containing mineral acids or salts thereof, containing mineral oxidizing substances

Industry

CPC
G03F7/423

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/423containing mineral acids or salts thereof, containing mineral oxidizing substances

Industries

Patents Grantslast 30 patents

Information Patent Grant
Wafer processing device and method
- Patent number 12,001,142
- Issue date Jun 4, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shih-Hung Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid, method for washing substrate, and method for remo...
- Patent number 11,899,369
- Issue date Feb 13, 2024
- FUJIFILM Corporation
- Tomonori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing heated ozone water, heated ozone water, and sem...
- Patent number 11,817,309
- Issue date Nov 14, 2023
- Tohoku University
- Yasuyuki Shirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing underlayers
- Patent number 11,733,609
- Issue date Aug 22, 2023
- Rohm and Haas Electronic Materials LLC
- Charlotte A. Cutler
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist removal
- Patent number 11,664,235
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Shang-Yuan Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning agent and preparation method and use thereof
- Patent number 11,549,086
- Issue date Jan 10, 2023
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Su Wang
- B08 - CLEANING
Information Patent Grant
Process flow with wet etching for smooth sidewalls in silicon nitri...
- Patent number 11,543,589
- Issue date Jan 3, 2023
- ANELLO PHOTONICS, INC.
- Avi Feshali
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
UV-assisted stripping of hardened photoresist to create chemical te...
- Patent number 11,538,684
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Mark H. Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Treatment liquid, method for washing substrate, and method for remo...
- Patent number 11,397,383
- Issue date Jul 26, 2022
- FUJIFILM Corporation
- Tomonori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating substrates with an aqueous liquid medium expose...
- Patent number 11,358,172
- Issue date Jun 14, 2022
- SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG
- Davide Dattilo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for producing ozone water
- Patent number 11,295,947
- Issue date Apr 5, 2022
- TOHOKU UNIVERSITY
- Yasuyuki Shirai
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Treatment liquid, method for washing substrate, and method for remo...
- Patent number 11,225,633
- Issue date Jan 18, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thinner composition
- Patent number 11,220,659
- Issue date Jan 11, 2022
- ENF TECHNOLOGY CO., LTD.
- Du Won Lee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Methods and systems for generating process gases
- Patent number 11,154,792
- Issue date Oct 26, 2021
- RASIRC, Inc.
- Jeffrey Spiegelman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist with gradient composition for improved uniformity
- Patent number 11,112,698
- Issue date Sep 7, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang Lilin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,056,335
- Issue date Jul 6, 2021
- Tokyo Electron Limited
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method and substrate processing device
- Patent number 11,036,142
- Issue date Jun 15, 2021
- SCREEN Holdings Co., Ltd.
- Kota Sotoku
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stripping compositions for removing photoresists from semiconductor...
- Patent number 10,947,484
- Issue date Mar 16, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- Atsushi Mizutani
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 10,928,732
- Issue date Feb 23, 2021
- Tokyo Electron Limited
- Hironobu Hyakutake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution and method for cleaning substrate
- Patent number 10,920,179
- Issue date Feb 16, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuo Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions and methods for selectively etching titanium nitride
- Patent number 10,920,141
- Issue date Feb 16, 2021
- Entegris, Inc.
- Li-Min Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photonically tuned etchant reactivity for wet etching
- Patent number 10,867,815
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic mask layer
- Patent number 10,824,078
- Issue date Nov 3, 2020
- Imec VZW
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Embossing lacquer and method for embossing, and substrate surface c...
- Patent number 10,809,622
- Issue date Oct 20, 2020
- Joanneum Research Forschungsgesellschaft mbH
- Dieter Nees
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-etch residue removal for advanced node beol processing
- Patent number 10,790,187
- Issue date Sep 29, 2020
- Entegris, Inc.
- Emanuel I. Cooper
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate processing method and substrate processing device
- Patent number 10,668,497
- Issue date Jun 2, 2020
- SCREEN Holdings Co., Ltd.
- Yusuke Akizuki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Cleaning formulations
- Patent number 10,647,950
- Issue date May 12, 2020
- VERSUM MATERIALS US, LLC
- Seiji Inaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning compositions and methods of use therefor
- Patent number 10,619,126
- Issue date Apr 14, 2020
- Fujifilm Electronic Materials U.S.A., Inc.
- Yasuo Sugishima
