Chemical or electrical treatment

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H01L21/306

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/306Chemical or electrical treatment

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Monolithic platen
- Patent number 12,311,498
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Lung Lai
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for etching a semiconductor substrate in a pla...
- Patent number 12,315,732
- Issue date May 27, 2025
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced etch selectivity using halides
- Patent number 12,315,733
- Issue date May 27, 2025
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isotropic silicon nitride removal
- Patent number 12,315,739
- Issue date May 27, 2025
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,317,524
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ling Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making semiconductor device with selective etching of su...
- Patent number 12,315,723
- Issue date May 27, 2025
- ATOMERA INCORPORATED
- Marek Hytha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,315,759
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bo-Cyuan Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,315,698
- Issue date May 27, 2025
- Tokyo Electron Limited
- Cedric Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 12,312,696
- Issue date May 27, 2025
- ASM IP Holding B.V.
- Tom E. Blomberg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for chemical mechanical polishing of a SiC wafer based on a...
- Patent number 12,311,497
- Issue date May 27, 2025
- GUANGDONG UNIVERSITY OF TECHNOLOGY
- Jiabin Lu
- B24 - GRINDING POLISHING
Information Patent Grant
Structure and method for preventing silicide contamination during t...
- Patent number 12,317,488
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimized proximity profile for strained source/drain feature and m...
- Patent number 12,317,548
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-An Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a radio frequency silicon-on-insulator (RFSOI) wa...
- Patent number 12,315,722
- Issue date May 27, 2025
- ATOMERA INCORPORATED
- Nyles Wynn Cody
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method and substrate treating apparatus
- Patent number 12,315,743
- Issue date May 27, 2025
- Semes Co., Ltd.
- Ki Yung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Step-stacked nanowire CMOS structure for low power logic device and...
- Patent number 12,317,588
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Byounghak Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and methods of manufacturing semiconduc...
- Patent number 12,315,703
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Kyoungchon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming films with improved film quality
- Patent number 12,315,718
- Issue date May 27, 2025
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput polishing modules and modular polishing systems
- Patent number 12,308,272
- Issue date May 20, 2025
- Applied Materials, Inc.
- Jagan Rangarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,308,208
- Issue date May 20, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing isolation structure of hybrid epitaxial ar...
- Patent number 12,308,281
- Issue date May 20, 2025
- Shanghai Huali Integrated Circuit Corporation
- Yongyue Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit structure with backside dielectric layer having...
- Patent number 12,308,287
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Lun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,310,093
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Liang Tai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor structure having fins
- Patent number 12,308,280
- Issue date May 20, 2025
- NANYA TECHNOLOGY CORPORATION
- Chen-Tsung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for semiconductor silicon wafer
- Patent number 12,308,228
- Issue date May 20, 2025
- Globalwafers Japan Co., Ltd
- Takeshi Senda
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus
- Patent number 12,308,240
- Issue date May 20, 2025
- SPTS Technologies Limited
- Janet Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition
- Patent number 12,305,081
- Issue date May 20, 2025
- Japan Vam & Poval Co., Ltd.
- Takashi Murakami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
3D semiconductor device and array layout with isolated conductive p...
- Patent number 12,310,023
- Issue date May 20, 2025
- Macronix International Co., Ltd.
- Hang-Ting Lue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure etching solution and method for fabricating...
- Patent number 12,308,239
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chung-Chieh Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,308,258
- Issue date May 20, 2025
- SCREEN Holdings Co., Ltd.
- Tomohiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for selective metal compound removal
- Patent number 12,300,501
- Issue date May 13, 2025
- Applied Materials, Inc.
- Zhenjiang Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICE FOR ETCHING SILICON OXIDE
- Publication number 20250174464
- Publication date May 29, 2025
- Central Glass Company, Limited
- Shoi SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING OF TRENCHES IN A SUBSTRATE
- Publication number 20250174489
- Publication date May 29, 2025
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Thierry BERGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PI-TYPE TRENCH GATE SILICON CARBIDE MOSFET DEVICE AND FABRICATION M...
- Publication number 20250176207
- Publication date May 29, 2025
- JSAB Technologies (Shenzhen) Ltd.
- Yong LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SEMICONDUCTOR D...
- Publication number 20250176242
- Publication date May 29, 2025
- SK HYNIX INC.
- Na Hye WON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH QUALITY NITRIDE AND OXIDE FABRICATION AND SYSTEM
- Publication number 20250174455
- Publication date May 29, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Saiful Islam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250174462
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Takuya SEINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH FIN END SPACER DUMMY GATE AND METHOD OF M...
- Publication number 20250176240
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Tai CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Edge structure of semiconductor wafer and manufacturing method thereof
- Publication number 20250166997
- Publication date May 22, 2025
- UNITED MICROELECTRONICS CORP.
- Yu-Ping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STACKED TRANSISTORS WITH DIFFERENT CHANNEL WIDTHS
- Publication number 20250169157
- Publication date May 22, 2025
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CHUCK ASSEMBLY
- Publication number 20250167037
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transistors with Recessed Silicon Cap and Method Forming Same
- Publication number 20250169170
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHANT COMPOSITION FOR ETCHING SILICON GERMANIUM FILM AND METHOD O...
- Publication number 20250163323
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Changjun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT
- Publication number 20250166977
- Publication date May 22, 2025
- SEMES CO., LTD.
- HYOUNGKYU SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CURTAIN FOR SEMICONDUCTOR MANUFACUTRING SYSTEM
- Publication number 20250166998
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Lid.
- Kent LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20250167013
- Publication date May 22, 2025
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING SOLUTION COMPOSITION AND ETCHING METHOD
- Publication number 20250154661
- Publication date May 15, 2025
- Hiroki INAZUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND E...
- Publication number 20250154410
- Publication date May 15, 2025
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION
- Publication number 20250157815
- Publication date May 15, 2025
- Applied Materials, Inc.
- Tassie ANDERSEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF OBTAINING NANOSCALE LINE BY USING LASER
- Publication number 20250157816
- Publication date May 15, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Jinbiao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHODS
- Publication number 20250157825
- Publication date May 15, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Keeyoung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250159936
- Publication date May 15, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Takahiro SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250157811
- Publication date May 15, 2025
- ASM IP HOLDING B.V.
- Jeonghoon Jang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER TREATMENT DEVICE AND WAFER TREATMENT METHOD
- Publication number 20250157838
- Publication date May 15, 2025
- SwaySure Technology Co., Ltd.
- Zhibo Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20250154409
- Publication date May 15, 2025
- Resonac Corporation
- Atsushi SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
THERMAL ATOMIC LAYER ETCHING PROCESSES
- Publication number 20250154662
- Publication date May 15, 2025
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHIP LIQUID-COOLING HEAT DISSIPATION STRUCTURE AND FABRICATION METH...
- Publication number 20250157884
- Publication date May 15, 2025
- ZTE Corporation
- Cheng TAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES WITH MULTIPLE SILICID...
- Publication number 20250159965
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Yip Loh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Source with Radial Coil Network
- Publication number 20250157791
- Publication date May 15, 2025
- Yuhui ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING THROUGH-GLASS VIAS
- Publication number 20250157812
- Publication date May 15, 2025
- Corning Incorporated
- Jason Roy Grenier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELD STRUCTURE FOR BACKSIDE THROUGH SUBSTRATE VIAS (TSVS)
- Publication number 20250149407
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Min-Feng Kao
- H01 - BASIC ELECTRIC ELEMENTS

