Chemical etching

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H01L21/30604

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/30604Chemical etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Inner spacer structures for gate-all-around field effect transistors
- Patent number 12,255,249
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Mrunal Abhijith Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming of inner spacer structure using semiconductor ma...
- Patent number 12,255,102
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Lun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming fin-on-nanosheet transistor stacks
- Patent number 12,255,099
- Issue date Mar 18, 2025
- Samsung Electronics Co., Ltd.
- Gunho Jo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etch apparatus
- Patent number 12,249,520
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hong-Ting Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment liquid for semiconductor with ruthenium and method of pro...
- Patent number 12,247,299
- Issue date Mar 11, 2025
- Tokuyama Corporation
- Tomoaki Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Managing trench depth in integrated systems
- Patent number 12,249,540
- Issue date Mar 11, 2025
- Ciena Corporation
- Benoît Filion
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor device
- Patent number 12,243,943
- Issue date Mar 4, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Takahiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming the same
- Patent number 12,243,741
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Johnny Chiahao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to provide uniform wet etching of material within high aspe...
- Patent number 12,243,749
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with fin end spacer dummy gate and method of m...
- Patent number 12,243,930
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Tai Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchant composition for etching silicon germanium film and method o...
- Patent number 12,234,400
- Issue date Feb 25, 2025
- Samsung Electronics Co., Ltd.
- Changjun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned inner spacer on gate-all-around structure and methods...
- Patent number 12,230,692
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsungyu Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with metal gate fill structure
- Patent number 12,230,503
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Area selective organic material removal
- Patent number 12,230,506
- Issue date Feb 18, 2025
- ASM IP Holding B.V.
- Mikko Ritala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stacked transistors with different channel widths
- Patent number 12,230,544
- Issue date Feb 18, 2025
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming backside power rails
- Patent number 12,224,324
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,224,209
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Cheng Chao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact architecture for capacitance reduction and satisfactory con...
- Patent number 12,224,326
- Issue date Feb 11, 2025
- Intel Corporation
- Rishabh Mehandru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source/drain silicide for multigate device performance and method o...
- Patent number 12,218,214
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ching Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,217,983
- Issue date Feb 4, 2025
- J.E.T. CO., LTD.
- Atsuo Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching for smoothing of arbitrary surfaces
- Patent number 12,217,968
- Issue date Feb 4, 2025
- California Institute of Technology
- Harold Frank Greer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid channel semiconductor device and method
- Patent number 12,211,900
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional semiconductor memory device
- Patent number 12,213,315
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Byungjin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate-all-around transistor with strained channels
- Patent number 12,211,897
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-En Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside ohmic contacts for semiconductor devices
- Patent number 12,211,920
- Issue date Jan 28, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Srinivasa Reddy Yeduru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate-all-around integrated circuit structures having oxide sub-fins
- Patent number 12,211,925
- Issue date Jan 28, 2025
- Intel Corporation
- Leonard P. Guler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field effect transistors comprising a matrix of gate-all-around cha...
- Patent number 12,211,848
- Issue date Jan 28, 2025
- International Business Machines Corporation
- Julien Frougier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of fin-type field effect transistor structure
- Patent number 12,211,843
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure
- Patent number 12,211,844
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jin-Aun Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,211,895
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lin Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR METHOD AND DEVICE
- Publication number 20250098280
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Cheng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU SIDEWALL PASSIVATION TOWARD THE BOTTOM OF HIGH ASPECT RATIO...
- Publication number 20250095984
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE
- Publication number 20250096000
- Publication date Mar 20, 2025
- United Microelectronics Corp.
- Kun-Ju Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20250098211
- Publication date Mar 20, 2025
- Kabushiki Kaisha Toshiba
- Kohei OASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSI...
- Publication number 20250079167
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Ernesto Suarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250081480
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jhih-Bin CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PERFORMING NANOTRANSFER WITHOUT CHEMICAL TREATMENT AND S...
- Publication number 20250069890
- Publication date Feb 27, 2025
- Korea Institute of Machinery and Materials
- Jun-ho JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250069898
- Publication date Feb 27, 2025
- Kokusai Electric Corporation
- Arito OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250063777
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD EFFECT TRANSISTORS HAVING VERTICALLY STACKED NANO-SHEET
- Publication number 20250063809
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wang-Chun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING FIN-THINNING THROUGH FEEDBACK
- Publication number 20250056823
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsu-Hui Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL GROWTH OF STRAINED Si/SiGe SUPERLATTICE
- Publication number 20250037997
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Ruiying HAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SiC TRENCH BOTTOM CORNER ROUNDING
- Publication number 20250038000
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Qintao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDE ETCHANT COMPOSITION AND METHOD
- Publication number 20250019590
- Publication date Jan 16, 2025
- Entegris, Inc.
- Eric Hong
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND DEVICE FOR ETCHING SILICON OXIDE
- Publication number 20250014906
- Publication date Jan 9, 2025
- Central Glass Company, Limited
- Shoi SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES WITH REMOVED SUB-FIN
- Publication number 20250006547
- Publication date Jan 2, 2025
- Intel Corporation
- Mohammad HASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE REGION TRIMMING AFTER FORMATION OF SOURCE/DRAIN COMPONENTS
- Publication number 20240429304
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chun Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE BOTTOM SEED LAYER FORMATION FOR BOTTOM-UP EPITAXY
- Publication number 20240429313
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Cheng Shiau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Having FIN Structure and Method of Forming The...
- Publication number 20240429305
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Min YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL MEMORY DEVICES
- Publication number 20240422981
- Publication date Dec 19, 2024
- Yangtze Memory Technologies Co., Ltd.
- Linchun WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH TUNABLE EPITAXY STRUCTURES AND METHOD OF...
- Publication number 20240413018
- Publication date Dec 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20240413022
- Publication date Dec 12, 2024
- TOKYO ELECTRON LIMITED
- Keisuke SAKAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240412986
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Byung Woo SIM
- B08 - CLEANING
Information Patent Application
WET TOOL KIT FOR FORMING SEMICONDUCTOR STRUCTURE AND CMOS IMAGE SEN...
- Publication number 20240404832
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- Chenchia Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROELECTRONIC DEVICES WITH THROUGH-SUBSTRATE INTERCONNECTS AND AS...
- Publication number 20240404880
- Publication date Dec 5, 2024
- Lodestar Licensing Group LLC
- Kyle K. Kirby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin Film Anisotropic Magnetoresistor Device and Formation
- Publication number 20240407268
- Publication date Dec 5, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Fuchao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240395864
- Publication date Nov 28, 2024
- Parabellum Strategic Opportunities Fund LLC
- Ka-Hing FUNG
- B82 - NANO-TECHNOLOGY
Information Patent Application
WET ETCHING PROCESS FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20240395903
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Wei LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCH APPARATUS
- Publication number 20240395572
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hong-Ting LU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...
- Publication number 20240384169
- Publication date Nov 21, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuya Tajima
- H01 - BASIC ELECTRIC ELEMENTS

Chemical etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Inner spacer structures for gate-all-around field effect transistors

Methods of forming of inner spacer structure using semiconductor ma...

Methods of forming fin-on-nanosheet transistor stacks

Wet etch apparatus

Treatment liquid for semiconductor with ruthenium and method of pro...

Managing trench depth in integrated systems

Semiconductor device

Semiconductor structure and method for forming the same

Methods to provide uniform wet etching of material within high aspe...

Semiconductor device with fin end spacer dummy gate and method of m...

Etchant composition for etching silicon germanium film and method o...

Self-aligned inner spacer on gate-all-around structure and methods...

Semiconductor device with metal gate fill structure

Area selective organic material removal

Stacked transistors with different channel widths

Method of forming backside power rails

Semiconductor device and manufacturing method thereof

Contact architecture for capacitance reduction and satisfactory con...

Source/drain silicide for multigate device performance and method o...

Substrate processing apparatus

Atomic layer etching for smoothing of arbitrary surfaces

Hybrid channel semiconductor device and method

Three-dimensional semiconductor memory device

Gate-all-around transistor with strained channels

Backside ohmic contacts for semiconductor devices

Gate-all-around integrated circuit structures having oxide sub-fins

Field effect transistors comprising a matrix of gate-all-around cha...

Manufacturing method of fin-type field effect transistor structure

Semiconductor structure

Method of manufacturing a semiconductor device and a semiconductor...

Patents Applicationslast 30 patents

SEMICONDUCTOR METHOD AND DEVICE

IN-SITU SIDEWALL PASSIVATION TOWARD THE BOTTOM OF HIGH ASPECT RATIO...

MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSI...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD FOR PERFORMING NANOTRANSFER WITHOUT CHEMICAL TREATMENT AND S...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

FIN FIELD EFFECT TRANSISTORS HAVING VERTICALLY STACKED NANO-SHEET

CONTROLLING FIN-THINNING THROUGH FEEDBACK

EPITAXIAL GROWTH OF STRAINED Si/SiGe SUPERLATTICE

SiC TRENCH BOTTOM CORNER ROUNDING

NITRIDE ETCHANT COMPOSITION AND METHOD

METHOD AND DEVICE FOR ETCHING SILICON OXIDE

INTEGRATED CIRCUIT STRUCTURES WITH REMOVED SUB-FIN

ACTIVE REGION TRIMMING AFTER FORMATION OF SOURCE/DRAIN COMPONENTS

SELECTIVE BOTTOM SEED LAYER FORMATION FOR BOTTOM-UP EPITAXY

Semiconductor Device Having FIN Structure and Method of Forming The...

THREE-DIMENSIONAL MEMORY DEVICES

SEMICONDUCTOR DEVICE WITH TUNABLE EPITAXY STRUCTURES AND METHOD OF...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

WET TOOL KIT FOR FORMING SEMICONDUCTOR STRUCTURE AND CMOS IMAGE SEN...

MICROELECTRONIC DEVICES WITH THROUGH-SUBSTRATE INTERCONNECTS AND AS...

Thin Film Anisotropic Magnetoresistor Device and Formation

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

WET ETCHING PROCESS FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

WET ETCH APPARATUS

ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...