Chemical etching

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CPC
H01L21/30604

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/30604Chemical etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Nanostructure and manufacturing method thereof
- Patent number 12,205,822
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Cheng Chao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect free germanium oxide gap fill
- Patent number 12,198,936
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fin field effect transistors having vertically stacked nano-sheet
- Patent number 12,199,095
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wang-Chun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual channel gate all around transistor device and fabrication meth...
- Patent number 12,198,986
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Sheng Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor method and device
- Patent number 12,191,212
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Cheng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,191,191
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Min-Ying Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing system and sub...
- Patent number 12,191,153
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Munehisa Kodama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device by driving hydrogen into a...
- Patent number 12,183,581
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside power rail structure and methods of forming same
- Patent number 12,183,678
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Cheng Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and no...
- Patent number 12,176,215
- Issue date Dec 24, 2024
- SCREEN Holdings Co., Ltd.
- Taiki Hinode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,176,224
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Kazuhiro Aiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchant composition for semiconductor substrates
- Patent number 12,173,216
- Issue date Dec 24, 2024
- ENF Technology CO., LTD.
- Jeong Sik Oh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Controlling fin-thinning through feedback
- Patent number 12,176,422
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsu-Hui Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,170,314
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 12,170,206
- Issue date Dec 17, 2024
- Kokusai Electric Corporation
- Arito Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,170,209
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Takashi Yabuta
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method for forming a semiconductor-on-insulator (SOI) substrate
- Patent number 12,165,911
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride etchant composition and method
- Patent number 12,152,187
- Issue date Nov 26, 2024
- Entegris, Inc.
- Eric Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to prevent surface charge induced cd-dependent etching of m...
- Patent number 12,148,625
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate-all-around structure and methods of forming the same
- Patent number 12,148,836
- Issue date Nov 19, 2024
- Parabellum Strategic Opportunities Fund LLC
- Pei-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate all-around semiconductor device
- Patent number 12,142,635
- Issue date Nov 12, 2024
- Parabellum Strategic Opportunities Fund LLC
- Ka-Hing Fung
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of manufacturing electronic structures
- Patent number 12,136,632
- Issue date Nov 5, 2024
- Pragmatic Printing Ltd
- Richard Price
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating FinFETs having different fin numbers and co...
- Patent number 12,136,571
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jhon Jhy Liaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming recesses in source/drain regions and devices fo...
- Patent number 12,132,089
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etchant compositions and methods
- Patent number 12,129,418
- Issue date Oct 29, 2024
- Entegris, Inc.
- Hsing-Chen Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Multi-gate transistors with backside power rail and reduced gate-dr...
- Patent number 12,125,852
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Huan-Chieh Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for etching silicon oxide
- Patent number 12,125,709
- Issue date Oct 22, 2024
- Central Glass Company, Limited
- Shoi Suzuki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hybrid source drain regions formed based on same fin and methods fo...
- Patent number 12,119,270
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 12,119,244
- Issue date Oct 15, 2024
- Mitsubishi Electric Corporation
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,119,394
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NITRIDE ETCHANT COMPOSITION AND METHOD
- Publication number 20250019590
- Publication date Jan 16, 2025
- Entegris, Inc.
- Eric Hong
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND DEVICE FOR ETCHING SILICON OXIDE
- Publication number 20250014906
- Publication date Jan 9, 2025
- Central Glass Company, Limited
- Shoi SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES WITH REMOVED SUB-FIN
- Publication number 20250006547
- Publication date Jan 2, 2025
- Intel Corporation
- Mohammad HASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE REGION TRIMMING AFTER FORMATION OF SOURCE/DRAIN COMPONENTS
- Publication number 20240429304
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE BOTTOM SEED LAYER FORMATION FOR BOTTOM-UP EPITAXY
- Publication number 20240429313
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Cheng Shiau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Having FIN Structure and Method of Forming The...
- Publication number 20240429305
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Min YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL MEMORY DEVICES
- Publication number 20240422981
- Publication date Dec 19, 2024
- Yangtze Memory Technologies Co., Ltd.
- Linchun WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH TUNABLE EPITAXY STRUCTURES AND METHOD OF...
- Publication number 20240413018
- Publication date Dec 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20240413022
- Publication date Dec 12, 2024
- TOKYO ELECTRON LIMITED
- Keisuke SAKAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240412986
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Byung Woo SIM
- B08 - CLEANING
Information Patent Application
WET TOOL KIT FOR FORMING SEMICONDUCTOR STRUCTURE AND CMOS IMAGE SEN...
- Publication number 20240404832
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- Chenchia Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROELECTRONIC DEVICES WITH THROUGH-SUBSTRATE INTERCONNECTS AND AS...
- Publication number 20240404880
- Publication date Dec 5, 2024
- Lodestar Licensing Group LLC
- Kyle K. Kirby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin Film Anisotropic Magnetoresistor Device and Formation
- Publication number 20240407268
- Publication date Dec 5, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Fuchao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240395864
- Publication date Nov 28, 2024
- Parabellum Strategic Opportunities Fund LLC
- Ka-Hing FUNG
- B82 - NANO-TECHNOLOGY
Information Patent Application
WET ETCHING PROCESS FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20240395903
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Wei LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCH APPARATUS
- Publication number 20240395572
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hong-Ting LU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...
- Publication number 20240384169
- Publication date Nov 21, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuya Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER
- Publication number 20240387181
- Publication date Nov 21, 2024
- Sumitomo Chemical Company, Limited
- Hajime FUJIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE WITH ALTERNATE COMPLEMENTARY CHANNELS AND FABRICATION METHOD...
- Publication number 20240387545
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ya LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...
- Publication number 20240384170
- Publication date Nov 21, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Choitsu Go
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20240387242
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- MIN-YING TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE POWER RAIL AND METHODS OF FORMING THE SAME
- Publication number 20240387534
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Huan-Chieh Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240387182
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ling Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...
- Publication number 20240387185
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE-ALL-AROUND STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20240379857
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Pei-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER RECEIVER, ELECTROCHEMICAL POROSIFICATION APPARATUS AND METHOD...
- Publication number 20240376629
- Publication date Nov 14, 2024
- Socpra Sciences et Genie s.e.c.
- Philippe-Olivier PROVOST
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240379674
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Che-Cheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Fabricating FinFETs Having Different Fin Numbers and Co...
- Publication number 20240379445
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Jhon Jhy Liaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Fabricating Method Thereof
- Publication number 20240379660
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Chien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240371982
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS

Chemical etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Nanostructure and manufacturing method thereof

Defect free germanium oxide gap fill

Fin field effect transistors having vertically stacked nano-sheet

Dual channel gate all around transistor device and fabrication meth...

Semiconductor method and device

Semiconductor structure and manufacturing method thereof

Substrate processing apparatus, substrate processing system and sub...

Method of forming a semiconductor device by driving hydrogen into a...

Backside power rail structure and methods of forming same

Substrate processing apparatus, substrate processing method, and no...

Substrate processing apparatus and substrate processing method

Etchant composition for semiconductor substrates

Controlling fin-thinning through feedback

Semiconductor device and manufacturing method thereof

Method of processing substrate, method of manufacturing semiconduct...

Substrate processing apparatus and substrate processing method

Method for forming a semiconductor-on-insulator (SOI) substrate

Nitride etchant composition and method

Methods to prevent surface charge induced cd-dependent etching of m...

Gate-all-around structure and methods of forming the same

Gate all-around semiconductor device

Methods of manufacturing electronic structures

Methods for fabricating FinFETs having different fin numbers and co...

Methods for forming recesses in source/drain regions and devices fo...

Selective etchant compositions and methods

Multi-gate transistors with backside power rail and reduced gate-dr...

Method and device for etching silicon oxide

Hybrid source drain regions formed based on same fin and methods fo...

Semiconductor manufacturing apparatus

Method of manufacturing a semiconductor device and a semiconductor...

Patents Applicationslast 30 patents

NITRIDE ETCHANT COMPOSITION AND METHOD

METHOD AND DEVICE FOR ETCHING SILICON OXIDE

INTEGRATED CIRCUIT STRUCTURES WITH REMOVED SUB-FIN

ACTIVE REGION TRIMMING AFTER FORMATION OF SOURCE/DRAIN COMPONENTS

SELECTIVE BOTTOM SEED LAYER FORMATION FOR BOTTOM-UP EPITAXY

Semiconductor Device Having FIN Structure and Method of Forming The...

THREE-DIMENSIONAL MEMORY DEVICES

SEMICONDUCTOR DEVICE WITH TUNABLE EPITAXY STRUCTURES AND METHOD OF...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

WET TOOL KIT FOR FORMING SEMICONDUCTOR STRUCTURE AND CMOS IMAGE SEN...

MICROELECTRONIC DEVICES WITH THROUGH-SUBSTRATE INTERCONNECTS AND AS...

Thin Film Anisotropic Magnetoresistor Device and Formation

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

WET ETCHING PROCESS FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

WET ETCH APPARATUS

ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...

METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER

DEVICE WITH ALTERNATE COMPLEMENTARY CHANNELS AND FABRICATION METHOD...

ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

BACKSIDE POWER RAIL AND METHODS OF FORMING THE SAME

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...

GATE-ALL-AROUND STRUCTURE AND METHODS OF FORMING THE SAME

WAFER RECEIVER, ELECTROCHEMICAL POROSIFICATION APPARATUS AND METHOD...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Methods for Fabricating FinFETs Having Different Fin Numbers and Co...

Semiconductor Device and Fabricating Method Thereof

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...