Exposure apparatus for microlithography

Industry

CPC
G03F7/70

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70Exposure apparatus for microlithography

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Exposure device and method
- Patent number 12,366,807
- Issue date Jul 22, 2025
- Chun-Jung Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Laser system for source material conditioning in an EUV light source
- Patent number 12,369,244
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Igor Vladimirovich Fomenkov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for correcting photomask and method thereof
- Patent number 12,366,799
- Issue date Jul 22, 2025
- Semes Co., Ltd.
- Hyo Won Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for controlling a lithographic process
- Patent number 12,366,809
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Roy Werkman
- G05 - CONTROLLING REGULATING
Information Patent Grant
Wafer processing apparatus
- Patent number 12,368,065
- Issue date Jul 22, 2025
- Samsung Electronics Co., Ltd.
- Seungbeom Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Hybrid metrology method and system
- Patent number 12,366,533
- Issue date Jul 22, 2025
- Gilad Barak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 12,366,808
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Radiation source
- Patent number 12,366,810
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Identification of hot spots or defects by machine learning
- Patent number 12,360,461
- Issue date Jul 15, 2025
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical assembly, method for deforming an optical element, and proj...
- Patent number 12,360,459
- Issue date Jul 15, 2025
- Carl Zeiss SMT GmbH
- Tim Hoffmann
- G02 - OPTICS
Information Patent Grant
Fiber bundle based optical spot size selector
- Patent number 12,360,463
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Ivan Maleev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method thereof
- Patent number 12,360,464
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material management method and system
- Patent number 12,360,465
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Rong-Syuan Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 12,360,467
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder and methods of use
- Patent number 12,362,218
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chi Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for coating photo resist over a substrate
- Patent number 12,362,179
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Hung Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation collector
- Patent number 12,360,458
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng Hung Tsai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical metrology system and method
- Patent number 12,360,462
- Issue date Jul 15, 2025
- Nova Ltd.
- Gilad Barak
- G01 - MEASURING TESTING
Information Patent Grant
EUV radiation system including maximizing droplet velocity change t...
- Patent number 12,363,818
- Issue date Jul 15, 2025
- ASML Netherlands B.V.
- Gijs Dingemans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for selecting photolithography processes
- Patent number 12,360,460
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Maintenance of modules for light sources used in semiconductor phot...
- Patent number 12,360,466
- Issue date Jul 15, 2025
- Cymer, LLC
- Russell Allen Burdt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for qualifying a mask of a lithography system
- Patent number 12,353,126
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Asad Rasool
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-speed nanopatterning method and apparatus of two-color super-r...
- Patent number 12,353,138
- Issue date Jul 8, 2025
- Foundation of Soongsil University-Industry Cooperation
- Dong-Ryoung Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field facet system and lithography apparatus
- Patent number 12,353,137
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Arno Schmittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,353,140
- Issue date Jul 8, 2025
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,353,142
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removal apparatus
- Patent number 12,354,867
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Chian Huang
- B08 - CLEANING
Information Patent Grant
Particle beam inspection apparatus
- Patent number 12,354,891
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Jeroen Gerard Gosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining feature contribution to perfor...
- Patent number 12,353,967
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Vahid Bastani
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT METHOD, MOLD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING M...
- Publication number 20250237943
- Publication date Jul 24, 2025
- Canon Kabushiki Kaisha
- MASAKI ISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHODS OF COMBINING MULTIPLE LASER BEAMS
- Publication number 20250237961
- Publication date Jul 24, 2025
- CYMER, LLC
- Rabin Paudel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCREW TRANSMISSION DRIVE, AND RETICLE STAGE AND MEASURING DEVICE FO...
- Publication number 20250237968
- Publication date Jul 24, 2025
- Carl Zeiss SMT GMBH
- Stephan Zschäck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSFER APPARATUS AND WAFER STORAGE CONTAINER CLEANING APPARATUS
- Publication number 20250236470
- Publication date Jul 24, 2025
- SHIBAURA MECHATRONICS CORPORATION
- Yukinobu NISHIBE
- B08 - CLEANING
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20250237948
- Publication date Jul 24, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS, COMPUTER PROGRAMS AND APPARATUSES FOR TREATING AN OPTICAL...
- Publication number 20250237960
- Publication date Jul 24, 2025
- Carl Zeiss SMS Ltd.
- Sergey Oshemkov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE
- Publication number 20250237962
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Manfred Petrus Johannes Maria DIKKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...
- Publication number 20250237965
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING SYSTEM
- Publication number 20250239454
- Publication date Jul 24, 2025
- SCREEN Holdings Co., Ltd.
- Hiroaki ISHII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20250237953
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takashi SAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250237963
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...
- Publication number 20250237964
- Publication date Jul 24, 2025
- David John McGee
- G02 - OPTICS
Information Patent Application
METHOD TO OBTAIN INFORMATION TO CONTROL A MANUFACTURING PROCESS FOR...
- Publication number 20250239494
- Publication date Jul 24, 2025
- Carl Zeiss SMT GMBH
- Christian Lutzweiler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-SLIP COMPOSITIONS AND COMPONENTS FOR SEMICONDUCTOR WAFER HANDL...
- Publication number 20250237944
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Chung-Ming Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Adhesive Film And Patterning Process
- Publication number 20250237955
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT MARK AND METHOD
- Publication number 20250237966
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chung CHIEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Transferable Nanostructure Fabrication by Gapless Stencil Lithography
- Publication number 20250236105
- Publication date Jul 24, 2025
- Massachusetts Institute of Technology
- Riccardo Comin
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250237954
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING DEFECTIVENESS OF PATTERN BASED ON AFTER DEVE...
- Publication number 20250237967
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Marleen KOOIMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
POSITIVE RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20250231482
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
WAFER HOLDER APPARATUS, SYSTEM AND METHOD OF FORMING SAME
- Publication number 20250231490
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Heng-Wei Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...
- Publication number 20250231501
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tao-Hsin CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250233382
- Publication date Jul 17, 2025
- Gigaphoton Inc.
- Takamitsu KOMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231480
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS
- Publication number 20250231494
- Publication date Jul 17, 2025
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Jinho AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT
- Publication number 20250231499
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Changsik YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...
- Publication number 20250234444
- Publication date Jul 17, 2025
- Gigaphoton Inc.
- Shogo KITASAKA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLACEMENT MEMBER
- Publication number 20250233009
- Publication date Jul 17, 2025
- KYOCERA CORPORATION
- Koji AKASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20250231399
- Publication date Jul 17, 2025
- Carl Zeiss SMT GMBH
- Eric EVA
- G02 - OPTICS
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250231481
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon Moon
- H01 - BASIC ELECTRIC ELEMENTS

