formation by oxidation

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H01L21/0223

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/0223formation by oxidation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Cyclic spin-on coating process for forming dielectric material
- Patent number 12,170,199
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Je-Ming Kuo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Gate-all-around device with trimmed channel and dipoled dielectric...
- Patent number 12,170,231
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Wei Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,165,929
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Han Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,159,925
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ji-Yin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device including isolation st...
- Patent number 12,154,821
- Issue date Nov 26, 2024
- NANYA TECHNOLOGY CORPORATION
- Ying-Cheng Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, method of manufacturing semiconductor...
- Patent number 12,148,611
- Issue date Nov 19, 2024
- Kokusai Electric Corporation
- Takaaki Noda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate-all-around structure and methods of forming the same
- Patent number 12,148,836
- Issue date Nov 19, 2024
- Parabellum Strategic Opportunities Fund LLC
- Pei-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,142,533
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chao-Ching Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device with high-K metal gate stack
- Patent number 12,142,685
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Cheng Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seal method to integrate non-volatile memory (NVM) into logic or bi...
- Patent number 12,144,173
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Bo Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with patterned fin structure
- Patent number 12,131,901
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure and semiconductor stru...
- Patent number 12,119,222
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Mengmeng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming epitaxial source/drain features in semiconductor...
- Patent number 12,119,378
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jia-Heng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film transistor including a compositionally-graded gate dielec...
- Patent number 12,113,115
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Wu-Wei Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having semiconductor device elements in a semi...
- Patent number 12,107,130
- Issue date Oct 1, 2024
- Infineon Technologies AG
- Ingo Muri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical transistor fabrication for memory applications
- Patent number 12,108,604
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jaesoo Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,107,151
- Issue date Oct 1, 2024
- United Microelectronics Corp.
- Fu-Jung Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment process to densify oxide layers
- Patent number 12,094,709
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Jung Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,068,162
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ya-Lan Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Latch-up prevention
- Patent number 12,062,721
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching metal films using plasma processing
- Patent number 12,057,322
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Nicholas Joy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate-all-around (GAA) method and devices
- Patent number 12,057,485
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shien-Yang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure and semiconductor...
- Patent number 12,051,615
- Issue date Jul 30, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Mengzhu Qiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for manufacturing semiconductor...
- Patent number 12,046,478
- Issue date Jul 23, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Luguang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a nano-FET semiconductor device
- Patent number 12,040,382
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Li-Chi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned epitaxy layer
- Patent number 12,040,386
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Cheng Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 12,033,852
- Issue date Jul 9, 2024
- Kokusai Electric Corporation
- Takayuki Waseda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor integrated circuit
- Patent number 12,027,424
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Sheng Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a carrier trapping region including cry...
- Patent number 12,027,579
- Issue date Jul 2, 2024
- Rohm Co., Ltd.
- Seigo Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 12,016,182
- Issue date Jun 18, 2024
- Kioxia Corporation
- Naomi Fukumaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240421213
- Publication date Dec 19, 2024
- UNITED MICROELECTRONICS CORP.
- Fu-Jung Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION
- Publication number 20240420952
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Bhaskar Soman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSIFIED SEAM-FREE SILICON-CONTAINING MATERIAL GAP FILL PROCESSES
- Publication number 20240420950
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Xiang Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSHEET TRANSISTOR
- Publication number 20240413224
- Publication date Dec 12, 2024
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- B82 - NANO-TECHNOLOGY
Information Patent Application
PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS
- Publication number 20240404823
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Jung Chan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240395874
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hsien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Device With High-K Metal Gate Stack
- Publication number 20240387736
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Cheng Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON CHANNEL TEMPERING
- Publication number 20240387745
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Mao-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20240379459
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Han Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE-ALL-AROUND STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20240379857
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Pei-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL SOURCE/DRAIN FEATURES
- Publication number 20240379807
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MEOL CONTACT STRUCTURE
- Publication number 20240379768
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Shumao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240379349
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20240371983
- Publication date Nov 7, 2024
- Ji-Yin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING EPITAXIAL SOURCE/DRAIN FEATURES IN SEMICONDUCTOR...
- Publication number 20240371938
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Jia-Heng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Protection Layer Formation during Plasma Etching Conductive Materials
- Publication number 20240371655
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Yen-Tien Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORIFICE SURROUNDED LOW PRESSURE HYDROXYL COMBUSTION
- Publication number 20240360996
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Christopher S. OLSEN
- C01 - INORGANIC CHEMISTRY
Information Patent Application
LATCH-UP PREVENTION
- Publication number 20240363759
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240363724
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ding-Kang SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELEC...
- Publication number 20240363716
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Wu-Wei TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING GATE-ALL-AROUND (GAA) DEVICES
- Publication number 20240355896
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shien-Yang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION METHOD AND PLASMA PROCESSING METHOD
- Publication number 20240355616
- Publication date Oct 24, 2024
- Hitachi High-Tech Corporation
- Kiyohiko SATOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INTEGRATED CIRCUIT
- Publication number 20240347388
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Sheng CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF DIELECTRIC MATERIAL UPON...
- Publication number 20240332071
- Publication date Oct 3, 2024
- Intel Corporation
- Alireza Narimannezhad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A NANO-FET SEMICONDUCTOR DEVICE
- Publication number 20240332401
- Publication date Oct 3, 2024
- Tawan Semiconductor Manufacturing Co., Ltd.
- Li-Chi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO IMPROVE QUALITY SILICON-CONTAINING MATERIALS
- Publication number 20240332006
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Tianyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE OXIDATION PROCESSES FOR GATE-ALL-AROUND TRANSISTORS
- Publication number 20240321584
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Byeong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER MANUFACTURING SYSTEM AND METHOD FOR MANUFACTURING WAFERS
- Publication number 20240321648
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Xiaoguang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20240321558
- Publication date Sep 26, 2024
- Kokusai Electric Corporation
- Takeshi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20240304459
- Publication date Sep 12, 2024
- DENSO CORPORATION
- SHUHEI ICHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS

formation by oxidation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Cyclic spin-on coating process for forming dielectric material

Gate-all-around device with trimmed channel and dipoled dielectric...

Semiconductor device and method

Semiconductor device and method

Method of manufacturing semiconductor device including isolation st...

Substrate processing method, method of manufacturing semiconductor...

Gate-all-around structure and methods of forming the same

Method of manufacturing a semiconductor device and a semiconductor...

FinFET device with high-K metal gate stack

Seal method to integrate non-volatile memory (NVM) into logic or bi...

Semiconductor structure with patterned fin structure

Method for preparing semiconductor structure and semiconductor stru...

Methods of forming epitaxial source/drain features in semiconductor...

Thin film transistor including a compositionally-graded gate dielec...

Semiconductor device having semiconductor device elements in a semi...

Vertical transistor fabrication for memory applications

Semiconductor device and method for fabricating the same

Plasma treatment process to densify oxide layers

Semiconductor device and method

Latch-up prevention

Methods for etching metal films using plasma processing

Gate-all-around (GAA) method and devices

Method for manufacturing semiconductor structure and semiconductor...

Semiconductor structure and method for manufacturing semiconductor...

Method of forming a nano-FET semiconductor device

Self-aligned epitaxy layer

Method of processing substrate, method of manufacturing semiconduct...

Semiconductor integrated circuit

Semiconductor device having a carrier trapping region including cry...

Semiconductor device and method of manufacturing the same

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION

DENSIFIED SEAM-FREE SILICON-CONTAINING MATERIAL GAP FILL PROCESSES

NANOSHEET TRANSISTOR

PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

FinFET Device With High-K Metal Gate Stack

SILICON CHANNEL TEMPERING

SEMICONDUCTOR DEVICES

GATE-ALL-AROUND STRUCTURE AND METHODS OF FORMING THE SAME

METAL SOURCE/DRAIN FEATURES

METHOD OF FORMING A MEOL CONTACT STRUCTURE

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

SEMICONDUCTOR DEVICES

METHODS OF FORMING EPITAXIAL SOURCE/DRAIN FEATURES IN SEMICONDUCTOR...

Protection Layer Formation during Plasma Etching Conductive Materials

ORIFICE SURROUNDED LOW PRESSURE HYDROXYL COMBUSTION

LATCH-UP PREVENTION

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELEC...

METHODS OF FORMING GATE-ALL-AROUND (GAA) DEVICES

FILM FORMATION METHOD AND PLASMA PROCESSING METHOD

SEMICONDUCTOR INTEGRATED CIRCUIT

PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF DIELECTRIC MATERIAL UPON...

METHOD OF FORMING A NANO-FET SEMICONDUCTOR DEVICE

METHODS TO IMPROVE QUALITY SILICON-CONTAINING MATERIALS

SELECTIVE OXIDATION PROCESSES FOR GATE-ALL-AROUND TRANSISTORS

WAFER MANUFACTURING SYSTEM AND METHOD FOR MANUFACTURING WAFERS

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE