Circuits specially adapted for controlling the RF discharge

Industry

CPC
H01J37/32174

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32174Circuits specially adapted for controlling the RF discharge

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and method for controlling source frequ...
- Patent number 12,362,144
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,143
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 12,362,149
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heating blades of razor using RF energy
- Patent number 12,350,851
- Issue date Jul 8, 2025
- HEATED BLADES HOLDING COMPANY, LLC
- Louis D. Tomassetti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio-frequency antenna and plasma processing device
- Patent number 12,354,839
- Issue date Jul 8, 2025
- EMD CORPORATION
- Akinori Ebe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method, and apparatus for controlling ion energy distributi...
- Patent number 12,354,836
- Issue date Jul 8, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device, substrate processing system, control m...
- Patent number 12,354,841
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 12,354,840
- Issue date Jul 8, 2025
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter box for a substrate processing system
- Patent number 12,347,648
- Issue date Jul 1, 2025
- Lam Research Corporation
- Miguel Benjamin Vasquez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 12,347,650
- Issue date Jul 1, 2025
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power return path
- Patent number 12,340,984
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Luke Bonecutter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,334,305
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter device and plasma processing apparatus
- Patent number 12,334,309
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and methods for implementing a micro pulsing scheme using du...
- Patent number 12,334,304
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- A N M Wasekul Azad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antennas, circuits for generating plasma, plasma processing apparat...
- Patent number 12,327,709
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Dong-Hyub Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsing plasma treatment for film densification
- Patent number 12,322,573
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Rui Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Robust tensorized shaped setpoint waveform streaming control
- Patent number 12,300,464
- Issue date May 13, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for a substrate support
- Patent number 12,293,902
- Issue date May 6, 2025
- Applied Materials, Inc.
- Muhannad Mustafa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of plasma formation by RF coupling structures
- Patent number 12,283,462
- Issue date Apr 22, 2025
- Lam Research Corporation
- Hema Swaroop Mopidevi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for multi-level pulsing in RF plasma tools
- Patent number 12,283,463
- Issue date Apr 22, 2025
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma antenna and apparatus for generating plasma having the same
- Patent number 12,278,088
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Il Gyo Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control system and methods
- Patent number 12,278,089
- Issue date Apr 15, 2025
- Applied Materials, Inc.
- Michael Andrew Stearns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple state pulsing for high aspect ratio etch
- Patent number 12,278,112
- Issue date Apr 15, 2025
- Lam Research Corporation
- Aniruddha Joi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced tuning methods for mitigating RF load impedance variations...
- Patent number 12,278,090
- Issue date Apr 15, 2025
- MKS Instruments, Inc.
- Aaron Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for emulating a reactive source impedance of a...
- Patent number 12,266,504
- Issue date Apr 1, 2025
- Advanced Energy Industries, Inc.
- Gideon Johannes Jacobus Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,025
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS
- Publication number 20250232957
- Publication date Jul 17, 2025
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20250226178
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS
- Publication number 20250226182
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment Device and Plasma Treatment Method
- Publication number 20250226180
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi OTOMO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250226181
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250220801
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD OF CONTROLLING PLASMA CHARACTERISTIC, AND SYSTEM...
- Publication number 20250218730
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Dong Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250218744
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250218725
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20250210308
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple State Pulsing for High Aspect Ratio Etch
- Publication number 20250210364
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Aniruddha Joi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250210370
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Fumiya TAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250212310
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY REFEEDING MODULE, SWITCHING CIRCUIT AND EMBODIMENT, PLASMA P...
- Publication number 20250210306
- Publication date Jun 26, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250210307
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Sho SAITOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...
- Publication number 20250210314
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250203749
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250201535
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Sho OIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250203748
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250191880
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE WAVEFORM BIASING OF PLASMA
- Publication number 20250191884
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SUPPLYING A LASER OR PLASMA WITH POWER, AND PLASMA OR LA...
- Publication number 20250191885
- Publication date Jun 12, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Christian Thome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER...
- Publication number 20250188594
- Publication date Jun 12, 2025
- Evatec AG
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250183012
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250183005
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Splitting Current from Direct-Drive Radiof...
- Publication number 20250174431
- Publication date May 29, 2025
- LAM RESEARCH CORPORATION
- Matthew Lowell Talley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER AFTER A STATE TRAN...
- Publication number 20250166969
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- RANADEEP BHOWMICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT
- Publication number 20250166971
- Publication date May 22, 2025
- ASM IP HOLDING B.V.
- Songwhe Herr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING

Circuits specially adapted for controlling the RF discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and method for controlling source frequ...

Plasma processing apparatus and plasma processing method

Film stress control for plasma enhanced chemical vapor deposition

Heating blades of razor using RF energy

Radio-frequency antenna and plasma processing device

System, method, and apparatus for controlling ion energy distributi...

Substrate processing device, substrate processing system, control m...

Systems and methods for optimizing power delivery to an electrode o...

Filter box for a substrate processing system

Substrate processing system including dual ion filter for downstrea...

Radio frequency power return path

Plasma processing apparatus

Filter device and plasma processing apparatus

System and methods for implementing a micro pulsing scheme using du...

Antennas, circuits for generating plasma, plasma processing apparat...

Pulsing plasma treatment for film densification

Robust tensorized shaped setpoint waveform streaming control

Process kit for a substrate support

Throughput improvement with interval conditioning purging

Control of plasma formation by RF coupling structures

Systems and methods for multi-level pulsing in RF plasma tools

Plasma antenna and apparatus for generating plasma having the same

Plasma uniformity control system and methods

Multiple state pulsing for high aspect ratio etch

Enhanced tuning methods for mitigating RF load impedance variations...

Process control enabled VDC sensor for plasma process

Method and apparatus for emulating a reactive source impedance of a...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Apparatus to control ion energy

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS

Plasma Treatment Device and Plasma Treatment Method

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

DEVICE AND METHOD OF CONTROLLING PLASMA CHARACTERISTIC, AND SYSTEM...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

Multiple State Pulsing for High Aspect Ratio Etch

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

ENERGY REFEEDING MODULE, SWITCHING CIRCUIT AND EMBODIMENT, PLASMA P...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

PLASMA PROCESSING APPARATUS

PULSED VOLTAGE WAVEFORM BIASING OF PLASMA

METHOD FOR SUPPLYING A LASER OR PLASMA WITH POWER, AND PLASMA OR LA...

VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER...

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

SUBSTRATE PROCESSING METHOD

Apparatus and Method for Splitting Current from Direct-Drive Radiof...

SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER AFTER A STATE TRAN...

SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...