Exposure Apparatus therefor

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/20Exposure Apparatus therefor

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing integrated circuit
- Patent number 12,271,107
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsu-Ting Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,271,113
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing an etch resist pattern on a metallic surface
- Patent number 12,270,111
- Issue date Apr 8, 2025
- Kateeva, Inc.
- Nava Shpaisman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,265,332
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoactive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,265,328
- Issue date Apr 1, 2025
- The University of Chicago
- Dmitri V. Talapin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent electrode, process for producing transparent electrode,...
- Patent number 12,262,571
- Issue date Mar 25, 2025
- Kabushiki Kaisha Toshiba
- Naomi Shida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Structured nanoporous materials, manufacture of structured nanoporo...
- Patent number 12,259,650
- Issue date Mar 25, 2025
- Kyoto University
- Easan Sivaniah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of flexographic printing plate and printing me...
- Patent number 12,259,655
- Issue date Mar 25, 2025
- Asahi Kasei Kabushiki Kaisha
- Hiroki Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Template, method for fabricating template, and method for fabricati...
- Patent number 12,259,663
- Issue date Mar 25, 2025
- Kioxia Corporation
- Toshiaki Komukai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for optically processing an object
- Patent number 12,253,803
- Issue date Mar 18, 2025
- Karlsruher Institut für Technologie
- Matthias Lauermann
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Electron beam lithography with a bilayer resist
- Patent number 12,248,248
- Issue date Mar 11, 2025
- The Boeing Company
- Antonio Mei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and pattern forming method
- Patent number 12,248,249
- Issue date Mar 11, 2025
- Oji Holdings Corporation
- Kimiko Hattori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable composition including a reactive polymer
- Patent number 12,247,133
- Issue date Mar 11, 2025
- Canon Kabushiki Kaisha
- Fen Wan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,249,509
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Larry Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bubble defect reduction
- Patent number 12,248,252
- Issue date Mar 11, 2025
- Lam Research Corporation
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for increasing the density of high-index nanoimprint lithog...
- Patent number 12,242,186
- Issue date Mar 4, 2025
- Applied Materials, Inc.
- Andrew Ceballos
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 12,242,196
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoacid generator for chemically amplified photoresists
- Patent number 12,242,190
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor photoresist composition, method for preparing thereof...
- Patent number 12,242,189
- Issue date Mar 4, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substrate support, lithographic apparatus, method for manipulating...
- Patent number 12,242,204
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Ruud Antonius Catharina Maria Beerens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition, method for producing the same, re...
- Patent number 12,242,192
- Issue date Mar 4, 2025
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 12,235,589
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line narrowing device and electronic device manufacturing method
- Patent number 12,237,640
- Issue date Feb 25, 2025
- Gigaphoton Inc.
- Koichi Fujii
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
- Publication number 20250116927
- Publication date Apr 10, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116929
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAK...
- Publication number 20250114981
- Publication date Apr 10, 2025
- Panther Life Sciences Corporation
- Ashutosh Shastry
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116924
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116925
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116926
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250116923
- Publication date Apr 10, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20250115691
- Publication date Apr 10, 2025
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...
- Publication number 20250116934
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS
- Publication number 20250116938
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...
- Publication number 20250110405
- Publication date Apr 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL...
- Publication number 20250110409
- Publication date Apr 3, 2025
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO...
- Publication number 20250110401
- Publication date Apr 3, 2025
- The Board of Trustees of the Leland Stanford Junior University
- Jia LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
- Publication number 20250110408
- Publication date Apr 3, 2025
- Intel Corporation
- Robert JORDAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HERRINGBONE MICROSTRUCTURE SURFACE PATTERN FOR FLEXOGRAPHIC PRINTIN...
- Publication number 20250110410
- Publication date Apr 3, 2025
- ESKO SOFTWARE BV
- Wolfgang Sievers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING A CONTROL DEVICE, CONTROL DEVICE, OPTICAL SYST...
- Publication number 20250110327
- Publication date Apr 3, 2025
- Carl Zeiss SMT GMBH
- Cornelius Richt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS
- Publication number 20250102927
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hua FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102912
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20250102925
- Publication date Mar 27, 2025
- Canon Kabushiki Kaisha
- SHIORI OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist and Method
- Publication number 20250102916
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS DIGITAL LIGHT PROCESSING ADDITIVE MANUFACTURING OF IMPLANTS
- Publication number 20250100225
- Publication date Mar 27, 2025
- H. David DEAN
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250092514
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Masanobu IGETA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250093774
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...
- Publication number 20250093788
- Publication date Mar 20, 2025
- Canon Kabushiki Kaisha
- YUICHIRO MORIKUNI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK
- Publication number 20250093764
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20250093773
- Publication date Mar 20, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SMOOTHER TONAL RESPONSE IN FLEXOGRAPHIC PRINTING
- Publication number 20250091375
- Publication date Mar 20, 2025
- ESKO Software BV
- Peter Morisse
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20250093775
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Po YANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...
- Publication number 20250085627
- Publication date Mar 13, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS

Exposure Apparatus therefor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing integrated circuit

Method of manufacturing a semiconductor device

Methods for producing an etch resist pattern on a metallic surface

Radiation-sensitive resin composition and method for forming resist...

Method of manufacturing a semiconductor device

Photoactive, inorganic ligand-capped inorganic nanocrystals

Photosensitive, inorganic ligand-capped inorganic nanocrystals

Radiation-sensitive resin composition, method of forming resist pat...

Transparent electrode, process for producing transparent electrode,...

Structured nanoporous materials, manufacture of structured nanoporo...

Manufacturing method of flexographic printing plate and printing me...

Template, method for fabricating template, and method for fabricati...

Positive resist composition and pattern forming process

Apparatus and method for optically processing an object

Electron beam lithography with a bilayer resist

Resist material and pattern forming method

Photocurable composition including a reactive polymer

Selective deposition of carbon on photoresist layer for lithography...

Bubble defect reduction

Methods for increasing the density of high-index nanoimprint lithog...

Resist underlayer film-forming composition containing indolocarbazo...

Method and system for determining a charged particle beam exposure...

Photoacid generator for chemically amplified photoresists

Resist underlayer film-forming composition comprising epoxy adduct...

Semiconductor photoresist composition, method for preparing thereof...

Substrate support, lithographic apparatus, method for manipulating...

Onium salt, chemically amplified resist composition and patterning...

Photosensitive resin composition, method for producing the same, re...

Method of manufacturing a semiconductor device and apparatus for ma...

Line narrowing device and electronic device manufacturing method

Patents Applicationslast 30 patents

PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAK...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

METHOD OF FORMING PATTERNS

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...

LITHOGRAPHY SYSTEM WITH NON-INVASIVE MONITORING AND METHODS

MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...

SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL...

LITHOGRAPHICALLY PATTERNED ELECTRICALLY CONDUCTIVE HYDROGELS, PHOTO...

SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY

HERRINGBONE MICROSTRUCTURE SURFACE PATTERN FOR FLEXOGRAPHIC PRINTIN...

METHOD FOR OPERATING A CONTROL DEVICE, CONTROL DEVICE, OPTICAL SYST...

LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

Photoresist and Method

CONTINUOUS DIGITAL LIGHT PROCESSING ADDITIVE MANUFACTURING OF IMPLANTS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS

SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARA...

EXTREME ULTRAVIOLET MASK

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

METHOD FOR SMOOTHER TONAL RESPONSE IN FLEXOGRAPHIC PRINTING

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS