Construction of apparatus

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CPC
G03F7/708

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/708Construction of apparatus

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Support for an optical element
- Patent number 12,271,117
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflector manufacturing method and associated reflector
- Patent number 12,269,229
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Sander Bas Roobol
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Differential measurement system
- Patent number 12,248,255
- Issue date Mar 11, 2025
- ASML Netherlands B.V.
- Hubert Matthieu Richard Steijns
- G01 - MEASURING TESTING
Information Patent Grant
Determining hot spot ranking based on wafer measurement
- Patent number 12,242,201
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing a substrate and lithographic apparatus
- Patent number 12,242,206
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Dennis Dominic Van Der Voort
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reaction chamber with stop-gapped vacuum seal
- Patent number 12,242,205
- Issue date Mar 4, 2025
- Canon Kabushiki Kaisha
- Byung-Jin Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holder for use in a lithographic apparatus and a device m...
- Patent number 12,243,768
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Johannes Josephus Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Object holder, electrostatic sheet and method for making an electro...
- Patent number 12,235,592
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Bastiaan Lambertus Wilhelmus Marinus Van De Ven
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems for cleaning a portion of a lithography apparatus
- Patent number 12,235,595
- Issue date Feb 25, 2025
- ASML Holding N.V.
- Daniel Paul Rodak
- B08 - CLEANING
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 12,235,096
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G01 - MEASURING TESTING
Information Patent Grant
System and method for dynamically controlling temperature of thermo...
- Patent number 12,235,593
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Jung Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing lithography process, light source, and EUV li...
- Patent number 12,235,594
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source contamination monitoring system
- Patent number 12,228,863
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interferometer systems and methods for real time etch process compe...
- Patent number 12,218,015
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus with parallel first and second parts o...
- Patent number 12,217,986
- Issue date Feb 4, 2025
- Screen Semiconductor Solutions Co., Ltd.
- Hiroyuki Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for submicron additive manufacturing
- Patent number 12,208,569
- Issue date Jan 28, 2025
- Lawrence Livermore National Security, LLC
- Sourabh Kumar Saha
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Substrate processing apparatus
- Patent number 12,204,256
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Kouichi Mizunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV microscope
- Patent number 12,203,874
- Issue date Jan 21, 2025
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
In-situ lithography pattern enhancement with localized stress treat...
- Patent number 12,204,253
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Andrew Weloth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 12,204,255
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate table, immersion lithographic apparatus and device manufa...
- Patent number 12,197,140
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marco Koert Stavenga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clamp assembly
- Patent number 12,189,309
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Ronald Van Der Wilk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning interference lithographic system
- Patent number 12,189,300
- Issue date Jan 7, 2025
- Tsinghua University; Beijing U-Precision Tech Co., Ltd.
- Leijie Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Storage environment monitoring system and methods of operation
- Patent number 12,174,528
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Wei Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Support unit, bake apparatus and substrate treating apparatus inclu...
- Patent number 12,174,553
- Issue date Dec 24, 2024
- Semes Co., Ltd.
- Tae Hoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage for extreme ultraviolet light lithography
- Patent number 12,169,369
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Guancyun Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
EUV Microscope
- Publication number 20250116615
- Publication date Apr 10, 2025
- EUV TECH, INC.
- CHAMI N. PERERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL APPARATUS
- Publication number 20250116943
- Publication date Apr 10, 2025
- ASML NETHERLANDS B.V.
- Debashis DE MUNSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING A PATTERN ON A SUBSTRATE
- Publication number 20250110411
- Publication date Apr 3, 2025
- ASM IP HOLDING B.V.
- Kishan Ashokbhai Patel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR COMPENSATING ACTUATOR EFFECTS OF ACTUATORS
- Publication number 20250110413
- Publication date Apr 3, 2025
- Carl Zeiss SMT GMBH
- Markus RAAB
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING TH...
- Publication number 20250102926
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A PRODUCTION SYSTEM AND METHOD FOR THERMALLY...
- Publication number 20250103855
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Wenjie JIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM
- Publication number 20250102920
- Publication date Mar 27, 2025
- Carl Zeiss SMT GMBH
- Malte LANGENHORST
- G02 - OPTICS
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...
- Publication number 20250093788
- Publication date Mar 20, 2025
- Canon Kabushiki Kaisha
- YUICHIRO MORIKUNI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20250085172
- Publication date Mar 13, 2025
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20250085641
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY
- Publication number 20250068088
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Guancyun LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTEGRATED SUBSTRATE PROCESSING SYSTEM WITH ADVANCED SUBSTRATE HAND...
- Publication number 20250069926
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Arunkumar Ramachandraiah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH
- Publication number 20250068089
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Sonja Schneider
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...
- Publication number 20250060682
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Armin Bernhard RIDINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...
- Publication number 20250060683
- Publication date Feb 20, 2025
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250060681
- Publication date Feb 20, 2025
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20250053103
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Hua WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK
- Publication number 20250053104
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20250053080
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIGITAL PHOTOLITHOGRAPHY SYSTEM, COMPONENTS THEREOF AND RELATED MET...
- Publication number 20250053101
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Assaf Kidron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...
- Publication number 20250053102
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHUTTER DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING ME...
- Publication number 20250053094
- Publication date Feb 13, 2025
- Canon Kabushiki Kaisha
- KENTAROU USHIKU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR
- Publication number 20250044711
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS
- Publication number 20250044712
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Thomas IRTENKAUF
- G02 - OPTICS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250044713
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Toshiaki Odaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...
- Publication number 20250028250
- Publication date Jan 23, 2025
- Carl Zeiss SMT GMBH
- Florian Baumer
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD
- Publication number 20250028256
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Keiichi YAHATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APERTURE AND METHOD
- Publication number 20250031294
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Roger Anton Marie TIMMERMANS
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE
- Publication number 20250021026
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- William Peter VAN DRENT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Construction of apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Support for an optical element

Reflector manufacturing method and associated reflector

Differential measurement system

Determining hot spot ranking based on wafer measurement

Method for preparing a substrate and lithographic apparatus

Reaction chamber with stop-gapped vacuum seal

Substrate holder for use in a lithographic apparatus and a device m...

Object holder, electrostatic sheet and method for making an electro...

Systems for cleaning a portion of a lithography apparatus

Inspection method and apparatus, lithographic apparatus, lithograph...

System and method for dynamically controlling temperature of thermo...

Method for performing lithography process, light source, and EUV li...

EUV light source contamination monitoring system

Method of forming an enhanced unexposed photoresist layer

Stage apparatus and electron beam lithography system

Interferometer systems and methods for real time etch process compe...

Substrate treating apparatus with parallel first and second parts o...

System and method for submicron additive manufacturing

Substrate processing apparatus

EUV microscope

In-situ lithography pattern enhancement with localized stress treat...

Lithographic apparatus and method

Substrate table, immersion lithographic apparatus and device manufa...

Clamp assembly

Scanning interference lithographic system

Calibration system for an extreme ultraviolet light source

Storage environment monitoring system and methods of operation

Support unit, bake apparatus and substrate treating apparatus inclu...

Storage for extreme ultraviolet light lithography

System for monitoring a plasma

Patents Applicationslast 30 patents

EUV Microscope

OPTICAL APPARATUS

METHOD FOR FORMING A PATTERN ON A SUBSTRATE

METHOD FOR COMPENSATING ACTUATOR EFFECTS OF ACTUATORS

RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING TH...

METHOD FOR CONTROLLING A PRODUCTION SYSTEM AND METHOD FOR THERMALLY...

METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM

SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY

INTEGRATED SUBSTRATE PROCESSING SYSTEM WITH ADVANCED SUBSTRATE HAND...

OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH

LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...

PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...

A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

DIGITAL PHOTOLITHOGRAPHY SYSTEM, COMPONENTS THEREOF AND RELATED MET...

METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...

SHUTTER DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING ME...

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES

TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR

OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...

SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD

APERTURE AND METHOD

APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE