containing esterified hydroxy groups bound to the carbon skeleton

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CPC
C07C309/12

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CCHEMISTRY METALLURGY C07Organic chemistry C07CACYCLIC OR CARBOCYCLIC COMPOUNDS C07C309/00Sulfonic acids Halides, esters, or anhydrides thereof

Current Industry

C07C309/12containing esterified hydroxy groups bound to the carbon skeleton

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Patents Grantslast 30 patents

Information Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
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Salt compound, chemically amplified resist composition, and pattern...
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Metal-containing onium salt compound, photodegradable base, resist...
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Actinic ray-sensitive or radiation sensitive resin composition, act...
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Photosensitive compound, photoacid generator and resist composition...
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Information Patent Grant
Resist composition, method of forming resist pattern, and compound
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- Takashi Nagamine
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Photoacid generator and photoresist composition including the same
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Information Patent Grant
Aryl acetate onium materials
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Information Patent Grant
Salt and photoresist composition containing the same
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- Issue date Nov 17, 2020
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

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ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
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BIO-BASED ISETHIONATE COMPOUNDS
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ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTE...
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
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Positive Resist Material And Patterning Process
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Novel Sulfonium Salt, Resist Composition, And Patterning Process
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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
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ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
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containing esterified hydroxy groups bound to the carbon skeleton

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoacid generators, photoresist compositions, and pattern formati...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

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Photoacid generator, photoresist composition including the same, an...

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Salts and photoresists comprising same

Salt, acid generator, resist composition and method for producing r...

Salt, acid generator, resist composition and method for producing r...

Radiation-sensitive resin composition and method for forming resist...

Photoacid generator, photoresist composition including the same, an...

Compound, photoresist composition comprising same, photoresist patt...

Resist composition, method of forming resist pattern, compound, aci...

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Radiation-sensitive resin composition and resist pattern-forming me...

Radiation-sensitive resin composition, resist pattern-forming metho...

Salt compound, chemically amplified resist composition, and pattern...

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Onium salt, chemically amplified resist composition, and patterning...

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Photoacid generator and photoresist composition including the same

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Salt and photoresist composition containing the same

Patents Applicationslast 30 patents

RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...

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ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

POLYONIUM SALT PHOTOACID GENERATOR FOR ARF LIGHT SOURCE DRY LITHOGR...

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