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G03F7/70641

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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Patents Grantslast 30 patents

Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,365
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 12,169,364
- Issue date Dec 17, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for focus control in extreme ultraviolet lithogra...
- Patent number 12,153,352
- Issue date Nov 26, 2024
- KLA Corporation
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus, exposure method, and method of manufacturing ar...
- Patent number 12,072,638
- Issue date Aug 27, 2024
- Canon Kabushiki Kaisha
- Kazuki Ota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,050,406
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for process metrology
- Patent number 12,007,697
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Bert Verstraeten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurment device
- Patent number 12,001,146
- Issue date Jun 4, 2024
- AUROS TECHNOLOGY, INC.
- Sun Hyoung Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 12,001,148
- Issue date Jun 4, 2024
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Defocus measurement method, correction method, and method of manufa...
- Patent number 11,977,338
- Issue date May 7, 2024
- Samsung Electronics Co., Ltd.
- Jieun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 11,960,214
- Issue date Apr 16, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with variable focal distance and optical assembly co...
- Patent number 11,921,432
- Issue date Mar 5, 2024
- Thales
- Luca Peverini
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 11,906,906
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring misregistration in the manufacture of topograph...
- Patent number 11,880,141
- Issue date Jan 23, 2024
- KLA Corporation
- Daria Negri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for accurately obtaining photolithography parameter
- Patent number 11,868,053
- Issue date Jan 9, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xun Yan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for diffraction pattern guided source mask opt...
- Patent number 11,846,889
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of surface topography measurement for lithography
- Patent number 11,835,866
- Issue date Dec 5, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method of manufacturing ar...
- Patent number 11,835,869
- Issue date Dec 5, 2023
- Canon Kabushiki Kaisha
- Kazuki Ota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurement apparatus
- Patent number 11,835,865
- Issue date Dec 5, 2023
- AUROS TECHNOLOGY, INC.
- Hyeon Gi Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and a method of determining a characteristic of...
- Patent number 11,822,254
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology device and detection apparatus therefor
- Patent number 11,782,351
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,768,443
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ching Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and method of adjusti...
- Patent number 11,740,546
- Issue date Aug 29, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,733,615
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method
- Patent number 11,709,434
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Rizvi Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 11,709,435
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selecting a set of locations associated with a measurement or featu...
- Patent number 11,681,231
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Pierluigi Frisco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for pattern fidelity control
- Patent number 11,669,020
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Tanbir Hasan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement for an inspection apparatus
- Patent number 11,662,198
- Issue date May 30, 2023
- ASML Holding N.V.
- Parag Vinayak Kelkar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model calibration and guided metrology based on smart sampling
- Patent number 11,630,396
- Issue date Apr 18, 2023
- ASML Netherlands B.V.
- Jun Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...
- Publication number 20240410827
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Diederik Jan MAAS
- G01 - MEASURING TESTING
Information Patent Application
Method and Structures for Acoustic Wave Overlay Error Determination
- Publication number 20240385533
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Ching Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...
- Publication number 20240369944
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...
- Publication number 20240361704
- Publication date Oct 31, 2024
- Carl Zeiss SMT GMBH
- Klaus Gwosch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...
- Publication number 20240310738
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY TOOL
- Publication number 20240288782
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROV...
- Publication number 20240280913
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANAGING SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240272561
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Junho SHIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240241454
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEMS, TEMPORAL AND SPATIAL COHERENCE SCRAMBLER AND MET...
- Publication number 20240241453
- Publication date Jul 18, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORI...
- Publication number 20240176251
- Publication date May 30, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORI...
- Publication number 20240176253
- Publication date May 30, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORI...
- Publication number 20240176252
- Publication date May 30, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD OF EXPOSURE APPARATUS, INFORMATI...
- Publication number 20240126182
- Publication date Apr 18, 2024
- Canon Kabushiki Kaisha
- JUN MOIZUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF FITTING MEASUREMENT DATA TO A MODEL AND MODELING A PERFO...
- Publication number 20240118629
- Publication date Apr 11, 2024
- ASML NETHERLANDS B.V.
- Aliasghar KEYVANI JANBAHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240094643
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Filippo ALPEGGIANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING AR...
- Publication number 20240061350
- Publication date Feb 22, 2024
- Canon Kabushiki Kaisha
- KAZUKI OTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A FOCUS ACTUATION PROFILE FOR ONE OR MORE AC...
- Publication number 20240061353
- Publication date Feb 22, 2024
- ASML NETHERLANDS B.V.
- Simon Hendrik Celine VAN GORP
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF SURFACE TOPOGRAPHY MEASUREMENT FOR LITHOGRAPHY
- Publication number 20240045343
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- YUNG-YAO LEE
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METRO...
- Publication number 20240036479
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20240036484
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Timothy Dugan DAVIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS BASED ON HIGH HARMONIC GENERATION AND ASSOCIATE...
- Publication number 20240004312
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Peter Michael KRAUS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20230400780
- Publication date Dec 14, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Metrology Apparatus and a Method of Determining a Characteristic of...
- Publication number 20230393490
- Publication date Dec 7, 2023
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20230333486
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MEASUREMENT APPARATUS
- Publication number 20230324811
- Publication date Oct 12, 2023
- AUROS TECHNOLOGY, INC.
- Hyeon Gi SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS...
- Publication number 20230305407
- Publication date Sep 28, 2023
- ASML NETHERLANDS B.V.
- Fei LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN ILLUMINATION SOURCE AND ASSOCIATED METROLOGY APPARATUS
- Publication number 20230288818
- Publication date Sep 14, 2023
- ASML Netherlands B,V.
- Wenjie JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR THERMO-MECHANICAL CONTROL OF A HEAT SENSITIVE ELEMENT AN...
- Publication number 20230229090
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Victor Sebastiaan Dolk
- G02 - OPTICS
Information Patent Application
SUBSTRATE, PATTERNING DEVICE AND METROLOGY APPARATUSES
- Publication number 20230205097
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Mattia MARELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Computer-readable storage medium recording data structure for stori...

Computer-readable storage medium recording data structure for stori...

System and method for focus control in extreme ultraviolet lithogra...

Process variability aware adaptive inspection and metrology

Exposure apparatus, exposure method, and method of manufacturing ar...

Method for controlling a lithographic apparatus and associated appa...

Method for process metrology

Overlay measurment device

Enhancing performance of overlay metrology

Defocus measurement method, correction method, and method of manufa...

Computer-readable storage medium recording data structure for stori...

Optical system with variable focal distance and optical assembly co...

Metrology method and associated metrology and lithographic apparatuses

Method of measuring misregistration in the manufacture of topograph...

Method for accurately obtaining photolithography parameter

Method and apparatus for diffraction pattern guided source mask opt...

Method and system of surface topography measurement for lithography

Exposure apparatus, exposure method, and method of manufacturing ar...

Overlay measurement apparatus

Metrology apparatus and a method of determining a characteristic of...

Metrology device and detection apparatus therefor

Method for manufacturing semiconductor structure

Multi charged particle beam writing apparatus and method of adjusti...

Methods and patterning devices and apparatuses for measuring focus...

Device manufacturing method

Method of manufacturing a semiconductor device and apparatus for ma...

Selecting a set of locations associated with a measurement or featu...

Method and apparatus for pattern fidelity control

Optical arrangement for an inspection apparatus

Model calibration and guided metrology based on smart sampling

Patents Applicationslast 30 patents

METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...

Method and Structures for Acoustic Wave Overlay Error Determination

METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...

METROLOGY METHOD AND ASSOCIATED METROLOGY TOOL

SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROV...

METHOD OF MANAGING SEMICONDUCTOR PROCESSING APPARATUS

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

METROLOGY SYSTEMS, TEMPORAL AND SPATIAL COHERENCE SCRAMBLER AND MET...

COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORI...

COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORI...

COMPUTER-READABLE STORAGE MEDIUM RECORDING DATA STRUCTURE FOR STORI...

EXPOSURE APPARATUS, CONTROL METHOD OF EXPOSURE APPARATUS, INFORMATI...

METHODS OF FITTING MEASUREMENT DATA TO A MODEL AND MODELING A PERFO...

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING AR...

METHOD FOR DETERMINING A FOCUS ACTUATION PROFILE FOR ONE OR MORE AC...

METHOD AND SYSTEM OF SURFACE TOPOGRAPHY MEASUREMENT FOR LITHOGRAPHY

METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METRO...

METHOD OF METROLOGY AND ASSOCIATED APPARATUSES

METROLOGY APPARATUS BASED ON HIGH HARMONIC GENERATION AND ASSOCIATE...

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

Metrology Apparatus and a Method of Determining a Characteristic of...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

OVERLAY MEASUREMENT APPARATUS

METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS...

AN ILLUMINATION SOURCE AND ASSOCIATED METROLOGY APPARATUS

METHOD FOR THERMO-MECHANICAL CONTROL OF A HEAT SENSITIVE ELEMENT AN...

SUBSTRATE, PATTERNING DEVICE AND METROLOGY APPARATUSES