Construction

Industry

CPC
H01J2237/061

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/061Construction

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Variable thickness ion source extraction plate
- Patent number 11,810,746
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming substrate surfaces with exposed cr...
- Patent number 11,735,432
- Issue date Aug 22, 2023
- Exogenesis Corporation
- Sean R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,688,580
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source module
- Patent number 11,557,455
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Laura Dinu-Gurtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermally isolated captive features for ion implantation systems
- Patent number 11,538,654
- Issue date Dec 27, 2022
- Applied Materials, Inc.
- Adam M. McLaughlin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Side inject designs for improved radical concentrations
- Patent number 11,501,945
- Issue date Nov 15, 2022
- Applied Materials, Inc.
- Eric Kihara Shono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 11,355,314
- Issue date Jun 7, 2022
- Canon Anelva Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing device with embedded fluid conduits
- Patent number 11,213,891
- Issue date Jan 4, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Joshua M. Abeshaus
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Thermally isolated captive features for ion implantation systems
- Patent number 11,127,558
- Issue date Sep 21, 2021
- Applied Materials, Inc.
- Adam M. McLaughlin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,043,354
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ultra-shallow etching using neutral beam processing base...
- Patent number 11,004,692
- Issue date May 11, 2021
- Exogenesis Corporation
- Sean R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam apparatus, charged-particle beam writing appa...
- Patent number 10,998,162
- Issue date May 4, 2021
- NuFlare Technology, Inc.
- Nobuo Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field ionization source, ion beam apparatus, and beam irradiation m...
- Patent number 10,971,329
- Issue date Apr 6, 2021
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation processes and apparatus using gallium
- Patent number 10,892,137
- Issue date Jan 12, 2021
- Entegris, Inc.
- Joseph D. Sweeney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 10,879,040
- Issue date Dec 29, 2020
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Side inject designs for improved radical concentrations
- Patent number 10,847,337
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Eric Kihara Shono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with tailored extraction shape
- Patent number 10,714,296
- Issue date Jul 14, 2020
- Axcelis Technologies, Inc.
- Patrick T. Heres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron source and electron beam device using the same
- Patent number 10,707,046
- Issue date Jul 7, 2020
- HITACHI HIGH-TECH CORPORATION
- Toshiaki Kusunoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source head structure of semiconductor ion implanter
- Patent number 10,658,149
- Issue date May 19, 2020
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Cheng Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focusing electrode for cathode arrangement, electron gun, and litho...
- Patent number 10,622,188
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Laura Dinu-Gürtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of adjusting the primary side of an X-ray diffractometer
- Patent number 10,598,615
- Issue date Mar 24, 2020
- Andreas Kleine
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,573,487
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lanthanated tungsten ion source and beamline components
- Patent number 10,535,498
- Issue date Jan 14, 2020
- Axcelis Technologies, Inc.
- Neil K Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing device with embedded fluid conduits
- Patent number 10,486,232
- Issue date Nov 26, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Joshua M. Abeshaus
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Semiconductor manufacturing device with embedded fluid conduits
- Patent number 10,427,217
- Issue date Oct 1, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Joshua M. Abeshaus
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Electron source architecture for a scanning electron microscopy system
- Patent number 10,388,489
- Issue date Aug 20, 2019
- KLA-Tencor Corporation
- Mohammed Tahmassebpur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator
- Patent number 10,361,058
- Issue date Jul 23, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Collision ionization source
- Patent number 10,325,750
- Issue date Jun 18, 2019
- FEI Company
- Gregory A. Schwind
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode ion source
- Patent number 10,242,846
- Issue date Mar 26, 2019
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
- Publication number 20240395495
- Publication date Nov 28, 2024
- UChicago Argonne, LLC
- Brahim Mustapha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATION DEVICE AND ION IMPLANTER
- Publication number 20240266140
- Publication date Aug 8, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Sho KAWATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure for Particle Acceleration And Charged Particle Beam Appar...
- Publication number 20240242918
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- RYO SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPELLER ASSEMBLY FOR MOUNTING INTO AN ARC CHAMBER OF AN ION IMPLAN...
- Publication number 20240029991
- Publication date Jan 25, 2024
- PLANSEE USA LLC
- Nam Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Gun and Charged Particle Beam System
- Publication number 20230178325
- Publication date Jun 8, 2023
- Hitachi High-Tech Corporation
- Masahiro FUKUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE MODULE
- Publication number 20230154719
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Laura DINU-GURTLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Thickness Ion Source Extraction Plate
- Publication number 20230080083
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20220262598
- Publication date Aug 18, 2022
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20210391138
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermally Isolated Captive Features For Ion Implantation Systems
- Publication number 20210384004
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermally Isolated Captive Features For Ion Implantation Systems
- Publication number 20210296077
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING SUBSTRATE SURFACES WITH EXPOSED CR...
- Publication number 20210225661
- Publication date Jul 22, 2021
- Exogenesis Corporation
- Sean R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20210104377
- Publication date Apr 8, 2021
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIDE INJECT DESIGNS FOR IMPROVED RADICAL CONCENTRATIONS
- Publication number 20210074505
- Publication date Mar 11, 2021
- Applied Materials, Inc.
- Eric Kihara SHONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20200286705
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION PROCESSES AND APPARATUS USING GALLIUM
- Publication number 20200083015
- Publication date Mar 12, 2020
- Entegris, Inc.
- Joseph D. SWEENEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE MODULE
- Publication number 20200043693
- Publication date Feb 6, 2020
- ASML NETHERLANDS B.V.
- Laura DINU-GURTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron Source and Electron Beam Device Using the Same
- Publication number 20190385809
- Publication date Dec 19, 2019
- Hitachi High-Technologies Corporation
- Toshiaki KUSUNOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIDE INJECT DESIGNS FOR IMPROVED RADICAL CONCENTRATIONS
- Publication number 20190228942
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Eric Kihara SHONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20190108973
- Publication date Apr 11, 2019
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190074157
- Publication date Mar 7, 2019
- HERMES MICROVISION, INC.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIELD IONIZATION SOURCE, ION BEAM APPARATUS, AND BEAM IRRADIATION M...
- Publication number 20190051491
- Publication date Feb 14, 2019
- Hitachi High-Technologies Corporation
- Shinichi MATSUBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LANTHANATED TUNGSTEN ION SOURCE AND BEAMLINE COMPONETS
- Publication number 20180358202
- Publication date Dec 13, 2018
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR
- Publication number 20180254166
- Publication date Sep 6, 2018
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ULTRA-SHALLOW ETCHING USING NEUTRAL BEAM PROCESSING BASE...
- Publication number 20180247831
- Publication date Aug 30, 2018
- Exogenesis Corporation
- Sean R. Kirkpatrick
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
ELECTRON MICROSCOPE ELECTRON GUN FOR FACILITATING POSITION ADJUSTME...
- Publication number 20180218874
- Publication date Aug 2, 2018
- Korea Research Institute of Standards and Science
- Bok Lae CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Beam Emitters with Ruthenium Coating
- Publication number 20180174794
- Publication date Jun 21, 2018
- KLA-Tencor Corporation
- Gildardo R. Delgado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A RIBON BEAM ION SOURCE OF ARBITRARY LENGTH
- Publication number 20170110282
- Publication date Apr 20, 2017
- Nicholas R. White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION DEVICE
- Publication number 20160307726
- Publication date Oct 20, 2016
- EBARA CORPORATION
- Masahiro Hatakeyama
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR GHz RATE HIGH DUTY CYCLE PULSING AND MANIPULATION OF...
- Publication number 20160293377
- Publication date Oct 6, 2016
- Euclid TechLabs, LLC
- Sergey V. Baryshev
- H01 - BASIC ELECTRIC ELEMENTS

