Cleaning

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CPC
G03F7/70925

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70925Cleaning

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Lithography method for positive tone development
- Patent number 12,222,654
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Hui Weng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle cleaning device and method of use
- Patent number 12,210,295
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of cleaning wafer table of photolithography system and metho...
- Patent number 12,210,296
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Yu Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus and wafer cleaning method using the same
- Patent number 12,165,866
- Issue date Dec 10, 2024
- Samsung Electronics Co., Ltd.
- Sung Hyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removal device and method
- Patent number 12,158,701
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method, method for forming semiconductor structure and sys...
- Patent number 12,153,341
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wu-Hung Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mitigating long-term energy decay of laser devices
- Patent number 12,147,166
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ping Yen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus with movable stages
- Patent number 12,147,167
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment device
- Patent number 12,138,671
- Issue date Nov 12, 2024
- Shibaura Mechatronics Corporation
- Minami Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate with UV blocker
- Patent number 12,130,561
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for cleaning a support structure in a lithogra...
- Patent number 12,117,737
- Issue date Oct 15, 2024
- ASML Holding N.V.
- Keane Michael Levy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for cleaning an EUV mask
- Patent number 12,099,310
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Hui Li
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle removing assembly and method of cleaning mask for lithography
- Patent number 12,085,866
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for detecting debris in a photolithography system
- Patent number 12,085,865
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Yu Tu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Cleaning system, exposure machine, and cleaning method
- Patent number 12,072,640
- Issue date Aug 27, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Lulu Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning jig, substrate treating apparatus including the same, clea...
- Patent number 12,055,866
- Issue date Aug 6, 2024
- Semes Co., Ltd.
- Kisang Eum
- B08 - CLEANING
Information Patent Grant
Lithography contamination control
- Patent number 12,055,867
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chieh Hsieh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pellicle cleaning apparatus and pellicle cleaning method using the...
- Patent number 12,032,281
- Issue date Jul 9, 2024
- Samsung Electronics Co., Ltd.
- Byunghoon Lee
- B08 - CLEANING
Information Patent Grant
EUV wafer defect improvement and method of collecting nonconductive...
- Patent number 12,032,303
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tao-Hsin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning system, exposure machine, and cleaning method
- Patent number 12,032,304
- Issue date Jul 9, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Lulu Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for cleaning substrates
- Patent number 12,032,302
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Hsuan Liu
- B08 - CLEANING
Information Patent Grant
Methods of cleaning a lithography system
- Patent number 12,019,378
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cho-Ying Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing electronic device
- Patent number 12,013,644
- Issue date Jun 18, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput and high position accurate method for particle insp...
- Patent number 12,013,646
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Jui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for fabricating a semiconductor device and method for fab...
- Patent number 12,009,238
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Po-Chien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component for use in a lithographic apparatus, method of protecting...
- Patent number 12,001,149
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improving critical dimension variation
- Patent number 11,988,972
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hsun Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removal method
- Patent number 11,984,314
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Chian Huang
- B08 - CLEANING
Information Patent Grant
Debris removal from high aspect structures
- Patent number 11,964,310
- Issue date Apr 23, 2024
- Bruker Nano, Inc.
- Tod Evan Robinson
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Imprint Apparatus with Movable Stages
- Publication number 20250028259
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Junichi KANEHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IDENTIFYING DEVIATING MODULES FROM A REFERENCE POPULATION FOR MACHI...
- Publication number 20250029014
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Dimitriy DOUNAEV
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
UTILITY STAGE FOR PHOTOLITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20250021024
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Keane Michael Levy
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
CLEANING METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT S...
- Publication number 20250013159
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Hayato KIKUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF LITHOGRAPHY SUPPORT CLEANING
- Publication number 20240419089
- Publication date Dec 19, 2024
- ASML Holding N.V.
- Keane Michael LEVY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240412946
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Kensuke KOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...
- Publication number 20240385512
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- WU-HUNG KO
- B08 - CLEANING
Information Patent Application
MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES
- Publication number 20240385542
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ping YEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING APPARATUS FOR CLEANING SURFACE OF PHOTOMASK
- Publication number 20240385543
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ting-Hsien Ko
- B08 - CLEANING
Information Patent Application
A CLEANING METHOD AND ASSOCIATED ILLUMINATION SOURCE METROLOGY APPA...
- Publication number 20240377765
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR CLEANING AN EUV MASK
- Publication number 20240377766
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Hui LI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240377764
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yu TU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHY CONTAMINATION CONTROL
- Publication number 20240361708
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh HSIEH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND SYSTEM OF REMOVING PARTICLES FROM PELLICLE
- Publication number 20240353767
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Kang HU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...
- Publication number 20240345490
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM
- Publication number 20240345491
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT
- Publication number 20240337956
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Lucas Christiaan Johan HEIJMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DRYING DEVICE
- Publication number 20240337442
- Publication date Oct 10, 2024
- Carl Zeiss SMT GMBH
- Arvid Maczeyzik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...
- Publication number 20240319617
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND DEVICE FOR CLEANING SUBSTRATES
- Publication number 20240310744
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hsuan LIU
- B08 - CLEANING
Information Patent Application
METHODS OF CLEANING A LITHOGRAPHY SYSTEM
- Publication number 20240302755
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- Cho-Ying LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20240295822
- Publication date Sep 5, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...
- Publication number 20240295826
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Jui HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION
- Publication number 20240295831
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hsun LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR REMOVING A SINGLE PARTICULATE FROM A SUBST...
- Publication number 20240295833
- Publication date Sep 5, 2024
- Carl Zeiss SMT GMBH
- Klaus Edinger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS FOR FABRICATING A SEMICONDUCTOR DEVICE AND METHOD FOR FAB...
- Publication number 20240297057
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- PO-CHIEN HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING COMPOSITION AND METHOD OF CLEANING MASK BY USING THE SAME
- Publication number 20240288785
- Publication date Aug 29, 2024
- Samsung Electronics Co., Ltd.
- Jungah KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR CLEANING AN EXTREME ULTRAVIOLET LIGHT CREATION CHAMBER
- Publication number 20240280917
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Jung Dohyun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHAMBER CLEAN FOR DRY DEVELOP OF METAL ORGANIC PHOTORESISTS
- Publication number 20240274414
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- NEELA AYALASOMAYAJULA
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithography method for positive tone development

Reticle cleaning device and method of use

Method of cleaning wafer table of photolithography system and metho...

Cleaning a structure surface in an EUV chamber

Wafer cleaning apparatus and wafer cleaning method using the same

Particle removal device and method

Cleaning method, method for forming semiconductor structure and sys...

Mitigating long-term energy decay of laser devices

Imprint apparatus with movable stages

Substrate treatment device

Gas distribution plate with UV blocker

Apparatus and method for cleaning a support structure in a lithogra...

System and method for cleaning an EUV mask

Particle removing assembly and method of cleaning mask for lithography

System and method for detecting debris in a photolithography system

Cleaning system, exposure machine, and cleaning method

Cleaning jig, substrate treating apparatus including the same, clea...

Lithography contamination control

Pellicle cleaning apparatus and pellicle cleaning method using the...

EUV wafer defect improvement and method of collecting nonconductive...

Cleaning system, exposure machine, and cleaning method

Method and device for cleaning substrates

Methods of cleaning a lithography system

Method for manufacturing electronic device

High throughput and high position accurate method for particle insp...

Apparatus for fabricating a semiconductor device and method for fab...

Component for use in a lithographic apparatus, method of protecting...

Method and apparatus for improving critical dimension variation

Particle removal method

Debris removal from high aspect structures

Patents Applicationslast 30 patents

Imprint Apparatus with Movable Stages

IDENTIFYING DEVIATING MODULES FROM A REFERENCE POPULATION FOR MACHI...

UTILITY STAGE FOR PHOTOLITHOGRAPHIC APPARATUS AND METHOD

CLEANING METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT S...

APPARATUS FOR AND METHOD OF LITHOGRAPHY SUPPORT CLEANING

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...

MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES

CLEANING APPARATUS FOR CLEANING SURFACE OF PHOTOMASK

A CLEANING METHOD AND ASSOCIATED ILLUMINATION SOURCE METROLOGY APPA...

SYSTEM AND METHOD FOR CLEANING AN EUV MASK

SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM

LITHOGRAPHY CONTAMINATION CONTROL

METHOD AND SYSTEM OF REMOVING PARTICLES FROM PELLICLE

AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...

EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM

APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT

METHOD AND DRYING DEVICE

METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...

METHOD AND DEVICE FOR CLEANING SUBSTRATES

METHODS OF CLEANING A LITHOGRAPHY SYSTEM

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...

METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION

APPARATUS AND METHOD FOR REMOVING A SINGLE PARTICULATE FROM A SUBST...

APPARATUS FOR FABRICATING A SEMICONDUCTOR DEVICE AND METHOD FOR FAB...

CLEANING COMPOSITION AND METHOD OF CLEANING MASK BY USING THE SAME

APPARATUS FOR CLEANING AN EXTREME ULTRAVIOLET LIGHT CREATION CHAMBER

CHAMBER CLEAN FOR DRY DEVELOP OF METAL ORGANIC PHOTORESISTS