Electrodes other than cathode

Industry

CPC
H01J37/3438

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3438Electrodes other than cathode

Industries

Patents Grantslast 30 patents

Information Patent Grant
Dual reverse pulse sputtering system
- Patent number 12,112,931
- Issue date Oct 8, 2024
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Holding device
- Patent number 12,027,387
- Issue date Jul 2, 2024
- NITERRA CO., LTD.
- Takahisa Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid sputter target
- Patent number 11,952,654
- Issue date Apr 9, 2024
- EVATEC AG
- Dominik Jaeger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process chamber with reduced plasma arc
- Patent number 11,875,969
- Issue date Jan 16, 2024
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed cathodic arc deposition
- Patent number 11,851,746
- Issue date Dec 26, 2023
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Jukka Kolehmainen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus including gas distribution system
- Patent number 11,674,213
- Issue date Jun 13, 2023
- Cardinal CG Company
- Klaus Hartig
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus including gas distribution system
- Patent number 11,501,959
- Issue date Nov 15, 2022
- Cardinal CG Company
- Klaus Hartig
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,348,770
- Issue date May 31, 2022
- Keihin Ramtech Co., Ltd.
- Hiroshi Iwata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling ion energy distribution using a pulse generator
- Patent number 11,284,500
- Issue date Mar 22, 2022
- APPLIED MATERIALS, INC.
- Leonid Dorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering system and method
- Patent number 11,257,663
- Issue date Feb 22, 2022
- Agency for Science, Technology and Research
- Jianwei Chai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Non-disappearing anode for use with dielectric deposition
- Patent number 11,114,289
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Michael S. Cox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,081,324
- Issue date Aug 3, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,081,323
- Issue date Aug 3, 2021
- Keihin Ramtech Co., Ltd.
- Hiroshi Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rate enhanced pulsed DC sputtering system
- Patent number 11,049,702
- Issue date Jun 29, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rate enhanced pulsed DC sputtering system
- Patent number 10,910,203
- Issue date Feb 2, 2021
- Advanced Energy Industries, Inc.
- Douglas Pelleymounter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit and method for processing a substrate
- Patent number 10,886,113
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Thanh X. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic anode for sputter magnetron cathode
- Patent number 10,811,236
- Issue date Oct 20, 2020
- General Plasma, Inc.
- Phong Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for large-scale high throughput quantitative c...
- Patent number 10,804,073
- Issue date Oct 13, 2020
- THE NCS TESTING TECHNOLOGY CO., LTD.
- Haizhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,791,617
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source crucible for solid feed materials
- Patent number 10,600,611
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,555,412
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Leonid Dorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ozone generation system and method for operating same
- Patent number 10,544,045
- Issue date Jan 28, 2020
- Mitsubishi Electric Corporation
- Noboru Wada
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Sputtering apparatus and sputtering method using the same
- Patent number 10,480,062
- Issue date Nov 19, 2019
- Samsung Display Co., Ltd.
- Seungho Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,448,495
- Issue date Oct 15, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,448,494
- Issue date Oct 15, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for manufacturing cleaned substrates or clean...
- Patent number 10,418,230
- Issue date Sep 17, 2019
- Oerlikon Trading AG, Truebbach
- Siegfried Krassnitzer
- B08 - CLEANING
Information Patent Grant
Method of processing a substrate using an ion beam and apparatus fo...
- Patent number 10,410,839
- Issue date Sep 10, 2019
- Samsung Electronics Co., Ltd.
- Yil-Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for single magnetron sputtering
- Patent number 10,373,811
- Issue date Aug 6, 2019
- AES Global Holdings, PTE. LTD
- David Christie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for balancing consumption of targets in pulsed dual magnetro...
- Patent number 10,332,730
- Issue date Jun 25, 2019
- AES Global Holdings, PTE. LTD
- David Christie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency power source device, and power source for dual cath...
- Patent number 10,244,615
- Issue date Mar 26, 2019
- Kyosan Electric Mfg. Co., Ltd.
- Itsuo Yuzurihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
STABLE GROUND ANODE FOR THIN FILM PROCESSING
- Publication number 20240194464
- Publication date Jun 13, 2024
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20230082246
- Publication date Mar 16, 2023
- KIOXIA Corporation
- Kazuya YOSHIMORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS, FILM FORMATION METHOD, AND METHOD FOR MANUFAC...
- Publication number 20230029343
- Publication date Jan 26, 2023
- Canon Kabushiki Kaisha
- Kazuya Demura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRODE PHASING USING CONTROL PARAMETERS
- Publication number 20220310370
- Publication date Sep 29, 2022
- Advanced Energy Industries, Inc.
- Craig Rappe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HOLDING DEVICE
- Publication number 20220223438
- Publication date Jul 14, 2022
- NGK Spark Plug Co., Ltd.
- Takahisa KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE USING IMPROVED SHI...
- Publication number 20220213590
- Publication date Jul 7, 2022
- Uday PAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON PLASMA APPARATUS
- Publication number 20220181129
- Publication date Jun 9, 2022
- BB PLASMA DESIGN AB
- Ladislav BARDOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pulsed Cathodic Arc Deposition
- Publication number 20220112591
- Publication date Apr 14, 2022
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Jukka Kolehmainen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIQUID SPUTTER TARGET
- Publication number 20210381099
- Publication date Dec 9, 2021
- Evatec AG
- Dominik Jaeger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20210351022
- Publication date Nov 11, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Reverse Pulse Sputtering System
- Publication number 20210287888
- Publication date Sep 16, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM
- Publication number 20210217586
- Publication date Jul 15, 2021
- Cardinal CG Company
- Klaus Hartig
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATE ENHANCED PULSED DC SPUTTERING SYSTEM
- Publication number 20210111010
- Publication date Apr 15, 2021
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition Apparatus
- Publication number 20210005439
- Publication date Jan 7, 2021
- SPTS TECHNOLOGIES LIMITED
- Rhonda Hyndman
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR
- Publication number 20200352017
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR LARGE-SCALE HIGH THROUGHPUT QUANTITATIVE C...
- Publication number 20200294760
- Publication date Sep 17, 2020
- THE NCS TESTING TECHNOLOGY CO., LTD.
- Haizhou WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SPUTTERING SYSTEM AND METHOD
- Publication number 20200279723
- Publication date Sep 3, 2020
- Agency for Science, Technology and Research
- Jianwei Chai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
- Publication number 20200154556
- Publication date May 14, 2020
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200126763
- Publication date Apr 23, 2020
- Canon ANELVA Corporation
- Kazunari SEKIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
- Publication number 20190350072
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FO...
- Publication number 20190272979
- Publication date Sep 5, 2019
- Samsung Electronics Co., Ltd.
- Yil-Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION PREVENTIVE PLATE, SPUTTERING APPARATUS, AND MANUFACTURIN...
- Publication number 20190259587
- Publication date Aug 22, 2019
- Toshiba Memory Corporation
- Tatsuhiko MIURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING SOURCE
- Publication number 20190252166
- Publication date Aug 15, 2019
- Evatec AG
- Heinz Felzer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ion Source Crucible For Solid Feed Materials
- Publication number 20190180971
- Publication date Jun 13, 2019
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM
- Publication number 20190080883
- Publication date Mar 14, 2019
- Cardinal CG Company
- Klaus Hartig
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATER
- Publication number 20190080891
- Publication date Mar 14, 2019
- GENCOA LTD
- Victor Bellido-Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE SPUTTERING
- Publication number 20180261428
- Publication date Sep 13, 2018
- GENCOA LTD
- Victor Bellido-Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FO...
- Publication number 20180197719
- Publication date Jul 12, 2018
- Samsung Electronics Co., Ltd.
- Yil-Hyung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT AND METHOD FOR PROCESSING A SUBSTRATE
- Publication number 20180151337
- Publication date May 31, 2018
- THANH X. NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nanoparticle Deposition Systems
- Publication number 20180127865
- Publication date May 10, 2018
- Regents of the University of Minnesota
- Jian-Ping Wang
- B82 - NANO-TECHNOLOGY

