Construction of apparatus

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CPC
G03F7/708

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/708Construction of apparatus

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interferometer systems and methods for real time etch process compe...
- Patent number 12,218,015
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus with parallel first and second parts o...
- Patent number 12,217,986
- Issue date Feb 4, 2025
- Screen Semiconductor Solutions Co., Ltd.
- Hiroyuki Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for submicron additive manufacturing
- Patent number 12,208,569
- Issue date Jan 28, 2025
- Lawrence Livermore National Security, LLC
- Sourabh Kumar Saha
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
EUV microscope
- Patent number 12,203,874
- Issue date Jan 21, 2025
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus
- Patent number 12,204,256
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Kouichi Mizunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ lithography pattern enhancement with localized stress treat...
- Patent number 12,204,253
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Andrew Weloth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 12,204,255
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate table, immersion lithographic apparatus and device manufa...
- Patent number 12,197,140
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marco Koert Stavenga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clamp assembly
- Patent number 12,189,309
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Ronald Van Der Wilk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning interference lithographic system
- Patent number 12,189,300
- Issue date Jan 7, 2025
- Tsinghua University; Beijing U-Precision Tech Co., Ltd.
- Leijie Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Storage environment monitoring system and methods of operation
- Patent number 12,174,528
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Wei Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Support unit, bake apparatus and substrate treating apparatus inclu...
- Patent number 12,174,553
- Issue date Dec 24, 2024
- Semes Co., Ltd.
- Tae Hoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage for extreme ultraviolet light lithography
- Patent number 12,169,369
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Guancyun Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,164,235
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating a mathematical model for positioning individu...
- Patent number 12,164,102
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Norman Kretzschmar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuator device and method for aligning an optical element, optical...
- Patent number 12,164,234
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Boaz Pnini-Mittler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
End-of-life monitoring of dynamic gas lock membranes and pupil face...
- Patent number 12,158,705
- Issue date Dec 3, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Joseph Harry Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method with improved contaminant particl...
- Patent number 12,158,706
- Issue date Dec 3, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van de Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reducing particulate deposition on photomask
- Patent number 12,158,707
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using a dual stage lithographic apparatus and lithographi...
- Patent number 12,153,354
- Issue date Nov 26, 2024
- ASML Netherlands B.V.
- Wouter Jan Cornelis Vijselaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Drive device, optical system and lithography apparatus
- Patent number 12,153,353
- Issue date Nov 26, 2024
- Carl Zeiss SMT GmbH
- Oliver Herbst
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 12,147,162
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Catharinus De Schiffart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology measurement method and apparatus
- Patent number 12,140,875
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Ilse Van Weperen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for avoiding a degradation of an optical element, projection...
- Patent number 12,140,877
- Issue date Nov 12, 2024
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Driving apparatus, exposure apparatus, and article manufacturing me...
- Patent number 12,140,874
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Tomohiro Okamoto
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Processing apparatus and article manufacturing method
- Patent number 12,140,876
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Tsutomu Terao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20250053103
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Hua WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK
- Publication number 20250053104
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20250053080
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIGITAL PHOTOLITHOGRAPHY SYSTEM, COMPONENTS THEREOF AND RELATED MET...
- Publication number 20250053101
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Assaf Kidron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...
- Publication number 20250053102
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHUTTER DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING ME...
- Publication number 20250053094
- Publication date Feb 13, 2025
- Canon Kabushiki Kaisha
- KENTAROU USHIKU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR
- Publication number 20250044711
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS
- Publication number 20250044712
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Thomas IRTENKAUF
- G02 - OPTICS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250044713
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Toshiaki Odaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...
- Publication number 20250028250
- Publication date Jan 23, 2025
- Carl Zeiss SMT GMBH
- Florian Baumer
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD
- Publication number 20250028256
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Keiichi YAHATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APERTURE AND METHOD
- Publication number 20250031294
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Roger Anton Marie TIMMERMANS
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE
- Publication number 20250021026
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- William Peter VAN DRENT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS
- Publication number 20250021017
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Raaja Ganapathy SUBRAMANIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMI...
- Publication number 20250020570
- Publication date Jan 16, 2025
- National Tsing-Hua University
- Tsai-Sheng Gau
- G01 - MEASURING TESTING
Information Patent Application
UTILITY STAGE FOR PHOTOLITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20250021024
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Keane Michael Levy
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
TOP MODULE AND EXPOSING APPARATUS INCLUDING THE SAME
- Publication number 20250021008
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Yebin Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS
- Publication number 20250021010
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Eduard Schweigert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20250021025
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Youngho HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...
- Publication number 20250004388
- Publication date Jan 2, 2025
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXHAUST DISCHARGING DEVICE WITH TEMPERATURE CONTROL AND HEAT RETENT...
- Publication number 20250004389
- Publication date Jan 2, 2025
- CHYI DING TECHNOLOGIES CO., LTD.
- Shih-Chia CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...
- Publication number 20240426603
- Publication date Dec 26, 2024
- Carl Zeiss SMT GMBH
- Heiner ZWICKEL
- G01 - MEASURING TESTING
Information Patent Application
PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE USING ELEC...
- Publication number 20240429015
- Publication date Dec 26, 2024
- DERKWOO SEMITECH CO., LTD.
- Ki Bum KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES I...
- Publication number 20240419066
- Publication date Dec 19, 2024
- Carl Zeiss SMT GMBH
- Uwe BIELKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REACTION CHAMBER WITH STOP-GAPPED VACUUM SEAL
- Publication number 20240419090
- Publication date Dec 19, 2024
- Canon Kabushiki Kaisha
- Byung-Jin Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MACHINING A WORKPIECE
- Publication number 20240411234
- Publication date Dec 12, 2024
- Carl Zeiss SMT GMBH
- Tobias MEISCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240411235
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Dae Geun YOON
- H01 - BASIC ELECTRIC ELEMENTS

