Circuits specially adapted for controlling the RF discharge

Industry

CPC
H01J37/32174

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32174Circuits specially adapted for controlling the RF discharge

Industries

Patents Grantslast 30 patents

Information Patent Grant
Apparatus with switches to produce a waveform
- Patent number 11,978,611
- Issue date May 7, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic control-setpoint modification
- Patent number 11,972,926
- Issue date Apr 30, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 11,967,486
- Issue date Apr 23, 2024
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion current droop compensation
- Patent number 11,967,484
- Issue date Apr 23, 2024
- Eagle Harbor Technologies, Inc.
- Christopher Bowman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shunt door for magnets in plasma process chamber
- Patent number 11,959,174
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 11,961,755
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shinya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, method for manufacturing semiconducor...
- Patent number 11,955,316
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Takayuki Katsunuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-temperature plasma pre-clean for selective gap fill
- Patent number 11,955,381
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Yi Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,955,333
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Jethro Tannos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing with radio frequency (RF) source and bias signal...
- Patent number 11,942,307
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and semiconductor device manufacturing...
- Patent number 11,929,239
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast neutral generation for plasma processing
- Patent number 11,915,910
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 11,908,660
- Issue date Feb 20, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for manipulating power at an edge ring in pla...
- Patent number 11,908,661
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for tuning plasma distribution using phase control
- Patent number 11,908,662
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,908,664
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, and recording medium
- Patent number 11,905,596
- Issue date Feb 20, 2024
- Kokusai Electric Corporation
- Teruo Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,898,236
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF generator device and substrate processing apparatus
- Patent number 11,901,159
- Issue date Feb 13, 2024
- Hitachi Kokusai Electric Inc.
- Naoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,881,382
- Issue date Jan 23, 2024
- Semes Co., Ltd.
- Jun Pyo Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Efficient energy recovery in a nanosecond pulser circuit
- Patent number 11,875,971
- Issue date Jan 16, 2024
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage waveform generator for plasma processing apparatuses
- Patent number 11,875,972
- Issue date Jan 16, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Antonius Wilhelmus Hendricus Johannes Driessen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,875,977
- Issue date Jan 16, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma control system and plasma control program
- Patent number 11,862,431
- Issue date Jan 2, 2024
- Nissin Electric Co., Ltd.
- Tsubasa Iwakoke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 11,854,771
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing using pulsed-voltage and radio-frequency power
- Patent number 11,848,176
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,842,884
- Issue date Dec 12, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,842,885
- Issue date Dec 12, 2023
- HITACHI HIGH-TECH CORPORATION
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Depositing a carbon hardmask by high power pulsed low frequency RF
- Patent number 11,837,441
- Issue date Dec 5, 2023
- Lam Research Corporation
- Matthew Scott Weimer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a function of tuning low frequency RF power d...
- Patent number 11,830,747
- Issue date Nov 28, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20240154594
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSECOND PULSER ADC SYSTEM
- Publication number 20240136152
- Publication date Apr 25, 2024
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
- Publication number 20240136153
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PROCESSING PLASMA AND METHOD OF PROCESSING PLASMA AND...
- Publication number 20240128055
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Hyunbae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240120176
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND METHO...
- Publication number 20240120177
- Publication date Apr 11, 2024
- Samsung Electronics Co., Ltd.
- Ji Mo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple State Pulsing for High Aspect Ratio Etch
- Publication number 20240120205
- Publication date Apr 11, 2024
- LAM RESEARCH CORPORATION
- Aniruddha Joi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240112895
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Publication number 20240105427
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240105424
- Publication date Mar 28, 2024
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20240096599
- Publication date Mar 21, 2024
- Hitachi High-Tech Corporation
- Koichi Takasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTI...
- Publication number 20240071721
- Publication date Feb 29, 2024
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240071728
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Takanori BANSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240071734
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Process Control of Multi-Electrode Systems Equipped with Ion...
- Publication number 20240055228
- Publication date Feb 15, 2024
- MKS Instruments, Inc.
- Linnell MARTINEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS TO CONTROL ION ENERGY
- Publication number 20240055225
- Publication date Feb 15, 2024
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20240047239
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20240038496
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER EFFICIENT LOAD CURRENT DERIVED SWITCH TIMING OF SWITCHING RES...
- Publication number 20240039407
- Publication date Feb 1, 2024
- Kaufman & Robinson, Inc.
- Steven J. Geissler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOAD CURRENT DERIVED SWITCH TIMING OF SWITCHING RESONANT TOPOLOGY
- Publication number 20240038495
- Publication date Feb 1, 2024
- Kaufman & Robinson, Inc.
- Steven J. Geissler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240038500
- Publication date Feb 1, 2024
- Tokyo Electron Limited
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20240030002
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240030003
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Torai IWASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240014006
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Naoki FUJIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANU...
- Publication number 20240006164
- Publication date Jan 4, 2024
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240006165
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Yoshihiro YANAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20240006152
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADAPTIVE ENGINE WITH IDENTITY MAPPING MODULES
- Publication number 20240006169
- Publication date Jan 4, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOOL FOR PREVENTING OR SUPPRESSING ARCING
- Publication number 20230416922
- Publication date Dec 28, 2023
- LAM RESEARCH CORPORATION
- Yukinori SAKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230420220
- Publication date Dec 28, 2023
- Ulvac, Inc.
- Taichi SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS

Circuits specially adapted for controlling the RF discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus with switches to produce a waveform

Dynamic control-setpoint modification

Substrate processing system including dual ion filter for downstrea...

Ion current droop compensation

Shunt door for magnets in plasma process chamber

Substrate support and substrate processing apparatus

Substrate processing method, method for manufacturing semiconducor...

Low-temperature plasma pre-clean for selective gap fill

Methods and apparatus for processing a substrate

Plasma processing with radio frequency (RF) source and bias signal...

Plasma processing apparatus and semiconductor device manufacturing...

Fast neutral generation for plasma processing

Systems and methods for optimizing power delivery to an electrode o...

Apparatus and methods for manipulating power at an edge ring in pla...

Device and method for tuning plasma distribution using phase control

Plasma processing apparatus

Method of manufacturing semiconductor device, and recording medium

Methods and apparatus for processing a substrate

RF generator device and substrate processing apparatus

Apparatus and method for treating substrate

Efficient energy recovery in a nanosecond pulser circuit

Voltage waveform generator for plasma processing apparatuses

Plasma processing apparatus and plasma processing method

Plasma control system and plasma control program

Film stress control for plasma enhanced chemical vapor deposition

Plasma processing using pulsed-voltage and radio-frequency power

Spatial monitoring and control of plasma processing environments

Plasma processing apparatus and plasma processing method

Depositing a carbon hardmask by high power pulsed low frequency RF

Plasma reactor having a function of tuning low frequency RF power d...

Patents Applicationslast 30 patents

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

NANOSECOND PULSER ADC SYSTEM

DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF

APPARATUS FOR PROCESSING PLASMA AND METHOD OF PROCESSING PLASMA AND...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND METHO...

Multiple State Pulsing for High Aspect Ratio Etch

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE

SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTI...

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD

Plasma Process Control of Multi-Electrode Systems Equipped with Ion...

APPARATUS TO CONTROL ION ENERGY

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

RF Voltage and Current (V-I) Sensors and Measurement Methods

POWER EFFICIENT LOAD CURRENT DERIVED SWITCH TIMING OF SWITCHING RES...

LOAD CURRENT DERIVED SWITCH TIMING OF SWITCHING RESONANT TOPOLOGY

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ELECTRODE STRUCTURE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANU...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ETCHING METHOD AND ETCHING APPARATUS

ADAPTIVE ENGINE WITH IDENTITY MAPPING MODULES

TOOL FOR PREVENTING OR SUPPRESSING ARCING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD