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PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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Photomechanical
Current Industry
G03F7/2004
characterised by the use of a particular light source
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Patents Grants
last 30 patents
Information
Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
Patent number
11,966,162
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Tzu-Yang Lin
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low...
Patent number
11,966,158
Issue date
Apr 23, 2024
Inpria Corporation
Benjamin L. Clark
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of critical dimension control by oxygen and nitrogen plasma...
Patent number
11,960,201
Issue date
Apr 16, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Pei-Cheng Hsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,953,829
Issue date
Apr 9, 2024
FUJIFILM Corporation
Kazunari Yagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...
Patent number
11,951,476
Issue date
Apr 9, 2024
Rutgers, The State University of New Jersey
Umer Hassan
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Monomers, polymers and lithographic compositions comprising same
Patent number
11,932,713
Issue date
Mar 19, 2024
Rohm and Haas Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
Patent number
11,927,879
Issue date
Mar 12, 2024
Samsung Electronics Co., Ltd.
Moosong Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pellicle for extreme ultraviolet lithography based on yttrium carbide
Patent number
11,927,881
Issue date
Mar 12, 2024
Korea Electronics Technology Institute
Hyeong Keun Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist imaging and development for enhanced nozzle plate adhesion
Patent number
11,926,157
Issue date
Mar 12, 2024
Funai Electric Co., Ltd.
Sean T. Weaver
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Grant
Methods for making hard masks useful in next-generation lithography
Patent number
11,921,427
Issue date
Mar 5, 2024
Lam Research Corporation
Timothy William Weidman
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Overlay correcting method, and photolithography method, semiconduct...
Patent number
11,921,421
Issue date
Mar 5, 2024
Samsung Electronics Co., Ltd.
Jeongjin Lee
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Light source device including discharge lamp, irradiation device an...
Patent number
11,913,985
Issue date
Feb 27, 2024
Phoenix Electric Co., Ltd.
Tomihiko Ikeda
G01 - MEASURING TESTING
Information
Patent Grant
Resist composition and patterning process
Patent number
11,914,291
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist, method of manufacturing a semiconductor device and met...
Patent number
11,914,301
Issue date
Feb 27, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Chieh-Hsin Hsieh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Manufacturing method of semiconductor chip, and kit
Patent number
11,914,300
Issue date
Feb 27, 2024
FUJIFILM Corporation
Tetsuya Kamimura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for controlling droplet in extreme ultraviolet...
Patent number
11,914,302
Issue date
Feb 27, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Chi-Hung Liao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Colored film, manufacturing method of same, and solid-state imaging...
Patent number
11,908,877
Issue date
Feb 20, 2024
FUJIFILM Corporation
Daisuke Hamada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Alternating copolymer chain scission photoresists
Patent number
11,906,901
Issue date
Feb 20, 2024
International Business Machines Corporation
Dario Goldfarb
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Methods for increasing the density of high-index nanoimprint lithog...
Patent number
11,892,771
Issue date
Feb 6, 2024
Applied Materials, Inc.
Andrew Ceballos
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Multiple patterning with organometallic photopatternable layers wit...
Patent number
11,886,116
Issue date
Jan 30, 2024
Inpria Corporation
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Methods for fabricating appliances from polymerizable compositions
Patent number
11,884,758
Issue date
Jan 30, 2024
Align Technology, Inc.
Michael Christopher Cole
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Grant
Substrate transferring unit, substrate processing apparatus, and su...
Patent number
11,881,426
Issue date
Jan 23, 2024
Samsung Electronics Co., Ltd.
Sangjine Park
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Composition, pattern-forming method, and compound-producing method
Patent number
11,880,138
Issue date
Jan 23, 2024
JSR Corporation
Shin-ya Nakafuji
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Salts and photoresists comprising same
Patent number
11,880,134
Issue date
Jan 23, 2024
Rohm and Haas Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
Patent number
11,874,600
Issue date
Jan 16, 2024
Intel Corporation
Marie Krysak
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Multifunctional lithography device
Patent number
11,868,055
Issue date
Jan 9, 2024
The Institute of Optics and Electronics, the Chinese Academy of Sciences
Xiangang Luo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pellicle and method of using the same
Patent number
11,868,041
Issue date
Jan 9, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Chue San Yoo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative type photosensitive siloxane composition and methods for p...
Patent number
11,868,048
Issue date
Jan 9, 2024
Merck Patent GmbH
Masanobu Hayashi
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Photosensitive resin composition, heterocyclic ring-containing poly...
