Exposure Apparatus therefor

Industry

CPC
G03F7/20

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/20Exposure Apparatus therefor

Industries

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for producing ultrapure water for semiconductor...
- Patent number 12,221,371
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Continuous digital light processing additive manufacturing of implants
- Patent number 12,220,870
- Issue date Feb 11, 2025
- H. David Dean
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Electron beam resist composition
- Patent number RE50296
- Issue date Feb 11, 2025
- The University of Manchester
- Scott Lewis
Information Patent Grant
Polypeptide, photoresist composition including the same, and method...
- Patent number 12,222,646
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- Jinha Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film forming composition having a disulfide struc...
- Patent number 12,222,651
- Issue date Feb 11, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator
- Patent number 12,216,402
- Issue date Feb 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor marks and forming methods thereof
- Patent number 12,218,073
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shengan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,216,404
- Issue date Feb 4, 2025
- FUJIFILM Corporation
- Masafumi Kojima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 12,216,401
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 12,210,283
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive composition
- Patent number 12,210,284
- Issue date Jan 28, 2025
- XSYS Germany GmbH
- Thomas Paulöhrl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,207,498
- Issue date Jan 21, 2025
- DUK SAN NEOLUX CO., LTD.
- Hyunsang Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Printing plate imaging and exposure apparatus and method
- Patent number 12,202,246
- Issue date Jan 21, 2025
- Esko-Graphics Imaging GmbH
- Wolfgang Sievers
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Lithography film stack and lithography method
- Patent number 12,204,247
- Issue date Jan 21, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- Ching-Shu Lo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist and method
- Patent number 12,197,128
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning device and method of use thereof
- Patent number 12,197,120
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marie-Claire Van Lare
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically sensitive sensor comprising micro-barrier and method of...
- Patent number 12,196,699
- Issue date Jan 14, 2025
- Technion Research & Development Foundation Limited
- Hossam Haick
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming semiconductor device
- Patent number 12,189,284
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Droplet recipe creation method, pattern formation method, and manuf...
- Patent number 12,189,285
- Issue date Jan 7, 2025
- Kioxia Corporation
- Ryo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production method for resist composition purified product, resist p...
- Patent number 12,186,715
- Issue date Jan 7, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Akihiko Nakata
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 12,189,292
- Issue date Jan 7, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an optical system and optical system
- Patent number 12,189,301
- Issue date Jan 7, 2025
- Karlsruhe Institute of Technology
- Philipp-Immanuel Dietrich
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,181,791
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching and thinning for the fabrication of lithographically patter...
- Patent number 12,184,259
- Issue date Dec 31, 2024
- University of Oregon
- Ignas Lekavicius
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...
- Publication number 20250053095
- Publication date Feb 13, 2025
- EULITHA A.G.
- FRANCIS CLUBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS
- Publication number 20250053084
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Eric Calvin Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS
- Publication number 20250053086
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- MADHUR SACHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...
- Publication number 20250053088
- Publication date Feb 13, 2025
- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SYSTEMS AND METHODS FOR MANUFACTURING ELECTRONIC DEVICES
- Publication number 20250044684
- Publication date Feb 6, 2025
- FABRIC8LABS, INC.
- Edward White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250044685
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Changsoo WOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV DOSE REDUCING LAYERS, RELATED STRUCTURES, AND METHODS AND SYSTE...
- Publication number 20250046609
- Publication date Feb 6, 2025
- ASM IP HOLDING B.V.
- Fatemeh Davodi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL PLATE FOR PRODUCING VAPOR DEPOSITION MASKS, PRODUCTION METHOD...
- Publication number 20250043399
- Publication date Feb 6, 2025
- DAI NIPPON PRINTING CO., LTD.
- Hiroki OKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ATOMIC LAYER ETCH OF Si-BASED MATERIALS
- Publication number 20250046614
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Mehrdad Rostami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...
- Publication number 20250043046
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Minsang KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...
- Publication number 20250044704
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Yuichi ASAHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS
- Publication number 20250044712
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Thomas IRTENKAUF
- G02 - OPTICS
Information Patent Application
IMAGE PROCESSING APPARATUS, IMAGE CAPTURING APPARATUS, CONTROL METH...
- Publication number 20250039554
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- Hiroaki Nashizawa
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
DIGITAL EXPOSURE SYSTEM
- Publication number 20250028247
- Publication date Jan 23, 2025
- Korea Institute of Machinery and Materials
- Won Seok CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...
- Publication number 20250028251
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250028257
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE
- Publication number 20250021009
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Ferry ZIJP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR REDUCING EXTREME ULTRAVIOLET (EUV) VESSEL TIN...
- Publication number 20250021005
- Publication date Jan 16, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Wei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer Bow Mitigation
- Publication number 20250021006
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Andrew Whittaker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD
- Publication number 20250021027
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Keisaku KAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250013152
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PREVENTING PATTERN COLLAPSE
- Publication number 20250013153
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Lior HULI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROFLUIDIC POROUS MEMBRANE ELECTRICAL CELL-SUBSTRATE IMPEDANCE SE...
- Publication number 20250013155
- Publication date Jan 9, 2025
- The Governing Council of the University of Toronto
- Oleg CHEBOTAREV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATIO...
- Publication number 20250011346
- Publication date Jan 9, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT-CURED ANTI-SLIP STRUCTURE OF SHOE SOLE MANUFACTURING METHOD
- Publication number 20250004379
- Publication date Jan 2, 2025
- FENG TAY ENTERPRISES CO., LTD.
- CHIEN-HSIN CHOU
- A43 - FOOTWEAR
Information Patent Application
A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...
- Publication number 20250004368
- Publication date Jan 2, 2025
- XSYS Germany GmbH
- Patrick-Kurt Dannecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...
- Publication number 20250004370
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Beomseok KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20250004365
- Publication date Jan 2, 2025
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Exposure Apparatus therefor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for producing ultrapure water for semiconductor...

Continuous digital light processing additive manufacturing of implants

Electron beam resist composition

Polypeptide, photoresist composition including the same, and method...

Resist underlayer film forming composition having a disulfide struc...

Method of manufacturing a semiconductor device and pattern formatio...

Positive resist composition and pattern forming process

Photoacid generator

Semiconductor marks and forming methods thereof

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Sulfonium salt, chemically amplified resist composition, and patter...

EUV photoresist with low-activation-energy ligands or high-develope...

Photosensitive composition

Method for preparing pixel define layer

Printing plate imaging and exposure apparatus and method

Lithography film stack and lithography method

Charged particle beam writing apparatus, charged particle beam writ...

Photoresist and method

Patterning device and method of use thereof

Chemically sensitive sensor comprising micro-barrier and method of...

Positive photosensitive resin composition, positive photosensitive...

Method for forming semiconductor device

Droplet recipe creation method, pattern formation method, and manuf...

Production method for resist composition purified product, resist p...

Organometallic solution based high resolution patterning compositions

Negative resist composition and pattern forming process

Method for producing an optical system and optical system

Photoresist composition and method of forming photoresist pattern

Extreme ultraviolet mask and method of manufacturing the same

Etching and thinning for the fabrication of lithographically patter...

Patents Applicationslast 30 patents

A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...

DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS

POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...

SYSTEMS AND METHODS FOR MANUFACTURING ELECTRONIC DEVICES

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

EUV DOSE REDUCING LAYERS, RELATED STRUCTURES, AND METHODS AND SYSTE...

METAL PLATE FOR PRODUCING VAPOR DEPOSITION MASKS, PRODUCTION METHOD...

SELECTIVE ATOMIC LAYER ETCH OF Si-BASED MATERIALS

POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...

SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...

OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS

IMAGE PROCESSING APPARATUS, IMAGE CAPTURING APPARATUS, CONTROL METH...

DIGITAL EXPOSURE SYSTEM

LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...

SEMICONDUCTOR PROCESS APPARATUS

AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE

SYSTEM AND METHOD FOR REDUCING EXTREME ULTRAVIOLET (EUV) VESSEL TIN...

Wafer Bow Mitigation

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

METHOD OF PREVENTING PATTERN COLLAPSE

MICROFLUIDIC POROUS MEMBRANE ELECTRICAL CELL-SUBSTRATE IMPEDANCE SE...

ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATIO...

LIGHT-CURED ANTI-SLIP STRUCTURE OF SHOE SOLE MANUFACTURING METHOD

A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...

POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...

RADIATION BASED PATTERNING METHODS