-
Post-CMP cleaning and apparatus
-
Patent number 12,170,195
-
Issue date Dec 17, 2024
-
Taiwan Semiconductor Manufacturing Company, Ltd.
-
Fu-Ming Huang
-
B08 - CLEANING
-
-
-
-
-
PECVD apparatus
-
Patent number 12,112,928
-
Issue date Oct 8, 2024
-
GUANGZHOU AIFO LIGHT COMMUNICATION TECHNOLOGY COMPANY LTD.
-
Guoqiang Li
-
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
-
Substrate processing device
-
Patent number 12,106,982
-
Issue date Oct 1, 2024
-
SCREEN Holdings Co., Ltd.
-
Masaki Inaba
-
H01 - BASIC ELECTRIC ELEMENTS
-
Wafer cleaning method
-
Patent number 12,087,602
-
Issue date Sep 10, 2024
-
Taiwan Semiconductor Manufacturing Company, Ltd
-
Kuo-Shu Tseng
-
H01 - BASIC ELECTRIC ELEMENTS
-
-
-
-
Dilute chemical supply device
-
Patent number 12,030,024
-
Issue date Jul 9, 2024
-
Kurita Water Industries Ltd.
-
Hideaki Iino
-
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
-
-
-
-
-
-
-
-
Fluid heating device
-
Patent number 11,985,736
-
Issue date May 14, 2024
-
Kelk Ltd.
-
Daisuke Watanabe
-
B08 - CLEANING
-
-
-
-
-
-
-
-
-
-