Exposure apparatus for microlithography

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CPC
G03F7/70

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70Exposure apparatus for microlithography

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Actuator assemblies comprising piezo actuators or electrostrictive...
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- Issue date Jan 28, 2025
- ASML Netherlands B.V.
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Reticle cleaning device and method of use
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- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
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System and method for submicron additive manufacturing
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- Lawrence Livermore National Security, LLC
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Optical proximity correction method and method of fabricating a sem...
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- Tokyo Electron Limited
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Method for determining a measurement recipe and associated apparatuses
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- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method of cleaning wafer table of photolithography system and metho...
- Patent number 12,210,296
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Yu Tu
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Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 12,210,289
- Issue date Jan 28, 2025
- Carl Zeiss SMT GmbH
- Kerstin Hild
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EUV microscope
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Information Patent Grant
Substrate processing apparatus
- Patent number 12,204,256
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- Tokyo Electron Limited
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Information Patent Grant
Extreme ultraviolet lithography system with heated tin vane bucket...
- Patent number 12,207,381
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
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- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Dual diffraction order spin-on-glass phase-grating beam-splitter ba...
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In-situ lithography pattern enhancement with localized stress treat...
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- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Andrew Weloth
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Lithographic apparatus and method
- Patent number 12,204,255
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Target supply system, extreme ultraviolet light generation apparatu...
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- Issue date Jan 21, 2025
- Gigaphoton Inc.
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- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
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Methods and apparatuses for aligning and diagnosing a laser beam
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- Cymer, LLC
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Training methods for machine learning assisted optical proximity error
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- ASML Netherlands B.V.
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Method and apparatus for inspection and metrology
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- Issue date Jan 21, 2025
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Optical mode optimization for wafer inspection
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Tag coordinate determination method and apparatus, computer-readabl...
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Lithography film stack and lithography method
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Pattern generation method, template, and method for manufacturing t...
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Method for decision making in a semiconductor manufacturing process
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- Issue date Jan 21, 2025
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- Arnaud Hubaux
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Multi-layered moiré targets and methods for using the same in measu...
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- KLA Corporation
- Yoel Feler
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Information Patent Grant
Machine learning on overlay management
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- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Cheng Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography measurement machine and operating method thereof
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- Issue date Jan 14, 2025
- Hon Hai Precision Industry Co., Ltd.
- Kuo-Kuei Fu
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Apparatus and method for process-window characterization
- Patent number 12,197,134
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Te-Sheng Wang
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Device and method for setting relative laser intensities
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- Issue date Jan 14, 2025
- Mycronic AB
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Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

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AUTO PARAMETER TUNING FOR CHARGED PARTICLE INSPECTION IMAGE ALIGNMENT
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METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING
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- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
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- Canon Kabushiki Kaisha
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TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...
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- ASML NETHERLANDS B.V.
- Aniruddha Ramakrishna SONDE
- G01 - MEASURING TESTING
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METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
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- KLA Corporation
- Myungjun Lee
- H01 - BASIC ELECTRIC ELEMENTS
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ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...
- Publication number 20250028250
- Publication date Jan 23, 2025
- Carl Zeiss SMT GMBH
- Florian Baumer
- G01 - MEASURING TESTING
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METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
- Publication number 20250028254
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...
- Publication number 20250028255
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Chenxi LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD
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- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Keiichi YAHATA
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DETECTING OUTLIERS AND ANOMALIES FOR OCD METROLOGY MACHINE LEARNING
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- NOVA LTD
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DRY DEVELOPMENT FOR METAL-OXIDE PHOTORESISTS
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- Applied Materials, Inc.
- NASRIN KAZEM
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METHOD FOR IMAGING A MASK LAYER AND ASSOCIATED IMAGING SYSTEM
- Publication number 20250028252
- Publication date Jan 23, 2025
- XSYS PREPRESS N.V.
- Frederik DEFOUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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COMPENSATING OPTICAL SYSTEM FOR NONUNIFORM SURFACES, A METROLOGY SY...
- Publication number 20250028258
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Oleg Viacheslavovich VOZNYI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Imprint Apparatus with Movable Stages
- Publication number 20250028259
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Junichi KANEHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS INCL...
- Publication number 20250031281
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Sanghyun LIM
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...
- Publication number 20250028251
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250028257
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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IDENTIFYING DEVIATING MODULES FROM A REFERENCE POPULATION FOR MACHI...
- Publication number 20250029014
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Dimitriy DOUNAEV
- G06 - COMPUTING CALCULATING COUNTING
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INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
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- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Tzu Shun Yang
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METHOD FOR DETECTING DEFECTS IN SEMICONDUCTOR STRUCTURE AND METHOD...
- Publication number 20250028253
- Publication date Jan 23, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YEN-FONG CHAN
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Information Patent Application
APERTURE AND METHOD
- Publication number 20250031294
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Roger Anton Marie TIMMERMANS
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Information Patent Application
APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE
- Publication number 20250021026
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- William Peter VAN DRENT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE
- Publication number 20250021009
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Ferry ZIJP
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Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
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Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD
- Publication number 20250021011
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Cornelius Richt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY
- Publication number 20250021016
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS
- Publication number 20250021017
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Raaja Ganapathy SUBRAMANIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METROLOGY CALIBRATION METHOD
- Publication number 20250021021
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Giulio BOTTEGAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMI...
- Publication number 20250020570
- Publication date Jan 16, 2025
- National Tsing-Hua University
- Tsai-Sheng Gau
- G01 - MEASURING TESTING

