Electrical

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CPC
G03F7/70658

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70658Electrical

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for characterizing a manufacturing process of semiconductor...
- Patent number 11,860,548
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,714,357
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,086,229
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test key layout and method of monitoring pattern misalignments usin...
- Patent number 10,698,323
- Issue date Jun 30, 2020
- United Microelectronics Corp.
- Tsai-Yu Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for defect classification based on electrical des...
- Patent number 10,209,628
- Issue date Feb 19, 2019
- KLA-Tencor Corporation
- Prasanti Uppaluri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for detecting pattern offset amount of exposed regions and d...
- Patent number 9,303,969
- Issue date Apr 5, 2016
- BOE Technology Group Co., Ltd.
- Jian Guo
- G01 - MEASURING TESTING
Information Patent Grant
Method for detecting pattern offset amount of exposed regions and d...
- Patent number 8,883,523
- Issue date Nov 11, 2014
- Beijing BOE Optoelectronics Technology Co., Ltd
- Jian Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining exposure condition and computer-readable sto...
- Patent number 8,867,023
- Issue date Oct 21, 2014
- Canon Kabushiki Kaisha
- Kouichirou Tsujita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for verifying stitching accuracy of stitched c...
- Patent number 8,803,542
- Issue date Aug 12, 2014
- BAE Systems Information and Electronic Systems Integration Inc.
- Thomas J. McIntyre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of selecting a set of illumination conditions of a lithograp...
- Patent number 8,621,401
- Issue date Dec 31, 2013
- Takumi Technology Corporation
- Martinus Maria Berkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for determining a critical dimension and overla...
- Patent number 8,502,979
- Issue date Aug 6, 2013
- KLA-Tencor Technologies Corp.
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Grant
Detecting dose and focus variations during photolithography
- Patent number 8,407,632
- Issue date Mar 26, 2013
- International Business Machines Corporation
- Ibrahim M. Elfadel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuits on a wafer and methods for manufacturing integr...
- Patent number 8,349,708
- Issue date Jan 8, 2013
- NXP B.V.
- Heimo Scheucher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for determining a critical dimension and overla...
- Patent number 8,179,530
- Issue date May 15, 2012
- KLA-Tencor Technologies Corp.
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining exposure condition and computer-readable sto...
- Patent number 8,085,386
- Issue date Dec 27, 2011
- Canon Kabushiki Kaisha
- Kouichirou Tsujita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining the effect of process variations
- Patent number 7,966,583
- Issue date Jun 21, 2011
- Synopsys, Inc.
- Paulus J. M. Van Adrichem
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test structures and methods for electrical characterization of alig...
- Patent number 7,935,965
- Issue date May 3, 2011
- PDF Solutions, Inc.
- Tomasz Brozek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for inspecting photoresist pattern
- Patent number 7,932,104
- Issue date Apr 26, 2011
- United Microelectronics Corp.
- Chia-Chen Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flexible and elastic dielectric integrated circuit
- Patent number 7,911,012
- Issue date Mar 22, 2011
- Taiwan Semiconductor Manufacturing Co., Ltd
- Glenn Leedy
- G11 - INFORMATION STORAGE
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,879,532
- Issue date Feb 1, 2011
- Renesas Electronics Corporation
- Masayuki Yanagisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Proportional variable resistor structures to electrically measure m...
- Patent number 7,868,629
- Issue date Jan 11, 2011
- NXP B.V.
- Joseph M Amato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resistor structures to electrically measure unidirectional misalign...
- Patent number 7,825,651
- Issue date Nov 2, 2010
- NXP B.V.
- Joseph M Amato
- G01 - MEASURING TESTING
Information Patent Grant
Stress-controlled dielectric integrated circuit
- Patent number 7,820,469
- Issue date Oct 26, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Glenn J Leedy
- G11 - INFORMATION STORAGE
Information Patent Grant
Alignment mark and defect inspection method
- Patent number 7,817,265
- Issue date Oct 19, 2010
- United Microelectronics Corp.
- Ling-Chun Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device for measuring an overlay error, method for mea...
- Patent number 7,786,477
- Issue date Aug 31, 2010
- ASML Netherlands B.V.
- Mircea Dusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method
- Patent number 7,771,906
- Issue date Aug 10, 2010
- Canon Kabushiki Kaisha
- Hiroto Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flexible and elastic dielectric integrated circuit
- Patent number 7,763,948
- Issue date Jul 27, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd
- Glenn J Leedy
- G11 - INFORMATION STORAGE
Information Patent Grant
Methods and systems for determining a critical dimension and overla...
- Patent number 7,751,046
- Issue date Jul 6, 2010
- KLA-Tencor Technologies Corp.
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor device for measuring an overlay error, method for mea...
- Patent number 7,704,850
- Issue date Apr 27, 2010
- ASML Netherlands B.V.
- Mircea Dusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Membrane IC fabrication
- Patent number 7,670,893
- Issue date Mar 2, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Glenn J Leedy
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTO...
- Publication number 20240111218
- Publication date Apr 4, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Efficient Semiconductor Metrology Using Machine Learning
- Publication number 20230317528
- Publication date Oct 5, 2023
- MELLANOX TECHNOLOGIES, LTD.
- Juan Jose Vegas Olmos
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20230010665
- Publication date Jan 12, 2023
- WINBOND ELECTRONICS CORP.
- Yen-Chiao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTO...
- Publication number 20220100098
- Publication date Mar 31, 2022
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20210325788
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Systems for Determining a Critical Dimension and Overla...
- Publication number 20130314710
- Publication date Nov 28, 2013
- KLA-Tencor Technologies Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLA...
- Publication number 20130039460
- Publication date Feb 14, 2013
- KLA-Tencor Technologies Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DETERMINING EXPOSURE CONDITION AND COMPUTER-READABLE STO...
- Publication number 20120081689
- Publication date Apr 5, 2012
- Canon Kabushiki Kaisha
- Kouichirou Tsujita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTING DOSE AND FOCUS VARIATIONS DURING PHOTOLITHOGRAPHY
- Publication number 20120065765
- Publication date Mar 15, 2012
- International Business Machines Corporation
- IBRAHIM M. ELFADEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Selecting a Set of Illumination Conditions of a Lithogra...
- Publication number 20120042290
- Publication date Feb 16, 2012
- TAKUMI TECHNOLOGY CORPORATION
- Martinus Maria Berkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR VERIFYING STITCHING ACCURACY OF STITCHED C...
- Publication number 20110287367
- Publication date Nov 24, 2011
- Thomas J. McIntyre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETECTING PATTERN OFFSET AMOUNT OF EXPOSED REGIONS AND D...
- Publication number 20110279132
- Publication date Nov 17, 2011
- BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Jian GUO
- G01 - MEASURING TESTING
Information Patent Application
ALIGNMENT MARK
- Publication number 20100327451
- Publication date Dec 30, 2010
- Ling-Chun Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY ROBUSTNESS MONITOR
- Publication number 20100308329
- Publication date Dec 9, 2010
- NXP B.V.
- Harold Gerardus Pieter Hendrikus Benten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INSPECTING PHOTORESIST PATTERN
- Publication number 20100297791
- Publication date Nov 25, 2010
- Chia-Chen Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLA...
- Publication number 20100271621
- Publication date Oct 28, 2010
- KLA-Tencor Technologies Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
INTEGRATED CIRCUITS ON A WAFER AND METHODS FOR MANUFACTURING INTEGR...
- Publication number 20100181568
- Publication date Jul 22, 2010
- NXP B.V.
- Heimo Scheucher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT MARK AND DEFECT INSPECTION METHOD
- Publication number 20100073671
- Publication date Mar 25, 2010
- Ling-Chun Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING THE EFFECT OF PROCESS VARIATIONS
- Publication number 20100011325
- Publication date Jan 14, 2010
- Synopsys, Inc.
- Paulus J.M. Van Adrichem
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESISTOR STRUCTURES TO ELECTRICALLY MEASURE UNIDIRECTIONAL MISALIGN...
- Publication number 20090212963
- Publication date Aug 27, 2009
- NXP B.V.
- JOSEPH M. AMATO
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE METHOD
- Publication number 20090180097
- Publication date Jul 16, 2009
- Hiroto YOSHII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flexible and elastic dielectric integrated circuit
- Publication number 20080302559
- Publication date Dec 11, 2008
- Elm Technology Corporation
- Glenn Joseph Leedy
- G02 - OPTICS
Information Patent Application
Proportional Variable Resistor Structures to Electrically Measure M...
- Publication number 20080197862
- Publication date Aug 21, 2008
- Koninklijke Philips Electronics N.V.
- Joseph M. Amato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING EXPOSURE CONDITION AND COMPUTER-READABLE STO...
- Publication number 20080151210
- Publication date Jun 26, 2008
- Canon Kabushiki Kaisha
- Kouichirou Tsujita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device for measuring an overlay error, method for mea...
- Publication number 20080149925
- Publication date Jun 26, 2008
- ASML NETHERLANDS B.V.
- Mircea Dusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device for measuring an overlay error, method for mea...
- Publication number 20080061291
- Publication date Mar 13, 2008
- ASML NETHERLANDS B.V.
- Mircea Dusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF QUANTIFYING VARIATIONS RESULTING FROM MANUFACTURING-INDU...
- Publication number 20070298524
- Publication date Dec 27, 2007
- DAVID D. WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Characterizing Lithography Effects on a Wafer
- Publication number 20070275329
- Publication date Nov 29, 2007
- Koninklijke Philips Electronics N.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems And Methods For Forming Integrated Circuit Components Havin...
- Publication number 20070178665
- Publication date Aug 2, 2007
- Craig A. West
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD
- Publication number 20070035716
- Publication date Feb 15, 2007
- Hiroto YOSHII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for characterizing a manufacturing process of semiconductor...

Method to predict yield of a device manufacturing process

Method to predict yield of a device manufacturing process

Test key layout and method of monitoring pattern misalignments usin...

System and method for defect classification based on electrical des...

Method for detecting pattern offset amount of exposed regions and d...

Method for detecting pattern offset amount of exposed regions and d...

Method for determining exposure condition and computer-readable sto...

Method and apparatus for verifying stitching accuracy of stitched c...

Method of selecting a set of illumination conditions of a lithograp...

Methods and systems for determining a critical dimension and overla...

Detecting dose and focus variations during photolithography

Integrated circuits on a wafer and methods for manufacturing integr...

Methods and systems for determining a critical dimension and overla...

Method for determining exposure condition and computer-readable sto...

Method and apparatus for determining the effect of process variations

Test structures and methods for electrical characterization of alig...

Method for inspecting photoresist pattern

Flexible and elastic dielectric integrated circuit

Method of manufacturing semiconductor device

Proportional variable resistor structures to electrically measure m...

Resistor structures to electrically measure unidirectional misalign...

Stress-controlled dielectric integrated circuit

Alignment mark and defect inspection method

Semiconductor device for measuring an overlay error, method for mea...

Exposure method

Flexible and elastic dielectric integrated circuit

Methods and systems for determining a critical dimension and overla...

Semiconductor device for measuring an overlay error, method for mea...

Membrane IC fabrication

Patents Applicationslast 30 patents

A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTO...

Efficient Semiconductor Metrology Using Machine Learning

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTO...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

Methods and Systems for Determining a Critical Dimension and Overla...

METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLA...

METHOD FOR DETERMINING EXPOSURE CONDITION AND COMPUTER-READABLE STO...

DETECTING DOSE AND FOCUS VARIATIONS DURING PHOTOLITHOGRAPHY

Method of Selecting a Set of Illumination Conditions of a Lithogra...

METHOD AND APPARATUS FOR VERIFYING STITCHING ACCURACY OF STITCHED C...

METHOD FOR DETECTING PATTERN OFFSET AMOUNT OF EXPOSED REGIONS AND D...

ALIGNMENT MARK

LITHOGRAPHY ROBUSTNESS MONITOR

METHOD FOR INSPECTING PHOTORESIST PATTERN

METHODS AND SYSTEMS FOR DETERMINING A CRITICAL DIMENSION AND OVERLA...

INTEGRATED CIRCUITS ON A WAFER AND METHODS FOR MANUFACTURING INTEGR...

ALIGNMENT MARK AND DEFECT INSPECTION METHOD

METHOD AND APPARATUS FOR DETERMINING THE EFFECT OF PROCESS VARIATIONS

RESISTOR STRUCTURES TO ELECTRICALLY MEASURE UNIDIRECTIONAL MISALIGN...

EXPOSURE METHOD

Flexible and elastic dielectric integrated circuit

Proportional Variable Resistor Structures to Electrically Measure M...

METHOD FOR DETERMINING EXPOSURE CONDITION AND COMPUTER-READABLE STO...

Semiconductor device for measuring an overlay error, method for mea...

Semiconductor device for measuring an overlay error, method for mea...

METHODS OF QUANTIFYING VARIATIONS RESULTING FROM MANUFACTURING-INDU...

System and Method for Characterizing Lithography Effects on a Wafer

Systems And Methods For Forming Integrated Circuit Components Havin...

EXPOSURE METHOD