control of ion bombardment energy

Industry

CPC
H01J2237/3348

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3348control of ion bombardment energy

Industries

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for extracting process control information from...
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- Issue date Oct 29, 2024
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Information Patent Grant
Semiconductor processing chamber
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- Issue date Sep 3, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Yan Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion stratification using bias pulses of short duration
- Patent number 11,189,462
- Issue date Nov 30, 2021
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,559,481
- Issue date Feb 11, 2020
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing contact areas on a semiconductor substrate
- Patent number 10,332,850
- Issue date Jun 25, 2019
- IMEC
- Eric Beyne
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Information Patent Grant
Negative ion control for dielectric etch
- Patent number 10,181,412
- Issue date Jan 15, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Etching method and etching apparatus
- Patent number 9,865,471
- Issue date Jan 9, 2018
- Tokyo Electron Limited
- Gaku Shimoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low electron temperature etch chamber with independent control over...
- Patent number 9,799,491
- Issue date Oct 24, 2017
- Applied Materials, Inc.
- Leonid Dorf
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Information Patent Grant
Etching apparatus
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- Issue date Jun 27, 2017
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- Eiichi Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Plasma processing apparatus
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- Issue date Oct 25, 2016
- Tokyo Electron Limited
- Yoshinobu Ooya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feature etching using varying supply of power pulses
- Patent number 9,401,263
- Issue date Jul 26, 2016
- GLOBALFOUNDRIES Inc.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
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- Issue date Apr 5, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ion control for dielectric etch
- Patent number 9,117,767
- Issue date Aug 25, 2015
- Lam Research Corporation
- Alexei Marakhatanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for preparing samples for imaging
- Patent number 9,111,720
- Issue date Aug 18, 2015
- FEI Company
- Ronald Kelley
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Information Patent Grant
Plasma processing in a capacitively-coupled reactor with trapezoida...
- Patent number 8,968,838
- Issue date Mar 3, 2015
- Ecole Polytechnique
- Jean-Paul Booth
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and etching apparatus
- Patent number 8,877,081
- Issue date Nov 4, 2014
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,642,478
- Issue date Feb 4, 2014
- Tokyo Electron Limited
- Yoshinobu Ooya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulated multi-frequency processing method
- Patent number 8,154,209
- Issue date Apr 10, 2012
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,491,649
- Issue date Feb 17, 2009
- Surface Technology Systems plc
- Jyoti Kiron Bhardwaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching magnetic and ferroelectric materials using a puls...
- Patent number 6,942,813
- Issue date Sep 13, 2005
- Applied Materials, Inc.
- Chentsau Ying
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for monitoring and controlling wafer fabricati...
- Patent number 6,632,321
- Issue date Oct 14, 2003
- Applied Materials, Inc.
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improving processing and reducing charge d...
- Patent number 6,247,425
- Issue date Jun 19, 2001
- Applied Materials, Inc.
- Dimitris Lymberopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improving processing and reducing charge d...
- Patent number 6,085,688
- Issue date Jul 11, 2000
- Applied Materials, Inc.
- Dimitris Lymberopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus
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- Issue date Apr 20, 1999
- Hyundai Electronics Industries Co., Ltd.
- Chang Heon Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon/polycide etch process for sub-micron gate stacks
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- Issue date Jun 25, 1996
- Siemens Aktiengesellschaft
- Virinder S. Grewal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing method and an apparatus for carrying out the same
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- Issue date Oct 31, 1995
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 5,417,798
- Issue date May 23, 1995
- Sumitomo Electric Industries, Ltd.
- Yoshiki Nishibayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrates
- Patent number 5,385,624
- Issue date Jan 31, 1995
- Tokyo Electron Limited
- Yutaka Amemiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for structuring a layer using a ring electrode and multiple...
- Patent number 5,332,468
- Issue date Jul 26, 1994
- Siemens Aktiengesellschaft
- Manfred Engelhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for removal of subsurface damage in semiconduc...
- Patent number 5,238,532
- Issue date Aug 24, 1993
- Hughes Aircraft Company
- Charles B. Zarowin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20240266150
- Publication date Aug 8, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yan LI
- H01 - BASIC ELECTRIC ELEMENTS
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MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCE...
- Publication number 20240242935
- Publication date Jul 18, 2024
- LAM RESEARCH CORPORATION
- He Zhang
- H01 - BASIC ELECTRIC ELEMENTS
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APPARATUS FOR TREATING SUBSTRATE
- Publication number 20240203704
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20230298857
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENTS WITH MULTI-LAYER COATING
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- Applied Materials, Inc.
- Laksheswar Kalita
- H01 - BASIC ELECTRIC ELEMENTS
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PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230282447
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURI...
- Publication number 20220285170
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Ion Stratification Using Bias Pulses of Short Duration
- Publication number 20220051875
- Publication date Feb 17, 2022
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
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Low Electron Temperature Etch Chamber with Independent Control Over...
- Publication number 20180053631
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ELECTRON TEMPERATURE ETCH CHAMBER WITH INDEPENDENT CONTROL OVER...
- Publication number 20170125217
- Publication date May 4, 2017
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING SAMPLES FOR IMAGING
- Publication number 20150179402
- Publication date Jun 25, 2015
- FEI Company
- Ronald Kelley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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DIELECTRIC WINDOW, ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20150155139
- Publication date Jun 4, 2015
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
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INDUCTIVELY COUPLED SPATIALLY DISCRETE MULTI-LOOP RF-DRIVEN PLASMA...
- Publication number 20150075717
- Publication date Mar 19, 2015
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEATURE ETCHING USING VARYING SUPPLY OF POWER PULSES
- Publication number 20150076111
- Publication date Mar 19, 2015
- GLOBALFOUNDRIES INC.
- Xiang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
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- Publication date Jan 29, 2015
- TOKYO ELECTRON LIMITED
- Toshio HAGA
- H01 - BASIC ELECTRIC ELEMENTS
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METHOD FOR PREPARING SAMPLES FOR IMAGING
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PLASMA PROCESSING APPARATUS
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- Publication date Apr 17, 2014
- TOKYO ELECTRON LIMITED
- Yoshinobu Ooya
- H01 - BASIC ELECTRIC ELEMENTS
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ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20130196511
- Publication date Aug 1, 2013
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PLASMA PROCESSING IN A CAPACITIVELY-COUPLED REACTOR WITH TRAPEZOIDA...
- Publication number 20130136872
- Publication date May 30, 2013
- Centre National de la Recherche Scientifique
- Jean-Paul Booth
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Negative Ion Control for Dielectric Etch
- Publication number 20130023064
- Publication date Jan 24, 2013
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120252219
- Publication date Oct 4, 2012
- Hitachi High-Technologies Corporation
- Michikazu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
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PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20120214313
- Publication date Aug 23, 2012
- TOKYO ELECTRON LIMITED
- Yoshinobu Ooya
- H01 - BASIC ELECTRIC ELEMENTS
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PLASMA ETCHING METHOD AND APPARATUS THEREOF
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- Samsung Electronics Co., Ltd.
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MODULATED MULTI-FREQUENCY PROCESSING METHOD
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- Publication date Oct 7, 2010
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
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- Publication date Jul 21, 2005
- Jyoti Kiron Bhardwaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching magnetic and ferroelectric materials using a puls...
- Publication number 20040173570
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- APPLIED MATERIALS, INC.
- Chentsau Ying
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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METHOD AND APPARATUS FOR MONITORING AND CONTROLLING WAFER FABRICATI...
- Publication number 20030029834
- Publication date Feb 13, 2003
- THORSTEN LILL
- H01 - BASIC ELECTRIC ELEMENTS

