Circuits specially adapted for controlling the RF discharge

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CPC
H01J37/32174

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32174Circuits specially adapted for controlling the RF discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Control of plasma formation by RF coupling structures
- Patent number 12,283,462
- Issue date Apr 22, 2025
- Lam Research Corporation
- Hema Swaroop Mopidevi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for multi-level pulsing in RF plasma tools
- Patent number 12,283,463
- Issue date Apr 22, 2025
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma antenna and apparatus for generating plasma having the same
- Patent number 12,278,088
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Il Gyo Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control system and methods
- Patent number 12,278,089
- Issue date Apr 15, 2025
- Applied Materials, Inc.
- Michael Andrew Stearns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple state pulsing for high aspect ratio etch
- Patent number 12,278,112
- Issue date Apr 15, 2025
- Lam Research Corporation
- Aniruddha Joi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced tuning methods for mitigating RF load impedance variations...
- Patent number 12,278,090
- Issue date Apr 15, 2025
- MKS Instruments, Inc.
- Aaron Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for emulating a reactive source impedance of a...
- Patent number 12,266,504
- Issue date Apr 1, 2025
- Advanced Energy Industries, Inc.
- Gideon Johannes Jacobus Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,025
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,249,487
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,249,486
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 12,237,148
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosecond pulser ADC system
- Patent number 12,230,477
- Issue date Feb 18, 2025
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing silicon nitride films
- Patent number 12,230,495
- Issue date Feb 18, 2025
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state pulsing for achieving a balance between bow control and...
- Patent number 12,217,972
- Issue date Feb 4, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Solid-state switch based high-speed pulser with plasma IEDF modific...
- Patent number 12,205,797
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power generator having multiple output ports
- Patent number 12,205,796
- Issue date Jan 21, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency generator
- Patent number 12,206,372
- Issue date Jan 21, 2025
- Comet AG
- Daniel Gruner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of processing substrate, met...
- Patent number 12,195,854
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Teruo Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compact high density plasma source
- Patent number 12,198,896
- Issue date Jan 14, 2025
- Lam Research Corporation
- Roger Patrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual RF for controllable film deposition
- Patent number 12,191,115
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 12,193,138
- Issue date Jan 7, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,116
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 12,176,183
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...
- Publication number 20250140565
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND COMMUNICATION SYSTEM FOR CONTROL OF...
- Publication number 20250138516
- Publication date May 1, 2025
- Hitachi High-Tech Corporation
- Tatsuya MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL METHOD, PLASMA PROCESSING APPARATUS AND PLASMA PROCE...
- Publication number 20250140524
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Yohei MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE
- Publication number 20250140525
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Masamichi NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY CONTROL OF SOURCE RADIO FREQUENCY POWER IN PLASMA PROCESSING
- Publication number 20250132129
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250132130
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MODULATION APPARATUS FOR SUBSTRATE PROCESSING SYSTEM
- Publication number 20250132131
- Publication date Apr 24, 2025
- ASM IP HOLDING B.V.
- Akshay Gunaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK ELECTRODE WITH SELF-INDUCED DC VOLTAGE
- Publication number 20250125180
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARC REDUCTION AND RF CONTROL FOR ELECTROSTATIC CHUCKS IN SEMICONDUC...
- Publication number 20250116001
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Allison Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADIO FREQUENCY POWER GENERATOR HAVING MULTIPLE OUTPUT PORTS
- Publication number 20250118533
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK LAYER AND FORMATION METHOD THEREOF
- Publication number 20250118569
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR PLASMA PROCESSING
- Publication number 20250118532
- Publication date Apr 10, 2025
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF
- Publication number 20250112028
- Publication date Apr 3, 2025
- JUSUNG ENGINEERING CO., LTD.
- Sang Kyo KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250106976
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRICAL VARIABLE CAPACITOR CIRCUIT AND SEMICONDUCTOR PROCESSING...
- Publication number 20250104970
- Publication date Mar 27, 2025
- INDUSTRIAL COOPERATION FOUNDATION JEONBUK NATIONAL UNIVERSITY
- Yongsug SUH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250095963
- Publication date Mar 20, 2025
- Hitachi High-Tech Corporation
- Haixiang HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS
- Publication number 20250087459
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Pingshan Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS
- Publication number 20250079128
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE
- Publication number 20250079121
- Publication date Mar 6, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250062101
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON MASK DEPOSITION
- Publication number 20250054760
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS
- Publication number 20250054736
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Patrick G. BREILING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250046620
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Kenta NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Device
- Publication number 20250046575
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Takahiro SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING
- Publication number 20250046574
- Publication date Feb 6, 2025
- UVAT TECHNOLOGY CO.,LTD.
- YUAN-CHI LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR HEATING A MEDIUM USING AN RF SIGNAL
- Publication number 20250029813
- Publication date Jan 23, 2025
- TRUMPF Huettinger GmbH + Co. KG
- Sebastian Wassenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250022684
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tatsuro OHSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20250014867
- Publication date Jan 9, 2025
- PSK INC.
- Sung Jin YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE
- Publication number 20250006470
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250006516
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- H01 - BASIC ELECTRIC ELEMENTS

Circuits specially adapted for controlling the RF discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Control of plasma formation by RF coupling structures

Systems and methods for multi-level pulsing in RF plasma tools

Plasma antenna and apparatus for generating plasma having the same

Plasma uniformity control system and methods

Multiple state pulsing for high aspect ratio etch

Enhanced tuning methods for mitigating RF load impedance variations...

Process control enabled VDC sensor for plasma process

Method and apparatus for emulating a reactive source impedance of a...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Apparatus to control ion energy

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Reducing aspect ratio dependent etch with direct current bias pulsing

Plasma processing assembly using pulsed-voltage and radio-frequency...

Nanosecond pulser ADC system

Method of depositing silicon nitride films

Radio frequency (RF) system with embedded RF signal pickups

Multi-state pulsing for achieving a balance between bow control and...

Rating substrate support assemblies based on impedance circuit elec...

Solid-state switch based high-speed pulser with plasma IEDF modific...

Radio frequency power generator having multiple output ports

Radio frequency generator

Substrate processing apparatus, method of processing substrate, met...

Compact high density plasma source

Dual RF for controllable film deposition

Matchless plasma source for semiconductor wafer fabrication

Plasma processing apparatus and plasma processing method

RF voltage and current (V-I) sensors and measurement methods

Substrate processing apparatus and interlock method thereof

Patents Applicationslast 30 patents

MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...

PLASMA PROCESSING APPARATUS AND COMMUNICATION SYSTEM FOR CONTROL OF...

PLASMA CONTROL METHOD, PLASMA PROCESSING APPARATUS AND PLASMA PROCE...

PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE

FREQUENCY CONTROL OF SOURCE RADIO FREQUENCY POWER IN PLASMA PROCESSING

PLASMA PROCESSING APPARATUS

PLASMA MODULATION APPARATUS FOR SUBSTRATE PROCESSING SYSTEM

BIPOLAR ELECTROSTATIC CHUCK ELECTRODE WITH SELF-INDUCED DC VOLTAGE

ARC REDUCTION AND RF CONTROL FOR ELECTROSTATIC CHUCKS IN SEMICONDUC...

RADIO FREQUENCY POWER GENERATOR HAVING MULTIPLE OUTPUT PORTS

HARD MASK LAYER AND FORMATION METHOD THEREOF

SYSTEM AND METHOD FOR PLASMA PROCESSING

SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

ELECTRICAL VARIABLE CAPACITOR CIRCUIT AND SEMICONDUCTOR PROCESSING...

PLASMA PROCESSING APPARATUS

TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS

PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS

DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CARBON MASK DEPOSITION

A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS

PLASMA PROCESSING METHOD

Plasma Processing Device

CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING

METHOD AND APPARATUS FOR HEATING A MEDIUM USING AN RF SIGNAL

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS