Focusing means

Industry

CPC
H01J2237/049

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/049Focusing means

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Bottom and middle edge rings
- Patent number 12,237,154
- Issue date Feb 25, 2025
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Bottom and middle edge rings
- Patent number 12,183,554
- Issue date Dec 31, 2024
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and the use thereof for flexibly setting the c...
- Patent number 12,119,204
- Issue date Oct 15, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 12,080,515
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a multiple particle beam system while altering...
- Patent number 12,057,290
- Issue date Aug 6, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle flooding to enhance voltag...
- Patent number 11,929,232
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Frank Nan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bandpass charged particle energy filtering detector for charged par...
- Patent number 11,749,495
- Issue date Sep 5, 2023
- KLA Corp.
- Youfei Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device for inspection of a specimen with a pl...
- Patent number 11,676,795
- Issue date Jun 13, 2023
- FEI Company
- Pavel Stejskal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power wafer cooling
- Patent number 11,670,483
- Issue date Jun 6, 2023
- Axcelis Technologies, Inc.
- Joseph Ferrara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Back-scatter electrons (BSE) imaging with a SEM in tilted mode usin...
- Patent number 11,626,267
- Issue date Apr 11, 2023
- Applied Materials Israel Ltd.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography system
- Patent number 11,610,758
- Issue date Mar 21, 2023
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion focusing device
- Patent number 11,605,531
- Issue date Mar 14, 2023
- Battelle Memorial Institute
- Yehia M. Ibrahim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system for adjusting the current of individual partic...
- Patent number 11,562,880
- Issue date Jan 24, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and method of controlling sample ch...
- Patent number 11,545,338
- Issue date Jan 3, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterriftechnik mbH
- Dominik Patrick Ehberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens arrangement usable in particle-optical systems
- Patent number 11,527,379
- Issue date Dec 13, 2022
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,495,444
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Masato Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, multi-beamlet assembly, and method...
- Patent number 11,495,433
- Issue date Nov 8, 2022
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of manufacturing semiconduct...
- Patent number 11,437,222
- Issue date Sep 6, 2022
- Samsung Electronics Co., Ltd.
- Jung-Pyo Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for focusing an electron beam on a wafer having a transparen...
- Patent number 11,378,531
- Issue date Jul 5, 2022
- Applied Materials Israel Ltd.
- Arie Bader
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION
- Publication number 20250112017
- Publication date Apr 3, 2025
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250112023
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTE...
- Publication number 20250112016
- Publication date Apr 3, 2025
- FEI Company
- Alexander Henstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...
- Publication number 20250104966
- Publication date Mar 27, 2025
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING ALIGNMENT APPARATUS
- Publication number 20250087464
- Publication date Mar 13, 2025
- Samsung Electronics Co., LTD
- Jaehyun SOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...
- Publication number 20240347316
- Publication date Oct 17, 2024
- Carl Zeiss MultiSEM GmbH
- Hans Fritz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM MICROSCOPE
- Publication number 20240304410
- Publication date Sep 12, 2024
- CARL ZEISS MICROSCOPY GMBH
- Erik Essers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240242921
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE
- Publication number 20240153739
- Publication date May 9, 2024
- US Electron, Inc.
- John Noonan
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
Creating Multiple Electron Beams with a Photocathode Film
- Publication number 20230395349
- Publication date Dec 7, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Specimen Observation Method
- Publication number 20230343549
- Publication date Oct 26, 2023
- Hitachi High-Tech Corporation
- Masahiro FUKUTA
- G01 - MEASURING TESTING
Information Patent Application
MINIATURE HYBRID ELECTRON BEAM COLUMN
- Publication number 20230326704
- Publication date Oct 12, 2023
- KLA Corporation
- Lawrence Muray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Energy Filter, and Energy Analyzer and Charged Particle Beam Device...
- Publication number 20230298845
- Publication date Sep 21, 2023
- Hitachi High-Tech Corporation
- Kazuhiro HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230290609
- Publication date Sep 14, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTIC...
- Publication number 20230282442
- Publication date Sep 7, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230245849
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam System and Method of Correcting Deviation of Field...
- Publication number 20230230801
- Publication date Jul 20, 2023
- JEOL Ltd.
- Yuichiro Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...
- Publication number 20230154723
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BANDPASS CHARGED PARTICLE ENERGY FILTERING DETECTOR FOR CHARGED PAR...
- Publication number 20230104558
- Publication date Apr 6, 2023
- KLA Corporation
- Youfei Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CH...
- Publication number 20230037583
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE
- Publication number 20220384138
- Publication date Dec 1, 2022
- US Electron, Inc.
- John Noonan
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND METHOD OF CONTROLLING SAMPLE CH...
- Publication number 20220359152
- Publication date Nov 10, 2022
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dominik Patrick Ehberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACK-SCATTER ELECTRONS (BSE) IMAGING WITH A SEM IN TILTED MODE USIN...
- Publication number 20220351937
- Publication date Nov 3, 2022
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, MULTI-BEAMLET ASSEMBLY, AND METHOD...
- Publication number 20220336186
- Publication date Oct 20, 2022
- lCT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS
- Publication number 20220246395
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...
- Publication number 20220223386
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS

Focusing means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Bottom and middle edge rings

Apparatus of plural charged-particle beams

Multiple charged-particle beam apparatus with low crosstalk

Method and system for the removal and/or avoidance of contamination...

Bottom and middle edge rings

Particle beam system and the use thereof for flexibly setting the c...

Bottom electrode assembly, plasma processing apparatus, and method...

Apparatus of plural charged-particle beams

Apparatus for multiple charged-particle beams

Method for operating a multiple particle beam system while altering...

Systems and methods for real time stereo imaging using multiple ele...

Systems and methods for charged particle flooding to enhance voltag...

Apparatus of plural charged-particle beams

Bandpass charged particle energy filtering detector for charged par...

Method and system for the removal and/or avoidance of contamination...

Apparatus of plural charged-particle beams

Charged particle beam device for inspection of a specimen with a pl...

High power wafer cooling

Back-scatter electrons (BSE) imaging with a SEM in tilted mode usin...

Charged particle beam lithography system

Ion focusing device

Apparatus of plural charged-particle beams

Particle beam system for adjusting the current of individual partic...

Charged particle beam apparatus and method of controlling sample ch...

Objective lens arrangement usable in particle-optical systems

In-situ plasma cleaning of process chamber components

Substrate processing apparatus and substrate processing method

Charged particle beam apparatus, multi-beamlet assembly, and method...

Plasma processing apparatus and method of manufacturing semiconduct...

Method for focusing an electron beam on a wafer having a transparen...

Patents Applicationslast 30 patents

IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTE...

MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF...

FOCUS RING ALIGNMENT APPARATUS

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING...

ELECTRON BEAM MICROSCOPE

CHARGED PARTICLE APPARATUS AND METHOD

ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

Creating Multiple Electron Beams with a Photocathode Film

Charged Particle Beam Device and Specimen Observation Method

MINIATURE HYBRID ELECTRON BEAM COLUMN

Energy Filter, and Energy Analyzer and Charged Particle Beam Device...

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTIC...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

Focused Ion Beam System and Method of Correcting Deviation of Field...

SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...

BANDPASS CHARGED PARTICLE ENERGY FILTERING DETECTOR FOR CHARGED PAR...

APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CH...

ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE

CHARGED PARTICLE BEAM APPARATUS AND METHOD OF CONTROLLING SAMPLE CH...

BACK-SCATTER ELECTRONS (BSE) IMAGING WITH A SEM IN TILTED MODE USIN...

CHARGED PARTICLE BEAM APPARATUS, MULTI-BEAMLET ASSEMBLY, AND METHOD...

APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS

CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...