Patent number
11,860,538
Issue date
Jan 2, 2024
FUJIFILM Corporation
Takeshi Kawabata
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask defect prevention
Patent number
11,860,530
Issue date
Jan 2, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Chi-Ta Lu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
Polymer, Chemically Amplified Positive Resist Composition, Resist P...
Publication number
20240134280
Publication date
Apr 25, 2024
Shin-Etsu Chemical Co., Ltd.
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUV-INDUCED CONDENSATION OF POLYSILOXANE SOL-GEL THIN FILM
Publication number
20240134281
Publication date
Apr 25, 2024
Brewer Science, Inc.
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...
Publication number
20240124635
Publication date
Apr 18, 2024
Samsung Electronics Co., Ltd.
Minsang KIM
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PHOTORESIST COMP...
Publication number
20240126170
Publication date
Apr 18, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chun-Chih HO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
Publication number
20240126168
Publication date
Apr 18, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20240118619
Publication date
Apr 11, 2024
Tokyo Ohka Kogyo Co., Ltd.
Keiichi Ibata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
Publication number
20240118614
Publication date
Apr 11, 2024
INPRIA CORPORATION
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SU...
Publication number
20240120232
Publication date
Apr 11, 2024
Samsung Electronics Co., Ltd.
Sangjine Park
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
Publication number
20240112912
Publication date
Apr 4, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Jui-Hsiung LIU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYSTEM AND STRUCTURE INCLUDING A PELLICLE
Publication number
20240103358
Publication date
Mar 28, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chue San YOO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
A STEPPER LITHOGRAPHY APPARATUS AND OPERATING METHOD THEREFOR, AND...
Publication number
20240103373
Publication date
Mar 28, 2024
Parcan Nanotech Co., Ltd.
Xiangqian ZHOU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Etching Composition And Method For EUV Mask Protective Structure
Publication number
20240103377
Publication date
Mar 28, 2024
VERSUM MATERIALS US, LLC
CHAO-HSIANG CHEN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
Publication number
20240105451
Publication date
Mar 28, 2024
JSR Corporation
Eiji YONEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SU...
Publication number
20240085812
Publication date
Mar 14, 2024
Samsung Electronics Co., Ltd.
Kyuhee Han
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
Publication number
20240087890
Publication date
Mar 14, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Yu-Lien HUANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROF...
Publication number
20240045333
Publication date
Feb 8, 2024
Merck Patent GmbH
Hung-Yang CHEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
TITANIUM ZIRCONIUM OXIDE NANOPARTICLES, PHOTORESIST AND PATTERNING...
Publication number
20240043281
Publication date
Feb 8, 2024
TSINGHUA UNIVERSITY
HONG XU
C01 - INORGANIC CHEMISTRY
Information
Patent Application
OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE
Publication number
20240045341
Publication date
Feb 8, 2024
ASML NETHERLANDS B.V.
Willard Earl CONLEY
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF FORMING PHOTOSENSITIVE ORGANOMETALLIC OXIDES BY CHEMICAL...
Publication number
20240045332
Publication date
Feb 8, 2024
TOKYO ELECTRON LIMITED
Kandabara Tapily
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR FORMING RESIST PATTERN BY USING EXTREME ULTRAVIOLET LIGH...
Publication number
20240045336
Publication date
Feb 8, 2024
Samsung Electronics Co., Ltd.
Sookyung KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RETICLE COVERING PELLICLE FOR PHOTOLITHOGRPHY SCANNER
Publication number
20240045323
Publication date
Feb 8, 2024
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
Yen-Hao Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...
Publication number
20240036457
Publication date
Feb 1, 2024
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
Publication number
20240021429
Publication date
Jan 18, 2024
JSR Corporation
Ken MARUYAMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
EXPOSURE MODULE WITH CLEANING SCRUBBER
Publication number
20240009712
Publication date
Jan 11, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Pei-Yi SU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MANUFACTURING MIXED WETTABILITY SURFACES
Publication number
20230408919
Publication date
Dec 21, 2023
Saudi Arabian Oil Company
Dong Kyu Cha
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LITHOGRAPHY SYSTEM AND METHODS
Publication number
20230400763
Publication date
Dec 14, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Cheng Hung TSAI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OLEFIN METATHESIS PHOTOPOLYMERS
Publication number
20230391945
Publication date
Dec 7, 2023
PolySpectra, Inc.
Aditya BALASUBRAMANIAN
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
Publication number
20230393467
Publication date
Dec 7, 2023
Taiwan Semiconductor Manufacturing company Ltd.
Siao-Shan WANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
GAS LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
Publication number
20230396033
Publication date
Dec 7, 2023
Gigaphoton Inc.
Keisuke ISHIDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
Publication number
20230393464
Publication date
Dec 7, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Li-Po YANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY