Details of optical elements

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CPC
G03F7/7015

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/7015Details of optical elements

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Patents Grantslast 30 patents

Information Patent Grant
Dual diffraction order spin-on-glass phase-grating beam-splitter ba...
- Patent number 12,204,249
- Issue date Jan 21, 2025
- Steven R. J. Brueck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assembly, in particular in a microlithographic projection exposure...
- Patent number 12,105,434
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Stefan Troeger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a membrane assembly
- Patent number 12,072,620
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protective coating for nonlinear optical crystal
- Patent number 12,072,606
- Issue date Aug 27, 2024
- KLA Corporation
- John Fielden
- G01 - MEASURING TESTING
Information Patent Grant
Assembly for collimating broadband radiation
- Patent number 12,050,409
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yongfeng Ni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Configuring optical layers in imprint lithography processes
- Patent number 12,044,976
- Issue date Jul 23, 2024
- Magic Leap, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods that utilize angled photolithography for manufa...
- Patent number 11,994,802
- Issue date May 28, 2024
- Waymo LLC
- James Dunphy
- G02 - OPTICS
Information Patent Grant
Diffraction based overlay metrology tool and method of diffraction...
- Patent number 11,953,450
- Issue date Apr 9, 2024
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Long sweep length DUV microlithographic beam scanning acousto-optic...
- Patent number 11,947,241
- Issue date Apr 2, 2024
- Mycronic AB
- Andrzej Karawajczyk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical diffraction component
- Patent number 11,947,265
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus
- Patent number 11,940,739
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,940,737
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light source apparatus, optical apparatus, exposure apparatus, devi...
- Patent number 11,934,104
- Issue date Mar 19, 2024
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Optical component and clamp used in lithographic apparatus
- Patent number 11,892,779
- Issue date Feb 6, 2024
- ASML Holding N.V.
- Victor Antonio Perez-Falcon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,886,123
- Issue date Jan 30, 2024
- Franklin Mark Schellenberg
- G11 - INFORMATION STORAGE
Information Patent Grant
Assembly including a non-linear element and a method of use thereof
- Patent number 11,886,096
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Vitaliy Prosyentsov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High uniformity telecentric illuminator
- Patent number 11,868,049
- Issue date Jan 9, 2024
- Innovations In Optics, Inc.
- Thomas J. Brukilacchio
- G02 - OPTICS
Information Patent Grant
Memory device
- Patent number 11,854,972
- Issue date Dec 26, 2023
- Winbond Electronics Corp.
- Chia-Jung Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle transportation container
- Patent number 11,837,486
- Issue date Dec 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Ching Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field facet system, optical arrangement and lithography apparatus
- Patent number 11,815,817
- Issue date Nov 14, 2023
- Carl Zeiss SMT GmbH
- Guenter Rudolph
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,809,085
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Hans Michael Stiepan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Radiation source supply system for lithographic tools
- Patent number 11,809,084
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 11,762,298
- Issue date Sep 19, 2023
- Canon Kabushiki Kaisha
- Daisuke Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,733,617
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded interface in Bragg reflector
- Patent number 11,720,013
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Wen Xiao
- G02 - OPTICS
Information Patent Grant
Measurement illumination optical unit for guiding illumination ligh...
- Patent number 11,720,028
- Issue date Aug 8, 2023
- Carl Zeiss SMT GmbH
- Thomas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Digital exposure apparatus and exposure method
- Patent number 11,669,016
- Issue date Jun 6, 2023
- BOE Technology Group Co., Ltd.
- Jing Feng
- G02 - OPTICS
Information Patent Grant
Projection optical unit for microlithography and method for produci...
- Patent number 11,650,510
- Issue date May 16, 2023
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diffraction based overlay metrology tool and method of diffraction...
- Patent number 11,644,428
- Issue date May 9, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250028257
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...
- Publication number 20240402610
- Publication date Dec 5, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20240369920
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...
- Publication number 20240353758
- Publication date Oct 24, 2024
- University of Pittsburgh of the Commonwealth System of Higher Education
- Hrvoje Petek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...
- Publication number 20240337952
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES
- Publication number 20240329540
- Publication date Oct 3, 2024
- Magic Leap, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Application
Optical Device and Method of Manufacture
- Publication number 20240319590
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
FAST UNIFORMITY DRIFT CORRECTION
- Publication number 20240319608
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Roberto B. WIENER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...
- Publication number 20240248409
- Publication date Jul 25, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20240248407
- Publication date Jul 25, 2024
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...
- Publication number 20240241448
- Publication date Jul 18, 2024
- Gigaphoton Inc.
- Atsushi UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20240201029
- Publication date Jun 20, 2024
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus
- Publication number 20240184218
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...
- Publication number 20240176248
- Publication date May 30, 2024
- Nikon Corporation
- Hideki KOMATSUDA
- G02 - OPTICS
Information Patent Application
LASER SYSTEM
- Publication number 20240170905
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Herman Philip GODFRIED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT FOR AN OPTICAL ELEMENT
- Publication number 20240159988
- Publication date May 16, 2024
- Carl Zeiss SMT GMBH
- Rodolfo Guglielmi Rabe
- G02 - OPTICS
Information Patent Application
GAS LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240136787
- Publication date Apr 25, 2024
- Gigaphoton Inc.
- Yousuke FUJIMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20240128702
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Shinichi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING OPTICAL UNIT
- Publication number 20240103382
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Hans-Jürgen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE,...
- Publication number 20240103357
- Publication date Mar 28, 2024
- MITSUI CHEMICALS, INC.
- Yosuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATOR-SENSOR DEVICE AND LITHOGRAPHY APPARATUS
- Publication number 20240027914
- Publication date Jan 25, 2024
- Carl Zeiss SMT GMBH
- Holger Sontag
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV MIRROR WITH IMPROVED OPTICAL STABILITY
- Publication number 20240019786
- Publication date Jan 18, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Yung-Yao Lee
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR
- Publication number 20240012332
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Luc Roger Simonne HASPESLAGH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, OPTICAL ARRANGEMENT AND INSERT COMPONENT
- Publication number 20240004160
- Publication date Jan 4, 2024
- Carl Zeiss SMT GMBH
- Eduard Schweigert
- G02 - OPTICS
Information Patent Application
FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230384685
- Publication date Nov 30, 2023
- Carl Zeiss SMT GMBH
- Arno Schmittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAYER-FORMING METHOD, OPTICAL ELEMENT AND OPTICAL SYSTEM
- Publication number 20230367226
- Publication date Nov 16, 2023
- Carl Zeiss SMT GMBH
- Vitaliy SHKLOVER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Details of optical elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Dual diffraction order spin-on-glass phase-grating beam-splitter ba...