Construction

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ion beam processing apparatus, electrode assembly, and method of cl...

Variable thickness ion source extraction plate

Method and apparatus for forming substrate surfaces with exposed cr...

Apparatus of plural charged-particle beams

Charged particle source module

Thermally isolated captive features for ion implantation systems

Side inject designs for improved radical concentrations

Ion beam processing apparatus, electrode assembly, and method of cl...

Semiconductor manufacturing device with embedded fluid conduits

Thermally isolated captive features for ion implantation systems

Apparatus of plural charged-particle beams

Method for ultra-shallow etching using neutral beam processing base...

Charged-particle beam apparatus, charged-particle beam writing appa...

Field ionization source, ion beam apparatus, and beam irradiation m...

Ion implantation processes and apparatus using gallium

Ion beam processing apparatus, electrode assembly, and method of cl...

Side inject designs for improved radical concentrations

Ion source with tailored extraction shape

Electron source and electron beam device using the same

Ion source head structure of semiconductor ion implanter

Focusing electrode for cathode arrangement, electron gun, and litho...

Method of adjusting the primary side of an X-ray diffractometer

Apparatus of plural charged-particle beams

Lanthanated tungsten ion source and beamline components

Semiconductor manufacturing device with embedded fluid conduits

Semiconductor manufacturing device with embedded fluid conduits

Electron source architecture for a scanning electron microscopy system

Ion generator

Collision ionization source

Hollow cathode ion source

Patents Applicationslast 30 patents

COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS

ION GENERATION DEVICE AND ION IMPLANTER

Structure for Particle Acceleration And Charged Particle Beam Appar...

REPELLER ASSEMBLY FOR MOUNTING INTO AN ARC CHAMBER OF AN ION IMPLAN...

Charged Particle Gun and Charged Particle Beam System

CHARGED PARTICLE SOURCE MODULE

Variable Thickness Ion Source Extraction Plate

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

Thermally Isolated Captive Features For Ion Implantation Systems

Thermally Isolated Captive Features For Ion Implantation Systems

METHOD AND APPARATUS FOR FORMING SUBSTRATE SURFACES WITH EXPOSED CR...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

SIDE INJECT DESIGNS FOR IMPROVED RADICAL CONCENTRATIONS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ION IMPLANTATION PROCESSES AND APPARATUS USING GALLIUM

CHARGED PARTICLE SOURCE MODULE

Electron Source and Electron Beam Device Using the Same

SIDE INJECT DESIGNS FOR IMPROVED RADICAL CONCENTRATIONS

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

FIELD IONIZATION SOURCE, ION BEAM APPARATUS, AND BEAM IRRADIATION M...

LANTHANATED TUNGSTEN ION SOURCE AND BEAMLINE COMPONETS

ION GENERATOR

METHOD FOR ULTRA-SHALLOW ETCHING USING NEUTRAL BEAM PROCESSING BASE...

ELECTRON MICROSCOPE ELECTRON GUN FOR FACILITATING POSITION ADJUSTME...

Electron Beam Emitters with Ruthenium Coating

A RIBON BEAM ION SOURCE OF ARBITRARY LENGTH

INSPECTION DEVICE

APPARATUS FOR GHz RATE HIGH DUTY CYCLE PULSING AND MANIPULATION OF...