Chemical or electrical treatment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Monolithic platen

Method and apparatus for etching a semiconductor substrate in a pla...

Enhanced etch selectivity using halides

Isotropic silicon nitride removal

Semiconductor device and method

Method for making semiconductor device with selective etching of su...

FinFET device and method of forming same

Plasma processing method and plasma processing apparatus

Thermal atomic layer etching processes

Method for chemical mechanical polishing of a SiC wafer based on a...

Structure and method for preventing silicide contamination during t...

Optimized proximity profile for strained source/drain feature and m...

Method for making a radio frequency silicon-on-insulator (RFSOI) wa...

Substrate treating method and substrate treating apparatus

Step-stacked nanowire CMOS structure for low power logic device and...

Plasma processing apparatus and methods of manufacturing semiconduc...

Forming films with improved film quality

High throughput polishing modules and modular polishing systems

Substrate processing method and substrate processing apparatus

Method for manufacturing isolation structure of hybrid epitaxial ar...

Integrated circuit structure with backside dielectric layer having...

Semiconductor device and manufacturing method thereof

Method of manufacturing semiconductor structure having fins

Manufacturing method for semiconductor silicon wafer

Method and apparatus

Polishing composition

3D semiconductor device and array layout with isolated conductive p...

Semiconductor structure etching solution and method for fabricating...

Substrate processing apparatus and substrate processing method

Systems and methods for selective metal compound removal

Patents Applicationslast 30 patents

METHOD AND DEVICE FOR ETCHING SILICON OXIDE

FORMING OF TRENCHES IN A SUBSTRATE

PI-TYPE TRENCH GATE SILICON CARBIDE MOSFET DEVICE AND FABRICATION M...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SEMICONDUCTOR D...

HIGH QUALITY NITRIDE AND OXIDE FABRICATION AND SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SEMICONDUCTOR DEVICE WITH FIN END SPACER DUMMY GATE AND METHOD OF M...

Edge structure of semiconductor wafer and manufacturing method thereof

STACKED TRANSISTORS WITH DIFFERENT CHANNEL WIDTHS

WAFER CHUCK ASSEMBLY

Transistors with Recessed Silicon Cap and Method Forming Same

ETCHANT COMPOSITION FOR ETCHING SILICON GERMANIUM FILM AND METHOD O...

SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT

GAS CURTAIN FOR SEMICONDUCTOR MANUFACUTRING SYSTEM

SHOWERHEAD DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM

ETCHING SOLUTION COMPOSITION AND ETCHING METHOD

COMPOSITION, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND E...

SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION

METHOD OF OBTAINING NANOSCALE LINE BY USING LASER

ETCHING METHODS

SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD

WAFER TREATMENT DEVICE AND WAFER TREATMENT METHOD

ETCHING METHOD

THERMAL ATOMIC LAYER ETCHING PROCESSES

CHIP LIQUID-COOLING HEAT DISSIPATION STRUCTURE AND FABRICATION METH...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES WITH MULTIPLE SILICID...

Inductively Coupled Plasma Source with Radial Coil Network

METHODS FOR FORMING THROUGH-GLASS VIAS

SHIELD STRUCTURE FOR BACKSIDE THROUGH SUBSTRATE VIAS (TSVS)