Cleaning

Industry

CPC
G03F7/70925

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70925Cleaning

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Particle removal apparatus
- Patent number 12,354,867
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Chian Huang
- B08 - CLEANING
Information Patent Grant
Process tool for dry removal of photoresist
- Patent number 12,346,035
- Issue date Jul 1, 2025
- Lam Research Corporation
- Dries Dictus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of removing particles from pellicle
- Patent number 12,346,034
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Kang Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method and substrate treatment system
- Patent number 12,339,593
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Yuya Kamei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
POD cleaning device
- Patent number 12,330,192
- Issue date Jun 17, 2025
- STI Co., Ltd.
- Young Soo Park
- B08 - CLEANING
Information Patent Grant
EUV wafer defect improvement and method of collecting nonconductive...
- Patent number 12,292,695
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tao-Hsin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for removing contamination
- Patent number 12,287,589
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chih Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for operating an EUV lithography apparatus, and EUV lithogra...
- Patent number 12,287,588
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Moritz Becker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reduce mask defect impact by contamination decompose
- Patent number 12,287,590
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyimide profile control
- Patent number 12,288,758
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Chi Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus for cleaning surface of photomask
- Patent number 12,282,264
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Ting-Hsien Ko
- B08 - CLEANING
Information Patent Grant
Pod cleaning process
- Patent number 12,251,736
- Issue date Mar 18, 2025
- STI CO., LTD.
- Young Soo Park
- B08 - CLEANING
Information Patent Grant
Pod cleaning chamber
- Patent number 12,246,361
- Issue date Mar 11, 2025
- STI CO., LTD.
- Young Soo Park
- B08 - CLEANING
Information Patent Grant
Systems for cleaning a portion of a lithography apparatus
- Patent number 12,235,595
- Issue date Feb 25, 2025
- ASML Holding N.V.
- Daniel Paul Rodak
- B08 - CLEANING
Information Patent Grant
EUV light source contamination monitoring system
- Patent number 12,228,863
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography method for positive tone development
- Patent number 12,222,654
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Hui Weng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle cleaning device and method of use
- Patent number 12,210,295
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of cleaning wafer table of photolithography system and metho...
- Patent number 12,210,296
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Yu Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus and wafer cleaning method using the same
- Patent number 12,165,866
- Issue date Dec 10, 2024
- Samsung Electronics Co., Ltd.
- Sung Hyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removal device and method
- Patent number 12,158,701
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method, method for forming semiconductor structure and sys...
- Patent number 12,153,341
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wu-Hung Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mitigating long-term energy decay of laser devices
- Patent number 12,147,166
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ping Yen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus with movable stages
- Patent number 12,147,167
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment device
- Patent number 12,138,671
- Issue date Nov 12, 2024
- Shibaura Mechatronics Corporation
- Minami Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate with UV blocker
- Patent number 12,130,561
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for cleaning a support structure in a lithogra...
- Patent number 12,117,737
- Issue date Oct 15, 2024
- ASML Holding N.V.
- Keane Michael Levy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for cleaning an EUV mask
- Patent number 12,099,310
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Hui Li
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle removing assembly and method of cleaning mask for lithography
- Patent number 12,085,866
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for detecting debris in a photolithography system
- Patent number 12,085,865
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Yu Tu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...
- Publication number 20250231501
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tao-Hsin CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PASSIVE DUST TRAP, ILLUMINATION SYSTEM, AND LITHOGRAPHY SYSTEM
- Publication number 20250216803
- Publication date Jul 3, 2025
- CYMER, LLC
- Sean Marcus Buczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCE MASK DEFECT IMPACT BY CONTAMINATION DECOMPOSE
- Publication number 20250216804
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS
- Publication number 20250181001
- Publication date Jun 5, 2025
- ASML Holding N.V.
- Daniel Paul RODAK
- B08 - CLEANING
Information Patent Application
EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM
- Publication number 20250155828
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT
- Publication number 20250147424
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS
- Publication number 20250138441
- Publication date May 1, 2025
- ASML NETHERLANDS B.V.
- Tammo UITTERDIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING AND DEVELOPING DEVICE
- Publication number 20250130511
- Publication date Apr 24, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Mark Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250123576
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Yu TU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE CLEANING DEVICE AND METHOD OF USE
- Publication number 20250110414
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chang HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS
- Publication number 20250102927
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hua FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20250085643
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARAT...
- Publication number 20250076776
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- SEUNGPYO HONG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET SOURCE CLEANING APPARATUS, EUV SOURCE CLEANING...
- Publication number 20250076775
- Publication date Mar 6, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- CHULMIN CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RE...
- Publication number 20250068059
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki Ide
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imprint Apparatus with Movable Stages
- Publication number 20250028259
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Junichi KANEHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IDENTIFYING DEVIATING MODULES FROM A REFERENCE POPULATION FOR MACHI...
- Publication number 20250029014
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Dimitriy DOUNAEV
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
UTILITY STAGE FOR PHOTOLITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20250021024
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Keane Michael Levy
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
CLEANING METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT S...
- Publication number 20250013159
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Hayato KIKUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF LITHOGRAPHY SUPPORT CLEANING
- Publication number 20240419089
- Publication date Dec 19, 2024
- ASML Holding N.V.
- Keane Michael LEVY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240412946
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Kensuke KOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...
- Publication number 20240385512
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- WU-HUNG KO
- B08 - CLEANING
Information Patent Application
MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES
- Publication number 20240385542
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ping YEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING APPARATUS FOR CLEANING SURFACE OF PHOTOMASK
- Publication number 20240385543
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Ting-Hsien Ko
- B08 - CLEANING
Information Patent Application
A CLEANING METHOD AND ASSOCIATED ILLUMINATION SOURCE METROLOGY APPA...
- Publication number 20240377765
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR CLEANING AN EUV MASK
- Publication number 20240377766
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Hui LI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240377764
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yu TU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHY CONTAMINATION CONTROL
- Publication number 20240361708
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh HSIEH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND SYSTEM OF REMOVING PARTICLES FROM PELLICLE
- Publication number 20240353767
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Kang HU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...
- Publication number 20240345490
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Particle removal apparatus

