Circuits specially adapted for controlling the RF discharge

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CPC
H01J37/32174

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32174Circuits specially adapted for controlling the RF discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Radio frequency power return path
- Patent number 12,340,984
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Luke Bonecutter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,334,305
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter device and plasma processing apparatus
- Patent number 12,334,309
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and methods for implementing a micro pulsing scheme using du...
- Patent number 12,334,304
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- A N M Wasekul Azad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antennas, circuits for generating plasma, plasma processing apparat...
- Patent number 12,327,709
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Dong-Hyub Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsing plasma treatment for film densification
- Patent number 12,322,573
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Rui Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Robust tensorized shaped setpoint waveform streaming control
- Patent number 12,300,464
- Issue date May 13, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for a substrate support
- Patent number 12,293,902
- Issue date May 6, 2025
- Applied Materials, Inc.
- Muhannad Mustafa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of plasma formation by RF coupling structures
- Patent number 12,283,462
- Issue date Apr 22, 2025
- Lam Research Corporation
- Hema Swaroop Mopidevi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for multi-level pulsing in RF plasma tools
- Patent number 12,283,463
- Issue date Apr 22, 2025
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma antenna and apparatus for generating plasma having the same
- Patent number 12,278,088
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Il Gyo Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control system and methods
- Patent number 12,278,089
- Issue date Apr 15, 2025
- Applied Materials, Inc.
- Michael Andrew Stearns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple state pulsing for high aspect ratio etch
- Patent number 12,278,112
- Issue date Apr 15, 2025
- Lam Research Corporation
- Aniruddha Joi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced tuning methods for mitigating RF load impedance variations...
- Patent number 12,278,090
- Issue date Apr 15, 2025
- MKS Instruments, Inc.
- Aaron Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for emulating a reactive source impedance of a...
- Patent number 12,266,504
- Issue date Apr 1, 2025
- Advanced Energy Industries, Inc.
- Gideon Johannes Jacobus Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,025
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,249,487
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,249,486
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 12,237,148
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosecond pulser ADC system
- Patent number 12,230,477
- Issue date Feb 18, 2025
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing silicon nitride films
- Patent number 12,230,495
- Issue date Feb 18, 2025
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state pulsing for achieving a balance between bow control and...
- Patent number 12,217,972
- Issue date Feb 4, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Solid-state switch based high-speed pulser with plasma IEDF modific...
- Patent number 12,205,797
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20250210308
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple State Pulsing for High Aspect Ratio Etch
- Publication number 20250210364
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Aniruddha Joi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250210370
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Fumiya TAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY REFEEDING MODULE, SWITCHING CIRCUIT AND EMBODIMENT, PLASMA P...
- Publication number 20250210306
- Publication date Jun 26, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250212310
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250210307
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Sho SAITOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...
- Publication number 20250210314
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250203749
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250201535
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Sho OIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250203748
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250191880
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE WAVEFORM BIASING OF PLASMA
- Publication number 20250191884
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SUPPLYING A LASER OR PLASMA WITH POWER, AND PLASMA OR LA...
- Publication number 20250191885
- Publication date Jun 12, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Christian Thome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER...
- Publication number 20250188594
- Publication date Jun 12, 2025
- Evatec AG
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250183012
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250183005
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Splitting Current from Direct-Drive Radiof...
- Publication number 20250174431
- Publication date May 29, 2025
- LAM RESEARCH CORPORATION
- Matthew Lowell Talley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER AFTER A STATE TRAN...
- Publication number 20250166969
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- RANADEEP BHOWMICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT
- Publication number 20250166971
- Publication date May 22, 2025
- ASM IP HOLDING B.V.
- Songwhe Herr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF CONTROLLING PHY...
- Publication number 20250149317
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yunha Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149298
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING POWER STORAG...
- Publication number 20250149297
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...
- Publication number 20250149299
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250149300
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Tangkuei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...
- Publication number 20250140565
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL METHOD, PLASMA PROCESSING APPARATUS AND PLASMA PROCE...
- Publication number 20250140524
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Yohei MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND COMMUNICATION SYSTEM FOR CONTROL OF...
- Publication number 20250138516
- Publication date May 1, 2025
- Hitachi High-Tech Corporation
- Tatsuya MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE
- Publication number 20250140525
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Masamichi NOMURA
- H01 - BASIC ELECTRIC ELEMENTS

Circuits specially adapted for controlling the RF discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radio frequency power return path

Plasma processing apparatus

Filter device and plasma processing apparatus

System and methods for implementing a micro pulsing scheme using du...

Antennas, circuits for generating plasma, plasma processing apparat...

Pulsing plasma treatment for film densification

Robust tensorized shaped setpoint waveform streaming control

Process kit for a substrate support

Throughput improvement with interval conditioning purging

Control of plasma formation by RF coupling structures

Systems and methods for multi-level pulsing in RF plasma tools

Plasma antenna and apparatus for generating plasma having the same

Plasma uniformity control system and methods

Multiple state pulsing for high aspect ratio etch

Enhanced tuning methods for mitigating RF load impedance variations...

Process control enabled VDC sensor for plasma process

Method and apparatus for emulating a reactive source impedance of a...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Apparatus to control ion energy

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Reducing aspect ratio dependent etch with direct current bias pulsing

Plasma processing assembly using pulsed-voltage and radio-frequency...

Nanosecond pulser ADC system

Method of depositing silicon nitride films

Radio frequency (RF) system with embedded RF signal pickups

Multi-state pulsing for achieving a balance between bow control and...

Rating substrate support assemblies based on impedance circuit elec...

Solid-state switch based high-speed pulser with plasma IEDF modific...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

Multiple State Pulsing for High Aspect Ratio Etch

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ENERGY REFEEDING MODULE, SWITCHING CIRCUIT AND EMBODIMENT, PLASMA P...

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

PLASMA PROCESSING APPARATUS

PULSED VOLTAGE WAVEFORM BIASING OF PLASMA

METHOD FOR SUPPLYING A LASER OR PLASMA WITH POWER, AND PLASMA OR LA...

VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER...

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

SUBSTRATE PROCESSING METHOD

Apparatus and Method for Splitting Current from Direct-Drive Radiof...

SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER AFTER A STATE TRAN...

SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF CONTROLLING PHY...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING POWER STORAG...

PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...

PLASMA CONTROL METHOD, PLASMA PROCESSING APPARATUS AND PLASMA PROCE...

PLASMA PROCESSING APPARATUS AND COMMUNICATION SYSTEM FOR CONTROL OF...

PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE