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CPC
H01J2237/006

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/006Details of gas supplies -

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ion source having different modes of operation
- Patent number 12,154,766
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for storage and supply of F3NO-free FNO gases a...
- Patent number 12,106,940
- Issue date Oct 1, 2024
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Ayaka Nishiyama
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Fluorine based molecular co-gas when running dimethylaluminum chlor...
- Patent number 12,051,561
- Issue date Jul 30, 2024
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cross-section sample preparation
- Patent number 12,007,344
- Issue date Jun 11, 2024
- Fibics Incorporated
- Michael William Phaneuf
- G01 - MEASURING TESTING
Information Patent Grant
Operating a gas feed device for a particle beam apparatus
- Patent number 12,002,656
- Issue date Jun 4, 2024
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture device and analyzer arrangement
- Patent number 11,942,316
- Issue date Mar 26, 2024
- SCIENTA OMICRON AB
- Peter Amann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus and method for controlling electron beam ap...
- Patent number 11,894,211
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Erina Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced charging by low negative voltage in FIB systems
- Patent number 11,887,810
- Issue date Jan 30, 2024
- Applied Materials Israel Ltd.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system for a shared gas delivery architecture
- Patent number 11,881,416
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Arun Chakravarthy Chakravarthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Build material handling unit for a powder module for an apparatus f...
- Patent number 11,878,463
- Issue date Jan 23, 2024
- CONCEPT LASER GMBH
- Dominik Eideloth
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Electron microscope sample holder fluid handling with independent p...
- Patent number 11,869,744
- Issue date Jan 9, 2024
- PROTOCHIPS, INC.
- Franklin Stampley Walden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broad-energy spectrum electron gun
- Patent number 11,848,174
- Issue date Dec 19, 2023
- The Regents of the University of Colorado, a Body Corporate
- Kieran Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Germanium tetraflouride and hydrogen mixtures for an ion implantati...
- Patent number 11,827,973
- Issue date Nov 28, 2023
- Entegris, Inc.
- Oleg Byl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Operating a gas supply device for a particle beam device
- Patent number 11,764,036
- Issue date Sep 19, 2023
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for extending a lifetime of an ion source for mol...
- Patent number 11,756,772
- Issue date Sep 12, 2023
- Axcelis Technologies, Inc.
- David Sporleder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multidimensional printer
- Patent number 11,738,312
- Issue date Aug 29, 2023
- GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY O...
- Andrei A. Kolmakov
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Method for cross-section sample preparation
- Patent number 11,726,050
- Issue date Aug 15, 2023
- Fibics Incorporated
- Michael William Phaneuf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine based molecular co-gas when running dimethylaluminum chlor...
- Patent number 11,699,565
- Issue date Jul 11, 2023
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus including gas distribution system
- Patent number 11,674,213
- Issue date Jun 13, 2023
- Cardinal CG Company
- Klaus Hartig
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,569,068
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system for ion implanter
- Patent number 11,569,062
- Issue date Jan 31, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hom-Chung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and gas introducing method
- Patent number 11,562,889
- Issue date Jan 24, 2023
- Tokyo Electron Limited
- Mayo Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and technique for profile modulation using high tilt angles
- Patent number 11,551,904
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Venkataramana R. Chavva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,542,603
- Issue date Jan 3, 2023
- Kokusai Electric Corporation
- Hirohisa Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implanter toxic gas delivery system
- Patent number 11,527,380
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ying-Chieh Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for plasma processing devices
- Patent number 11,527,388
- Issue date Dec 13, 2022
- Kyocera Corporation
- Hiromasa Matsufuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus including gas distribution system
- Patent number 11,501,959
- Issue date Nov 15, 2022
- Cardinal CG Company
- Klaus Hartig
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 11,476,122
- Issue date Oct 18, 2022
- Kioxia Corporation
