for extracting the material from the process chamber

Industry

CPC
H01J37/32788

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32788for extracting the material from the process chamber

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for treating substrate and apparatus for treating substrate
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- Issue date Nov 12, 2024
- Semes Co., Ltd.
- Ji-Hwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
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- Lam Research Corporation
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Information Patent Grant
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Information Patent Grant
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- Kokusai Electric Corporation
- Tomoki Imamura
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Information Patent Grant
Apparatus and system including high angle extraction optics
- Patent number 11,948,781
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Christopher Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion implanter
- Patent number 11,848,170
- Issue date Dec 19, 2023
- SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO, LTD.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,664,233
- Issue date May 30, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of workpieces using fluorocarbon plasma
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- Issue date May 16, 2023
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Information Patent Grant
Processing method of workpiece
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- Issue date Dec 27, 2022
- Disco Corporation
- Yoshio Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion implanter
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- Issue date Jul 5, 2022
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
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Information Patent Grant
Ion source device
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- Issue date Jun 14, 2022
- Sumitomo Heavy Industries, Ltd.
- Toshikazu Hiasa
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Information Patent Grant
Charged particle beam apparatus
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- Ayana Muraki
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Information Patent Grant
Gas-phase chemical reactor and method of using same
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Information Patent Grant
Method and system for galvanizing by plasma evaporation
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- Issue date Mar 8, 2022
- NEOVAC GMBH
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Gas curtain for semiconductor manufacturing system
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Information Patent Grant
Reactor system coupled to an energy emitter control circuit
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- Issue date Aug 31, 2021
- LytEn, Inc.
- Michael W. Stowell
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Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,107,694
- Issue date Aug 31, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and semiconductor/liquid crystal manufacturing...
- Patent number 11,037,811
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Information Patent Grant
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Plasma processing apparatus
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Information Patent Grant
Plasma excitation for spatial atomic layer deposition (ALD) reactors
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Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
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- Hitachi High-Technologies Corporation
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Information Patent Grant
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Information Patent Grant
Plasma enhanced chemical vapor deposition apparatus and method for...
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Information Patent Grant
Manufacturing method of semiconductor device
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- Issue date Aug 21, 2018
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- Kotaro Horikoshi
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Information Patent Grant
Direct lift process apparatus
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- Issue date May 22, 2018
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- Khiem Nguyen
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Patents Applicationslast 30 patents

Information Patent Application
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APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES
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ION GENERATOR AND ION IMPLANTER
- Publication number 20240079199
- Publication date Mar 7, 2024
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- Syuta Ochi
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SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
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- PSK INC.
- Jin Woo PARK
- H01 - BASIC ELECTRIC ELEMENTS
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MULTI-STATION PROCESSING TOOLS WITH STATION-VARYING SUPPORT FEATURE...
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OPERATION METHOD OF ETCHING APPARATUS AND METHOD OF MANUFACTURING S...
- Publication number 20230307217
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- Samsung Electronics Co., Ltd.
- Dooyoung Gwak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCALED LINER LAYER FOR ISOLATION STRUCTURE
- Publication number 20230178419
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Benjamin COLOMBEAU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE
- Publication number 20230154731
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- TES CO., LTD.
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- LAM RESEARCH CORPORATION
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- H01 - BASIC ELECTRIC ELEMENTS
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PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD
- Publication number 20230053083
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- Hiroyuki MATSUURA
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SYSTEMS AND METHODS FOR DECOMPOSITION OF MOLECULES
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VACUUM PROCESSING APPARATUS
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CHAMBER COMPONENT CLEANLINESS MEASUREMENT SYSTEM
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GAS-PHASE CHEMICAL REACTOR AND METHOD OF USING SAME
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SUBSTRATE TREATING APPARATUS AND SUBSTRATE TRANSFERRING METHOD
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- SEMES CO., LTD.
- Seung Bae LEE
- H01 - BASIC ELECTRIC ELEMENTS
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- Publication number 20220081759
- Publication date Mar 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Yu Lee
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PLASMA FILM FORMING APPARATUS AND PLASMA FILM FORMING METHOD
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- Masaru Shimada
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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20210407774
- Publication date Dec 30, 2021
- Kokusai Electric Corporation
- Tomoki IMAMURA
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APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS
- Publication number 20210391155
- Publication date Dec 16, 2021
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- Christopher Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CURTAIN FOR SEMICONDUCTOR MANUFACTURING SYSTEM
- Publication number 20210391179
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- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Kent LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
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- Masaki ISHIGURO
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Information Patent Application
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- Publication date Sep 30, 2021
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
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- Publication number 20210265136
- Publication date Aug 26, 2021
- LAM RESEARCH CORPORATION
- Ming LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
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- Publication number 20210166960
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- TOKYO ELECTRON LIMITED
- Kippei SUGITA
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- SEMES CO., LTD.
- JI-HWAN LEE
- H01 - BASIC ELECTRIC ELEMENTS

for extracting the material from the process chamber

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for treating substrate and apparatus for treating substrate

Chamber component cleanliness measurement system

Apparatus and method for manufacturing metal gate structures

Method of manufacturing semiconductor device, substrate processing...

Apparatus and system including high angle extraction optics

Ion generator and ion implanter

Method for releasing sample and plasma processing apparatus using same

Processing of workpieces using fluorocarbon plasma

Processing method of workpiece

Ion generator and ion implanter

Ion source device

Charged particle beam apparatus

Gas-phase chemical reactor and method of using same

Method and system for galvanizing by plasma evaporation

Gas curtain for semiconductor manufacturing system

Reactor system coupled to an energy emitter control circuit

Method for releasing sample and plasma processing apparatus using same

Electrostatic chuck and semiconductor/liquid crystal manufacturing...

Inflatable seal for media cooling

Metal recess for semiconductor structures

Metal recess for semiconductor structures

Spatial atomic layer deposition chamber with plasma pulsing to prev...

Film forming method and film forming apparatus

Plasma processing apparatus

Plasma excitation for spatial atomic layer deposition (ALD) reactors

Method for releasing sample and plasma processing apparatus using same

Integrated direct dielectric and metal deposition

Plasma enhanced chemical vapor deposition apparatus and method for...

Manufacturing method of semiconductor device

Direct lift process apparatus

Patents Applicationslast 30 patents

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

METHOD FOR FORMING THIN FILM AND APPARATUS FOR PROCESSING SUBSTRATE...

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...

ION GENERATOR AND ION IMPLANTER

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

MULTI-STATION PROCESSING TOOLS WITH STATION-VARYING SUPPORT FEATURE...

OPERATION METHOD OF ETCHING APPARATUS AND METHOD OF MANUFACTURING S...

SCALED LINER LAYER FOR ISOLATION STRUCTURE

METHOD OF PROCESSING SUBSTRATE

SLIDE AND PIVOT ASSEMBLIES FOR PROCESS MODULE BIAS ASSEMBLIES OF SU...

PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD

SYSTEMS AND METHODS FOR DECOMPOSITION OF MOLECULES

VACUUM PROCESSING APPARATUS

SPUTTER DEPOSITION

ION GENERATOR AND ION IMPLANTER

CHAMBER COMPONENT CLEANLINESS MEASUREMENT SYSTEM

GAS-PHASE CHEMICAL REACTOR AND METHOD OF USING SAME

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TRANSFERRING METHOD

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

PLASMA FILM FORMING APPARATUS AND PLASMA FILM FORMING METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS

GAS CURTAIN FOR SEMICONDUCTOR MANUFACTURING SYSTEM

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

CONTINUOUS FLOW SYSTEM AND METHOD FOR COATING SUBSTRATES

Processing of Workpieces Using Flourocarbon Plasma

METHOD AND APPARATUS FOR PROCESSING WAFERS

JIG, PROCESSING SYSTEM AND PROCESSING METHOD

METHOD FOR TREATING SUBSTRATE AND APPARATUS FOR TREATING SUBSTRATE