Construction of apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of forming an enhanced unexposed photoresist layer

Stage apparatus and electron beam lithography system

Interferometer systems and methods for real time etch process compe...

Substrate treating apparatus with parallel first and second parts o...

System and method for submicron additive manufacturing

EUV microscope

Substrate processing apparatus

In-situ lithography pattern enhancement with localized stress treat...

Lithographic apparatus and method

Substrate table, immersion lithographic apparatus and device manufa...

Clamp assembly

Scanning interference lithographic system

Calibration system for an extreme ultraviolet light source

Storage environment monitoring system and methods of operation

Support unit, bake apparatus and substrate treating apparatus inclu...

Storage for extreme ultraviolet light lithography

System for monitoring a plasma

Semiconductor processing tool and methods of operation

Method for generating a mathematical model for positioning individu...

Actuator device and method for aligning an optical element, optical...

End-of-life monitoring of dynamic gas lock membranes and pupil face...

Lithographic apparatus and method with improved contaminant particl...

Methods and systems for reducing particulate deposition on photomask

Method of using a dual stage lithographic apparatus and lithographi...

Drive device, optical system and lithography apparatus

Imprint lithography

Metrology measurement method and apparatus

Method for avoiding a degradation of an optical element, projection...

Driving apparatus, exposure apparatus, and article manufacturing me...

Processing apparatus and article manufacturing method

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

DIGITAL PHOTOLITHOGRAPHY SYSTEM, COMPONENTS THEREOF AND RELATED MET...

METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...

SHUTTER DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING ME...

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES

TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR

OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...

SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD

APERTURE AND METHOD

APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE

METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS

PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMI...

UTILITY STAGE FOR PHOTOLITHOGRAPHIC APPARATUS AND METHOD

TOP MODULE AND EXPOSING APPARATUS INCLUDING THE SAME

DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...

EXHAUST DISCHARGING DEVICE WITH TEMPERATURE CONTROL AND HEAT RETENT...

OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...

PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE USING ELEC...

METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES I...

REACTION CHAMBER WITH STOP-GAPPED VACUUM SEAL

HIGH RESOLUTION PHOTOLITHOGRAPHY

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS

METHOD FOR MACHINING A WORKPIECE

SEMICONDUCTOR MANUFACTURING APPARATUS