Exposure apparatus for microlithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Exposure device and method

Metrology system and method for determining a characteristic of one...

Laser system for source material conditioning in an EUV light source

Apparatus for correcting photomask and method thereof

Methods and apparatus for controlling a lithographic process

Wafer processing apparatus

Hybrid metrology method and system

Substrate holder, lithographic apparatus, device manufacturing meth...

Radiation source

Identification of hot spots or defects by machine learning

Optical assembly, method for deforming an optical element, and proj...

Fiber bundle based optical spot size selector

Lithography system and method thereof

Material management method and system

Dynamic generation of layout adaptive packaging

Substrate holder and methods of use

Method and apparatus for coating photo resist over a substrate

Radiation collector

Optical metrology system and method

EUV radiation system including maximizing droplet velocity change t...

System and method for selecting photolithography processes

Maintenance of modules for light sources used in semiconductor phot...

Method and device for qualifying a mask of a lithography system

High-speed nanopatterning method and apparatus of two-color super-r...

Field facet system and lithography apparatus

Information processing apparatus and information processing method

Semiconductor processing tool and methods of operation

Particle removal apparatus

Particle beam inspection apparatus

Method and apparatus for determining feature contribution to perfor...

Patents Applicationslast 30 patents

IMPRINT METHOD, MOLD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING M...

APPARATUS FOR AND METHODS OF COMBINING MULTIPLE LASER BEAMS

SCREW TRANSMISSION DRIVE, AND RETICLE STAGE AND MEASURING DEVICE FO...

TRANSFER APPARATUS AND WAFER STORAGE CONTAINER CLEANING APPARATUS

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

METHODS, COMPUTER PROGRAMS AND APPARATUSES FOR TREATING AN OPTICAL...

APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE

SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...

SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING SYSTEM

SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...

SEMICONDUCTOR PROCESS APPARATUS

METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...

METHOD TO OBTAIN INFORMATION TO CONTROL A MANUFACTURING PROCESS FOR...

ANTI-SLIP COMPOSITIONS AND COMPONENTS FOR SEMICONDUCTOR WAFER HANDL...

Composition For Forming Adhesive Film And Patterning Process

ALIGNMENT MARK AND METHOD

Transferable Nanostructure Fabrication by Gapless Stencil Lithography

Composition For Forming Metal-Containing Film And Patterning Process

METHOD FOR DETERMINING DEFECTIVENESS OF PATTERN BASED ON AFTER DEVE...

POSITIVE RESIST MATERIAL AND PATTERNING PROCESS

WAFER HOLDER APPARATUS, SYSTEM AND METHOD OF FORMING SAME

EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

RESIST COMPOSITION AND PATTERN FORMING PROCESS

COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS

METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...

PLACEMENT MEMBER

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...