Exposure with radiation other than visible light or UV light

Industry

CPC
G03F7/2047

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2047Exposure with radiation other than visible light or UV light

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,747,730
- Issue date Sep 5, 2023
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask structure and manufacturing method thereof
- Patent number 11,366,381
- Issue date Jun 21, 2022
- Unimicron Technology Corp.
- Pu-Ju Lin
- G01 - MEASURING TESTING
Information Patent Grant
Resist composition, and method of forming resist pattern
- Patent number 11,256,169
- Issue date Feb 22, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for applying curable gellant composition for digital embossi...
- Patent number 11,143,958
- Issue date Oct 12, 2021
- Xerox Corporation
- Jennifer L. Belelie
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical liquid, chemical liquid storage body, and pattern forming...
- Patent number 11,079,677
- Issue date Aug 3, 2021
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making microstructures and photolithography mask plate
- Patent number 10,942,452
- Issue date Mar 9, 2021
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing pattern and article manufacturing method
- Patent number 10,754,257
- Issue date Aug 25, 2020
- Canon Kabushiki Kaisha
- Noburu Takakura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography mask plate
- Patent number 10,564,539
- Issue date Feb 18, 2020
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron flood lithography
- Patent number 10,529,537
- Issue date Jan 7, 2020
- Facebook Technologies, LLC
- Christopher Percival
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition for extreme ultraviolet and method of formi...
- Patent number 10,353,290
- Issue date Jul 16, 2019
- Samsung Electronics Co., Ltd.
- Cheol Hong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of circuit substrate and mask structure and ma...
- Patent number 10,324,370
- Issue date Jun 18, 2019
- Unimicron Technology Corp.
- Pu-Ju Lin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for making a micro- or nano-scale patterned layer of materia...
- Patent number 10,248,024
- Issue date Apr 2, 2019
- UNIV PARIS XIII PARIS-NORD VILLETANEUSE
- Alexis Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for controlled ultraviolet light exposure
- Patent number 9,971,249
- Issue date May 15, 2018
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet/soft X-ray laser nano-scale patterning using th...
- Patent number 9,007,562
- Issue date Apr 14, 2015
- Colorado State University Research Foundation
- Mario C. Marconi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for manufacturing a surface using character projection litho...
- Patent number 8,852,831
- Issue date Oct 7, 2014
- D2S, Inc.
- Akira Fujimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and system for manufacturing a surface using character proje...
- Patent number 8,404,404
- Issue date Mar 26, 2013
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device fabrication method and fabrication apparatus u...
- Patent number 7,977,653
- Issue date Jul 12, 2011
- Kabushiki Kaisha Toshiba
- Takeshi Shibata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Defining a pattern on a substrate
- Patent number 7,847,926
- Issue date Dec 7, 2010
- International Business Machines Corporation
- Gerhard Meyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thin film pattern forming device and method
- Patent number 7,834,332
- Issue date Nov 16, 2010
- Top Engineering Co., Ltd.
- Chang-Bok Lee
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor device fabrication method and fabrication apparatus u...
- Patent number 7,501,214
- Issue date Mar 10, 2009
- Kabushiki Kaisha Toshiba
- Takeshi Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus, exposure method and semiconductor device produc...
- Patent number 7,326,940
- Issue date Feb 5, 2008
- Sony Corporation
- Shigeru Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defining a pattern on a substrate
- Patent number 7,315,367
- Issue date Jan 1, 2008
- International Business Machines Corporation
- Gerhard Meyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for creating charged-particle-beam exposure data, method for...
- Patent number 7,076,761
- Issue date Jul 11, 2006
- Kabushiki Kaisha Toshiba
- Ryouichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam proximity exposure apparatus
- Patent number 6,703,623
- Issue date Mar 9, 2004
- Leepl Corporation
- Nobuo Shimazu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure mask and pattern designing method thereof
- Patent number 6,447,960
- Issue date Sep 10, 2002
- NEC Corporation
- Hiroshi Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of mask for electron beam proximity exposure a...
- Patent number 6,444,374
- Issue date Sep 3, 2002
- LEEPL Corporatin
- Nobuo Shimazu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography method forming nanocrystal shadowmasks an...
- Patent number 6,440,637
- Issue date Aug 27, 2002
- The Aerospace Corporation
- Sung H. Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged-particle-beam projection-exposure methods and apparatus tha...
- Patent number 6,433,347
- Issue date Aug 13, 2002
- Nikon Corporation
- Kazuaki Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for defining a pattern on a substrate
- Patent number 6,313,905
- Issue date Nov 6, 2001
- International Business Machines Corporation
- Juergen P. Brugger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of imaging a mask pattern on a substrate by means of EUV rad...
- Patent number 6,280,906
- Issue date Aug 28, 2001
- U.S. Philips Corporation
- Josephus J. M. Braat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MATERIALS AND METHODS FOR DRY RESIST TECHNOLOGY
- Publication number 20240369933
- Publication date Nov 7, 2024
- David Howard Fairbrother
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHYSICALLY DETECTABLE ID INTRODUCED BY LITHOGRAPHY SRAF INSERTION F...
- Publication number 20240201583
- Publication date Jun 20, 2024
- International Business Machines Corporation
- Cheng Chi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PRINTING PLATE EXPOSURE METHOD AND APPARATUS WITH REDUCED THERMAL P...
- Publication number 20240118624
- Publication date Apr 11, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Jörg Wolterink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20240004300
- Publication date Jan 4, 2024
- NANYA TECHNOLOGY CORPORATION
- CHIH-YING TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME
- Publication number 20230408903
- Publication date Dec 21, 2023
- SK enpulse Co., Ltd.
- Seong Yoon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION
- Publication number 20230084088
- Publication date Mar 16, 2023
- DUKE UNIVERSITY
- Xin Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE
- Publication number 20210157239
- Publication date May 27, 2021
- TSINGHUA UNIVERSITY
- MO CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION AND PATTERN FORMAT...
- Publication number 20210018841
- Publication date Jan 21, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR MAKING MICROSTRUCTURES AND PHOTOLITHOGRAPHY MASK PLATE
- Publication number 20200150525
- Publication date May 14, 2020
- TSINGHUA UNIVERSITY
- MO CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190361346
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL LIQUID, CHEMICAL LIQUID STORAGE BODY, AND PATTERN FORMING...
- Publication number 20190346764
- Publication date Nov 14, 2019
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Applying Curable Gellant Composition For Digital Embossi...
- Publication number 20190310550
- Publication date Oct 10, 2019
- Xerox Corporation.
- Jennifer L. Belelie
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MASK STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20190250502
- Publication date Aug 15, 2019
- Unimicron Technology Corp.
- Pu-Ju Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DEVICE FOR MANUFACTURING A SURFACE USING CHARACTER PROJECTION LITHO...
- Publication number 20140146298
- Publication date May 29, 2014
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXTREME ULTRAVIOLET/SOFT X-RAY LASER NANO-SCALE PATTERNING USING TH...
- Publication number 20140023973
- Publication date Jan 23, 2014
- Mario C. Marconi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARACTER PROJE...
- Publication number 20110045409
- Publication date Feb 24, 2011
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor device fabrication method and fabrication apparatus u...
- Publication number 20090158236
- Publication date Jun 18, 2009
- Kabushiki Kiasha Toshiba
- Takeshi Shibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEFINING A PATTERN ON A SUBSTRATE
- Publication number 20080074656
- Publication date Mar 27, 2008
- Gerhard Meyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thin film pattern forming device and method
- Publication number 20070148560
- Publication date Jun 28, 2007
- Top Engineering Co., Ltd.
- Chang-Bok Lee
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Electron beam exposure method and system therefor
- Publication number 20060124866
- Publication date Jun 15, 2006
- Tokushige Hisatsugu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Defining a pattern on a substrate
- Publication number 20050280792
- Publication date Dec 22, 2005
- International Business Machines Corporation
- Gerhard Meyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device fabrication method and fabrication apparatus u...
- Publication number 20050170268
- Publication date Aug 4, 2005
- Takeshi Shibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method and semiconductor device produc...
- Publication number 20050133734
- Publication date Jun 23, 2005
- Sony Corporation
- Shigeru Moriya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for creating charged-particle-beam exposure data, method for...
- Publication number 20040117757
- Publication date Jun 17, 2004
- Ryouichi Inanami
- B82 - NANO-TECHNOLOGY
Information Patent Application
Manufacturing method of mask for electron beam proximity exposure a...
- Publication number 20020071994
- Publication date Jun 13, 2002
- Nobuo Shimazu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Microelectronic-device fabrication method
- Publication number 20020016015
- Publication date Feb 7, 2002
- Tomoharu Fujiwara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure mask and pattern designing method thereof
- Publication number 20010028984
- Publication date Oct 11, 2001
- NEC Corporation
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS

Exposure with radiation other than visible light or UV light

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for making photolithography mask plate

Mask structure and manufacturing method thereof

Resist composition, and method of forming resist pattern

Method for applying curable gellant composition for digital embossi...

Chemical liquid, chemical liquid storage body, and pattern forming...

Method for making microstructures and photolithography mask plate

Method of manufacturing pattern and article manufacturing method

Photolithography mask plate

Electron flood lithography

Photoresist composition for extreme ultraviolet and method of formi...

Manufacturing method of circuit substrate and mask structure and ma...

Method for making a micro- or nano-scale patterned layer of materia...

Method and system for controlled ultraviolet light exposure

Extreme ultraviolet/soft X-ray laser nano-scale patterning using th...

Device for manufacturing a surface using character projection litho...

Method and system for manufacturing a surface using character proje...

Semiconductor device fabrication method and fabrication apparatus u...

Defining a pattern on a substrate

Thin film pattern forming device and method

Semiconductor device fabrication method and fabrication apparatus u...

Exposure apparatus, exposure method and semiconductor device produc...

Defining a pattern on a substrate

Method for creating charged-particle-beam exposure data, method for...

Electron beam proximity exposure apparatus

Electron beam exposure mask and pattern designing method thereof

Manufacturing method of mask for electron beam proximity exposure a...

Electron beam lithography method forming nanocrystal shadowmasks an...

Charged-particle-beam projection-exposure methods and apparatus tha...

Apparatus and method for defining a pattern on a substrate

Method of imaging a mask pattern on a substrate by means of EUV rad...

Patents Applicationslast 30 patents

MATERIALS AND METHODS FOR DRY RESIST TECHNOLOGY

PHYSICALLY DETECTABLE ID INTRODUCED BY LITHOGRAPHY SRAF INSERTION F...

PRINTING PLATE EXPOSURE METHOD AND APPARATUS WITH REDUCED THERMAL P...

METHOD OF PROCESSING A SUBSTRATE

SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME

METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION

METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION AND PATTERN FORMAT...

METHOD FOR MAKING MICROSTRUCTURES AND PHOTOLITHOGRAPHY MASK PLATE

RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN

CHEMICAL LIQUID, CHEMICAL LIQUID STORAGE BODY, AND PATTERN FORMING...

Method For Applying Curable Gellant Composition For Digital Embossi...

MASK STRUCTURE AND MANUFACTURING METHOD THEREOF

DEVICE FOR MANUFACTURING A SURFACE USING CHARACTER PROJECTION LITHO...

EXTREME ULTRAVIOLET/SOFT X-RAY LASER NANO-SCALE PATTERNING USING TH...

METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARACTER PROJE...

Semiconductor device fabrication method and fabrication apparatus u...

DEFINING A PATTERN ON A SUBSTRATE

Thin film pattern forming device and method

Electron beam exposure method and system therefor

Defining a pattern on a substrate

Semiconductor device fabrication method and fabrication apparatus u...

Exposure apparatus, exposure method and semiconductor device produc...

Method for creating charged-particle-beam exposure data, method for...

Manufacturing method of mask for electron beam proximity exposure a...

Microelectronic-device fabrication method

Electron beam exposure mask and pattern designing method thereof