control of ion bombardment energy

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for extracting process control information from...

Semiconductor processing chamber

Ion stratification using bias pulses of short duration

Plasma processing apparatus and plasma processing method

Method for producing contact areas on a semiconductor substrate

Negative ion control for dielectric etch

Etching method and etching apparatus

Low electron temperature etch chamber with independent control over...

Etching apparatus

Plasma processing apparatus

Feature etching using varying supply of power pulses

Plasma processing apparatus and plasma processing method

Negative ion control for dielectric etch

Method for preparing samples for imaging

Plasma processing in a capacitively-coupled reactor with trapezoida...

Etching method and etching apparatus

Plasma processing method and plasma processing apparatus

Modulated multi-frequency processing method

Plasma processing apparatus

Method of etching magnetic and ferroelectric materials using a puls...

Method and apparatus for monitoring and controlling wafer fabricati...

Method and apparatus for improving processing and reducing charge d...

Method and apparatus for improving processing and reducing charge d...

Plasma etching apparatus

Polysilicon/polycide etch process for sub-micron gate stacks

Surface processing method and an apparatus for carrying out the same

Etching method

Apparatus and method for treating substrates

Method for structuring a layer using a ring electrode and multiple...

Method and apparatus for removal of subsurface damage in semiconduc...

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING CHAMBER

MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCE...

APPARATUS FOR TREATING SUBSTRATE

Systems and Methods for Extracting Process Control Information from...

SEMICONDUCTOR CHAMBER COMPONENTS WITH MULTI-LAYER COATING

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURI...

Ion Stratification Using Bias Pulses of Short Duration

Low Electron Temperature Etch Chamber with Independent Control Over...

LOW ELECTRON TEMPERATURE ETCH CHAMBER WITH INDEPENDENT CONTROL OVER...

METHOD FOR PREPARING SAMPLES FOR IMAGING

DIELECTRIC WINDOW, ANTENNA AND PLASMA PROCESSING APPARATUS

INDUCTIVELY COUPLED SPATIALLY DISCRETE MULTI-LOOP RF-DRIVEN PLASMA...

FEATURE ETCHING USING VARYING SUPPLY OF POWER PULSES

PLASMA PROCESSING APPARATUS

METHOD FOR PREPARING SAMPLES FOR IMAGING

PLASMA PROCESSING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

PLASMA PROCESSING IN A CAPACITIVELY-COUPLED REACTOR WITH TRAPEZOIDA...

Negative Ion Control for Dielectric Etch

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD AND APPARATUS THEREOF

MODULATED MULTI-FREQUENCY PROCESSING METHOD

Plasma processing apparatus

Method of etching magnetic and ferroelectric materials using a puls...

METHOD AND APPARATUS FOR MONITORING AND CONTROLLING WAFER FABRICATI...