Chemical or electrical treatment

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H01L21/306

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/306Chemical or electrical treatment

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of making a three-dimensional memory device using composite...
- Patent number 12,261,080
- Issue date Mar 25, 2025
- SanDisk Technologies, Inc.
- Roshan Jayakhar Tirukkonda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch of a substrate
- Patent number 12,261,049
- Issue date Mar 25, 2025
- Applied Materials , Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing an optoelectronic device
- Patent number 12,261,249
- Issue date Mar 25, 2025
- Aledia
- Maxime Boistard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing semiconductor devices by etching active fi...
- Patent number 12,261,087
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Min-Chul Sun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma treatment apparatus, lower electrode assembly and forming me...
- Patent number 12,261,012
- Issue date Mar 25, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC.
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, and etching gas
- Patent number 12,261,050
- Issue date Mar 25, 2025
- Kioxia Corporation
- Takaya Ishino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field stop IGBT with grown injection region
- Patent number 12,262,553
- Issue date Mar 25, 2025
- iPower Semiconductor
- Hamza Yilmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High electron mobility transistor and fabricating method of the same
- Patent number 12,261,052
- Issue date Mar 25, 2025
- United Microelectronics Corp.
- Ming-Hua Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with reduced loading effect
- Patent number 12,261,085
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Lun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic complementary field-effect transistors having carbon-dop...
- Patent number 12,262,559
- Issue date Mar 25, 2025
- Applied Materials, Inc.
- Andrew Anthony Cockburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, substrate processing apparatus, rec...
- Patent number 12,255,072
- Issue date Mar 18, 2025
- Kokusai Electric Corporation
- Masato Kawanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a FinFET with merged epitaxial source/drain...
- Patent number 12,255,255
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Min Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing composition, rinse composition, chemi...
- Patent number 12,252,632
- Issue date Mar 18, 2025
- Entegris, Inc.
- Hiroshi Kitamura
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Integrated assemblies and methods of forming integrated assemblies
- Patent number 12,256,546
- Issue date Mar 18, 2025
- Micron Technology, Inc.
- Yiping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inner spacer structures for gate-all-around field effect transistors
- Patent number 12,255,249
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Mrunal Abhijith Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gallium nitride drain structures and methods of forming the same
- Patent number 12,255,232
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated cleaning process for substrate etching
- Patent number 12,255,055
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming of inner spacer structure using semiconductor ma...
- Patent number 12,255,102
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Lun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon carbide substrate manufacturing method, silicon carbide sub...
- Patent number 12,255,073
- Issue date Mar 18, 2025
- Kwansei Gakuin Educational Foundation
- Tadaaki Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etching method and semiconductor structure manufactured u...
- Patent number 12,255,074
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Da Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming fin-on-nanosheet transistor stacks
- Patent number 12,255,099
- Issue date Mar 18, 2025
- Samsung Electronics Co., Ltd.
- Gunho Jo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical planarization equipment, wafer transfer method,...
- Patent number 12,251,785
- Issue date Mar 18, 2025
- HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.
- EdwardLiCang Lee
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device, semiconductor component and method of fabrica...
- Patent number 12,255,162
- Issue date Mar 18, 2025
- Infineon Technologies Austria AG
- Carsten von Koblinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated assemblies and methods of forming integrated assemblies
- Patent number 12,250,812
- Issue date Mar 11, 2025
- Micron Technology, Inc.
- Jordan D. Greenlee
- G11 - INFORMATION STORAGE
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method, method for producing semiconductor substr...
- Patent number 12,249,513
- Issue date Mar 11, 2025
- Fujimi Incorporated
- Tsutomu Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etch apparatus
- Patent number 12,249,520
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hong-Ting Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment liquid for semiconductor with ruthenium and method of pro...
- Patent number 12,247,299
- Issue date Mar 11, 2025
- Tokuyama Corporation
- Tomoaki Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, method of manufacturing the same and electron...
- Patent number 12,249,544
- Issue date Mar 11, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Huilong Zhu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing a grid
- Patent number 12,249,630
- Issue date Mar 11, 2025
- II-VI DELAWARE, INC.
- Adolf Schöner
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR METHOD AND DEVICE
- Publication number 20250098280
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Cheng Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU SIDEWALL PASSIVATION TOWARD THE BOTTOM OF HIGH ASPECT RATIO...
- Publication number 20250095984
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20250096001
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- Junsang KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE
- Publication number 20250096000
- Publication date Mar 20, 2025
- United Microelectronics Corp.
- Kun-Ju Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO CONTROL ETCH PROFILE BY RF PULSING
- Publication number 20250095964
- Publication date Mar 20, 2025
- LAM RESEARCH CORPORATION
- Daksh AGARWAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION AND SURFACE TREATMENT METHOD
- Publication number 20250092284
- Publication date Mar 20, 2025
- FUJIMI INCORPORATED
- Toshio SHINODA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SURFACE PROCESSING METHOD
- Publication number 20250096002
- Publication date Mar 20, 2025
- DENSON CORPORATION
- Kazufumi AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DAM LAMINATE ISOLATION SUBSTRATE
- Publication number 20250096034
- Publication date Mar 20, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Chang-Yen KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20250098211
- Publication date Mar 20, 2025
- Kabushiki Kaisha Toshiba
- Kohei OASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS W...
- Publication number 20250087485
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Chen-Ying WU
- C30 - CRYSTAL GROWTH
Information Patent Application
CONTACT RESISTANCE REDUCTION FOR TRANSISTORS
- Publication number 20250087491
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Ping Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PROCESS USING STEAM FOR POLISHING FLU...
- Publication number 20250083282
- Publication date Mar 13, 2025
- WESTERN DIGITAL TECHNOLOGIES, INC.,
- Yohei YAMADA
- B24 - GRINDING POLISHING
Information Patent Application
Advanced Substrates for Large, High Performance Power Packages
- Publication number 20250087566
- Publication date Mar 13, 2025
- Google LLC
- Ilyas Mohammed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH
- Publication number 20250087456
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROTECTING TO REUSE SILICON CARRIER WAFER BASED ON IR L...
- Publication number 20250079166
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Panupong JAIPAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCEMENT-MODE SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURI...
- Publication number 20250079170
- Publication date Mar 6, 2025
- ENKRIS SEMICONDUCTOR, INC.
- Kai CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS AMPLIFIER FOR CMP COOLING
- Publication number 20250073850
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Haosheng WU
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR PLASMA ETCHING A LAYER BASED ON A III-N MATERIAL
- Publication number 20250079122
- Publication date Mar 6, 2025
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Nicolas POSSEME
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20250081530
- Publication date Mar 6, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Junjie LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSI...
- Publication number 20250079167
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Ernesto Suarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etched Compound Semiconductor
- Publication number 20250079175
- Publication date Mar 6, 2025
- SPTS TECHNOLOGIES LIMITED
- Alex CROOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER-LEVEL FABRICATION OF ELECTROSTATIC DISCHARGE DEVICES
- Publication number 20250079401
- Publication date Mar 6, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Rongwei ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250081480
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jhih-Bin CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Profile Control of Channel Structures for Semiconductor Devices
- Publication number 20250081531
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Wei HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Carbide Epitaxy
- Publication number 20250079165
- Publication date Mar 6, 2025
- ThinSiC Inc.
- Tirunelveli Subramaniam Ravi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20250079178
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250079177
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- En-Ping LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF FORMATION
- Publication number 20250069893
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu Ming HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PERFORMING NANOTRANSFER WITHOUT CHEMICAL TREATMENT AND S...
- Publication number 20250069890
- Publication date Feb 27, 2025
- Korea Institute of Machinery and Materials
- Jun-ho JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20250069935
- Publication date Feb 27, 2025
- KIOXIA Corporation
- Wu LI
- H01 - BASIC ELECTRIC ELEMENTS

