Exposure apparatus for microlithography

Industry

CPC
G03F7/70

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70Exposure apparatus for microlithography

Industries

Patents Grantslast 30 patents

Information Patent Grant
Determining hot spot ranking based on wafer measurement
- Patent number 12,242,201
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing a substrate and lithographic apparatus
- Patent number 12,242,206
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Dennis Dominic Van Der Voort
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for overlay error correction
- Patent number 12,242,202
- Issue date Mar 4, 2025
- NANYA TECHNOLOGY CORPORATION
- Shih-Yuan Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,242,203
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using wafer stage
- Patent number 12,242,199
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus and a method of manufacturing a device
- Patent number 12,242,200
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate support, lithographic apparatus, method for manipulating...
- Patent number 12,242,204
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Ruud Antonius Catharina Maria Beerens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing particles from pellicle and photomask
- Patent number 12,242,182
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tzu Han Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus, system and method
- Patent number 12,242,197
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber with stop-gapped vacuum seal
- Patent number 12,242,205
- Issue date Mar 4, 2025
- Canon Kabushiki Kaisha
- Byung-Jin Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,242,765
- Issue date Mar 4, 2025
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus for and method of optical component alignment
- Patent number 12,244,116
- Issue date Mar 4, 2025
- Cymer, LLC
- Hong Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder for use in a lithographic apparatus and a device m...
- Patent number 12,243,768
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Johannes Josephus Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process window qualification modulation layouts
- Patent number 12,235,224
- Issue date Feb 25, 2025
- KLA Corporation
- Andrew Cross
- G01 - MEASURING TESTING
Information Patent Grant
Scanning overlay metrology with high signal to noise ratio
- Patent number 12,235,588
- Issue date Feb 25, 2025
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 12,235,589
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,235,590
- Issue date Feb 25, 2025
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photolithography system fuel source and methods of operating th...
- Patent number 12,235,586
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Hao Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Object holder, electrostatic sheet and method for making an electro...
- Patent number 12,235,592
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Bastiaan Lambertus Wilhelmus Marinus Van De Ven
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems for cleaning a portion of a lithography apparatus
- Patent number 12,235,595
- Issue date Feb 25, 2025
- ASML Holding N.V.
- Daniel Paul Rodak
- B08 - CLEANING
Information Patent Grant
Machine learning on overlay management
- Patent number 12,237,188
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Cheng Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow-core photonic crystal fiber based broadband radiation generator
- Patent number 12,237,639
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- John Colin Travers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temporary storage and reflow frame substrate system
- Patent number 12,238,867
- Issue date Feb 25, 2025
- ECLAT FOREVER MACHINERY CO., LTD.
- Kun-Lin Chou
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for dynamically controlling temperature of thermo...
- Patent number 12,235,593
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Jung Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 12,235,096
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G01 - MEASURING TESTING
Information Patent Grant
Method for performing lithography process, light source, and EUV li...
- Patent number 12,235,594
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 12,236,364
- Issue date Feb 25, 2025
- Nova Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Radiation conduit
- Patent number 12,235,585
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Remco Johannes Elisa Heijmans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and system for determining initial contact control values fo...
- Patent number 12,235,587
- Issue date Feb 25, 2025
- Canon Kabushiki Kaisha
- Daniel Ironside
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for positioning a shadow mask
- Patent number 12,235,591
- Issue date Feb 25, 2025
- ABB Schweiz AG
- Johannes Felix Holger Schmitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RE...
- Publication number 20250068059
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki Ide
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM, PROJECTION ILLUMINATION FACILITY AND PROJECTIO...
- Publication number 20250068081
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY
- Publication number 20250068082
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- YingChiao WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM
- Publication number 20250068087
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Yangyang SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY
- Publication number 20250068088
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Guancyun LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MECHANICALLY CONTROLLED STRESS-ENGINEERED OPTICAL SYSTEMS AND METHODS
- Publication number 20250068090
- Publication date Feb 27, 2025
- ASML NETHERLANDS B.V.
- Adel JOOBEUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED SUBSTRATE PROCESSING SYSTEM WITH ADVANCED SUBSTRATE HAND...
- Publication number 20250069926
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Arunkumar Ramachandraiah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOHARDENABLE COMPOSITIONS AND METHODS OF FORMING AN OBJECT
- Publication number 20250068071
- Publication date Feb 27, 2025
- QUADRATIC 3D, INC.
- SAMUEL N. SANDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELEMENT OF AN AFM TOOL
- Publication number 20250067768
- Publication date Feb 27, 2025
- ASML NETHERLANDS B.V.
- Mustafa Ümit ARABUL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKLESS PHOTOLITHOGRAPHY PROCESS FOR THE SYNTHESIS OF METALLIC NAN...
- Publication number 20250068086
- Publication date Feb 27, 2025
- QATAR FOUNDATION FOR EDUCATION, SCIENCE AND COMMUNITY DEVELOPMENT
- Hicham Hamoudi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH
- Publication number 20250068089
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Sonja Schneider
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20250068084
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Joern WEBER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS, STICKER, COVER RING AND ME...
- Publication number 20250068085
- Publication date Feb 27, 2025
- ASML NETHERLANDS B.V.
- Gijs KRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE, PROJECTION ILLUMINATION SYSTEM A...
- Publication number 20250068083
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Susanne Beder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR...
- Publication number 20250069899
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jakyoung Gu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and Reticle Protection with Atomic Layer Deposition (ALD)
- Publication number 20250068054
- Publication date Feb 27, 2025
- Nano-Master, Inc.
- Birol Kuyel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual-modal information storage and anti-counterfeiting material, an...
- Publication number 20250059385
- Publication date Feb 20, 2025
- HANGZHOU NORMAL UNIVERSITY
- Baiheng WU
- B82 - NANO-TECHNOLOGY
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES
- Publication number 20250060680
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Aabid PATEL
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...
- Publication number 20250060682
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Armin Bernhard RIDINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LATENT SPACE SYNCHRONIZATION OF MACHINE LEARNING MODELS FOR IN-DEVI...
- Publication number 20250060679
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Davide BARBIERI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...
- Publication number 20250060683
- Publication date Feb 20, 2025
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...
- Publication number 20250060661
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SERIES OF STACKED CONFOCAL PULSE STRETCHERS FOR SPECKLE REDUCTION
- Publication number 20250062582
- Publication date Feb 20, 2025
- CYMER, LLC
- Eric Anders Mason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS
- Publication number 20250060673
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20250060678
- Publication date Feb 20, 2025
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...
- Publication number 20250060672
- Publication date Feb 20, 2025
- WESTERN DIGITAL TECHNOLOGIES, INC.,
- Shinichi HISADOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...
- Publication number 20250060677
- Publication date Feb 20, 2025
- Carl Zeiss SMT GMBH
- Walter Pauls
- G01 - MEASURING TESTING
Information Patent Application
A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250060681
- Publication date Feb 20, 2025
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
- Publication number 20250051501
- Publication date Feb 13, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Minoru Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
- Publication number 20250053096
- Publication date Feb 13, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Exposure apparatus for microlithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Determining hot spot ranking based on wafer measurement

Method for preparing a substrate and lithographic apparatus

Method for overlay error correction

Target for measuring a parameter of a lithographic process

Method of using wafer stage

Lithography apparatus and a method of manufacturing a device

Substrate support, lithographic apparatus, method for manipulating...

Method for removing particles from pellicle and photomask

Apparatus, system and method

Reaction chamber with stop-gapped vacuum seal

Information processing apparatus and information processing method

Apparatus for and method of optical component alignment

Substrate holder for use in a lithographic apparatus and a device m...

Process window qualification modulation layouts

Scanning overlay metrology with high signal to noise ratio

Method of manufacturing a semiconductor device and apparatus for ma...

Computer-readable storage medium recording data structure for stori...

EUV photolithography system fuel source and methods of operating th...

Object holder, electrostatic sheet and method for making an electro...

Systems for cleaning a portion of a lithography apparatus

Machine learning on overlay management

Hollow-core photonic crystal fiber based broadband radiation generator

Temporary storage and reflow frame substrate system

System and method for dynamically controlling temperature of thermo...

Inspection method and apparatus, lithographic apparatus, lithograph...

Method for performing lithography process, light source, and EUV li...

Metrology and process control for semiconductor manufacturing

Radiation conduit

Method and system for determining initial contact control values fo...

Device and method for positioning a shadow mask

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RE...

ILLUMINATION SYSTEM, PROJECTION ILLUMINATION FACILITY AND PROJECTIO...

GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY

MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM

STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY

MECHANICALLY CONTROLLED STRESS-ENGINEERED OPTICAL SYSTEMS AND METHODS

INTEGRATED SUBSTRATE PROCESSING SYSTEM WITH ADVANCED SUBSTRATE HAND...

PHOTOHARDENABLE COMPOSITIONS AND METHODS OF FORMING AN OBJECT

ELEMENT OF AN AFM TOOL

MASKLESS PHOTOLITHOGRAPHY PROCESS FOR THE SYNTHESIS OF METALLIC NAN...

OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS, STICKER, COVER RING AND ME...

CATADIOPTRIC PROJECTION OBJECTIVE, PROJECTION ILLUMINATION SYSTEM A...

SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR...

Mask and Reticle Protection with Atomic Layer Deposition (ALD)

Dual-modal information storage and anti-counterfeiting material, an...

GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES

LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...

LATENT SPACE SYNCHRONIZATION OF MACHINE LEARNING MODELS FOR IN-DEVI...

PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...

SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...

SERIES OF STACKED CONFOCAL PULSE STRETCHERS FOR SPECKLE REDUCTION

DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS

Pattern Measurement Device and Pattern Measurement Method

PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING...

A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS

RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD

Flexible Measurement Models For Model Based Measurements Of Semicon...