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G03F7/0048
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PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F7/00
Photomechanical
Current Industry
G03F7/0048
characterised by the solvents or agents facilitating spreading
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Patents Grants
last 30 patents
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Patent Grant
Chemical liquid storage body
Patent number
11,976,001
Issue date
May 7, 2024
FUJIFILM Corporation
Tetsuya Kamimura
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Photoresist developer and method of developing photoresist
Patent number
11,971,657
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
An-Ren Zi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Radiation-sensitive resin composition and method for forming pattern
Patent number
11,966,160
Issue date
Apr 23, 2024
JSR Corporation
Ryuichi Nemoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Salt, acid generator, resist composition and method for producing r...
Patent number
11,947,257
Issue date
Apr 2, 2024
Sumitomo Chemical Company, Limited
Tatsuro Masuyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive composition, negative photosensitive composition, pi...
Patent number
11,940,729
Issue date
Mar 26, 2024
Toray Industries, Inc.
Akihiro Ishikawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Substrate treating method
Patent number
11,927,886
Issue date
Mar 12, 2024
Semes Co., Ltd.
Doo Young Oh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Binder resin, negative-type photosensitive resin composition, and d...
Patent number
11,892,772
Issue date
Feb 6, 2024
LG Chem, Ltd.
Junhyun An
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resin, positive photosensitive resin composition and use
Patent number
11,886,115
Issue date
Jan 30, 2024
YANTAI SUNERA LLC
Zhiguo Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
Patent number
11,874,600
Issue date
Jan 16, 2024
Intel Corporation
Marie Krysak
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Positive resist composition and patterning process
Patent number
11,860,540
Issue date
Jan 2, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Solution, method of forming resist pattern, and semiconductor devic...
Patent number
11,822,250
Issue date
Nov 21, 2023
Tokyo Ohka Kogyo Co., Ltd.
Hiroyuki Iida
C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information
Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
Patent number
11,796,916
Issue date
Oct 24, 2023
Rohm and Haas Electronic Materials LLC
Xisen Hou
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Composition including quantum dot, manufacturing method quantum dot...
Patent number
11,762,289
Issue date
Sep 19, 2023
Samsung SDI Co., Ltd.
Jinsuop Youn
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Photoresist composition, method for preparing the same, and pattern...
Patent number
11,762,290
Issue date
Sep 19, 2023
Beijing Asahi Electronic Materials Co., Ltd
Teng Zhang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemical liquid, chemical liquid storage body, pattern forming meth...
Patent number
11,747,727
Issue date
Sep 5, 2023
FUJIFILM Corporation
Tetsuya Kamimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polymer for formation of resist underlayer film, composition for fo...
Patent number
11,725,076
Issue date
Aug 15, 2023
SK Innovation Co., Ltd.
Minho Jung
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplified resist composition and patterning process
Patent number
11,720,018
Issue date
Aug 8, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,709,425
Issue date
Jul 25, 2023
Tokyo Ohka Kogyo Co., Ltd.
Takaya Maehashi
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Substrate protective film-forming composition and pattern forming p...
Patent number
11,662,663
Issue date
May 30, 2023
Shin-Etsu Chemical Co., Ltd.
Tomohiro Kobayashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Printable compositions including highly viscous components and meth...
Patent number
11,650,498
Issue date
May 16, 2023
3M Innovative Properties Company
Daniel J. Skamser
B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,635,685
Issue date
Apr 25, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method of forming patterned polyimide layer
Patent number
11,609,496
Issue date
Mar 21, 2023
ECHEM SOLUTIONS CORP.
Ting-Wei Chang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-type photosensitive resin composition
Patent number
11,592,743
Issue date
Feb 28, 2023
HD MICROSYSTEMS, LTD.
Tadamitsu Nakamura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and apparatus for multi-spray RRC process with dynamic control
Patent number
11,592,748
Issue date
Feb 28, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Ming-Hsuan Chuang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemically-amplified-type negative-type photoresist composition
Patent number
11,586,109
Issue date
Feb 21, 2023
YOUNG CHANG CHEMICAL CO., LTD
Seung Hun Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
Patent number
11,573,489
Issue date
Feb 7, 2023
FUJIFILM Corporation
Tetsuya Kamimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist material
Patent number
11,487,204
Issue date
Nov 1, 2022
DIC Corporation
Tomoyuki Imada
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Near-infrared absorbing photosensitive composition, cured film, opt...
Patent number
11,467,491
Issue date
Oct 11, 2022
FUJIFILM Corporation
Kyohei Arayama
G02 - OPTICS
Information
Patent Grant
Positive resist composition and patterning process
Patent number
11,460,772
Issue date
Oct 4, 2022
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
11,448,962
Issue date
Sep 20, 2022
Shin-Etsu Chemical Co., Ltd.
Takayuki Fujiwara
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
Publication number
20240126168
Publication date
Apr 18, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RESIST P...
Publication number
20240118612
Publication date
Apr 11, 2024
JSR Corporation
Keiichi SATOU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118615
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING...
Publication number
20240118616
Publication date
Apr 11, 2024
DONGJIN SEMICHEM CO., LTD.
Kyoungsoon SHIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYIMIDE PRECURSOR RESIN COMPOSITION AND METHOD FOR MANUFACTURING...
Publication number
20240101761
Publication date
Mar 28, 2024
Asahi Kasei Kabushiki Kaisha
Kohei MURAKAMI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Composition For Forming Adhesive Film, Patterning Process, And Meth...
Publication number
20240103370
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Seiichiro TACHIBANA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...
Publication number
20240103367
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
Publication number
20240103366
Publication date
Mar 28, 2024
SAMSUNG SDI CO., LTD.
Jihong KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ORGANIC EL DISPLAY DEVICE
Publication number
20240085784
Publication date
Mar 14, 2024
TOYO INK SC HOLDINGS CO., LTD
Taketo KOGURE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF PATTERNING SEMICONDUCTOR LAYER
Publication number
20240061332
Publication date
Feb 22, 2024
RAYNERGY TEK INCORPORATION
Yi-Ming CHANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USE
Publication number
20240061333
Publication date
Feb 22, 2024
YANTAI SUNERA LLC
Zhiguo WANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20240053679
Publication date
Feb 15, 2024
FUJIFILM CORPORATION
Takamitsu TOMIGA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE DRY FILM, LAMINATED FILM, METHOD FOR PRODUCING LAMIN...
Publication number
20240053680
Publication date
Feb 15, 2024
Tokyo Ohka Kogyo Co., Ltd.
Aya MOMOZAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROF...
Publication number
20240045333
Publication date
Feb 8, 2024
Merck Patent GmbH
Hung-Yang CHEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
TITANIUM ZIRCONIUM OXIDE NANOPARTICLES, PHOTORESIST AND PATTERNING...
Publication number
20240043281
Publication date
Feb 8, 2024
TSINGHUA UNIVERSITY
HONG XU
C01 - INORGANIC CHEMISTRY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION
Publication number
20240045326
Publication date
Feb 8, 2024
SUMITOMO BAKELITE CO., LTD.
Makoto HORII
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT...
Publication number
20240027906
Publication date
Jan 25, 2024
Samsung SDI Co., Ltd.
Jinsuop YOUN
B82 - NANO-TECHNOLOGY
Information
Patent Application
DISPERSION RESIN, PREPARATION METHOD THEREFOR AND PHOTORESIST COMPO...
Publication number
20240019781
Publication date
Jan 18, 2024
ShenZhen Brthrborder Semiconductor Materials Co., Ltd.
Meidi ZHONG
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM AND MICROLENS ARRAY
Publication number
20240019780
Publication date
Jan 18, 2024
Advanced Echem Materials Company Limited
Ya-Qian Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLY...
Publication number
20230416451
Publication date
Dec 28, 2023
JSR Corporation
Shuhei YAMADA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polymerizable Monomer, Polymer Compound, Resist Composition, And Pa...
Publication number
20230408921
Publication date
Dec 21, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, ME...
Publication number
20230393468
Publication date
Dec 7, 2023
FUJIFILM CORPORATION
Shunsuke YANAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTO...
Publication number
20230384668
Publication date
Nov 30, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
An-Ren ZI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUV Metallic Resist Performance Enhancement Via Additives
Publication number
20230375924
Publication date
Nov 23, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
An-Ren Zi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST COMPOSITION INCLUDING A CHRYSENE COMPOUND, METHOD OF FO...
Publication number
20230357123
Publication date
Nov 9, 2023
Seoul National University R&DB Foundation
Jonghoon KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION
Publication number
20230350290
Publication date
Nov 2, 2023
FUJIFILM CORPORATION
Tetsuya KAMIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20230350296
Publication date
Nov 2, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST COMPOSITION WITH NOVEL SOLVENT
Publication number
20230341773
Publication date
Oct 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
An-Ren ZI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM,...
Publication number
20230333468
Publication date
Oct 19, 2023
Central Glass Company, Limited
Takashi MASUBUCHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE INCLUDING THE SAME
Publication number
20230324795
Publication date
Oct 12, 2023
SAMSUNG DISPLAY CO., LTD.
Sung Hwan HONG
H01 - BASIC ELECTRIC ELEMENTS