Chemical or electrical treatment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of making a three-dimensional memory device using composite...

Selective etch of a substrate

Method for producing an optoelectronic device

Methods of manufacturing semiconductor devices by etching active fi...

Plasma treatment apparatus, lower electrode assembly and forming me...

Method of manufacturing semiconductor device, and etching gas

Field stop IGBT with grown injection region

High electron mobility transistor and fabricating method of the same

Semiconductor device with reduced loading effect

Monolithic complementary field-effect transistors having carbon-dop...

Method of processing substrate, substrate processing apparatus, rec...

Method of manufacturing a FinFET with merged epitaxial source/drain...

Chemical-mechanical polishing composition, rinse composition, chemi...

Integrated assemblies and methods of forming integrated assemblies

Inner spacer structures for gate-all-around field effect transistors

Gallium nitride drain structures and methods of forming the same

Integrated cleaning process for substrate etching

Methods of forming of inner spacer structure using semiconductor ma...

Silicon carbide substrate manufacturing method, silicon carbide sub...

Selective etching method and semiconductor structure manufactured u...

Methods of forming fin-on-nanosheet transistor stacks

Chemical mechanical planarization equipment, wafer transfer method,...

Semiconductor device, semiconductor component and method of fabrica...

Integrated assemblies and methods of forming integrated assemblies

Etching method and etching apparatus

Surface treatment method, method for producing semiconductor substr...

Wet etch apparatus

Treatment liquid for semiconductor with ruthenium and method of pro...

Semiconductor device, method of manufacturing the same and electron...

Method for manufacturing a grid

Patents Applicationslast 30 patents

SEMICONDUCTOR METHOD AND DEVICE

IN-SITU SIDEWALL PASSIVATION TOWARD THE BOTTOM OF HIGH ASPECT RATIO...

METHOD OF PROCESSING A SUBSTRATE

MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE

METHOD TO CONTROL ETCH PROFILE BY RF PULSING

POLISHING COMPOSITION AND SURFACE TREATMENT METHOD

SURFACE PROCESSING METHOD

DAM LAMINATE ISOLATION SUBSTRATE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS W...

CONTACT RESISTANCE REDUCTION FOR TRANSISTORS

CHEMICAL MECHANICAL POLISHING PROCESS USING STEAM FOR POLISHING FLU...

Advanced Substrates for Large, High Performance Power Packages

HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH

METHODS FOR PROTECTING TO REUSE SILICON CARRIER WAFER BASED ON IR L...

ENHANCEMENT-MODE SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURI...

GAS AMPLIFIER FOR CMP COOLING

METHOD FOR PLASMA ETCHING A LAYER BASED ON A III-N MATERIAL

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSI...

Plasma Etched Compound Semiconductor

WAFER-LEVEL FABRICATION OF ELECTROSTATIC DISCHARGE DEVICES

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Profile Control of Channel Structures for Semiconductor Devices

Silicon Carbide Epitaxy

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHODS OF FORMATION

METHOD FOR PERFORMING NANOTRANSFER WITHOUT CHEMICAL TREATMENT AND S...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...