Expansion of gas before it reaches the substrate

Industry

CPC
C23C16/45582

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Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/45582Expansion of gas before it reaches the substrate

Industries

Patents Grantslast 30 patents

Information Patent Grant
Asymmetric injection for better wafer uniformity
- Patent number 11,959,169
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 11,926,896
- Issue date Mar 12, 2024
- Beneq Oy
- Johannes Wesslin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated cluster tool for selective area deposition
- Patent number 11,725,274
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dogbone inlet cone profile for remote plasma oxidation chamber
- Patent number 11,501,954
- Issue date Nov 15, 2022
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Asymmetric injection for better wafer uniformity
- Patent number 11,486,038
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for depositing chalcogenide thin films
- Patent number 11,377,735
- Issue date Jul 5, 2022
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Remy Gassilloud
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 11,264,213
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dogbone inlet cone profile for remote plasma oxidation chamber
- Patent number 11,049,696
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Counter-flow multi inject for atomic layer deposition chamber
- Patent number 10,982,326
- Issue date Apr 20, 2021
- Applied Materials, Inc.
- Dien-Yeh Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution showerhead for semiconductor processing
- Patent number 10,829,855
- Issue date Nov 10, 2020
- Applied Materials, Inc.
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Effective and novel design for lower particle count and better wafe...
- Patent number 10,808,310
- Issue date Oct 20, 2020
- Applied Mateirals, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 10,745,824
- Issue date Aug 18, 2020
- NuFlare Technology, Inc.
- Kunihiko Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply manifold and method of supplying gases to chamber using...
- Patent number 10,683,571
- Issue date Jun 16, 2020
- ASM IP Holding B.V.
- Lucian C. Jdira
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas jetting apparatus for film formation apparatus
- Patent number 10,676,825
- Issue date Jun 9, 2020
- Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Yoichiro Tabata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film encapsulation processing system and process kit
- Patent number 10,655,222
- Issue date May 19, 2020
- Applied Materials, Inc.
- Shinichi Kurita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dogbone inlet cone profile for remote plasma oxidation chamber
- Patent number 10,636,626
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Effective and novel design for lower particle count and better wafe...
- Patent number 10,619,235
- Issue date Apr 14, 2020
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution showerhead for semiconductor processing
- Patent number 10,577,690
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Anh N. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution apparatus for improved film uniformity in an epita...
- Patent number 10,501,866
- Issue date Dec 10, 2019
- ASM IP Holding B.V.
- Stephen Dale Coomer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition reactor with plasma source
- Patent number 10,494,718
- Issue date Dec 3, 2019
- Picosun Oy
- Vaino Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition chamber with counter-flow multi inject
- Patent number 10,487,399
- Issue date Nov 26, 2019
- Applied Materials, Inc.
- Dien-Yeh Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reaction system for growing a thin film
- Patent number 10,468,291
- Issue date Nov 5, 2019
- ASM America, Inc.
- Mohith Verghese
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatuses for showerhead backside parasitic plasma su...
- Patent number 10,407,773
- Issue date Sep 10, 2019
- Lam Research Corporation
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated cluster tool for selective area deposition
- Patent number 10,358,715
- Issue date Jul 23, 2019
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 10,354,843
- Issue date Jul 16, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Modular gas injection device
- Patent number 10,221,479
- Issue date Mar 5, 2019
- Koolerheadz
- Jacques Constant Stefan Kools
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling coating in non-line-of-sight loca...
- Patent number 10,179,948
- Issue date Jan 15, 2019
- United Technologies Corporation
- Brooks E Snyder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 9,978,564
- Issue date May 22, 2018
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,970,110
- Issue date May 15, 2018
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition with plasma source
- Patent number 9,868,131
- Issue date Jan 16, 2018
- Picosun Oy
- Vaino Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20240018652