Electrodes other than cathode

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Dual reverse pulse sputtering system

Holding device

Liquid sputter target

Process chamber with reduced plasma arc

Pulsed cathodic arc deposition

Sputtering apparatus including gas distribution system

Sputtering apparatus including gas distribution system

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Method of controlling ion energy distribution using a pulse generator

Sputtering system and method

Non-disappearing anode for use with dielectric deposition

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Rate enhanced pulsed DC sputtering system

Rate enhanced pulsed DC sputtering system

Process kit and method for processing a substrate

Magnetic anode for sputter magnetron cathode

Apparatus and method for large-scale high throughput quantitative c...

Method of controlling ion energy distribution using a pulse generat...

Ion source crucible for solid feed materials

Method of controlling ion energy distribution using a pulse generat...

Ozone generation system and method for operating same

Sputtering apparatus and sputtering method using the same

Method of controlling ion energy distribution using a pulse generat...

Method of controlling ion energy distribution using a pulse generat...

Method and apparatus for manufacturing cleaned substrates or clean...

Method of processing a substrate using an ion beam and apparatus fo...

Systems and methods for single magnetron sputtering

Method for balancing consumption of targets in pulsed dual magnetro...

Radio frequency power source device, and power source for dual cath...

Patents Applicationslast 30 patents

STABLE GROUND ANODE FOR THIN FILM PROCESSING

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...

SPUTTERING APPARATUS, FILM FORMATION METHOD, AND METHOD FOR MANUFAC...

ELECTRODE PHASING USING CONTROL PARAMETERS

HOLDING DEVICE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE USING IMPROVED SHI...

MAGNETRON PLASMA APPARATUS

Pulsed Cathodic Arc Deposition

LIQUID SPUTTER TARGET

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

Dual Reverse Pulse Sputtering System

SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM

RATE ENHANCED PULSED DC SPUTTERING SYSTEM

Deposition Apparatus

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR

APPARATUS AND METHOD FOR LARGE-SCALE HIGH THROUGHPUT QUANTITATIVE C...

SPUTTERING SYSTEM AND METHOD

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...

PLASMA PROCESSING APPARATUS

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...

METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FO...

DEPOSITION PREVENTIVE PLATE, SPUTTERING APPARATUS, AND MANUFACTURIN...

SPUTTERING SOURCE

Ion Source Crucible For Solid Feed Materials

SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM

COATER

ION SOURCE SPUTTERING

METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FO...

PROCESS KIT AND METHOD FOR PROCESSING A SUBSTRATE

Nanoparticle Deposition Systems