characterised by the use of a particular light source

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2004characterised by the use of a particular light source

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods of synthesizing a polynucleotide array using photoactivated...
- Patent number 12,319,712
- Issue date Jun 3, 2025
- Vibrant Holdings, LLC
- John J. Rajasekaran
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,313,968
- Issue date May 27, 2025
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
UV LED radiation sources for use in photopolymer exposure
- Patent number 12,304,190
- Issue date May 20, 2025
- Esko-Graphics Imaging GmbH
- Klaus Walter Arlt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Width adjustment of EUV radiation beam
- Patent number 12,292,687
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,292,686
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for fabricating appliances from polymerizable compositions
- Patent number 12,286,493
- Issue date Apr 29, 2025
- Align Technology, Inc.
- Michael Christopher Cole
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithography system and methods
- Patent number 12,287,572
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling extreme ultraviolet light
- Patent number 12,282,262
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam guide and positioning device for positioning a scraper mirror,...
- Patent number 12,282,258
- Issue date Apr 22, 2025
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- William Bettridge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate transferring unit, substrate processing apparatus, and su...
- Patent number 12,278,133
- Issue date Apr 15, 2025
- Samsung Electronics Co., Ltd.
- Sangjine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist inspection apparatus, photoresist inspection method usi...
- Patent number 12,276,907
- Issue date Apr 15, 2025
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...
- Patent number 12,275,008
- Issue date Apr 15, 2025
- Rutgers, The State University of New Jersey
- Umer Hassan
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,271,113
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,265,332
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transparent electrode, process for producing transparent electrode,...
- Patent number 12,262,571
- Issue date Mar 25, 2025
- Kabushiki Kaisha Toshiba
- Naomi Shida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography with a bilayer resist
- Patent number 12,248,248
- Issue date Mar 11, 2025
- The Boeing Company
- Antonio Mei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition including a reactive polymer
- Patent number 12,247,133
- Issue date Mar 11, 2025
- Canon Kabushiki Kaisha
- Fen Wan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,249,509
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Larry Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for increasing the density of high-index nanoimprint lithog...
- Patent number 12,242,186
- Issue date Mar 4, 2025
- Applied Materials, Inc.
- Andrew Ceballos
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoacid generator for chemically amplified photoresists
- Patent number 12,242,190
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor photoresist composition, method for preparing thereof...
- Patent number 12,242,189
- Issue date Mar 4, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition, method for producing the same, re...
- Patent number 12,242,192
- Issue date Mar 4, 2025
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 12,235,589
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoacid generator
- Patent number 12,216,402
- Issue date Feb 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
UV LED RADIATION SOURCES FOR USE IN PHOTOPOLYMER EXPOSURE
- Publication number 20250178334
- Publication date Jun 5, 2025
- ESKO-GRAPHICS IMAGING GMBH
- Klaus Walter Arlt
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250180933
- Publication date Jun 5, 2025
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BOW COMPENSATION BY PATTERNED UV CURE
- Publication number 20250166991
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Tong LEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20250164883
- Publication date May 22, 2025
- JSR Corporation
- Motohiro SHIRATANI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FABRICATION OF DENTAL APPLIANCES FROM PHASE-SEPARATED COMPOSITIONS
- Publication number 20250154307
- Publication date May 15, 2025
- Align Technology, Inc.
- Michael Christopher Cole
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20250155808
- Publication date May 15, 2025
- ZEON CORPORATION
- Makoto FUJIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250155805
- Publication date May 15, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Issei SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME,...
- Publication number 20250155810
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jiyup KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20250147416
- Publication date May 8, 2025
- POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
- Myung-Gil KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...
- Publication number 20250147417
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20250147431
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE...
- Publication number 20250138416
- Publication date May 1, 2025
- Inha University Research and Business Foundation
- JIN-KYUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250130491
- Publication date Apr 24, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE
- Publication number 20250123560
- Publication date Apr 17, 2025
- Christopher D. Simpson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR STRUCTURE AND SYSTEM FOR MANUFACTURING THE SAME
- Publication number 20250123570
- Publication date Apr 17, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Wei WANG
- G01 - MEASURING TESTING
Information Patent Application
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
- Publication number 20250116927
- Publication date Apr 10, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116929
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250116923
- Publication date Apr 10, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS
- Publication number 20250116938
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL...
- Publication number 20250110409
- Publication date Apr 3, 2025
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
- Publication number 20250110408
- Publication date Apr 3, 2025
- Intel Corporation
- Robert JORDAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING A CONTROL DEVICE, CONTROL DEVICE, OPTICAL SYST...
- Publication number 20250110327
- Publication date Apr 3, 2025
- Carl Zeiss SMT GMBH
- Cornelius Richt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS
- Publication number 20250102927
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hua FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoresist and Method
- Publication number 20250102916
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250093774
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK
- Publication number 20250093764
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...
- Publication number 20250085627
- Publication date Mar 13, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...
- Publication number 20250074930
- Publication date Mar 6, 2025
- INPRIA CORPORATION
- Alexander C. Marwitz
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20250068067
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

characterised by the use of a particular light source

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of synthesizing a polynucleotide array using photoactivated...

Reflective mask blank, reflective mask, and method for manufacturin...

UV LED radiation sources for use in photopolymer exposure

Treatment liquid and pattern forming method

Width adjustment of EUV radiation beam

Semiconductor structure and manufacturing method thereof

Systems for fabricating appliances from polymerizable compositions

Lithography system and methods

Method for controlling extreme ultraviolet light

Beam guide and positioning device for positioning a scraper mirror,...

Photoresist compositions and pattern formation methods

Organotin oxide hydroxide patterning compositions, precursors, and...

Substrate transferring unit, substrate processing apparatus, and su...

Photoresist inspection apparatus, photoresist inspection method usi...

Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...

Method of manufacturing a semiconductor device

Method of manufacturing a semiconductor device

Transparent electrode, process for producing transparent electrode,...

Radiation-sensitive resin composition, method of forming resist pat...

Electron beam lithography with a bilayer resist

Photocurable composition including a reactive polymer

Selective deposition of carbon on photoresist layer for lithography...

Methods for increasing the density of high-index nanoimprint lithog...

Photoacid generator for chemically amplified photoresists

Semiconductor photoresist composition, method for preparing thereof...

Photosensitive resin composition, method for producing the same, re...

Method of manufacturing a semiconductor device and apparatus for ma...

Coating composition for forming resist underlayer film for EUV lith...

Method of manufacturing a semiconductor device and pattern formatio...

Photoacid generator

Patents Applicationslast 30 patents

UV LED RADIATION SOURCES FOR USE IN PHOTOPOLYMER EXPOSURE

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

WAFER BOW COMPENSATION BY PATTERNED UV CURE

RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD

FABRICATION OF DENTAL APPLIANCES FROM PHASE-SEPARATED COMPOSITIONS

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME,...

PHOTORESIST COMPOSITION

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE...

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE

SEMICONDUCTOR STRUCTURE AND SYSTEM FOR MANUFACTURING THE SAME

PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS

SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL...

SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY

METHOD FOR OPERATING A CONTROL DEVICE, CONTROL DEVICE, OPTICAL SYST...

LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS

Photoresist and Method

RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS

EXTREME ULTRAVIOLET MASK

ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS

ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...