- Publication date Jan 18, 2024
- BENEQ OY
- Johannes WESSLIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR MANUFACTURING A SEMICONDUCTOR WAFER USING A PREHEAT RIN...
- Publication number 20230243065
- Publication date Aug 3, 2023
- GLOBALWAFERS CO., LTD.
- Chieh Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY
- Publication number 20230028054
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS
- Publication number 20220411927
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTOR FOR GAS TREATMENT OF A SUBSTRATE
- Publication number 20220307138
- Publication date Sep 29, 2022
- SWEGAN AB
- Olof Kordina
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR A PREHEAT RING IN A SEMICONDUCTOR WAFER REA...
- Publication number 20220205134
- Publication date Jun 30, 2022
- GLOBALWAFERS CO., LTD.
- Chieh Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOGBONE INLET CONE PROFILE FOR REMOTE PLASMA OXIDATION CHAMBER
- Publication number 20210272776
- Publication date Sep 2, 2021
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTOR SYSTEM INCLUDING A GAS DISTRIBUTION ASSEMBLY FOR USE WITH A...
- Publication number 20210102292
- Publication date Apr 8, 2021
- ASM IP HOLDING B.V.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOGBONE INLET CONE PROFILE FOR REMOTE PLASMA OXIDATION CHAMBER
- Publication number 20200219703
- Publication date Jul 9, 2020
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EFFECTIVE AND NOVEL DESIGN FOR LOWER PARTICLE COUNT AND BETTER WAFE...
- Publication number 20200199730
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION CHAMBER WITH COUNTER-FLOW MULTI INJECT
- Publication number 20200087784
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Dien-Yeh WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20190385823
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
INTEGRATED CLUSTER TOOL FOR SELECTIVE AREA DEPOSITION
- Publication number 20190301009
- Publication date Oct 3, 2019
- Applied Materials, Inc.
- Tobin KAUFMAN-OSBORN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOGBONE INLET CONE PROFILE FOR REMOTE PLASMA OXIDATION CHAMBER
- Publication number 20190228951
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic Layer Deposition with Plasma Source
- Publication number 20180099304
- Publication date Apr 12, 2018
- Picosun Oy
- Vaino Kilpi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING
- Publication number 20170335457
- Publication date Nov 23, 2017
- Applied Materials, Inc.
- Anh N. NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING
- Publication number 20170335456
- Publication date Nov 23, 2017
- Applied Materials, Inc.
- Anh N. NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION APPARATUS FOR IMPROVED FILM UNIFORMITY IN AN EPITA...
- Publication number 20170260649
- Publication date Sep 14, 2017
- ASM IP HOLDING B.V.
- Stephen Dale Coomer
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS AND APPARATUSES FOR SHOWERHEAD BACKSIDE PARASITIC PLASMA SU...
- Publication number 20170167017
- Publication date Jun 15, 2017
- LAM RESEARCH CORPORATION
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170159181
- Publication date Jun 8, 2017
- Hitachi Kokusai Electric Inc.
- Kazuyuki TOYODA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR GAS INJECTION DEVICE
- Publication number 20160319426
- Publication date Nov 3, 2016
- KOOLERHEADZ
- Jacques Constant Stefan KOOLS
- C30 - CRYSTAL GROWTH
Information Patent Application
ATOMIC LAYER DEPOSITION CHAMBER WITH COUNTER-FLOW MULTI INJECT
- Publication number 20150376784
- Publication date Dec 31, 2015
- Applied Materials, Inc.
- Dien-Yeh WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION APPARATUS, FILM FORMATION METHOD, AND STORAGE MEDIUM
- Publication number 20150361550
- Publication date Dec 17, 2015
- TOKYO ELECTRON LIMITED
- Kazuo YABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20150152554
- Publication date Jun 4, 2015
- Hitachi Kokusai Electric Inc.
- Shuhei SAIDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus
- Publication number 20150107517
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STRUCTURE FOR IMPROVED GAS ACTIVATION FOR CROSS-FLOW TYPE THERMAL C...
- Publication number 20150020734
- Publication date Jan 22, 2015
- Applied Materials, Inc.
- Zhiyuan YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY DEVICE, PROCESSING APPARATUS, PROCESSING METHOD, AND STO...
- Publication number 20140209023
- Publication date Jul 31, 2014
- TOKYO ELECTRON LIMITED
- Einosuke Tsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD ELECTRODE ASSEMBLY WITH GAS FLOW MODIFICATION FOR EXTEND...
- Publication number 20140187049
- Publication date Jul 3, 2014
- LAM RESEARCH CORPORATION
- Jason Augustino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20140097270
- Publication date Apr 10, 2014
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DEPOSITION REACTOR WITH PLASMA SOURCE
- Publication number 20140087093
- Publication date Mar 27, 2014
- Picosun Oy
- Vaino Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Expansion of gas before it reaches the substrate

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Asymmetric injection for better wafer uniformity

Atomic layer deposition apparatus

Integrated cluster tool for selective area deposition

Dogbone inlet cone profile for remote plasma oxidation chamber

Asymmetric injection for better wafer uniformity

Apparatus for depositing chalcogenide thin films

Chemical control features in wafer process equipment

Dogbone inlet cone profile for remote plasma oxidation chamber

Counter-flow multi inject for atomic layer deposition chamber

Gas distribution showerhead for semiconductor processing

Effective and novel design for lower particle count and better wafe...

Film forming apparatus

Gas supply manifold and method of supplying gases to chamber using...

Gas jetting apparatus for film formation apparatus

Thin film encapsulation processing system and process kit

Dogbone inlet cone profile for remote plasma oxidation chamber

Effective and novel design for lower particle count and better wafe...

Gas distribution showerhead for semiconductor processing

Gas distribution apparatus for improved film uniformity in an epita...

Deposition reactor with plasma source

Atomic layer deposition chamber with counter-flow multi inject

Reaction system for growing a thin film

Methods and apparatuses for showerhead backside parasitic plasma su...

Integrated cluster tool for selective area deposition

Chemical control features in wafer process equipment

Modular gas injection device

Method and system for controlling coating in non-line-of-sight loca...

Chemical control features in wafer process equipment

Plasma processing apparatus

Atomic layer deposition with plasma source

Patents Applicationslast 30 patents

ATOMIC LAYER DEPOSITION APPARATUS

METHODS FOR MANUFACTURING A SEMICONDUCTOR WAFER USING A PREHEAT RIN...

ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY

PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS

REACTOR FOR GAS TREATMENT OF A SUBSTRATE

SYSTEMS AND METHODS FOR A PREHEAT RING IN A SEMICONDUCTOR WAFER REA...

DOGBONE INLET CONE PROFILE FOR REMOTE PLASMA OXIDATION CHAMBER

REACTOR SYSTEM INCLUDING A GAS DISTRIBUTION ASSEMBLY FOR USE WITH A...

DOGBONE INLET CONE PROFILE FOR REMOTE PLASMA OXIDATION CHAMBER

EFFECTIVE AND NOVEL DESIGN FOR LOWER PARTICLE COUNT AND BETTER WAFE...

ATOMIC LAYER DEPOSITION CHAMBER WITH COUNTER-FLOW MULTI INJECT

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

INTEGRATED CLUSTER TOOL FOR SELECTIVE AREA DEPOSITION

DOGBONE INLET CONE PROFILE FOR REMOTE PLASMA OXIDATION CHAMBER

Atomic Layer Deposition with Plasma Source

GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING

GAS DISTRIBUTION SHOWERHEAD FOR SEMICONDUCTOR PROCESSING

GAS DISTRIBUTION APPARATUS FOR IMPROVED FILM UNIFORMITY IN AN EPITA...

METHODS AND APPARATUSES FOR SHOWERHEAD BACKSIDE PARASITIC PLASMA SU...

SUBSTRATE PROCESSING APPARATUS

MODULAR GAS INJECTION DEVICE

ATOMIC LAYER DEPOSITION CHAMBER WITH COUNTER-FLOW MULTI INJECT

FILM FORMATION APPARATUS, FILM FORMATION METHOD, AND STORAGE MEDIUM

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

Plasma Processing Apparatus

STRUCTURE FOR IMPROVED GAS ACTIVATION FOR CROSS-FLOW TYPE THERMAL C...

GAS SUPPLY DEVICE, PROCESSING APPARATUS, PROCESSING METHOD, AND STO...

SHOWERHEAD ELECTRODE ASSEMBLY WITH GAS FLOW MODIFICATION FOR EXTEND...

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

DEPOSITION REACTOR WITH PLASMA SOURCE