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Exposure apparatus for microlithography
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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Photomechanical
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G03F7/70
Exposure apparatus for microlithography
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last 30 patents
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Two-photon-polymerization laser direct writing system based on acou...
Patent number
11,982,945
Issue date
May 14, 2024
Huazhong University of Science & Technology
Wei Xiong
B33 - ADDITIVE MANUFACTURING TECHNOLOGY
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Patent Grant
System and method for removing airborne molecular contaminants from...
Patent number
11,980,847
Issue date
May 14, 2024
Entegris, Inc.
Marc Venet
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Quick-release valve module, reticle pod provided with quick-release...
Patent number
11,981,483
Issue date
May 14, 2024
Gudeng Precision Industrial Co., Ltd.
Chia-Ho Chuang
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Patent Grant
Reticle pod provided with optically identifiable marks and method f...
Patent number
11,982,937
Issue date
May 14, 2024
Gudeng Precision Industrial Co., Ltd.
Chia-Ho Chuang
G06 - COMPUTING CALCULATING COUNTING
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Metrology targets
Patent number
11,982,946
Issue date
May 14, 2024
ASML Netherlands B.V.
Nikhil Mehta
G01 - MEASURING TESTING
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Contamination trap
Patent number
11,982,947
Issue date
May 14, 2024
ASML NETHERLAND B.V.
Sander Catharina Reinier Derks
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Patent Grant
Semiconductor structure and method for manufacturing same
Patent number
11,984,406
Issue date
May 14, 2024
CHANGXIN MEMORY TECHNOLOGIES, INC.
Yunsheng Xia
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Particle removal method
Patent number
11,984,314
Issue date
May 14, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Siao-Chian Huang
B08 - CLEANING
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Component-manufacturing tool and component-manufacturing method
Patent number
11,984,341
Issue date
May 14, 2024
Mitsui Chemicals Tohcello, Inc.
Eiji Hayashishita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Mask inspection of a semiconductor specimen
Patent number
11,983,867
Issue date
May 14, 2024
Applied Materials Israel Ltd.
Ariel Shkalim
G06 - COMPUTING CALCULATING COUNTING
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Method for determining a center of a radiation spot, sensor and sta...
Patent number
11,982,948
Issue date
May 14, 2024
ASML Netherlands B.V.
Mihaita Popinciuc
G01 - MEASURING TESTING
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Radiation system
Patent number
11,984,236
Issue date
May 14, 2024
ASML Netherlands B.V.
Han-Kwang Nienhuys
G02 - OPTICS
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Methods and apparatus for measuring a property of a substrate
Patent number
11,977,034
Issue date
May 7, 2024
ASML Netherlands B.V.
Wouter Lodewijk Elings
Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
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Method for detecting stochastic weak points of layout pattern of se...
Patent number
11,977,828
Issue date
May 7, 2024
Samsung Electronics Co., Ltd.
Seungjin Lee
G06 - COMPUTING CALCULATING COUNTING
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Laser apparatus and electronic device manufacturing method
Patent number
11,978,997
Issue date
May 7, 2024
Gigaphoton Inc.
Hirotaka Miyamoto
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
EUV light source and apparatus for lithography
Patent number
11,979,971
Issue date
May 7, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Yen-Shuo Su
G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
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Semiconductor manufacturing apparatus and operating method thereof
Patent number
11,979,973
Issue date
May 7, 2024
Samsung Electronics Co., Ltd.
Dohyung Kim
H01 - BASIC ELECTRIC ELEMENTS
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Lithographic patterning method
Patent number
11,977,337
Issue date
May 7, 2024
Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
Diederik Jan Maas
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Substrate processing system and substrate processing method, and de...
Patent number
11,977,339
Issue date
May 7, 2024
Nikon Corporation
Yuichi Shibazaki
H01 - BASIC ELECTRIC ELEMENTS
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Pellicle for EUV lithography
Patent number
11,977,326
Issue date
May 7, 2024
ASML Netherlands B.V.
Dennis De Graaf
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Wavefront optimization for tuning scanner based on performance matc...
Patent number
11,977,334
Issue date
May 7, 2024
ASML Netherlands B.V.
Duan-Fu Stephen Hsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Mask orientation
Patent number
11,977,246
Issue date
May 7, 2024
Applied Materials, Inc.
Yongan Xu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Pattern decomposition method
Patent number
11,977,335
Issue date
May 7, 2024
United Microelectronics Corp.
Min Cheng Yang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Defocus measurement method, correction method, and method of manufa...
Patent number
11,977,338
Issue date
May 7, 2024
Samsung Electronics Co., Ltd.
Jieun Park
H01 - BASIC ELECTRIC ELEMENTS
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Method for improving a process for a patterning process
Patent number
11,977,336
Issue date
May 7, 2024
ASML Netherlands B.V.
Jen-Shiang Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Digital exposure machine and exposure control method thereof
Patent number
11,971,662
Issue date
Apr 30, 2024
BOE Technology Group Co., Ltd.
Zhichong Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method for determining patterning device pattern based on manufactu...
Patent number
11,972,194
Issue date
Apr 30, 2024
ASML Netherlands B.V.
Roshni Biswas
G06 - COMPUTING CALCULATING COUNTING
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Determination method, determination device, exposure device, and pr...
Patent number
11,972,325
Issue date
Apr 30, 2024
Nikon Corporation
Yosuke Okudaira
G06 - COMPUTING CALCULATING COUNTING
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Methods for modeling of a design in reticle enhancement technology
Patent number
11,972,187
Issue date
Apr 30, 2024
D2S, Inc.
P. Jeffrey Ungar
G06 - COMPUTING CALCULATING COUNTING
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Patent Grant
Light sources and methods of controlling; devices and methods for u...
Patent number
11,971,663
Issue date
Apr 30, 2024
ASML Netherlands B.V.
Marinus Petrus Reijnders
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
SYSTEMS AND METHODS FOR DISTRIBUTING LIGHT DELIVERY
Publication number
20240160110
Publication date
May 16, 2024
ASML NETHERLANDS B.V.
Jasper WINTERS
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
Publication number
20240160112
Publication date
May 16, 2024
ASML NETHERLANDS B.V.
Steven George Hansen
G06 - COMPUTING CALCULATING COUNTING
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Patent Application
RETICLE STORAGE CABINET SYSTEM AND METHOD USING THE SAME
Publication number
20240160116
Publication date
May 16, 2024
Ming-Chien CHIU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
HOME PORT AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME
Publication number
20240160119
Publication date
May 16, 2024
SEMES CO., LTD.
Nam Ki HONG
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Application
SUPPORT FOR AN OPTICAL ELEMENT
Publication number
20240159988
Publication date
May 16, 2024
Carl Zeiss SMT GMBH
Rodolfo Guglielmi Rabe
G02 - OPTICS
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Patent Application
SINGLE GRAB OVERLAY MEASUREMENT OF TALL TARGETS
Publication number
20240159585
Publication date
May 16, 2024
KLA Corporation
Amnon Manassen
G01 - MEASURING TESTING
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Patent Application
LITHOGRAPHIC APPARATUS AND METHOD FOR ILLUMINATION UNIFORMITY CORRE...
Publication number
20240160108
Publication date
May 16, 2024
ASML NETHERLANDS B.V.
Nikolaos SOTIROPOULOS
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DE...
Publication number
20240160115
Publication date
May 16, 2024
Samsung Electronics Co., Ltd.
Wooyong JUNG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
Publication number
20240160109
Publication date
May 16, 2024
ASML NETHERLANDS B.V.
Yue Ma
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR OPERATING AN OPTICAL SYSTEM
Publication number
20240160113
Publication date
May 16, 2024
Carl Zeiss SMT GMBH
Julian Zips
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SINGLE-CELL SCATTEROMETRY OVERLAY WITH SENSITIVITY CALIBRATION
Publication number
20240160114
Publication date
May 16, 2024
KLA Corporation
Mordechy Kot
G01 - MEASURING TESTING
Information
Patent Application
PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS
Publication number
20240160117
Publication date
May 16, 2024
Applied Materials, Inc.
Dmitry LUBOMIRSKY
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...
Publication number
20240160107
Publication date
May 16, 2024
Gigaphoton Inc.
Yoshiyuki HONDA
G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information
Patent Application
INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
Publication number
20240160100
Publication date
May 16, 2024
Applied Materials, Inc.
Tzu Shun Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET...
Publication number
20240160106
Publication date
May 16, 2024
Taiwan Semiconductor Manufacturing Co., Ltd.
Chi-Hung LIAO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DIGITAL DIRECT RECORDING DEVICE COMPRISING REAL TIME ANALYSIS AND C...
Publication number
20240160111
Publication date
May 16, 2024
Visitech Lithography AS
Endre Kirkhorn
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS
Publication number
20240160118
Publication date
May 16, 2024
SEMES CO., LTD.
Seojung PARK
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
TARGET MATERIAL TRANSFER SYSTEM COMPONENTS AND METHODS OF MAKING TH...
Publication number
20240164004
Publication date
May 16, 2024
ASML NETHERLANDS B.V.
Dietmar Uwe Herbert Trees
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Patent Application
MASK EXPOSURE SYSTEM AND MASK EXPOSURE METHOD
Publication number
20240152062
Publication date
May 9, 2024
Samsung Electronics Co., Ltd.
Sukjong Bae
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...
Publication number
20240152043
Publication date
May 9, 2024
Samsung Electronics Co., Ltd.
Minseung SONG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
Publication number
20240152059
Publication date
May 9, 2024
ASML NETHERLANDS B.V.
Dogacan KARA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...
Publication number
20240152060
Publication date
May 9, 2024
ASML NETHERLANDS B.V.
Patrick Philipp HELFENSTEIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
IMMERSION LITHOGRAPHIC SYSTEM
Publication number
20240152058
Publication date
May 9, 2024
Samsung Electronics Co., Ltd.
Wonki LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DATA INSPECTION FOR DIGITAL LITHOGRAPHY FOR HVM USING OFFLINE AND I...
Publication number
20240152061
Publication date
May 9, 2024
Applied Materials, Inc.
Chung-Shin KANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
Publication number
20240152064
Publication date
May 9, 2024
Samsung Electronics Co., Ltd.
Mincheol KWAK
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
HOLLOW-CORE OPTICAL FIBER BASED RADIATION SOURCE
Publication number
20240152024
Publication date
May 9, 2024
ASML NETHERLANDS B.V.
Willem Richard PONGERS
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
METHOD OF CONTROLLING SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCE...
Publication number
20240152046
Publication date
May 9, 2024
Samsung Electronics Co., Ltd.
Jeongjin LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
Publication number
20240152057
Publication date
May 9, 2024
Carl Zeiss SMT GMBH
Johannes Ruoff
G01 - MEASURING TESTING
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Patent Application
MAINTENANCE OF MODULES FOR LIGHT SOURCES USED IN SEMICONDUCTOR PHOT...
Publication number
20240152063
Publication date
May 9, 2024
CYMER, LLC
Russell Allen Burdt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTIVE MATRIX SUBSTRATE, METHOD FOR MANUFACTURING ACTIVE MATRIX SUB...
Publication number
20240152013
Publication date
May 9, 2024
Sharp Display Technology Corporation
Yoshihito HARA
G06 - COMPUTING CALCULATING COUNTING