Construction of apparatus

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CPC
G03F7/708

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/708Construction of apparatus

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 12,366,808
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Lithography system and method thereof
- Patent number 12,360,464
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material management method and system
- Patent number 12,360,465
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Rong-Syuan Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,353,142
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle beam inspection apparatus
- Patent number 12,354,891
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Jeroen Gerard Gosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder and method of manufacturing a substrate holder
- Patent number 12,353,139
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method for heating an optical element in a microlithographic projec...
- Patent number 12,353,141
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system
- Patent number 12,346,033
- Issue date Jul 1, 2025
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System, lithographic apparatus and method
- Patent number 12,346,032
- Issue date Jul 1, 2025
- ASML Netherlands B.V.
- Rob Johan Theodoor Rutten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for thermo-mechanical control of a heat sensitive element an...
- Patent number 12,339,592
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Victor Sebastiaan Dolk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target supply system, extreme ultraviolet light generation apparatu...
- Patent number 12,332,575
- Issue date Jun 17, 2025
- Gigaphoton Inc.
- Fumio Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Chamber device, and electronic device manufacturing method
- Patent number 12,327,975
- Issue date Jun 10, 2025
- Gigaphoton Inc.
- Junichi Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure apparatus for semiconductor lithography
- Patent number 12,321,105
- Issue date Jun 3, 2025
- Carl Zeiss SMT GmbH
- Timo Laufer
- G01 - MEASURING TESTING
Information Patent Grant
Device for detecting a temperature, installation for producing an o...
- Patent number 12,321,106
- Issue date Jun 3, 2025
- Carl Zeiss SMT GmbH
- Michael Stolz
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system, lithographic apparatus, and inspection method
- Patent number 12,313,980
- Issue date May 27, 2025
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure apparatus having a device for determining the c...
- Patent number 12,306,551
- Issue date May 20, 2025
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G01 - MEASURING TESTING
Information Patent Grant
Hollow-core photonic crystal fiber based optical component for broa...
- Patent number 12,306,433
- Issue date May 20, 2025
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, illumination switches an...
- Patent number 12,306,541
- Issue date May 20, 2025
- ASML Holding N.V. & ASML Netherlands B.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inner pod holding device conducive to reducing dust contamination a...
- Patent number 12,306,550
- Issue date May 20, 2025
- GUDENG EQUIPMENT CO., LTD.
- Yin-Feng Chan
- G01 - MEASURING TESTING
Information Patent Grant
Connecting components of an optical imaging device
- Patent number 12,298,674
- Issue date May 13, 2025
- Carl Zeiss SMT GmbH
- Viktor Schulga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for semiconductor lithography with a...
- Patent number 12,298,675
- Issue date May 13, 2025
- Carl Zeiss SMT GmbH
- Philipp Gaida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid purging system, projection system, illumination system, litho...
- Patent number 12,292,696
- Issue date May 6, 2025
- ASML Netherlands B.V.
- José Nilton Fonseca Junior
- G02 - OPTICS
Information Patent Grant
Stage system, lithographic apparatus, method for positioning and de...
- Patent number 12,287,586
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Stef Marten Johan Janssens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices using a photomask
- Patent number 12,287,581
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for calculating a spatial map associated with...
- Patent number 12,276,918
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Mauritius Gerardus Elisabeth Schneiders
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exhaust system with U-shaped pipes
- Patent number 12,276,923
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Fu Lin
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Micromirror arrays
- Patent number 12,276,784
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Luc Roger Simonne Haspeslagh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflector manufacturing method and associated reflector
- Patent number 12,269,229
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Sander Bas Roobol
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Support for an optical element
- Patent number 12,271,117
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE
- Publication number 20250237962
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Manfred Petrus Johannes Maria DIKKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRICAL CONNECTOR FOR HIGH POWER IN A VACUUM ENVIRONMENT AND METHOD
- Publication number 20250233353
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Johannes Wilhelmus DAMEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY
- Publication number 20250224662
- Publication date Jul 10, 2025
- ASML NETHERLANDS B.V.
- Paul Alexander VERMEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING A SURFACE
- Publication number 20250224325
- Publication date Jul 10, 2025
- NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
- Antonius Martinus Cornelis Petrus DE JONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR DEVICE, PROJECTION OBJECTIVE AND METHOD FOR MEASURING THE TE...
- Publication number 20250216801
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G01 - MEASURING TESTING
Information Patent Application
MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOS...
- Publication number 20250216794
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETI...
- Publication number 20250218718
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Hoonseop KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mir...
- Publication number 20250216796
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AIR CONDITIONER AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20250216800
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Sang Hoon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIPOD, OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS
- Publication number 20250208523
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Sonia Anaelle Bissie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE W...
- Publication number 20250208524
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Eva Linda MATHIEU
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
ASSEMBLY OF AN OPTICAL SYSTEM
- Publication number 20250208376
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Christoph Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF VIBRATION CANCELLATION FOR LASER WAVELE...
- Publication number 20250208525
- Publication date Jun 26, 2025
- CYMER, LLC
- Mohammad Amin KHAMEHCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY SUBSTRATE WITH PURGE FLOW DIRECTION
- Publication number 20250208526
- Publication date Jun 26, 2025
- Entegris, Inc.
- Huaping Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PULSE STRETCHER APPARATUS
- Publication number 20250208404
- Publication date Jun 26, 2025
- CYMER, LLC
- Thao Trieu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WARPAGE DETERMINATION SYSTEM
- Publication number 20250199421
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Efthymios STRATIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FO...
- Publication number 20250199422
- Publication date Jun 19, 2025
- Carl Zeiss SMT GMBH
- Stefan LIPPOLDT
- G02 - OPTICS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20250201586
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
- Publication number 20250202184
- Publication date Jun 19, 2025
- CYMER, LLC
- Eric Anders Mason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE CLAMPING MODULE
- Publication number 20250199420
- Publication date Jun 19, 2025
- GUDENG EQUIPMENT CO., LTD.
- YU-LIN CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS
- Publication number 20250181001
- Publication date Jun 5, 2025
- ASML Holding N.V.
- Daniel Paul RODAK
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20250180999
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsieh-Yu WEI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-CLEANLINESS RETICLE CLAMPING MODULE
- Publication number 20250181000
- Publication date Jun 5, 2025
- GUDENG EQUIPMENT CO., LTD.
- AN-PANG WANG
- G01 - MEASURING TESTING
Information Patent Application
TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...
- Publication number 20250175589
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Senthil Lakshmanan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250174452
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD INCLUDING THERMAL MANAGEMENT
- Publication number 20250172885
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Wei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUSES AND METHODS FOR REDUCING PARTICLE CONTAMINATION OF WAFE...
- Publication number 20250164899
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Zheng-Hao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM...
- Publication number 20250164893
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Steffen VAAS
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
WAFER BOW COMPENSATION BY PATTERNED UV CURE
- Publication number 20250166991
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Tong LEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND ERROR COMPENSATION SYSTEM USING THE SAME
- Publication number 20250164897
- Publication date May 22, 2025
- SAMSUNG DISPLAY CO., LTD.
- Jungwoong Byun
- H01 - BASIC ELECTRIC ELEMENTS