Process tool for dry removal of photoresist

Method and system of removing particles from pellicle

Developing method and substrate treatment system

POD cleaning device

EUV wafer defect improvement and method of collecting nonconductive...

Method and apparatus for removing contamination

Method for operating an EUV lithography apparatus, and EUV lithogra...

Reduce mask defect impact by contamination decompose

Polyimide profile control

Cleaning apparatus for cleaning surface of photomask

Pod cleaning process

Pod cleaning chamber

Systems for cleaning a portion of a lithography apparatus

EUV light source contamination monitoring system

Lithography method for positive tone development

Reticle cleaning device and method of use

Method of cleaning wafer table of photolithography system and metho...

Cleaning a structure surface in an EUV chamber

Wafer cleaning apparatus and wafer cleaning method using the same

Particle removal device and method

Cleaning method, method for forming semiconductor structure and sys...

Mitigating long-term energy decay of laser devices

Imprint apparatus with movable stages

Substrate treatment device

Gas distribution plate with UV blocker

Apparatus and method for cleaning a support structure in a lithogra...

System and method for cleaning an EUV mask

Particle removing assembly and method of cleaning mask for lithography

System and method for detecting debris in a photolithography system

Patents Applicationslast 30 patents

EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...

PASSIVE DUST TRAP, ILLUMINATION SYSTEM, AND LITHOGRAPHY SYSTEM

REDUCE MASK DEFECT IMPACT BY CONTAMINATION DECOMPOSE

SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS

EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM

LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT

SYSTEMS AND METHODS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS

COATING AND DEVELOPING DEVICE

SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES

RETICLE CLEANING DEVICE AND METHOD OF USE

LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARAT...

EXTREME ULTRAVIOLET SOURCE CLEANING APPARATUS, EUV SOURCE CLEANING...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RE...

Imprint Apparatus with Movable Stages

IDENTIFYING DEVIATING MODULES FROM A REFERENCE POPULATION FOR MACHI...

UTILITY STAGE FOR PHOTOLITHOGRAPHIC APPARATUS AND METHOD

CLEANING METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT S...

APPARATUS FOR AND METHOD OF LITHOGRAPHY SUPPORT CLEANING

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...

MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES

CLEANING APPARATUS FOR CLEANING SURFACE OF PHOTOMASK

A CLEANING METHOD AND ASSOCIATED ILLUMINATION SOURCE METROLOGY APPA...

SYSTEM AND METHOD FOR CLEANING AN EUV MASK

SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM

LITHOGRAPHY CONTAMINATION CONTROL

METHOD AND SYSTEM OF REMOVING PARTICLES FROM PELLICLE

AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...