- Shuichi Kuboi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrahigh selective nitride etch to form FinFET devices
- Patent number 11,469,079
- Issue date Oct 11, 2022
- Lam Research Corporation
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...
- Publication number 20240429020
- Publication date Dec 26, 2024
- Hitachi, Ltd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240404780
- Publication date Dec 5, 2024
- HITACHI HIGH-TECH CORPORATION
- Masahiro KAMIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM AND RELATED METHODS
- Publication number 20240379320
- Publication date Nov 14, 2024
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...
- Publication number 20240363304
- Publication date Oct 31, 2024
- FEI Company
- Jaroslav Velcovský
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM EXTRACTION ELECTRODE, ION SOURCE AND EXTRACTION ELECTRODE...
- Publication number 20240290576
- Publication date Aug 29, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Reducing Particle Formation in a Process Cham...
- Publication number 20240274404
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING EQUIPMENT
- Publication number 20240203693
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Hee Won MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPORIZER, ION SOURCE, ION BEAM IRRADIATION APPARATUS, AND AN OPERA...
- Publication number 20240186101
- Publication date Jun 6, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED DEPOSITION RATE BY APPLYING A NEGATIVE VOLTAGE TO A GAS IN...
- Publication number 20240105421
- Publication date Mar 28, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTIMIZED SADDLE NOZZLE DESIGN FOR GAS INJECTION SYSTEM
- Publication number 20240096592
- Publication date Mar 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED DEPOSITION RATE BY THERMAL ISOLATION COVER FOR GIS MANIPUL...
- Publication number 20240062990
- Publication date Feb 22, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Sean Kashy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHLORINE-CONTAINING PRECURSORS FOR ION IMPLANTATION SYSTEMS AND REL...
- Publication number 20240062987
- Publication date Feb 22, 2024
- Entegris, Inc.
- Joseph R. Despres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR IMAGING AND PROCESSING A SAMPLE USING A FOCUSED PARTICLE...
- Publication number 20240062989
- Publication date Feb 22, 2024
- Carl Zeiss SMT GMBH
- Daniel Schwarz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND C...
- Publication number 20240047175
- Publication date Feb 8, 2024
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SAMPLE, PARTICLE BEAM SYSTEM, AND COMPUTER P...
- Publication number 20240029996
- Publication date Jan 25, 2024
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
OPERATING A GAS SUPPLY DEVICE FOR A PARTICLE BEAM DEVICE
- Publication number 20230420224
- Publication date Dec 28, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE HAVING DIFFERENT MODES OF OPERATION
- Publication number 20230395357
- Publication date Dec 7, 2023
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE
- Publication number 20230386786
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Assisted Etching Of Metal Oxides
- Publication number 20230386854
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CROSS-SECTION SAMPLE PREPARATION
- Publication number 20230358696
- Publication date Nov 9, 2023
- Fibics Incorporated
- Michael William PHANEUF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE BASED MOLECULAR CO-GAS WHEN RUNNING DIMETHYLALUMINUM CHLOR...
- Publication number 20230352265
- Publication date Nov 2, 2023
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCED CHARGING BY LOW NEGATIVE VOLTAGE IN FIB SYSTEMS
- Publication number 20230343545
- Publication date Oct 26, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
END POINT DETERMINATION BY MEANS OF CONTRAST GAS
- Publication number 20230341766
- Publication date Oct 26, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTIC...
- Publication number 20230282442
- Publication date Sep 7, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MASK REPAIR
- Publication number 20230280647
- Publication date Sep 7, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...
- Publication number 20230241650
- Publication date Aug 3, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- B08 - CLEANING
Information Patent Application
GAS SUPPLY DEVICE, PARTICLE BEAM APPARATUS HAVING A GAS SUPPLY DEVI...
- Publication number 20230215688
- Publication date Jul 6, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR OBSERVING PERMEATION AND DIFFUSION PATH OF OBSERVATION T...
- Publication number 20230127466
- Publication date Apr 27, 2023
- National Institute for Materials Science
- Akiko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES
- Publication number 20230084901
- Publication date Mar 16, 2023
- LAM RESEARCH CORPORATION
- Kwame EASON
- H01 - BASIC ELECTRIC ELEMENTS

Details of gas supplies -

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ion source having different modes of operation

Systems and methods for storage and supply of F3NO-free FNO gases a...

