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METAL SOURCE/DRAIN FEATURES
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Publication number 20240097001
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Publication date Mar 21, 2024
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Taiwan Semiconductor Manufacturing Co., Ltd.
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Pei-Yu Wang
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H01 - BASIC ELECTRIC ELEMENTS
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DC Bias in Plasma Process
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Publication number 20240071722
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Publication date Feb 29, 2024
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Taiwan Semiconductor Manufacturing Co., Ltd.
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Sheng-Liang Pan
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H01 - BASIC ELECTRIC ELEMENTS
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Method for Forming SiGe Channel
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Publication number 20240072168
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Publication date Feb 29, 2024
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Shanghai Huali Integrated Circuit Corporation
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Xinhua Cheng
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H01 - BASIC ELECTRIC ELEMENTS
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SUBSTRATE PROCESSING METHOD
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Publication number 20240063014
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Publication date Feb 22, 2024
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ASM IP HOLDING B.V.
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SangHeon Yong
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H01 - BASIC ELECTRIC ELEMENTS
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FIN STRUCTURES
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Publication number 20230411168
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Publication date Dec 21, 2023
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Taiwan Semiconductor Manufacturing Company, Ltd.
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Chun-Yang Lu
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H01 - BASIC ELECTRIC ELEMENTS
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SEMICONDUCTOR DEVICE
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Publication number 20230395713
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Publication date Dec 7, 2023
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Rohm Co., Ltd.
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Shuhei MITANI
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H01 - BASIC ELECTRIC ELEMENTS