Exposure apparatus for microlithography

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CPC
G03F7/70

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70Exposure apparatus for microlithography

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for predicting substrate image
- Patent number 12,271,114
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of measuring mask overlay using test patterns
- Patent number 12,271,116
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tseng Chin Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle demounting method, and pellicle demounting device
- Patent number 12,271,109
- Issue date Apr 8, 2025
- Mitsui Chemicals, Inc.
- Akira Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Support for an optical element
- Patent number 12,271,117
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmissive diffusor
- Patent number 12,271,008
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Andrey Nikipelov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflector manufacturing method and associated reflector
- Patent number 12,269,229
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Sander Bas Roobol
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,272,554
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jia-Lin Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle pod having latch including ramped surface
- Patent number 12,271,110
- Issue date Apr 8, 2025
- Entegris, Inc.
- Russ V. Raschke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to detect a defect on a lithographic sample and metrology sy...
- Patent number 12,271,115
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toufic Jabbour
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for calibration of an optical measurement system and optical...
- Patent number 12,270,647
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G01 - MEASURING TESTING
Information Patent Grant
Target delivery system
- Patent number 12,273,986
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Georgiy Olegovich Vaschenko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Compact dual pass interferometer for a plane mirror interferometer
- Patent number 12,270,644
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G02 - OPTICS
Information Patent Grant
Parallel mask rule checking on evolving mask shapes in optical prox...
- Patent number 12,271,676
- Issue date Apr 8, 2025
- NVIDIA Corporation
- Kumara Narasimha Sastry Kunigal
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 12,265,327
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Hai Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 12,265,334
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Agglutinant for pellicle, pellicle, exposure original plate with pe...
- Patent number 12,265,324
- Issue date Apr 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yuichi Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanopositioning systems and associated methods
- Patent number 12,266,501
- Issue date Apr 1, 2025
- The Texas A&M University System
- ChaBum Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment-overlay mark and method using the same
- Patent number 12,265,335
- Issue date Apr 1, 2025
- Micron Technology, Inc.
- Kazuko Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,265,336
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G02 - OPTICS
Information Patent Grant
Exposure apparatus
- Patent number 12,265,337
- Issue date Apr 1, 2025
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micromirror arrays
- Patent number 12,259,546
- Issue date Mar 25, 2025
- ASML Netherlands B.V.
- Alexandre Halbach
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Work stage and exposure apparatus
- Patent number 12,261,077
- Issue date Mar 25, 2025
- Ushio Denki Kabushiki Kaisha
- Shunta Sugisaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system and method of detecting fluid leakage in liquid...
- Patent number 12,259,657
- Issue date Mar 25, 2025
- United Microelectronics Corp.
- Zhi Fan Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and inspection platform for lithography
- Patent number 12,259,660
- Issue date Mar 25, 2025
- Industrial Technology Research Institute
- Cheng-Hsien Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device with grating structure
- Patent number 12,259,658
- Issue date Mar 25, 2025
- NANYA TECHNOLOGY CORPORATION
- Chun-Yen Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aligning a distorted image
- Patent number 12,259,659
- Issue date Mar 25, 2025
- ASML Netherlands B.V.
- Coen Adrianus Verschuren
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay mark, overlay marking method and overlay measuring method
- Patent number 12,259,661
- Issue date Mar 25, 2025
- NEXCHIP SEMICONDUCTOR CORPORATION
- Kuotung Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for manufacturing semiconductor devices using MOIRÉ patterns
- Patent number 12,259,662
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Woohyeok Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pod cleaning process
- Patent number 12,251,736
- Issue date Mar 18, 2025
- STI CO., LTD.
- Young Soo Park
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
A SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES
- Publication number 20250110381
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- Yongfeng Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20250110402
- Publication date Apr 3, 2025
- NISSAN CHEMICAL CORPORATION
- Kodai KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...
- Publication number 20250110405
- Publication date Apr 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING A PATTERN ON A SUBSTRATE
- Publication number 20250110411
- Publication date Apr 3, 2025
- ASM IP HOLDING B.V.
- Kishan Ashokbhai Patel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR COMPENSATING ACTUATOR EFFECTS OF ACTUATORS
- Publication number 20250110413
- Publication date Apr 3, 2025
- Carl Zeiss SMT GMBH
- Markus RAAB
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT
- Publication number 20250110412
- Publication date Apr 3, 2025
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE CLEANING DEVICE AND METHOD OF USE
- Publication number 20250110414
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chang HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...
- Publication number 20250110407
- Publication date Apr 3, 2025
- JSR Corporation
- Hiroyuki KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...
- Publication number 20250102923
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Lingling PU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102911
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING TH...
- Publication number 20250102926
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS
- Publication number 20250102927
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hua FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING A PRODUCTION SYSTEM AND METHOD FOR THERMALLY...
- Publication number 20250103855
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Wenjie JIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS THAT USE INFRARED (IR) SPECTROSCOPY TO MONITOR...
- Publication number 20250105066
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Sean Berglund
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...
- Publication number 20250102909
- Publication date Mar 27, 2025
- INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY
- Hyun-Dam JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20250102925
- Publication date Mar 27, 2025
- Canon Kabushiki Kaisha
- SHIORI OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSEMBLY FOR A LITHOGRAPHIC APPARATUS
- Publication number 20250102902
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Tim Willem Johan VAN DE GOOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFERENTIAL EVACUATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20250102919
- Publication date Mar 27, 2025
- Gigaphoton Inc.
- Atsushi UEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method of semiconductor pattern
- Publication number 20250102922
- Publication date Mar 27, 2025
- UNITED MICROELECTRONICS CORP.
- Shin-Hung Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM
- Publication number 20250102920
- Publication date Mar 27, 2025
- Carl Zeiss SMT GMBH
- Malte LANGENHORST
- G02 - OPTICS
Information Patent Application
ADAPTIVE TARGET CONTROL FOR CURVILINEAR OPTICAL PROXIMITY CORRECTIO...
- Publication number 20250102921
- Publication date Mar 27, 2025
- Siemens Industry Software Inc.
- George P. Lippincott
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FIBER BUNDLE BASED OPTICAL SPOT SIZE SELECTOR
- Publication number 20250102924
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE CARRIER AND ASSOCIATED METHODS
- Publication number 20250093789
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Hsun CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...
- Publication number 20250093785
- Publication date Mar 20, 2025
- Nikon Corporation
- Yuho KANAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF SURFACE TOPOGRAPHY MEASUREMENT FOR LITHOGRAPHY
- Publication number 20250093787
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YUNG-YAO LEE
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...
- Publication number 20250093788
- Publication date Mar 20, 2025
- Canon Kabushiki Kaisha
- YUICHIRO MORIKUNI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DIE
- Publication number 20250095987
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...
- Publication number 20250093778
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM, AND PROJECTION E...
- Publication number 20250093782
- Publication date Mar 20, 2025
- Carl Zeiss SMT GMBH
- Malte LANGENHORST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR ASSESSING PHOTORESIST RINSE SOLUTION
- Publication number 20250093784
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- DAIKI MINAMI
- G06 - COMPUTING CALCULATING COUNTING

Exposure apparatus for microlithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for predicting substrate image

Method of measuring mask overlay using test patterns

Pellicle demounting method, and pellicle demounting device

Support for an optical element

Transmissive diffusor

Reflector manufacturing method and associated reflector

Method of manufacturing a semiconductor device

Reticle pod having latch including ramped surface

Method to detect a defect on a lithographic sample and metrology sy...

Method for calibration of an optical measurement system and optical...

Target delivery system

Compact dual pass interferometer for a plane mirror interferometer

Parallel mask rule checking on evolving mask shapes in optical prox...

Semiconductor manufacturing apparatus and method thereof

Optical proximity correction and photomasks

Agglutinant for pellicle, pellicle, exposure original plate with pe...

Nanopositioning systems and associated methods

Matching process controllers for improved matching of process

Alignment-overlay mark and method using the same

Semiconductor processing tool and methods of operation

Exposure apparatus

Micromirror arrays

Work stage and exposure apparatus

Lithography system and method of detecting fluid leakage in liquid...

Inspection method and inspection platform for lithography

Semiconductor device with grating structure

Aligning a distorted image

Overlay mark, overlay marking method and overlay measuring method

Methods for manufacturing semiconductor devices using MOIRÉ patterns

Pod cleaning process

Patents Applicationslast 30 patents

A SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...

METHOD FOR FORMING A PATTERN ON A SUBSTRATE

METHOD FOR COMPENSATING ACTUATOR EFFECTS OF ACTUATORS

SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT

RETICLE CLEANING DEVICE AND METHOD OF USE

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...

A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING TH...

LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS

METHOD FOR CONTROLLING A PRODUCTION SYSTEM AND METHOD FOR THERMALLY...

SYSTEMS AND METHODS THAT USE INFRARED (IR) SPECTROSCOPY TO MONITOR...

TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...

PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

ASSEMBLY FOR A LITHOGRAPHIC APPARATUS

DIFFERENTIAL EVACUATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING...

Exposure method of semiconductor pattern

METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM

ADAPTIVE TARGET CONTROL FOR CURVILINEAR OPTICAL PROXIMITY CORRECTIO...

FIBER BUNDLE BASED OPTICAL SPOT SIZE SELECTOR

RETICLE CARRIER AND ASSOCIATED METHODS

METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...

METHOD AND SYSTEM OF SURFACE TOPOGRAPHY MEASUREMENT FOR LITHOGRAPHY

SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...

METHOD FOR FORMING SEMICONDUCTOR DIE

METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...

METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM, AND PROJECTION E...

APPARATUS AND METHOD FOR ASSESSING PHOTORESIST RINSE SOLUTION