Exposure apparatus for microlithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Actuator assemblies comprising piezo actuators or electrostrictive...

Reticle cleaning device and method of use

System and method for submicron additive manufacturing

Optical proximity correction method and method of fabricating a sem...

Treatment solution supply apparatus, reporting method, and storage...

Method for determining a measurement recipe and associated apparatuses

Method of cleaning wafer table of photolithography system and metho...

Mirror, in particular for a microlithographic projection exposure a...

Aberration impact systems, models, and manufacturing processes

EUV microscope

Substrate processing apparatus

Extreme ultraviolet lithography system with heated tin vane bucket...

Dual diffraction order spin-on-glass phase-grating beam-splitter ba...

In-situ lithography pattern enhancement with localized stress treat...

Lithographic apparatus and method

Target supply system, extreme ultraviolet light generation apparatu...

Methods and apparatuses for aligning and diagnosing a laser beam

Training methods for machine learning assisted optical proximity error

Method and apparatus for inspection and metrology

Optical mode optimization for wafer inspection

Tag coordinate determination method and apparatus, computer-readabl...

Lithography film stack and lithography method

Pattern generation method, template, and method for manufacturing t...

Method for decision making in a semiconductor manufacturing process

Multi-layered moiré targets and methods for using the same in measu...

Machine learning on overlay management

Lithography measurement machine and operating method thereof

Apparatus and method for process-window characterization

Device and method for setting relative laser intensities

Mask and reticle protection with atomic layer deposition (ALD)

Patents Applicationslast 30 patents

AUTO PARAMETER TUNING FOR CHARGED PARTICLE INSPECTION IMAGE ALIGNMENT

METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...

TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...

METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...

SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...

SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD

DETECTING OUTLIERS AND ANOMALIES FOR OCD METROLOGY MACHINE LEARNING

DRY DEVELOPMENT FOR METAL-OXIDE PHOTORESISTS

METHOD FOR IMAGING A MASK LAYER AND ASSOCIATED IMAGING SYSTEM

COMPENSATING OPTICAL SYSTEM FOR NONUNIFORM SURFACES, A METROLOGY SY...

Imprint Apparatus with Movable Stages

SUBSTRATE SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS INCL...

LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...

SEMICONDUCTOR PROCESS APPARATUS

IDENTIFYING DEVIATING MODULES FROM A REFERENCE POPULATION FOR MACHI...

INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...

METHOD FOR DETECTING DEFECTS IN SEMICONDUCTOR STRUCTURE AND METHOD...

APERTURE AND METHOD

APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE

AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD

IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY

METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS

METROLOGY CALIBRATION METHOD

PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMI...