Circuits specially adapted for controlling the RF discharge

Industry

CPC
H01J37/32174

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32174Circuits specially adapted for controlling the RF discharge

Industries

Patents Grantslast 30 patents

Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state pulsing for achieving a balance between bow control and...
- Patent number 12,217,972
- Issue date Feb 4, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Solid-state switch based high-speed pulser with plasma IEDF modific...
- Patent number 12,205,797
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power generator having multiple output ports
- Patent number 12,205,796
- Issue date Jan 21, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency generator
- Patent number 12,206,372
- Issue date Jan 21, 2025
- Comet AG
- Daniel Gruner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of processing substrate, met...
- Patent number 12,195,854
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Teruo Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compact high density plasma source
- Patent number 12,198,896
- Issue date Jan 14, 2025
- Lam Research Corporation
- Roger Patrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual RF for controllable film deposition
- Patent number 12,191,115
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 12,193,138
- Issue date Jan 7, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,116
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 12,176,183
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a material layer for semiconductor applications
- Patent number 12,165,877
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zhigang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control a waveform
- Patent number 12,154,759
- Issue date Nov 26, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,761
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single chamber flowable film formation and treatments
- Patent number 12,142,459
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming coating layer having plasma resistance
- Patent number 12,139,785
- Issue date Nov 12, 2024
- Soon Young Kwon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wiring abnormality detection method and plasma processing apparatus
- Patent number 12,136,541
- Issue date Nov 5, 2024
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage waveform generator for plasma assisted processing apparatuses
- Patent number 12,136,534
- Issue date Nov 5, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Jordi Everts
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with multiple radio frequency meshes to control...
- Patent number 12,136,536
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,136,535
- Issue date Nov 5, 2024
- Tokyo Electron Limited
- Tatsuro Ohshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter unit, substrate treating apparatus including the same, and s...
- Patent number 12,125,678
- Issue date Oct 22, 2024
- Semes Co., Ltd.
- Ogsen Galstyan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CARBON MASK DEPOSITION
- Publication number 20250054760
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS
- Publication number 20250054736
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Patrick G. BREILING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250046620
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Kenta NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Device
- Publication number 20250046575
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Takahiro SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING
- Publication number 20250046574
- Publication date Feb 6, 2025
- UVAT TECHNOLOGY CO.,LTD.
- YUAN-CHI LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR HEATING A MEDIUM USING AN RF SIGNAL
- Publication number 20250029813
- Publication date Jan 23, 2025
- TRUMPF Huettinger GmbH + Co. KG
- Sebastian Wassenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250022684
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tatsuro OHSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20250014867
- Publication date Jan 9, 2025
- PSK INC.
- Sung Jin YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE
- Publication number 20250006470
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250006516
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20250006463
- Publication date Jan 2, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...
- Publication number 20240429026
- Publication date Dec 26, 2024
- CENTROTHERM INTERNATIONAL AG
- Sebastian Hubertus Schulz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240429027
- Publication date Dec 26, 2024
- TOKYO ELECTRON LIMITED
- Noriyuki SAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240429024
- Publication date Dec 26, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240420922
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DRY ETCHING USING PLASMA
- Publication number 20240412979
- Publication date Dec 12, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240404860
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING APPARATUS USING PLASMA PHASE SHIFT
- Publication number 20240404790
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Jeongsu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...
- Publication number 20240404789
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING
- Publication number 20240395509
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Enclosure Including Spectral Reflectometry System for Pla...
- Publication number 20240395519
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SOURCE SYSTEM, AND PLASMA PROCES...
- Publication number 20240387143
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Pengkai HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240379328
- Publication date Nov 14, 2024
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS MODULE CHAMBER PROVIDING SYMMETRIC RF RETURN PATH
- Publication number 20240371604
- Publication date Nov 7, 2024
- LAM RESEARCH CORPORATION
- Sam Jafarian Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240371609
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD OF FORMING
- Publication number 20240371650
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Li Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240355584
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced Tuning Methods for Mitigating RF Load Impedance Variations...
- Publication number 20240355585
- Publication date Oct 24, 2024
- MKS Instruments, Inc.
- Aaron BURRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION CURRENT DROOP COMPENSATION
- Publication number 20240347318
- Publication date Oct 17, 2024
- Eagle Harbor Technologies, Inc.
- Christopher Bowman
- H01 - BASIC ELECTRIC ELEMENTS

Circuits specially adapted for controlling the RF discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radio frequency (RF) system with embedded RF signal pickups

Multi-state pulsing for achieving a balance between bow control and...

Rating substrate support assemblies based on impedance circuit elec...

Solid-state switch based high-speed pulser with plasma IEDF modific...

Radio frequency power generator having multiple output ports

Radio frequency generator

Substrate processing apparatus, method of processing substrate, met...

Compact high density plasma source

Dual RF for controllable film deposition

Matchless plasma source for semiconductor wafer fabrication

Plasma processing apparatus and plasma processing method

RF voltage and current (V-I) sensors and measurement methods

Substrate processing apparatus and interlock method thereof

Methods and systems for advanced ion control for etching processes

Dual-frequency, direct-drive inductively coupled plasma source

Control method and plasma processing apparatus

Methods for etching a material layer for semiconductor applications

Spatial control of plasma processing environments

Apparatus to control a waveform

Plasma processing apparatus and plasma processing method

Etching method and plasma processing apparatus

Symmetric plasma source to generate pie-shaped treatment

Single chamber flowable film formation and treatments

Control of plasma sheath with bias supplies

Method for forming coating layer having plasma resistance

Wiring abnormality detection method and plasma processing apparatus

Voltage waveform generator for plasma assisted processing apparatuses

Electrostatic chuck with multiple radio frequency meshes to control...

Plasma processing apparatus and plasma processing method

Filter unit, substrate treating apparatus including the same, and s...

Patents Applicationslast 30 patents

CARBON MASK DEPOSITION

A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS

PLASMA PROCESSING METHOD

Plasma Processing Device

CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING

METHOD AND APPARATUS FOR HEATING A MEDIUM USING AN RF SIGNAL

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...

PLASMA PROCESSING APPARATUS

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

METHOD FOR DRY ETCHING USING PLASMA

PLASMA PROCESSING APPARATUS AND METHOD

WAFER PROCESSING APPARATUS USING PLASMA PHASE SHIFT

SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING

Metrology Enclosure Including Spectral Reflectometry System for Pla...

PLASMA PROCESSING APPARATUS, POWER SOURCE SYSTEM, AND PLASMA PROCES...

PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS

PROCESS MODULE CHAMBER PROVIDING SYMMETRIC RF RETURN PATH

PLASMA PROCESSING APPARATUS

FIN FIELD-EFFECT TRANSISTOR DEVICE AND METHOD OF FORMING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Enhanced Tuning Methods for Mitigating RF Load Impedance Variations...

ION CURRENT DROOP COMPENSATION