Fluorine based molecular co-gas when running dimethylaluminum chlor...

Method for cross-section sample preparation

Operating a gas feed device for a particle beam apparatus

Aperture device and analyzer arrangement

Electron beam apparatus and method for controlling electron beam ap...

Reduced charging by low negative voltage in FIB systems

Gas delivery system for a shared gas delivery architecture

Build material handling unit for a powder module for an apparatus f...

Electron microscope sample holder fluid handling with independent p...

Broad-energy spectrum electron gun

Germanium tetraflouride and hydrogen mixtures for an ion implantati...

Operating a gas supply device for a particle beam device

System and method for extending a lifetime of an ion source for mol...

Multidimensional printer

Method and system for the removal and/or avoidance of contamination...

Method for cross-section sample preparation

Fluorine based molecular co-gas when running dimethylaluminum chlor...

Sputtering apparatus including gas distribution system

Plasma processing apparatus

Gas delivery system for ion implanter

Plasma processing apparatus and gas introducing method

System and technique for profile modulation using high tilt angles

Substrate processing apparatus, method of manufacturing semiconduct...

Ion implanter toxic gas delivery system

Member for plasma processing devices

Sputtering apparatus including gas distribution system

Plasma etching method and plasma etching apparatus

Ultrahigh selective nitride etch to form FinFET devices

Patents Applicationslast 30 patents

SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...

SEMICONDUCTOR PROCESSING APPARATUS

ION IMPLANTATION SYSTEM AND RELATED METHODS

IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...

ION BEAM EXTRACTION ELECTRODE, ION SOURCE AND EXTRACTION ELECTRODE...

System and Method for Reducing Particle Formation in a Process Cham...

PLASMA PROCESSING EQUIPMENT

VAPORIZER, ION SOURCE, ION BEAM IRRADIATION APPARATUS, AND AN OPERA...

ENHANCED DEPOSITION RATE BY APPLYING A NEGATIVE VOLTAGE TO A GAS IN...

OPTIMIZED SADDLE NOZZLE DESIGN FOR GAS INJECTION SYSTEM

ENHANCED DEPOSITION RATE BY THERMAL ISOLATION COVER FOR GIS MANIPUL...

CHLORINE-CONTAINING PRECURSORS FOR ION IMPLANTATION SYSTEMS AND REL...

DEVICE FOR IMAGING AND PROCESSING A SAMPLE USING A FOCUSED PARTICLE...

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND C...

METHOD OF PROCESSING A SAMPLE, PARTICLE BEAM SYSTEM, AND COMPUTER P...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

OPERATING A GAS SUPPLY DEVICE FOR A PARTICLE BEAM DEVICE

ION SOURCE HAVING DIFFERENT MODES OF OPERATION

GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE

Plasma-Assisted Etching Of Metal Oxides

METHOD FOR CROSS-SECTION SAMPLE PREPARATION

FLUORINE BASED MOLECULAR CO-GAS WHEN RUNNING DIMETHYLALUMINUM CHLOR...

REDUCED CHARGING BY LOW NEGATIVE VOLTAGE IN FIB SYSTEMS

END POINT DETERMINATION BY MEANS OF CONTRAST GAS

GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTIC...

METHOD AND APPARATUS FOR MASK REPAIR

GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...

GAS SUPPLY DEVICE, PARTICLE BEAM APPARATUS HAVING A GAS SUPPLY DEVI...

DEVICE FOR OBSERVING PERMEATION AND DIFFUSION PATH OF OBSERVATION T...

ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES