Exposure Apparatus therefor

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/20Exposure Apparatus therefor

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent electrode, process for producing transparent electrode,...
- Patent number 12,262,571
- Issue date Mar 25, 2025
- Kabushiki Kaisha Toshiba
- Naomi Shida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Template, method for fabricating template, and method for fabricati...
- Patent number 12,259,663
- Issue date Mar 25, 2025
- Kioxia Corporation
- Toshiaki Komukai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structured nanoporous materials, manufacture of structured nanoporo...
- Patent number 12,259,650
- Issue date Mar 25, 2025
- Kyoto University
- Easan Sivaniah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of flexographic printing plate and printing me...
- Patent number 12,259,655
- Issue date Mar 25, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for optically processing an object
- Patent number 12,253,803
- Issue date Mar 18, 2025
- Karlsruher Institut für Technologie
- Matthias Lauermann
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Electron beam lithography with a bilayer resist
- Patent number 12,248,248
- Issue date Mar 11, 2025
- The Boeing Company
- Antonio Mei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and pattern forming method
- Patent number 12,248,249
- Issue date Mar 11, 2025
- Oji Holdings Corporation
- Kimiko Hattori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable composition including a reactive polymer
- Patent number 12,247,133
- Issue date Mar 11, 2025
- Canon Kabushiki Kaisha
- Fen Wan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,249,509
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Larry Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bubble defect reduction
- Patent number 12,248,252
- Issue date Mar 11, 2025
- Lam Research Corporation
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for increasing the density of high-index nanoimprint lithog...
- Patent number 12,242,186
- Issue date Mar 4, 2025
- Applied Materials, Inc.
- Andrew Ceballos
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 12,242,196
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoacid generator for chemically amplified photoresists
- Patent number 12,242,190
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor photoresist composition, method for preparing thereof...
- Patent number 12,242,189
- Issue date Mar 4, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substrate support, lithographic apparatus, method for manipulating...
- Patent number 12,242,204
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Ruud Antonius Catharina Maria Beerens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition, method for producing the same, re...
- Patent number 12,242,192
- Issue date Mar 4, 2025
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 12,235,589
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line narrowing device and electronic device manufacturing method
- Patent number 12,237,640
- Issue date Feb 25, 2025
- Gigaphoton Inc.
- Koichi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,235,578
- Issue date Feb 25, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 12,234,369
- Issue date Feb 25, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Micropatterning method, micropatterning apparatus and micropatterni...
- Patent number 12,235,583
- Issue date Feb 25, 2025
- Seoul National University R&DB Foundation
- Seung Hwan Ko
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal plate for producing vapor deposition masks, production method...
- Patent number 12,227,823
- Issue date Feb 18, 2025
- Dai Nippon Printing Co., Ltd.
- Hiroki Oka
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS
- Publication number 20250102927
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102912
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20250102925
- Publication date Mar 27, 2025
- Canon Kabushiki Kaisha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTINUOUS DIGITAL LIGHT PROCESSING ADDITIVE MANUFACTURING OF IMPLANTS
- Publication number 20250100225
- Publication date Mar 27, 2025
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Photoresist and Method
- Publication number 20250102916
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250092514
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Masanobu IGETA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250093774
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...
- Publication number 20250093788
- Publication date Mar 20, 2025
- Canon Kabushiki Kaisha
- YUICHIRO MORIKUNI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK
- Publication number 20250093764
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20250093773
- Publication date Mar 20, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SMOOTHER TONAL RESPONSE IN FLEXOGRAPHIC PRINTING
- Publication number 20250091375
- Publication date Mar 20, 2025
- ESKO Software BV
- Peter Morisse
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20250093775
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Po YANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...
- Publication number 20250085627
- Publication date Mar 13, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND ME...
- Publication number 20250085637
- Publication date Mar 13, 2025
- SK HYNIX INC.
- Jong Hoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV NANOIMPRINTED LITHOGRAPHIC DEVICES MADE FROM POLYCYCLOOLEFINIC P...
- Publication number 20250085632
- Publication date Mar 13, 2025
- PROMERUS, LLC
- LARRY F. RHODES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOFLUIDIC CELL FOR CHARACTERIZATION OF NANO-BUBBLES IN A SIMULATE...
- Publication number 20250087443
- Publication date Mar 13, 2025
- Saudi Arabian Oil Company
- Dong Kyu Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR EXPOSURE OF RELIEF PRECURSORS
- Publication number 20250076766
- Publication date Mar 6, 2025
- XSYS PREPRESS NV
- Dirk Ludo Julien DE RAUW
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOREIGN SUBSTANCE INSPECTION METHOD, FOREIGN SUBSTANCE INSPECTION A...
- Publication number 20250076213
- Publication date Mar 6, 2025
- Canon Kabushiki Kaisha
- TOSHIKI ITO
- G01 - MEASURING TESTING
Information Patent Application
ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL
- Publication number 20250076753
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shih-Hao Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING
- Publication number 20250076767
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND M...
- Publication number 20250076768
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Zhongchuan Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING ME...
- Publication number 20250076769
- Publication date Mar 6, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki AKIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...
- Publication number 20250074930
- Publication date Mar 6, 2025
- INPRIA CORPORATION
- Alexander C. Marwitz
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF FABRICATING AND SERVICING A PHOTOMASK
- Publication number 20250068060
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fu YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20250068067
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOHARDENABLE COMPOSITIONS AND METHODS OF FORMING AN OBJECT
- Publication number 20250068071
- Publication date Feb 27, 2025
- QUADRATIC 3D, INC.
- SAMUEL N. SANDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLEC...
- Publication number 20250068077
- Publication date Feb 27, 2025
- Brewer Science, Inc.
- Daniel Patrick Sweat
- C07 - ORGANIC CHEMISTRY
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS HAVING AN OPTICAL SYSTEM, AND...
- Publication number 20250068078
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Mohammad Awad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKLESS PHOTOLITHOGRAPHY PROCESS FOR THE SYNTHESIS OF METALLIC NAN...
- Publication number 20250068086
- Publication date Feb 27, 2025
- QATAR FOUNDATION FOR EDUCATION, SCIENCE AND COMMUNITY DEVELOPMENT
- Hicham Hamoudi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Exposure Apparatus therefor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photosensitive, inorganic ligand-capped inorganic nanocrystals

Radiation-sensitive resin composition, method of forming resist pat...

Transparent electrode, process for producing transparent electrode,...

Template, method for fabricating template, and method for fabricati...

Structured nanoporous materials, manufacture of structured nanoporo...

Manufacturing method of flexographic printing plate and printing me...

Positive resist composition and pattern forming process

Apparatus and method for optically processing an object

Electron beam lithography with a bilayer resist

Resist material and pattern forming method

Photocurable composition including a reactive polymer

Selective deposition of carbon on photoresist layer for lithography...

Bubble defect reduction

Methods for increasing the density of high-index nanoimprint lithog...

Resist underlayer film-forming composition containing indolocarbazo...

Method and system for determining a charged particle beam exposure...

Photoacid generator for chemically amplified photoresists

Resist underlayer film-forming composition comprising epoxy adduct...

Semiconductor photoresist composition, method for preparing thereof...

Substrate support, lithographic apparatus, method for manipulating...

Onium salt, chemically amplified resist composition and patterning...

Photosensitive resin composition, method for producing the same, re...

Method of manufacturing a semiconductor device and apparatus for ma...

Line narrowing device and electronic device manufacturing method

Organometallic solution based high resolution patterning compositions

Photoresist topcoat compositions and methods of processing photores...

Micropatterning method, micropatterning apparatus and micropatterni...

Pattern formation methods

Metal plate for producing vapor deposition masks, production method...

Solution, solution storage body, actinic ray-sensitive or radiation...

Patents Applicationslast 30 patents

LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

CONTINUOUS DIGITAL LIGHT PROCESSING ADDITIVE MANUFACTURING OF IMPLANTS

Photoresist and Method

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS

SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...

EXTREME ULTRAVIOLET MASK

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

METHOD FOR SMOOTHER TONAL RESPONSE IN FLEXOGRAPHIC PRINTING

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS

EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND ME...

UV NANOIMPRINTED LITHOGRAPHIC DEVICES MADE FROM POLYCYCLOOLEFINIC P...

NANOFLUIDIC CELL FOR CHARACTERIZATION OF NANO-BUBBLES IN A SIMULATE...

APPARATUS AND METHOD FOR EXPOSURE OF RELIEF PRECURSORS

FOREIGN SUBSTANCE INSPECTION METHOD, FOREIGN SUBSTANCE INSPECTION A...

ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL

SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING

DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND M...

MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE AND PRINTING ME...

ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...

METHOD OF FABRICATING AND SERVICING A PHOTOMASK

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

PHOTOHARDENABLE COMPOSITIONS AND METHODS OF FORMING AN OBJECT

CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLEC...

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS HAVING AN OPTICAL SYSTEM, AND...

MASKLESS PHOTOLITHOGRAPHY PROCESS FOR THE SYNTHESIS OF METALLIC NAN...