Deposition of halogen doped silicon oxide

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H01L21/31629

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/31629Deposition of halogen doped silicon oxide

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Deposition of halogen doped silicon oxide

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device and manufacturing method of the same

Semiconductor device and manufacturing method of the same

Devices formed with dual damascene process

Method of fabricating semiconductor device

Barrier-metal-free copper damascene technology using enhanced reflow

Metal capacitor and method of making the same including dielectric...

Metal capacitor and method of making the same including dielectric...

Method for reducing amine based contaminants

Method for manufacturing semiconductor device, semiconductor device...

Semiconductor structure having reduced amine-based contaminants

Barrier-metal-free copper damascene technology using atomic hydroge...

Method of fabricating a semiconductor device

Metal capacitor and method of making the same

Heat treatment method, heat treatment apparatus and substrate proce...

Dual damascene process

Method of manufacturing semiconductor device

Semiconductor device

Method for manufacturing semiconductor device, semiconductor device...

Method for forming low dielectric constant fluorine-doped layers

Method for preventing backside defects in dielectric layers formed...

Barrier-metal-free copper damascene technology using atomic hydroge...

Method for reducing amine based contaminants

Semiconductor device

Semiconductor device having a tapered plug

Methods of forming fluorine doped insulating materials

Semiconductor device and method of manufacture thereof

Method for improving mechanical properties of low dielectric consta...

Barrier-metal-free copper damascene technology using atomic hydroge...

Method for forming low dielectric constant fluorine-doped layers

Process for depositing low dielectric constant materials

Patents Applicationslast 30 patents

BARRIER-METAL-FREE COPPER DAMASCENE TECHNOLOGY USING ENHANCED REFLOW

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

METAL CAPACITOR AND METHOD OF MAKING THE SAME

METAL CAPACITOR AND METHOD OF MAKING THE SAME

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SEMICONDUCTOR DEVICE

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Semiconductor device having a tapered plug

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ELECTRON BEAM MODIFICATION OF CVD DEPOSITED LOW DIELECTRIC CONSTANT...

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Method for forming silicon-containing film and method for decreasin...

Method for forming low dielectric constant fluorine-doped layers

Methods for improving low k FSG film gap-fill characteristics

Method of forming an electrical isolation associated with a wiring...