tert-butylphenylcarbonyl-4′-diphenylsulfonium diphenylsulfide tetrakis(pentafluorophenyl)borate, diphenyl [4-(phenylthio)phenyl]sulfonium hexafluoroantimonate and the like.
The photoresist formulation may optionally include an effective amount of an adhesion enhancing agent such as a silane compound. Silane compounds that are compatible with the components of the photoresist formulation typically have a functional group capable of reacting with at least one member selected from the group consisting of the multifunctional epoxy compound, the difunctional epoxy compound and the photoinitiator. Such an adhesion enhancing agent may be a silane with an epoxide functional group such as a glycidoxyalkyltrialkoxysilane, e.g., gamma-glycidoxypropyltrimethoxysilane. When used, the adhesion enhancing agent can be present in an amount ranging from about 0.5 to about 2 weight percent, such as from about 1.0 to about 1.5 weight percent based on total weight of the cured resin, including all ranges subsumed therein. Adhesion enhancing agents, as used herein, are defined to mean organic materials soluble in the photoresist composition which assist the film forming and adhesion characteristics of the composite film layer 200 or 240 adjacent the device surface 114 of the substrate 110.
An exemplary solvent for use in the photoresist formulation is a solvent which is non-photoreactive. Non-photoreactive solvents include, but are not limited gamma-butyrolactone, C1-6 acetates, tetrahydrofuran, low molecular weight ketones, mixtures thereof and the like. The non-photoreactive solvent is present in the formulation mixture used to provide the composite film layer 124 in an amount ranging from about 20 to about 90 weight percent, such as from about 40 to about 60 weight percent, based on the total weight of the photoresist formulation. In an exemplary embodiment, the non-photoreactive solvent does not remain in the cured composite film layer and is thus removed prior to or during the composite film layer curing steps.
A representative formulation for layers 210 and 214 is illustrated below in Table 1.
In order to provide the composite film layer 200, the first layer 210 of photoresist resin containing photoacid generator 1 may be coated onto the carrier film 210 and dried. Next the second layer 214 of photoresist resin containing photoacid generator 2 may be coated onto the first layer 210 and dried. The composite dry film layer 200 may then be removed from the carrier film 212 and laminated to the device surface 114 of the substrate 110 as shown in
With reference to
After exposing the composite film 200 to radiation, the composite film layer 200 is heated to cross-link the photoresist material in the exposed areas thereof. A developer solvent is then applied to the substrate 110 and composite film layer 200 to remove uncured photoresist material thereby forming the fluid supply channels 118 (
In an alternative embodiment illustrated in
In one embodiment, a third layer 244 containing the first photoacid generator may be applied to the second layer 242. The wavelength of the photoacid generator in the third layer may be selected from e-line, g-line, h-line, i-line, mid UV, or deep UV radiation with a wavelength that is different from the first and second radiation exposure wavelengths. In an alternative embodiment, the third layer 244 may include a third photoacid generator that has a wavelength selected from -line, g-line, K-line, i-line, mid UV, or deep UV radiation with a wavelength that is different from the first and second radiation exposure wavelengths. The third layer 244 may have a thickness ranging from about 3 to about 50 μm.
Representative formulations for layers 210, 242 and 244 are illustrated below in Tables 2 and 3.
The above formulations may also contain a phenoxy resin that may be added to the photoresist layers 210 and/or 242 to increase the hydrophilicity of layers 210 and/or 242. Compounds that may be added to layers 210 and/or 242 to increase the hydrophobicity of layers may include, but are not limited to heptadecafluoro-decyltrimethoxysilane, octadecyldimethylchlorosilane, ocatadecyltricholorsilane, and siloxanes.
By using the composite film layers 200 and 240 described above, the use of multiple adhesion promotion steps for making the fluid ejection head may be avoided. Since the formulations of each layer are similar, except for the photoacid generator and small amount of green dye, the photoresist materials will mix and adhere to each other at the interface between the layers without the need for an adhesion promotion layer. The amount of green dye may be varied in the layers to further enhance the radiation wavelengths needed to image the layers.
While two and three layer composite films have been demonstrated above, the disclosure is not limited to two and three layer composite films. The disclosure is thus adaptable to making 3D MEMS and nano devices having three or more layers, wherein each layer may include a photoacid generator that enables each layer to be imaged with a different radiation wavelength or two or more layers may be imaged with the same radiation wavelength.
Having described various aspects and embodiments of the disclosure and several advantages thereof, it will be recognized by those of ordinary skills that the embodiments are susceptible to various modifications, substitutions and revisions within the spirit and scope of the appended claims.
