Dose control

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G03F7/70558

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70558Dose control

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatuses for aligning and diagnosing a laser beam
- Patent number 12,204,161
- Issue date Jan 21, 2025
- Cymer, LLC
- Donald Harrison Barnhart
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 12,197,134
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for setting relative laser intensities
- Patent number 12,197,135
- Issue date Jan 14, 2025
- Mycronic AB
- Fredric Ihren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure system and method for manufacturing electronic devices
- Patent number 12,197,132
- Issue date Jan 14, 2025
- Gigaphoton Inc.
- Koichi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining best focus and best dose in exposure process
- Patent number 12,135,504
- Issue date Nov 5, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for exposure of relief precursors
- Patent number 12,124,171
- Issue date Oct 22, 2024
- XSYS PREPRESS N.V.
- Pieter Lenssens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and ultraviolet radiation control system
- Patent number 12,124,172
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Alexander Kremer
- G01 - MEASURING TESTING
Information Patent Grant
Method for controlling a lithographic system
- Patent number 12,099,306
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser system for target metrology and alteration in an EUV light so...
- Patent number 12,078,934
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improving critical dimension variation
- Patent number 11,988,972
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hsun Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for maskless lithography
- Patent number 11,953,835
- Issue date Apr 9, 2024
- ASML Netherlands B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy correction module for an optical source apparatus
- Patent number 11,947,268
- Issue date Apr 2, 2024
- Cymer, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless based lithography methods
- Patent number 11,934,107
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Shih-Hsien Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window based on defect probability
- Patent number 11,822,255
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 11,796,922
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation measurement system
- Patent number 11,774,867
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Herman Philip Godfried
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for gamma radiation based stabilization of repl...
- Patent number 11,762,301
- Issue date Sep 19, 2023
- The Aerospace Corporation
- Rafael J. Zaldivar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 11,709,435
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for illuminating image points
- Patent number 11,681,228
- Issue date Jun 20, 2023
- EV Group E. Thallner GmbH
- Bernhard Thallner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gamma ray generator and method of generating gamma ray
- Patent number 11,669,014
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dose optimization techniques for mask synthesis tools
- Patent number 11,651,135
- Issue date May 16, 2023
- Synopsys, Inc.
- Thomas Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic process and apparatus and inspection process and appar...
- Patent number 11,599,027
- Issue date Mar 7, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 11,592,752
- Issue date Feb 28, 2023
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining the contribution of a processing apparatus to...
- Patent number 11,579,535
- Issue date Feb 14, 2023
- ASML Netherlands B.V.
- Roy Anunciado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for improving critical dimension variation
- Patent number 11,579,539
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hsun Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple charged particle beam writing apparatus and multiple charg...
- Patent number 11,556,061
- Issue date Jan 17, 2023
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determination of Imaging Transfer Function of a Charged-Particle Ex...
- Publication number 20240427254
- Publication date Dec 26, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...
- Publication number 20240411232
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Jingshi LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
- Publication number 20240402607
- Publication date Dec 5, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EMBEDDING REDISTRIBUTION LAYER METAL TRACES IN A POLYMERIC DIELECTRIC
- Publication number 20240379411
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Peng SOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...
- Publication number 20240369944
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...
- Publication number 20240345488
- Publication date Oct 17, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...
- Publication number 20240329541
- Publication date Oct 3, 2024
- National Cheng Kung University
- YUNG-CHUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE
- Publication number 20240302750
- Publication date Sep 12, 2024
- SAMSUNG DISPLAY CO., LTD.
- CHOULWON MIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION
- Publication number 20240295831
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hsun LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING
- Publication number 20240280911
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- CHI-MING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROV...
- Publication number 20240280913
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Method for Imprinting Three-Dimensional Microstructure...
- Publication number 20240248395
- Publication date Jul 25, 2024
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Ladislav KUNA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
- Publication number 20240219848
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...
- Publication number 20240210839
- Publication date Jun 27, 2024
- KIOXIA Corporation
- Yoshio MIZUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS
- Publication number 20240210336
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM
- Publication number 20240184217
- Publication date Jun 6, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR DISTRIBUTING LIGHT DELIVERY
- Publication number 20240160110
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCE...
- Publication number 20240152046
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Jeongjin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20240126181
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PREDICT METROLOGY OFFSET OF A SEMICONDUCTOR MANUFACTURING...
- Publication number 20240094640
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Thiago DOS SANTOS GUZELLA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASKLESS BASED LITHOGRAPHY METHODS
- Publication number 20240077805
- Publication date Mar 7, 2024
- Applied Materials, Inc.
- Shih-Hsien LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20240019787
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT METAL NANO PATTERNING
- Publication number 20240014004
- Publication date Jan 11, 2024
- QATAR FOUNDATION FOR EDUCATION, SCIENCE AND COMMUNITY DEVELOPMENT
- Hicham Hamoudi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION SOURCE ARRANGEMENT AND METROLOGY DEVICE
- Publication number 20240004308
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Ali ALSAQQA
- G02 - OPTICS
Information Patent Application
DEVICE AND METHOD FOR SETTING RELATIVE LASER INTENSITIES
- Publication number 20230333484
- Publication date Oct 19, 2023
- Mycronic AB
- Fredric IHREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTER...
- Publication number 20230333483
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20230333486
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR CONDITIONING OPTICAL APPARATUSES
- Publication number 20230251583
- Publication date Aug 10, 2023
- ASML NETHERLANDS B.V.
- Oleg Viacheslavovich VOZNYI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Dose control

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and apparatuses for aligning and diagnosing a laser beam

Apparatus and method for process-window characterization

Device and method for setting relative laser intensities

Exposure system and method for manufacturing electronic devices

Calibration system for an extreme ultraviolet light source

Method of manufacturing semiconductor devices

Method for determining best focus and best dose in exposure process

Apparatus and method for exposure of relief precursors

Lithographic apparatus and ultraviolet radiation control system

Method for controlling a lithographic system

Laser system for target metrology and alteration in an EUV light so...

Multi-charged-particle-beam writing method, multi-charged-particle-...

Method and apparatus for improving critical dimension variation

Charged particle beam writing apparatus, charged particle beam writ...

Methods and systems for maskless lithography

Energy correction module for an optical source apparatus

Maskless based lithography methods

Process window based on defect probability

Method of manufacturing semiconductor devices

Radiation measurement system

Systems and methods for gamma radiation based stabilization of repl...

Method of manufacturing a semiconductor device and apparatus for ma...

Method and apparatus for illuminating image points

Gamma ray generator and method of generating gamma ray

Dose optimization techniques for mask synthesis tools

Lithographic process and apparatus and inspection process and appar...

Apparatus and method for process-window characterization

Method of determining the contribution of a processing apparatus to...

Method and apparatus for improving critical dimension variation

Multiple charged particle beam writing apparatus and multiple charg...

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

Determination of Imaging Transfer Function of a Charged-Particle Ex...

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

EMBEDDING REDISTRIBUTION LAYER METAL TRACES IN A POLYMERIC DIELECTRIC

METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...

OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...

CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...

CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE

METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION

DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROV...

Lithographic Method for Imprinting Three-Dimensional Microstructure...

EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...

PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS

METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM

SYSTEMS AND METHODS FOR DISTRIBUTING LIGHT DELIVERY

METHOD OF CONTROLLING SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCE...

PROCESS WINDOW BASED ON DEFECT PROBABILITY

METHOD TO PREDICT METROLOGY OFFSET OF A SEMICONDUCTOR MANUFACTURING...

MASKLESS BASED LITHOGRAPHY METHODS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

DIRECT METAL NANO PATTERNING

RADIATION SOURCE ARRANGEMENT AND METROLOGY DEVICE

DEVICE AND METHOD FOR SETTING RELATIVE LASER INTENSITIES

OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTER...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

SYSTEM AND METHOD FOR CONDITIONING OPTICAL APPARATUSES