Construction of apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Substrate holder, lithographic apparatus, device manufacturing meth...

Lithography system and method thereof

Material management method and system

Semiconductor processing tool and methods of operation

Particle beam inspection apparatus

Substrate holder and method of manufacturing a substrate holder

Method for heating an optical element in a microlithographic projec...

Optical system

System, lithographic apparatus and method

Method for thermo-mechanical control of a heat sensitive element an...

Target supply system, extreme ultraviolet light generation apparatu...

Chamber device, and electronic device manufacturing method

Projection exposure apparatus for semiconductor lithography

Device for detecting a temperature, installation for producing an o...

Inspection system, lithographic apparatus, and inspection method

Projection exposure apparatus having a device for determining the c...

Hollow-core photonic crystal fiber based optical component for broa...

Lithographic apparatus, metrology systems, illumination switches an...

Inner pod holding device conducive to reducing dust contamination a...

Connecting components of an optical imaging device

Projection exposure apparatus for semiconductor lithography with a...

Fluid purging system, projection system, illumination system, litho...

Stage system, lithographic apparatus, method for positioning and de...

Method of manufacturing semiconductor devices using a photomask

Method and apparatus for calculating a spatial map associated with...

Exhaust system with U-shaped pipes

Micromirror arrays

Reflector manufacturing method and associated reflector

Support for an optical element

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE

ELECTRICAL CONNECTOR FOR HIGH POWER IN A VACUUM ENVIRONMENT AND METHOD

PELLICLE FOR EUV LITHOGRAPHY

METHOD AND SYSTEM FOR INSPECTING A SURFACE

MIRROR DEVICE, PROJECTION OBJECTIVE AND METHOD FOR MEASURING THE TE...

MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOS...

CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETI...

Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mir...

AIR CONDITIONER AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

BIPOD, OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS

HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE W...

ASSEMBLY OF AN OPTICAL SYSTEM

APPARATUS FOR AND METHOD OF VIBRATION CANCELLATION FOR LASER WAVELE...

PHOTOLITHOGRAPHY SUBSTRATE WITH PURGE FLOW DIRECTION

OPTICAL PULSE STRETCHER APPARATUS

SUBSTRATE WARPAGE DETERMINATION SYSTEM

INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FO...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER

RETICLE CLAMPING MODULE

SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

HIGH-CLEANLINESS RETICLE CLAMPING MODULE

TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...

LITHOGRAPHY SYSTEM AND METHOD INCLUDING THERMAL MANAGEMENT

APPARATUSES AND METHODS FOR REDUCING PARTICLE CONTAMINATION OF WAFE...

APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM...

WAFER BOW COMPENSATION BY PATTERNED UV CURE

STAGE AND ERROR COMPENSATION SYSTEM USING THE SAME