Extraction optics

Industry

CPC
H01J27/024

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J27/00Ion beam tubes

Current Industry

H01J27/024Extraction optics

Industries

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam source, surface processing apparatus and surf...
- Patent number 12,125,664
- Issue date Oct 22, 2024
- Oxford Instruments Nanotechnology Tools Limited
- David Pearson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Ion generation device, ion generation method, and ion generation pr...
- Patent number 12,002,646
- Issue date Jun 4, 2024
- Kabushiki Kaisha Toshiba
- Takeshi Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, devices, and methods for contaminant resistant insulative...
- Patent number 11,894,212
- Issue date Feb 6, 2024
- TAE TECHNOLOGIES, INC.
- Christopher J. Killer
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Inner source assembly and associated components
- Patent number 11,848,186
- Issue date Dec 19, 2023
- Micromass UK Limited
- Alastair Booth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable thickness ion source extraction plate
- Patent number 11,810,746
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with multiple bias electrodes
- Patent number 11,545,330
- Issue date Jan 3, 2023
- Axcelis Technologies, Inc.
- Wilhelm Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid assembly and ion beam etching apparatus
- Patent number 11,508,545
- Issue date Nov 22, 2022
- CANON ANELVA CORPORATION
- Masashi Tsujiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 11,355,314
- Issue date Jun 7, 2022
- Canon Anelva Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, devices, and methods for contaminant resistant insulative...
- Patent number 11,355,303
- Issue date Jun 7, 2022
- TAE TECHNOLOGIES, INC.
- Christopher J. Killer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for continuously supplying negative ions using...
- Patent number 11,337,296
- Issue date May 17, 2022
- Korea Atomic Energy Research Institute
- Sungryul Huh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and system including extraction optics having movable blo...
- Patent number 11,270,864
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extraction apparatus and system for high throughput ion beam proces...
- Patent number 11,127,556
- Issue date Sep 21, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source
- Patent number 11,017,974
- Issue date May 25, 2021
- Nissin Ion Equipment Co., Ltd.
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field ionization source, ion beam apparatus, and beam irradiation m...
- Patent number 10,971,329
- Issue date Apr 6, 2021
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High reliability, long lifetime, negative ion source
- Patent number 10,950,409
- Issue date Mar 16, 2021
- PHOENIX LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with biased extraction plate
- Patent number 10,923,306
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 10,879,040
- Issue date Dec 29, 2020
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Ion source with tailored extraction shape
- Patent number 10,714,296
- Issue date Jul 14, 2020
- Axcelis Technologies, Inc.
- Patrick T. Heres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source
- Patent number 10,600,608
- Issue date Mar 24, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Masakazu Adachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 10,490,389
- Issue date Nov 26, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing actively cooled accelerator grid with full...
- Patent number 10,480,863
- Issue date Nov 19, 2019
- Institute for Plasma Research
- Jaydeep Joshi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
MEMS device for generating an ion beam
- Patent number 10,395,907
- Issue date Aug 27, 2019
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Thomas Alava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High reliability, long lifetime, negative ion source
- Patent number 10,297,412
- Issue date May 21, 2019
- PHOENIX LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High brightness ion beam extraction using bias electrodes and magne...
- Patent number 10,290,462
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ribbon ion beams from pulsed plasmas
- Patent number 10,290,470
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blind-vented electrode
- Patent number 10,256,003
- Issue date Apr 9, 2019
- Plansee Japan Ltd.
- Noboru Shirozu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 10,224,179
- Issue date Mar 5, 2019
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Linear anode layer slit ion source
- Patent number 10,134,557
- Issue date Nov 20, 2018
- General Plasma, Inc.
- John E. Madocks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 9,978,554
- Issue date May 22, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EXTRACTION GRID
- Publication number 20240021399
- Publication date Jan 18, 2024
- BÜHLER ALZENAU GMBH
- Holger REUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID METAL ION SOURCE
- Publication number 20230369003
- Publication date Nov 16, 2023
- ENPULSION GmbH
- Ivanhoe VASILJEVICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM EXTRACTION APPARATUS AND METHOD FOR CREATING AN ION BEAM
- Publication number 20230230793
- Publication date Jul 20, 2023
- Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.
- Christian HOPF
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Variable Thickness Ion Source Extraction Plate
- Publication number 20230080083
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH MULTIPLE BIAS ELECTRODES
- Publication number 20220367138
- Publication date Nov 17, 2022
- Axcelis Technologies, Inc.
- Wilhelm Platow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20220262598
- Publication date Aug 18, 2022
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURF...
- Publication number 20220216027
- Publication date Jul 7, 2022
- Oxford Instruments Nanotechnology Tools Limited
- David PEARSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATION DEVICE, ION GENERATION METHOD, AND ION GENERATION PR...
- Publication number 20210383996
- Publication date Dec 9, 2021
- Kabushiki Kaisha Toshiba
- Takeshi TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND SYSTEM INCLUDING EXTRACTION OPTICS HAVING MOVABLE BLO...
- Publication number 20210305001
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INNER SOURCE ASSEMBLY AND ASSOCIATED COMPONENTS
- Publication number 20210265154
- Publication date Aug 26, 2021
- Micromass UK Limited
- Alastair BOOTH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20210104377
- Publication date Apr 8, 2021
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source With Biased Extraction Plate
- Publication number 20200294750
- Publication date Sep 17, 2020
- Applied Materials, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CONTINUOUSLY SUPPLYING NEGATIVE IONS USING...
- Publication number 20200288561
- Publication date Sep 10, 2020
- Korea Atomic Energy Research Institute
- Sungryul HUH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH TAILORED EXTRACTION APERTURE SHAPE
- Publication number 20200194219
- Publication date Jun 18, 2020
- Axcelis Technologies Inc.
- Patrick T. Heres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURF...
- Publication number 20200176214
- Publication date Jun 4, 2020
- Oxford Instruments Nanotechnology Tools Limited
- David PEARSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE
- Publication number 20190279835
- Publication date Sep 12, 2019
- PHOENIX LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20190108973
- Publication date Apr 11, 2019
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
FIELD IONIZATION SOURCE, ION BEAM APPARATUS, AND BEAM IRRADIATION M...
- Publication number 20190051491
- Publication date Feb 14, 2019
- Hitachi High-Technologies Corporation
- Shinichi MATSUBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20180350559
- Publication date Dec 6, 2018
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FOCUSING IN AN ION PUMP USING INTERNAL FERROUS MATERIALS
- Publication number 20180306175
- Publication date Oct 25, 2018
- Edwards Vacuum LLC
- Anthony Wynohrad
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
Dual Cathode Ion Source
- Publication number 20180211808
- Publication date Jul 26, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Brightness Ion Beam Extraction
- Publication number 20180166250
- Publication date Jun 14, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE
- Publication number 20180122615
- Publication date May 3, 2018
- Phoenix Nuclear Labs LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Negative Ribbon Ion Beams from Pulsed Plasmas
- Publication number 20170309454
- Publication date Oct 26, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ceramic Ion Source Chamber
- Publication number 20170309434
- Publication date Oct 26, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE CHARGER
- Publication number 20170229275
- Publication date Aug 10, 2017
- SHIMADZU CORPORATION
- Yoshihiro UENO
- G01 - MEASURING TESTING
Information Patent Application
Ceramic Ion Source Chamber
- Publication number 20170221669
- Publication date Aug 3, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source For Multiple Charged Species
- Publication number 20170117113
- Publication date Apr 27, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Alvarado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRID, METHOD OF MANUFACTURING THE SAME, AND ION BEAM PROCESSING APP...
- Publication number 20170084419
- Publication date Mar 23, 2017
- Canon ANELVA Corporation
- Masashi Tsujiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Negative Ribbon Ion Beams from Pulsed Plasmas
- Publication number 20170032937
- Publication date Feb 2, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS

Extraction optics

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam source, surface processing apparatus and surf...

Ion beam processing apparatus, electrode assembly, and method of cl...

Ion generation device, ion generation method, and ion generation pr...

Systems, devices, and methods for contaminant resistant insulative...

Inner source assembly and associated components

Variable thickness ion source extraction plate

Ion source with multiple bias electrodes

Grid assembly and ion beam etching apparatus

Ion beam processing apparatus, electrode assembly, and method of cl...

Systems, devices, and methods for contaminant resistant insulative...

Systems and methods for continuously supplying negative ions using...

Apparatus and system including extraction optics having movable blo...

Extraction apparatus and system for high throughput ion beam proces...

Ion source

Field ionization source, ion beam apparatus, and beam irradiation m...

High reliability, long lifetime, negative ion source

Ion source with biased extraction plate

Ion beam processing apparatus, electrode assembly, and method of cl...

Ion source with tailored extraction shape

Ion source

Ion implanter and ion implantation method

Method of manufacturing actively cooled accelerator grid with full...

MEMS device for generating an ion beam

High reliability, long lifetime, negative ion source

High brightness ion beam extraction using bias electrodes and magne...

Negative ribbon ion beams from pulsed plasmas

Blind-vented electrode

Ion beam processing apparatus, electrode assembly, and method of cl...

Linear anode layer slit ion source

Dual cathode ion source

Patents Applicationslast 30 patents

EXTRACTION GRID

LIQUID METAL ION SOURCE

ION BEAM EXTRACTION APPARATUS AND METHOD FOR CREATING AN ION BEAM

Variable Thickness Ion Source Extraction Plate

ION SOURCE WITH MULTIPLE BIAS ELECTRODES

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURF...

ION GENERATION DEVICE, ION GENERATION METHOD, AND ION GENERATION PR...

APPARATUS AND SYSTEM INCLUDING EXTRACTION OPTICS HAVING MOVABLE BLO...

INNER SOURCE ASSEMBLY AND ASSOCIATED COMPONENTS

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

Ion Source With Biased Extraction Plate

SYSTEMS AND METHODS FOR CONTINUOUSLY SUPPLYING NEGATIVE IONS USING...

ION SOURCE WITH TAILORED EXTRACTION APERTURE SHAPE

CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURF...

HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

FIELD IONIZATION SOURCE, ION BEAM APPARATUS, AND BEAM IRRADIATION M...

ION IMPLANTER AND ION IMPLANTATION METHOD

MAGNETIC FOCUSING IN AN ION PUMP USING INTERNAL FERROUS MATERIALS

Dual Cathode Ion Source

High Brightness Ion Beam Extraction

HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE

Negative Ribbon Ion Beams from Pulsed Plasmas

Ceramic Ion Source Chamber

PARTICLE CHARGER

Ceramic Ion Source Chamber

Ion Source For Multiple Charged Species

GRID, METHOD OF MANUFACTURING THE SAME, AND ION BEAM PROCESSING APP...

Negative Ribbon Ion Beams from Pulsed Plasmas