Assembly, in particular in a microlithographic projection exposure...

Method of manufacturing a membrane assembly

Protective coating for nonlinear optical crystal

Assembly for collimating broadband radiation

Configuring optical layers in imprint lithography processes

Metrology system and method for determining a characteristic of one...

Systems and methods that utilize angled photolithography for manufa...

Diffraction based overlay metrology tool and method of diffraction...

Long sweep length DUV microlithographic beam scanning acousto-optic...

Optical diffraction component

Metrology apparatus

Method of fabricating reticle

Light source apparatus, optical apparatus, exposure apparatus, devi...

Optical component and clamp used in lithographic apparatus

Method and system for nanoscale data recording

Assembly including a non-linear element and a method of use thereof

High uniformity telecentric illuminator

Memory device

Reticle transportation container

Field facet system, optical arrangement and lithography apparatus

Mirror, in particular for a microlithographic projection exposure a...

Radiation source supply system for lithographic tools

Exposure apparatus and method of manufacturing article

Frequency broadening apparatus and method

Graded interface in Bragg reflector

Measurement illumination optical unit for guiding illumination ligh...

Digital exposure apparatus and exposure method

Projection optical unit for microlithography and method for produci...

Diffraction based overlay metrology tool and method of diffraction...

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESS APPARATUS

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...

METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY

SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...

EXPOSURE DEVICE

SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...

CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES

Optical Device and Method of Manufacture

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

FAST UNIFORMITY DRIFT CORRECTION

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

METHOD FOR DETERMINING A POSITION OF A MIRROR

PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

Metrology Apparatus

LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...

LASER SYSTEM

SUPPORT FOR AN OPTICAL ELEMENT

GAS LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...

IMAGING OPTICAL UNIT

PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE,...

ACTUATOR-SENSOR DEVICE AND LITHOGRAPHY APPARATUS

EUV MIRROR WITH IMPROVED OPTICAL STABILITY

HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR

OPTICAL ELEMENT, OPTICAL ARRANGEMENT AND INSERT COMPONENT

FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS

LAYER-FORMING METHOD, OPTICAL ELEMENT AND OPTICAL SYSTEM