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Resist multilayer film-attached substrate and patterning process
- Patent number 10,514,605
- Issue date Dec 24, 2019
- International Business Machines Corporation
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...
- Publication number 20240231237
- Publication date Jul 11, 2024
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATING A SUBSTRATE
- Publication number 20240152056
- Publication date May 9, 2024
- SEMES CO., LTD.
- Sang Gun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...
- Publication number 20240134284
- Publication date Apr 25, 2024
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Etching Composition And Method For EUV Mask Protective Structure
- Publication number 20240103377
- Publication date Mar 28, 2024
- VERSUM MATERIALS US, LLC
- CHAO-HSIANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING DEVICE AND METHOD
- Publication number 20220317574
- Publication date Oct 6, 2022
- ChangXin Memory Technologies, Inc.
- SHIH-HUNG LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...
- Publication number 20220260919
- Publication date Aug 18, 2022
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PROCESS FLOW WITH WET ETCHING FOR SMOOTH SIDEWALLS IN SILICON NITRI...
- Publication number 20220082756
- Publication date Mar 17, 2022
- Anello Photonics, Inc.
- Avi Feshali
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING UNDERLAYERS
- Publication number 20210397093
- Publication date Dec 23, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Charlotte A Cutler
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING OZONE WATER
- Publication number 20210163850
- Publication date Jun 3, 2021
- Tohoku University
- Yasuyuki SHIRAI
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
CLEANING AGENT AND PREPARATION METHOD AND USE THEREOF
- Publication number 20210130750
- Publication date May 6, 2021
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Su WANG
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
APPARATUS FOR REMOVING PHOTORESISTS AND METHOD OF MANUFACTURING SEM...
- Publication number 20200241423
- Publication date Jul 30, 2020
- Samsung Electronics Co., Ltd.
- Hyun Jung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200152443
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THINNER COMPOSITION
- Publication number 20200071640
- Publication date Mar 5, 2020
- ENF TECHNOLOGY CO., LTD.
- Du Won LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTONICALLY TUNED ETCHANT REACTIVITY FOR WET ETCHING
- Publication number 20200075358
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Paul ABEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV-ASSISTED STRIPPING OF HARDENED PHOTORESIST TO CREATE CHEMICAL TE...
- Publication number 20200066509
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTA...
- Publication number 20190265593
- Publication date Aug 29, 2019
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR...
- Publication number 20190233771
- Publication date Aug 1, 2019
- Fujifilm Electronic Materials U.S.A., Inc.
- Atsushi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING UNDERLAYERS
- Publication number 20190146343
- Publication date May 16, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Charlotte A Cutler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20190043708
- Publication date Feb 7, 2019
- SCREEN Holdings Co., Ltd.
- Kota SOTOKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20180284616
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Shinichiro Kawakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USE OF NON-OXIDIZING STRONG ACIDS FOR THE REMOVAL OF ION-IMPLANTED...
- Publication number 20180240680
- Publication date Aug 23, 2018
- Entegris, Inc.
- Steven Bilodeau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING COMPOSITIONS AND METHODS OF USE THEREFOR
- Publication number 20180201884
- Publication date Jul 19, 2018
- Fujifilm Electronic Materials U.S.A., Inc.
- Yasuo Sugishima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lithographic Mask Layer
- Publication number 20180173109
- Publication date Jun 21, 2018
- IMEC vzw
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist with Gradient Composition for Improved Uniformity
- Publication number 20180151351
- Publication date May 31, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang Lilin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING FORMULATIONS
- Publication number 20180105774
- Publication date Apr 19, 2018
- VERSUM MATERIALS US, LLC
- Seiji INAOKA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTORESIST REMOVAL
- Publication number 20180047580
- Publication date Feb 15, 2018
- Taiwan Semiconductor Manufacturing Company Limited
- Shang-Yuan YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBOSSING LACQUER AND METHOD FOR EMBOSSING, AND SUBSTRATE SURFACE C...
- Publication number 20170343900
- Publication date Nov 30, 2017
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Dieter NEES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20170162400
- Publication date Jun 8, 2017
- SCREEN Holdings Co., Ltd.
- Keiji IWATA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170059996
- Publication date Mar 2, 2017
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USE OF NON-OXIDIZING STRONG ACIDS FOR THE REMOVAL OF ION-IMPLANTED...
- Publication number 20160322232
- Publication date Nov 3, 2016
- Entegris, Inc.
- Steven BILODEAU
- H01 - BASIC ELECTRIC ELEMENTS

containing mineral acids or salts thereof, containing mineral oxidizing substances

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer processing device and method

Semiconductor device production method employing silicon-containing...

Treatment liquid, method for washing substrate, and method for remo...

Method of producing heated ozone water, heated ozone water, and sem...

Silicon-containing underlayers

Photoresist removal

Cleaning agent and preparation method and use thereof

Process flow with wet etching for smooth sidewalls in silicon nitri...

UV-assisted stripping of hardened photoresist to create chemical te...

Treatment liquid, method for washing substrate, and method for remo...

Method for treating substrates with an aqueous liquid medium expose...

Method for producing ozone water

Treatment liquid, method for washing substrate, and method for remo...

Thinner composition

Methods and systems for generating process gases

Photoresist with gradient composition for improved uniformity

Substrate processing apparatus

Substrate processing method and substrate processing device

Stripping compositions for removing photoresists from semiconductor...

Substrate liquid processing apparatus, substrate liquid processing...

Cleaning solution and method for cleaning substrate

Compositions and methods for selectively etching titanium nitride

Photonically tuned etchant reactivity for wet etching

Lithographic mask layer

Embossing lacquer and method for embossing, and substrate surface c...

Post-etch residue removal for advanced node beol processing

Substrate processing method and substrate processing device

Cleaning formulations

Cleaning compositions and methods of use therefor

Resist multilayer film-attached substrate and patterning process

Patents Applicationslast 30 patents

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...

METHOD FOR TREATING A SUBSTRATE

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...

Etching Composition And Method For EUV Mask Protective Structure

WAFER PROCESSING DEVICE AND METHOD

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...

PROCESS FLOW WITH WET ETCHING FOR SMOOTH SIDEWALLS IN SILICON NITRI...

SILICON-CONTAINING UNDERLAYERS

METHOD FOR PRODUCING OZONE WATER

CLEANING AGENT AND PREPARATION METHOD AND USE THEREOF

APPARATUS FOR REMOVING PHOTORESISTS AND METHOD OF MANUFACTURING SEM...

SUBSTRATE PROCESSING APPARATUS

THINNER COMPOSITION

PHOTONICALLY TUNED ETCHANT REACTIVITY FOR WET ETCHING

UV-ASSISTED STRIPPING OF HARDENED PHOTORESIST TO CREATE CHEMICAL TE...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTA...

STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR...

SILICON-CONTAINING UNDERLAYERS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

USE OF NON-OXIDIZING STRONG ACIDS FOR THE REMOVAL OF ION-IMPLANTED...

CLEANING COMPOSITIONS AND METHODS OF USE THEREFOR

Lithographic Mask Layer

Photoresist with Gradient Composition for Improved Uniformity

CLEANING FORMULATIONS

PHOTORESIST REMOVAL

EMBOSSING LACQUER AND METHOD FOR EMBOSSING, AND SUBSTRATE SURFACE C...

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SUBSTRATE PROCESSING APPARATUS

USE OF NON-OXIDIZING STRONG ACIDS FOR THE REMOVAL OF ION-IMPLANTED...