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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/2004characterised by the use of a particular light source

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Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,181,791
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 12,164,229
- Issue date Dec 10, 2024
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organically modified metal oxide nanoparticle, method for producing...
- Patent number 12,153,347
- Issue date Nov 26, 2024
- National Institute of Advanced Industrial Science and Technology
- Kiwamu Sue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inorganic-infiltrated polymer hybrid thin film resists for advanced...
- Patent number 12,140,865
- Issue date Nov 12, 2024
- Brookhaven Science Associates, LLC
- Chang-Yong Nam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,140,867
- Issue date Nov 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
- Patent number 12,140,866
- Issue date Nov 12, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 12,134,690
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Hao Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organometallic photoresists for DUV or EUV lithography
- Patent number 12,135,503
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 12,129,271
- Issue date Oct 29, 2024
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask defect prevention
- Patent number 12,124,163
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming underlayer film in imprinting method, kit,...
- Patent number 12,109,752
- Issue date Oct 8, 2024
- FUJIFILM Corporation
- Akihiro Hakamata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 12,111,566
- Issue date Oct 8, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film-forming composition, silicon-containing film, and resist patte...
- Patent number 12,098,282
- Issue date Sep 24, 2024
- JSR Corporation
- Tomoaki Seko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer composition and method of manufacturing a semiconductor...
- Patent number 12,099,301
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,085,856
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process monitoring method
- Patent number 12,085,867
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Jie Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,085,855
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Laminate, optical filter, solid image pickup element, image display...
- Patent number 12,078,828
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Shunsuke Kitajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,072,619
- Issue date Aug 27, 2024
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tin dodecamers and radiation patternable coatings with strong EUV a...
- Patent number 12,071,449
- Issue date Aug 27, 2024
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,072,628
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography method, extreme ultraviolet mask an...
- Patent number 12,072,633
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor wafer and cleaning scrubber
- Patent number 12,070,779
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Yi Su
- B08 - CLEANING
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 12,060,317
- Issue date Aug 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Extreme ultraviolet lithography method using robust, high transmiss...
- Patent number 12,055,855
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, micropattern forming method, and subst...
- Patent number 12,057,323
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Sangjine Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for exposure of flexographic printing plates u...
- Patent number 12,055,856
- Issue date Aug 6, 2024
- Esko-Graphics Imaging GmbH
- Jörg Wolterink
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
NANOPATTERNED SUBSTRATES
- Publication number 20240427235
- Publication date Dec 26, 2024
- Corning Incorporated
- Robert Alan Bellman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC DEVICE MANUFACTURING SOLUTION, METHOD FOR MANUFACTURING...
- Publication number 20240425777
- Publication date Dec 26, 2024
- Merck Patent GmbH
- KAZUMA YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MASK REPAIR
- Publication number 20240419065
- Publication date Dec 19, 2024
- Carl Zeisss SMT GmbH
- Christian Felix Hermanns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20240419072
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMP...
- Publication number 20240411226
- Publication date Dec 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroki Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20240411228
- Publication date Dec 12, 2024
- JSR Corporation
- Ken MARUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...
- Publication number 20240411232
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Jingshi LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
- Publication number 20240402607
- Publication date Dec 5, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UV LITHOGRAPHY SYSTEM AND METHOD
- Publication number 20240393696
- Publication date Nov 28, 2024
- The Regents of the University of California
- Alexander Groisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240393690
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20240393677
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Min WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK DEFECT PREVENTION
- Publication number 20240385507
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20240385521
- Publication date Nov 21, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO ENHANCE SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20240387601
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yao-Ren KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST FOR SEMICONDUCTOR FABRICATION
- Publication number 20240385516
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240385523
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY PROCESS MONITORING METHOD
- Publication number 20240385545
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Jie Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20240377736
- Publication date Nov 14, 2024
- Arkema France
- Kangtai REN
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240377739
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Siao-Shan WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240376303
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-hao CHEN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240377730
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV A...
- Publication number 20240376135
- Publication date Nov 14, 2024
- INPRIA CORPORATION
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377738
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377741
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CROSS-LINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20240369926
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Po YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20240369928
- Publication date Nov 7, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240369932
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chih CHEN
- H01 - BASIC ELECTRIC ELEMENTS

characterised by the use of a particular light source

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Extreme ultraviolet mask and method of manufacturing the same

Resist composition and pattern forming process

Resist composition and method for producing resist pattern

Organically modified metal oxide nanoparticle, method for producing...

Inorganic-infiltrated polymer hybrid thin film resists for advanced...

Resist composition and resist pattern forming method

Photoacid generators, photoresist compositions, and pattern formati...

Photoresist composition and method of manufacturing a semiconductor...

Resin, photoresist composition, and method of manufacturing semicon...

Organometallic photoresists for DUV or EUV lithography

Organotin clusters, solutions of organotin clusters, and applicatio...

Negative resist formulation for producing undercut pattern profiles

Mask defect prevention

Composition for forming underlayer film in imprinting method, kit,...

Reflective mask blank, reflective mask and manufacturing method the...

Film-forming composition, silicon-containing film, and resist patte...

Underlayer composition and method of manufacturing a semiconductor...

Positive photosensitive resin composition, positive photosensitive...

Lithography process monitoring method

Resin, photoresist composition, and method of manufacturing semicon...

Laminate, optical filter, solid image pickup element, image display...

Reflective mask blank, reflective mask, and method for manufacturin...

Tin dodecamers and radiation patternable coatings with strong EUV a...

Resist composition and pattern forming process

Extreme ultraviolet lithography method, extreme ultraviolet mask an...

Method of manufacturing semiconductor wafer and cleaning scrubber

Onium salt, chemically amplified negative resist composition, and p...

Extreme ultraviolet lithography method using robust, high transmiss...

Substrate processing method, micropattern forming method, and subst...

Method and apparatus for exposure of flexographic printing plates u...

Patents Applicationslast 30 patents

NANOPATTERNED SUBSTRATES

ELECTRONIC DEVICE MANUFACTURING SOLUTION, METHOD FOR MANUFACTURING...

METHOD AND APPARATUS FOR MASK REPAIR

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMP...

PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES

METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

UV LITHOGRAPHY SYSTEM AND METHOD

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD FOR FORMING SEMICONDUCTOR DEVICE

MASK DEFECT PREVENTION

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

METHOD AND APPARATUS TO ENHANCE SEMICONDUCTOR DEVICE MANUFACTURING

PHOTORESIST FOR SEMICONDUCTOR FABRICATION

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

LITHOGRAPHY PROCESS MONITORING METHOD

PHOTOSENSITIVE COMPOSITION

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

BOTTOM ANTIREFLECTIVE COATING MATERIALS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV A...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

CROSS-LINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...