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CPC
B24B37/10
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Parent Industries
B
PERFORMING OPERATIONS TRANSPORTING
B24
Grinding technology
B24B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
B24B37/00
Lapping machines or devices Accessories
Current Industry
B24B37/10
for single side lapping
Industries
Overview
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Chemical mechanical polishing apparatus and method
Patent number
11,964,358
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Shang-Yu Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing system, substrate processing method and comput...
Patent number
11,929,268
Issue date
Mar 12, 2024
Tokyo Electron Limited
Munehisa Kodama
B24 - GRINDING POLISHING
Information
Patent Grant
Apparatus for polishing and method of polishing
Patent number
11,926,018
Issue date
Mar 12, 2024
Ebara Corporation
Masayoshi Ito
B24 - GRINDING POLISHING
Information
Patent Grant
Apparatus and method for CMP temperature control
Patent number
11,919,123
Issue date
Mar 5, 2024
Applied Materials, Inc.
Surajit Kumar
B24 - GRINDING POLISHING
Information
Patent Grant
Low-temperature metal CMP for minimizing dishing and corrosion, and...
Patent number
11,897,079
Issue date
Feb 13, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus for smoothing diamonds
Patent number
11,897,087
Issue date
Feb 13, 2024
Board of Trustees of Michigan State University
Aaron Hardy
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing carrier head with piezoelectric pressure control
Patent number
11,890,715
Issue date
Feb 6, 2024
Applied Materials, Inc.
Brian J. Brown
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate processing apparatus and substrate processing method
Patent number
11,887,869
Issue date
Jan 30, 2024
Tokyo Electron Limited
Nobuhiko Mouri
B08 - CLEANING
Information
Patent Grant
Polishing apparatus
Patent number
11,865,665
Issue date
Jan 9, 2024
Ebara Corporation
Kenichi Kobayashi
B24 - GRINDING POLISHING
Information
Patent Grant
Temperature-based in-situ edge assymetry correction during CMP
Patent number
11,865,671
Issue date
Jan 9, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Grinding apparatus
Patent number
11,858,087
Issue date
Jan 2, 2024
Disco Corporation
Jiro Genozono
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus
Patent number
11,858,088
Issue date
Jan 2, 2024
Disco Corporation
Toshiyuki Moriya
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus
Patent number
11,839,948
Issue date
Dec 12, 2023
Ebara Corporation
Takashi Yamazaki
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing system, learning device, and learning method of learning...
Patent number
11,833,635
Issue date
Dec 5, 2023
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Keitaro Fujii
B24 - GRINDING POLISHING
Information
Patent Grant
Slurry distribution device for chemical mechanical polishing
Patent number
11,806,835
Issue date
Nov 7, 2023
Applied Materials, Inc.
Yen-Chu Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Compensation for slurry composition in in-situ electromagnetic indu...
Patent number
11,794,302
Issue date
Oct 24, 2023
Applied Materials, Inc.
Kun Xu
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing with applied magnetic field
Patent number
11,787,008
Issue date
Oct 17, 2023
Applied Materials, Inc.
Xingfeng Wang
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing carrier head with multiple angular pressurizable zones
Patent number
11,780,049
Issue date
Oct 10, 2023
Applied Materials, Inc.
Steven M. Zuniga
B24 - GRINDING POLISHING
Information
Patent Grant
Asymmetry correction via variable relative velocity of a wafer
Patent number
11,764,069
Issue date
Sep 19, 2023
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing temperature scanning apparatus for te...
Patent number
11,752,589
Issue date
Sep 12, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate rotation device, substrate cleaning device, substrate pro...
Patent number
11,731,241
Issue date
Aug 22, 2023
Ebara Corporation
Ichiju Satoh
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus including polishing pad conditioner, non-contac...
Patent number
11,735,427
Issue date
Aug 22, 2023
Samsung Electronics Co., Ltd.
Jin Shin
B24 - GRINDING POLISHING
Information
Patent Grant
Pivotable substrate retaining ring
Patent number
11,724,357
Issue date
Aug 15, 2023
Applied Materials, Inc.
Steven M. Zuniga
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate polish edge uniformity control with secondary fluid dispense
Patent number
11,724,355
Issue date
Aug 15, 2023
Applied Materials, Inc.
Justin H. Wong
B24 - GRINDING POLISHING
Information
Patent Grant
Retaining ring for use in chemical mechanical polishing and CMP app...
Patent number
11,717,933
Issue date
Aug 8, 2023
XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
Yong-Seok Ro
B24 - GRINDING POLISHING
Information
Patent Grant
Polyurethane polishing pad and composition for manufacturing the same
Patent number
11,717,932
Issue date
Aug 8, 2023
XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
Kwang-Bok Kim
B24 - GRINDING POLISHING
Information
Patent Grant
Fabrication of a polishing pad for chemical mechanical polishing
Patent number
11,697,183
Issue date
Jul 11, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
An-Hsuan Lee
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Temperature-based assymetry correction during CMP and nozzle for me...
Patent number
11,697,187
Issue date
Jul 11, 2023
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of using polishing pad
Patent number
11,691,243
Issue date
Jul 4, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
ChunHung Chen
B24 - GRINDING POLISHING
Information
Patent Grant
Method and system for performing chemical mechanical polishing
Patent number
11,685,015
Issue date
Jun 27, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Chih-Yuan Yang
B24 - GRINDING POLISHING
Patents Applications
last 30 patents
Information
Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
Publication number
20240157504
Publication date
May 16, 2024
Applied Materials, Inc.
Surajit Kumar
B24 - GRINDING POLISHING
Information
Patent Application
COMPENSATION FOR SLURRY COMPOSITION IN IN-SITU ELECTROMAGNETIC INDU...
Publication number
20240123565
Publication date
Apr 18, 2024
Applied Materials, Inc.
Kun Xu
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING APPARATUS
Publication number
20240091899
Publication date
Mar 21, 2024
EBARA CORPORATION
Kenichi KOBAYASHI
B24 - GRINDING POLISHING
Information
Patent Application
MODULAR CHEMICAL MECHANICAL POLISHER WITH SIMULTANEOUS POLISHING AN...
Publication number
20240075582
Publication date
Mar 7, 2024
Applied Materials, Inc.
Steven M. Zuniga
B24 - GRINDING POLISHING
Information
Patent Application
LOW-TEMPERATURE METAL CMP FOR MINIMIZING DISHING AND CORROSION, AND...
Publication number
20240066660
Publication date
Feb 29, 2024
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
WORKPIECE PROCESSING METHOD
Publication number
20240058922
Publication date
Feb 22, 2024
Disco Corporation
Minoru MATSUZAWA
B24 - GRINDING POLISHING
Information
Patent Application
ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM
Publication number
20240050995
Publication date
Feb 15, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chih-Wen Liu
B08 - CLEANING
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Publication number
20240051080
Publication date
Feb 15, 2024
EBARA CORPORATION
Kohei OTA
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING CARRIER HEAD WITH MULTIPLE ZONES
Publication number
20230405758
Publication date
Dec 21, 2023
Applied Materials, Inc.
Steven M. Zuniga
B24 - GRINDING POLISHING
Information
Patent Application
SEMICONDUCTOR SUBSTRATE GRINDING APPARATUS AND SEMICONDUCTOR SUBSTR...
Publication number
20230373058
Publication date
Nov 23, 2023
Samsung Electronics Co., Ltd.
Donghoon KWON
B08 - CLEANING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS WITH INTEGRATED SLURRY MIXE...
Publication number
20230373062
Publication date
Nov 23, 2023
Taiwan Semiconductor Manufacturing Company Limited
Yu-Chen Wei
B24 - GRINDING POLISHING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...
Publication number
20230356351
Publication date
Nov 9, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD
Publication number
20230352326
Publication date
Nov 2, 2023
EBARA CORPORATION
Kuniaki YAMAGUCHI
B24 - GRINDING POLISHING
Information
Patent Application
Fabrication of a Polishing Pad for Chemical Mechanical Polishing
Publication number
20230347471
Publication date
Nov 2, 2023
Taiwan Semiconductor Manufacturing Co., LTD
An-Hsuan Lee
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE
Publication number
20230339066
Publication date
Oct 26, 2023
Applied Materials, Inc.
Justin H. WONG
B24 - GRINDING POLISHING
Information
Patent Application
METHOD OF USING POLISHING PAD
Publication number
20230339068
Publication date
Oct 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
ChunHung CHEN
B24 - GRINDING POLISHING
Information
Patent Application
PLANE POLISHING MACHINE
Publication number
20230321787
Publication date
Oct 12, 2023
NORITAKE CO., LIMITED
Makoto Sato
B24 - GRINDING POLISHING
Information
Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE
Publication number
20230294238
Publication date
Sep 21, 2023
KIOXIA Corporation
Yasuhide OKADA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
NOVEL CHEMICAL-MECHANICAL POLISHING APPARATUS
Publication number
20230286106
Publication date
Sep 14, 2023
Taiwan Semiconductor Manufacturing Co., LTD
Chun-Hsi Huang
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING APPARATUS FOR SUBSTRATE AND POLISHING METHOD FOR SUBSTRAT...
Publication number
20230286108
Publication date
Sep 14, 2023
SAMSUNG ELECTRONICS CO., LTD.
Donghoon Kwon
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING APPARATUS FOR SMOOTHING DIAMONDS
Publication number
20230286102
Publication date
Sep 14, 2023
Board of Trustees of Michigan State University
Aaron HARDY
B24 - GRINDING POLISHING
Information
Patent Application
METHOD AND SYSTEM FOR PERFORMING CHEMICAL MECHANICAL POLISHING
Publication number
20230278160
Publication date
Sep 7, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Chih-Yuan YANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND SYSTEM FOR CHEMICAL MECHANICAL POLISHING PROCESS
Publication number
20230274929
Publication date
Aug 31, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Chih-I PENG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LARGE AREA QUARTZ CRYSTAL WAFER LAPPING DEVICE AND A LAPPING METHOD...
Publication number
20230249312
Publication date
Aug 10, 2023
TANGSHAN GUOXIN JINGYUAN ELECTRONICS CO., LTD.
Jianmin XU
B24 - GRINDING POLISHING
Information
Patent Application
MEGA-SONIC VIBRATION ASSISTED CHEMICAL MECHANICAL PLANARIZATION
Publication number
20230219188
Publication date
Jul 13, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Chun-Hao Kung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MACHINE FOR FINISHING A WORK PIECE, AND HAVING A HIGHLY CONTROLLABL...
Publication number
20230211453
Publication date
Jul 6, 2023
II-VI Delaware, Inc.
Edward J. GRATRIX
B24 - GRINDING POLISHING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD USING THE SAME
Publication number
20230191555
Publication date
Jun 22, 2023
Samsung Electronics Co., Ltd.
Chaelyoung Kim
B24 - GRINDING POLISHING
Information
Patent Application
SYSTEM AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING
Publication number
20230182257
Publication date
Jun 15, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Chih-Yu WANG
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING APPARATUS
Publication number
20230158632
Publication date
May 25, 2023
EBARA CORPORATION
Hiroyuki SHINOZAKI
B24 - GRINDING POLISHING
Information
Patent Application
CMP PROCESS APPLIED TO A THIN SIC WAFER FOR STRESS RELEASE AND DAMA...
Publication number
20230128739
Publication date
Apr 27, 2023
STMicroelectronics S.r.l.
Agata GRASSO
H01 - BASIC ELECTRIC ELEMENTS