Details of optical elements

Industry

CPC
G03F7/7015

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/7015Details of optical elements

Industries

Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Field facet system and lithography apparatus
- Patent number 12,353,137
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Arno Schmittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for regulating and controlling incident angle of...
- Patent number 12,346,030
- Issue date Jul 1, 2025
- Tsinghua University
- Leijie Wang
- G01 - MEASURING TESTING
Information Patent Grant
Facet assembly for a facet mirror
- Patent number 12,339,587
- Issue date Jun 24, 2025
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Grant
High force low voltage piezoelectric micromirror actuator
- Patent number 12,339,588
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Luc Roger Simonne Haspeslagh
- G02 - OPTICS
Information Patent Grant
Configuring optical layers in imprint lithography processes
- Patent number 12,332,572
- Issue date Jun 17, 2025
- Magic Leap, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Grant
Optical component
- Patent number 12,326,663
- Issue date Jun 10, 2025
- Carl Zeiss SMT GmbH
- Valentin Jonatan Bolsinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Optical element, EUV lithography system, and method for forming nan...
- Patent number 12,306,539
- Issue date May 20, 2025
- Carl Zeiss SMT GmbH
- Anastasia Gonchar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmissive diffusor
- Patent number 12,271,008
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Andrey Nikipelov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Micromirror arrays
- Patent number 12,259,546
- Issue date Mar 25, 2025
- ASML Netherlands B.V.
- Alexandre Halbach
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of forming photoresist pattern and projection exposure appar...
- Patent number 12,253,804
- Issue date Mar 18, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Kanyu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual diffraction order spin-on-glass phase-grating beam-splitter ba...
- Patent number 12,204,249
- Issue date Jan 21, 2025
- Steven R. J. Brueck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assembly, in particular in a microlithographic projection exposure...
- Patent number 12,105,434
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Stefan Troeger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a membrane assembly
- Patent number 12,072,620
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protective coating for nonlinear optical crystal
- Patent number 12,072,606
- Issue date Aug 27, 2024
- KLA Corporation
- John Fielden
- G01 - MEASURING TESTING
Information Patent Grant
Assembly for collimating broadband radiation
- Patent number 12,050,409
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yongfeng Ni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Configuring optical layers in imprint lithography processes
- Patent number 12,044,976
- Issue date Jul 23, 2024
- Magic Leap, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods that utilize angled photolithography for manufa...
- Patent number 11,994,802
- Issue date May 28, 2024
- Waymo LLC
- James Dunphy
- G02 - OPTICS
Information Patent Grant
Diffraction based overlay metrology tool and method of diffraction...
- Patent number 11,953,450
- Issue date Apr 9, 2024
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Long sweep length DUV microlithographic beam scanning acousto-optic...
- Patent number 11,947,241
- Issue date Apr 2, 2024
- Mycronic AB
- Andrzej Karawajczyk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical diffraction component
- Patent number 11,947,265
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus
- Patent number 11,940,739
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,940,737
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light source apparatus, optical apparatus, exposure apparatus, devi...
- Patent number 11,934,104
- Issue date Mar 19, 2024
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Optical component and clamp used in lithographic apparatus
- Patent number 11,892,779
- Issue date Feb 6, 2024
- ASML Holding N.V.
- Victor Antonio Perez-Falcon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,886,123
- Issue date Jan 30, 2024
- Franklin Mark Schellenberg
- G11 - INFORMATION STORAGE
Information Patent Grant
Assembly including a non-linear element and a method of use thereof
- Patent number 11,886,096
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Vitaliy Prosyentsov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High uniformity telecentric illuminator
- Patent number 11,868,049
- Issue date Jan 9, 2024
- Innovations In Optics, Inc.
- Thomas J. Brukilacchio
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE W...
- Publication number 20250208524
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Eva Linda MATHIEU
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
ILLUMINATION SYSTEM, RADIATION SOURCE APPARATUS, METHOD FOR ILLUMIN...
- Publication number 20250199413
- Publication date Jun 19, 2025
- Carl Zeiss SMT GMBH
- Stig BIELING
- G02 - OPTICS
Information Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
- Publication number 20250202184
- Publication date Jun 19, 2025
- CYMER, LLC
- Eric Anders Mason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diffraction-Based Illumination Sampling
- Publication number 20250198836
- Publication date Jun 19, 2025
- KLA Corporation
- Florian Melsheimer
- G02 - OPTICS
Information Patent Application
MIRROR FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20250138228
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS
Information Patent Application
DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...
- Publication number 20250130506
- Publication date Apr 24, 2025
- Carl Zeiss Jena GmbH
- Markus GIEHL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS
- Publication number 20250126698
- Publication date Apr 17, 2025
- Carl Zeiss SMT GMBH
- Silvi HAENDEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS
- Publication number 20250116938
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20250085172
- Publication date Mar 13, 2025
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...
- Publication number 20250044705
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Robert BUSCHLINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20250044702
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250028257
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...
- Publication number 20240402610
- Publication date Dec 5, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20240369920
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...
- Publication number 20240353758
- Publication date Oct 24, 2024
- University of Pittsburgh of the Commonwealth System of Higher Education
- Hrvoje Petek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...
- Publication number 20240337952
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES
- Publication number 20240329540
- Publication date Oct 3, 2024
- Magic Leap, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Application
Optical Device and Method of Manufacture
- Publication number 20240319590
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
FAST UNIFORMITY DRIFT CORRECTION
- Publication number 20240319608
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Roberto B. WIENER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...
- Publication number 20240248409
- Publication date Jul 25, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20240248407
- Publication date Jul 25, 2024
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...
- Publication number 20240241448
- Publication date Jul 18, 2024
- Gigaphoton Inc.
- Atsushi UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20240201029
- Publication date Jun 20, 2024
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus
- Publication number 20240184218
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...
- Publication number 20240176248
- Publication date May 30, 2024
- Nikon Corporation
- Hideki KOMATSUDA
- G02 - OPTICS
Information Patent Application
LASER SYSTEM
- Publication number 20240170905
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Herman Philip GODFRIED
- H01 - BASIC ELECTRIC ELEMENTS

Details of optical elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Field facet system and lithography apparatus

Device and method for regulating and controlling incident angle of...

Facet assembly for a facet mirror

High force low voltage piezoelectric micromirror actuator

Configuring optical layers in imprint lithography processes

Optical component

Method for generating EUV radiation

Optical element, EUV lithography system, and method for forming nan...

Transmissive diffusor

Micromirror arrays

Method of forming photoresist pattern and projection exposure appar...

Dual diffraction order spin-on-glass phase-grating beam-splitter ba...

Assembly, in particular in a microlithographic projection exposure...

Method of manufacturing a membrane assembly

Protective coating for nonlinear optical crystal

Assembly for collimating broadband radiation

Configuring optical layers in imprint lithography processes

Metrology system and method for determining a characteristic of one...

Systems and methods that utilize angled photolithography for manufa...

Diffraction based overlay metrology tool and method of diffraction...

Long sweep length DUV microlithographic beam scanning acousto-optic...

Optical diffraction component

Metrology apparatus

Method of fabricating reticle

Light source apparatus, optical apparatus, exposure apparatus, devi...

Optical component and clamp used in lithographic apparatus

Method and system for nanoscale data recording

Assembly including a non-linear element and a method of use thereof

High uniformity telecentric illuminator

Patents Applicationslast 30 patents

HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE W...

ILLUMINATION SYSTEM, RADIATION SOURCE APPARATUS, METHOD FOR ILLUMIN...

PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER

Diffraction-Based Illumination Sampling

MIRROR FOR A PROJECTION EXPOSURE APPARATUS

DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...

EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS

LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

SEMICONDUCTOR PROCESS APPARATUS

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...

METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY

SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...

EXPOSURE DEVICE

SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...

CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES

Optical Device and Method of Manufacture

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

FAST UNIFORMITY DRIFT CORRECTION

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

METHOD FOR DETERMINING A POSITION OF A MIRROR

PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

Metrology Apparatus

LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...

LASER SYSTEM