Exposure apparatus for microlithography

Industry

CPC
G03F7/70

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70Exposure apparatus for microlithography

Industries

Patents Grantslast 30 patents

Information Patent Grant
Exposing apparatus and method for manufacturing article
- Patent number 12,326,666
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Takashi Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical component
- Patent number 12,326,663
- Issue date Jun 10, 2025
- Carl Zeiss SMT GmbH
- Valentin Jonatan Bolsinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dose mapper method
- Patent number 12,326,664
- Issue date Jun 10, 2025
- Shanghai Huali Integrated Circuit Corporation
- Shuo Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quantum meta-device for ultrasensitive displacement metrology
- Patent number 12,326,665
- Issue date Jun 10, 2025
- City University of Hong Kong
- Yubin Fan
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, metrology system, and intensity imbalance m...
- Patent number 12,326,670
- Issue date Jun 10, 2025
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for forming a patterned layer of material
- Patent number 12,325,911
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Tamara Druzhinina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Illumination apparatus and associated metrology and lithographic ap...
- Patent number 12,326,669
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chamber device, and electronic device manufacturing method
- Patent number 12,327,975
- Issue date Jun 10, 2025
- Gigaphoton Inc.
- Junichi Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet-dry bilayer resist dual tone exposure
- Patent number 12,327,726
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor lithography system and/or method
- Patent number 12,321,100
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Large die wafer, large die and method of forming the same
- Patent number 12,322,707
- Issue date Jun 3, 2025
- Wuhan Xinxin Semiconductor Manufacturing Co., Ltd.
- Sheng Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of controlling droplet generator performance
- Patent number 12,324,084
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Pooriya Beyhaghi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 12,322,660
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for applying a deposition model in a semiconductor manufactu...
- Patent number 12,321,101
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of generating a set of illumination patterns for...
- Patent number 12,321,103
- Issue date Jun 3, 2025
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder for use in a lithographic apparatus
- Patent number 12,321,104
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Thomas Poiesz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for applying fiducial markings
- Patent number 12,322,148
- Issue date Jun 3, 2025
- The United States of America, as represented by the Secretary of the Navy
- Eric R. Walzer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate support member, substrate treatment apparatus, and substr...
- Patent number 12,321,098
- Issue date Jun 3, 2025
- Tokyo Electron Limited
- Hitoshi Hashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Machine and deep learning methods for spectra-based metrology and p...
- Patent number 12,321,102
- Issue date Jun 3, 2025
- Nova Ltd.
- Barak Bringoltz
- G05 - CONTROLLING REGULATING
Information Patent Grant
Extreme ultraviolet light source device and protection method for r...
- Patent number 12,321,107
- Issue date Jun 3, 2025
- USHIO DENKI KABUSHIKI KAISHA
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and system for fabricating unique chips using a charged part...
- Patent number 12,322,569
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Projection exposure apparatus for semiconductor lithography
- Patent number 12,321,105
- Issue date Jun 3, 2025
- Carl Zeiss SMT GmbH
- Timo Laufer
- G01 - MEASURING TESTING
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Device for detecting a temperature, installation for producing an o...
- Patent number 12,321,106
- Issue date Jun 3, 2025
- Carl Zeiss SMT GmbH
- Michael Stolz
- G01 - MEASURING TESTING
Information Patent Grant
State monitoring method, state monitoring apparatus and state monit...
- Patent number 12,321,157
- Issue date Jun 3, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xiaojun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Film formation device, film formation method, and article manufactu...
- Patent number 12,313,977
- Issue date May 27, 2025
- Canon Kabushiki Kaisha
- Hiroshi Kurosawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system, lithographic apparatus, and inspection method
- Patent number 12,313,980
- Issue date May 27, 2025
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask structure for deposition device, deposition device, and operat...
- Patent number 12,312,671
- Issue date May 27, 2025
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Holding mechanism and exposure apparatus
- Patent number 12,311,504
- Issue date May 27, 2025
- Ushio Denki Kabushiki Kaisha
- Kenji Ishida
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...
- Patent number 12,313,979
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Sanguk Park
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF DETERMINING OVERLAYER REFERENCE WAVELENGTH
- Publication number 20250189902
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Byeongseon PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD, RESIN SOLUTION, RESIST COMPOSITION OR THERMOSETT...
- Publication number 20250189903
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Komei HIRAHARA
- G01 - MEASURING TESTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...
- Publication number 20250189901
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE REMOVAL TOOL
- Publication number 20250191952
- Publication date Jun 12, 2025
- PHOTRONICS, INC.
- Hilario Ar-Miguel Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20250189887
- Publication date Jun 12, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...
- Publication number 20250189900
- Publication date Jun 12, 2025
- Carl Zeiss SMT GMBH
- Sandro HOFFMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...
- Publication number 20250189904
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAS PURGE SYSTEMS FOR A LASER SOURCE
- Publication number 20250189905
- Publication date Jun 12, 2025
- CYMER, LLC
- Gamaralalage G Padmabandu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS
- Publication number 20250189881
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Ya LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250189893
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yosuke SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER
- Publication number 20250189899
- Publication date Jun 12, 2025
- Canon Kabushiki Kaisha
- Qi Ni
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK REPAIR APPARATUS AND METHODS
- Publication number 20250180979
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Meng-Han HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20250181941
- Publication date Jun 5, 2025
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20250180998
- Publication date Jun 5, 2025
- Carl Zeiss SMT GMBH
- Oliver HERBST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS
- Publication number 20250181001
- Publication date Jun 5, 2025
- ASML Holding N.V.
- Daniel Paul RODAK
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20250180999
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsieh-Yu WEI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-CLEANLINESS RETICLE CLAMPING MODULE
- Publication number 20250181000
- Publication date Jun 5, 2025
- GUDENG EQUIPMENT CO., LTD.
- AN-PANG WANG
- G01 - MEASURING TESTING
Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250180933
- Publication date Jun 5, 2025
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250183611
- Publication date Jun 5, 2025
- Gigaphoton Inc.
- Keita KOUZAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER SYSTEM AND METHOD FOR PROVIDING A PULSED LASER BEAM INTENDED...
- Publication number 20250174956
- Publication date May 29, 2025
- TRUMPF LASER GMBH
- Jonathan Brons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...
- Publication number 20250175589
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Senthil Lakshmanan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHOD OF MANUFACTUR...
- Publication number 20250172880
- Publication date May 29, 2025
- Samsung Electronics Co., Ltd.
- Jihyeon Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for evaluating at least one marker on a physical object for...
- Publication number 20250172882
- Publication date May 29, 2025
- ROBERT BOSCH GmbH
- Cedric Donie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE PRESSING DEVICE AND RETICLE BOX USING THE SAME
- Publication number 20250172884
- Publication date May 29, 2025
- GUDENG PRECISION INDUSTRIAL CO., LTD.
- Ming-Chien CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...
- Publication number 20250170671
- Publication date May 29, 2025
- Nikon Corporation
- Yasushi MIZUNO
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES
- Publication number 20250172886
- Publication date May 29, 2025
- CYMER, LLC
- Spencer Ryan Williams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20250172881
- Publication date May 29, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXHAUST DEVICE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250172883
- Publication date May 29, 2025
- A Rah CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...
- Publication number 20250172875
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250174452
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS

Exposure apparatus for microlithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Exposing apparatus and method for manufacturing article

Optical component

Dose mapper method

Quantum meta-device for ultrasensitive displacement metrology

Lithographic apparatus, metrology system, and intensity imbalance m...

Method and apparatus for forming a patterned layer of material

Illumination apparatus and associated metrology and lithographic ap...

Chamber device, and electronic device manufacturing method

Wet-dry bilayer resist dual tone exposure

Semiconductor lithography system and/or method

Large die wafer, large die and method of forming the same

Apparatus for and method of controlling droplet generator performance

Method and apparatus to determine a patterning process parameter

Method for applying a deposition model in a semiconductor manufactu...

System and method of generating a set of illumination patterns for...

Substrate holder for use in a lithographic apparatus

Apparatus and methods for applying fiducial markings

Substrate support member, substrate treatment apparatus, and substr...

Machine and deep learning methods for spectra-based metrology and p...

Extreme ultraviolet light source device and protection method for r...

Method and system for fabricating unique chips using a charged part...

Projection exposure apparatus for semiconductor lithography

Method for generating EUV radiation

Device for detecting a temperature, installation for producing an o...

State monitoring method, state monitoring apparatus and state monit...

Film formation device, film formation method, and article manufactu...

Inspection system, lithographic apparatus, and inspection method

Mask structure for deposition device, deposition device, and operat...

Holding mechanism and exposure apparatus

Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...

Patents Applicationslast 30 patents

METHODS OF DETERMINING OVERLAYER REFERENCE WAVELENGTH

INSPECTION METHOD, RESIN SOLUTION, RESIST COMPOSITION OR THERMOSETT...

CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE D...

PELLICLE REMOVAL TOOL

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...

METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...

GAS PURGE SYSTEMS FOR A LASER SOURCE

LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER

MASK REPAIR APPARATUS AND METHODS

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

HIGH-CLEANLINESS RETICLE CLAMPING MODULE

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

LASER SYSTEM AND METHOD FOR PROVIDING A PULSED LASER BEAM INTENDED...

TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...

OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHOD OF MANUFACTUR...

Method for evaluating at least one marker on a physical object for...

RETICLE PRESSING DEVICE AND RETICLE BOX USING THE SAME

OPTICAL DEVICE, EXPOSURE DEVICE, METHOD FOR MANUFACTURING FLAT PANE...

STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

EXHAUST DEVICE AND SUBSTRATE PROCESSING APPARATUS

POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...