formed by deposition from a gas or vapour

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H01L21/3145

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/3145formed by deposition from a gas or vapour

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 9,806,096
- Issue date Oct 31, 2017
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Grant
High κ gate stack on III-V compound semiconductors
- Patent number 9,805,949
- Issue date Oct 31, 2017
- GLOBALFOUNDRIES Inc.
- Jean Fompeyrine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a gate dielectric for high-k metal gate devices
- Patent number 9,711,373
- Issue date Jul 18, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Hao Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 9,698,236
- Issue date Jul 4, 2017
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon nitride film, and semiconductor device
- Patent number 9,679,918
- Issue date Jun 13, 2017
- Semiconductor Energy Laboratory Co., Ltd.
- Toru Takayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor reaction chamber with plasma capabilities
- Patent number 9,412,564
- Issue date Aug 9, 2016
- ASM IP Holding B.V.
- Robert Brennan Milligan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide-nitride-oxide stack having multiple oxynitride layers
- Patent number 9,349,824
- Issue date May 24, 2016
- Cypress Semiconductor Corporation
- Sagy Charel Levy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device using the same
- Patent number 9,269,568
- Issue date Feb 23, 2016
- Wonik IPS Co., Ltd.
- Young Soo Kwon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 9,196,632
- Issue date Nov 24, 2015
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Grant
Semiconductor reaction chamber with plasma capabilities
- Patent number 9,018,111
- Issue date Apr 28, 2015
- ASM IP Holding B.V.
- Robert Brennan Milligan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating a nonvolatile charge trap memory device
- Patent number 8,993,453
- Issue date Mar 31, 2015
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing silicon and oxide films from organoaminosilan...
- Patent number 8,940,648
- Issue date Jan 27, 2015
- Air Products and Chemicals, Inc.
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of silicon-containing films
- Patent number 8,906,455
- Issue date Dec 9, 2014
- Air Products and Chemicals, Inc.
- Liu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device and substrate process...
- Patent number 8,895,455
- Issue date Nov 25, 2014
- Hitachi Kokusai Electric Inc.
- Naonori Akae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film semiconductor device having silicon nitride film
- Patent number 8,866,144
- Issue date Oct 21, 2014
- Semiconductor Energy Laboratory Co., Ltd.
- Toru Takayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,860,118
- Issue date Oct 14, 2014
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced cyclic chemical vapor deposition of silicon-contain...
- Patent number 8,828,505
- Issue date Sep 9, 2014
- Air Products and Chemicals, Inc.
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device using a microwave pla...
- Patent number 8,809,203
- Issue date Aug 19, 2014
- Semiconductor Energy Laboratory Co., Ltd.
- Mitsuhiro Ichijo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectrics containing at least one of a refractory metal or a non-...
- Patent number 8,772,851
- Issue date Jul 8, 2014
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 8,658,522
- Issue date Feb 25, 2014
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Oxide-nitride-oxide stack having multiple oxynitride layers
- Patent number 8,643,124
- Issue date Feb 4, 2014
- Cypress Semiconductor Corporation
- Sagy Levy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,610,182
- Issue date Dec 17, 2013
- Semiconductor Energy Laboratory Co., Ltd.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Grant
Method for manufacturing semiconductor device and substrate process...
- Patent number 8,609,551
- Issue date Dec 17, 2013
- Hitachi Kokusai Electric Inc.
- Naonori Akae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,603,892
- Issue date Dec 10, 2013
- Elpida Memory, Inc.
- Yoh Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectrics containing at least one of a refractory metal or a non-...
- Patent number 8,557,672
- Issue date Oct 15, 2013
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 8,557,717
- Issue date Oct 15, 2013
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing silicon and oxide films from organoaminosilan...
- Patent number 8,530,361
- Issue date Sep 10, 2013
- Air Products and Chemicals, Inc.
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of semiconductor substrate and substrate proce...
- Patent number 8,524,580
- Issue date Sep 3, 2013
- Hitachi Kokusai Electric Inc.
- Naonori Akae
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tantalum silicon oxynitride high-K dielectrics and metal gates
- Patent number 8,519,466
- Issue date Aug 27, 2013
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of gate dielectrics with uniform nitrogen distribution
- Patent number 8,492,291
- Issue date Jul 23, 2013
- Texas Instruments Incorporated
- Hiroaki Niimi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
- Publication number 20140322920
- Publication date Oct 30, 2014
- Young Soo KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...
- Publication number 20140322923
- Publication date Oct 30, 2014
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDE-NITRIDE-OXIDE STACK HAVING MULTIPLE OXYNITRIDE LAYERS
- Publication number 20140284696
- Publication date Sep 25, 2014
- CYPRESS SEMICONDUCTOR CORPORATION
- Sagy Charel Levy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device and Method for Manufacturing the Same
- Publication number 20140139776
- Publication date May 22, 2014
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...
- Publication number 20140065840
- Publication date Mar 6, 2014
- Hitachi Kokusai Electric Inc.
- Naonori Akae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...
- Publication number 20140035101
- Publication date Feb 6, 2014
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for Producing Silicon and Oxide Films from Organoaminosilan...
- Publication number 20130330937
- Publication date Dec 12, 2013
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low Temperature Deposition of Silicon-Containing Films
- Publication number 20130189853
- Publication date Jul 25, 2013
- TOKYO ELECTRON LIMITED
- Liu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS
- Publication number 20130149468
- Publication date Jun 13, 2013
- Applied Materials, Inc.
- Tatsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES AND METHODS TO IMPROVE CARRIER MOBILITY
- Publication number 20130045578
- Publication date Feb 21, 2013
- Micron Technology, Inc.
- Arup Bhattacharyya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH k GATE STACK ON III-V COMPOUND SEMICONDUCTORS
- Publication number 20120326212
- Publication date Dec 27, 2012
- International Business Machines Corporation
- Jean Fompeyrine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20120292685
- Publication date Nov 22, 2012
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TANTALUM SILICON OXYNITRIDE HIGH-K DIELECTRICS AND METAL GATES
- Publication number 20120205720
- Publication date Aug 16, 2012
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device and Method for Manufacturing the Same
- Publication number 20120187411
- Publication date Jul 26, 2012
- Semiconductor Energy Laboratory Co., Ltd
- Masahiko Hayakawa
- G02 - OPTICS
Information Patent Application
Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon- Contai...
- Publication number 20120171874
- Publication date Jul 5, 2012
- Air Products and Chemicals, Inc.
- Hareesh Thridandam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20120164816
- Publication date Jun 28, 2012
- Elpida Memory, Inc.
- Yoh MATSUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FORMATION OF GATE DIELECTRICS WITH UNIFORM NITROGEN DISTRIBUTION
- Publication number 20120149186
- Publication date Jun 14, 2012
- TEXAS INSTRUMENTS INCORPORATED
- Hiroaki Niimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...
- Publication number 20120133428
- Publication date May 31, 2012
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20120122289
- Publication date May 17, 2012
- TOKYO ELECTRON LIMITED
- Kenji Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
- Publication number 20120045905
- Publication date Feb 23, 2012
- Naonori AKAE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20120012917
- Publication date Jan 19, 2012
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for Producing Silicon and Oxide Films from Organoaminosilan...
- Publication number 20110262642
- Publication date Oct 27, 2011
- Air Products and Chemicals, Inc.
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILMS
- Publication number 20110256718
- Publication date Oct 20, 2011
- ASM INTERNATIONAL N.V.
- Suvi P. Haukka
- C30 - CRYSTAL GROWTH
Information Patent Application
Oxide-Nitride-Oxide Stack Having Multiple Oxynitride Layers
- Publication number 20110248332
- Publication date Oct 13, 2011
- Sagy Levy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON OXIDE FILM, METHOD FOR FORMING SILICON OXIDE FILM, AND PLAS...
- Publication number 20110206590
- Publication date Aug 25, 2011
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON OXYNITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTE...
- Publication number 20110189862
- Publication date Aug 4, 2011
- TOKYO ELECTRON LIMITED
- Minoru Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE...
- Publication number 20110175208
- Publication date Jul 21, 2011
- Semiconductor Energy Laboratory Co., Ltd.
- Satoshi TORIUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS
- Publication number 20110168093
- Publication date Jul 14, 2011
- Applied Materials, Inc.
- Tatsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS OF PLASMA TREATMENT
- Publication number 20110124200
- Publication date May 26, 2011
- Canon ANELVA Corporation
- Takashi Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE FILM, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFA...
- Publication number 20110095292
- Publication date Apr 28, 2011
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Toru Takayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

formed by deposition from a gas or vapour

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device and method for manufacturing the same

High κ gate stack on III-V compound semiconductors

Method of fabricating a gate dielectric for high-k metal gate devices

Semiconductor device and method for manufacturing the same

Silicon nitride film, and semiconductor device

Semiconductor reaction chamber with plasma capabilities

Oxide-nitride-oxide stack having multiple oxynitride layers

Method of manufacturing semiconductor device using the same

Semiconductor device and method for manufacturing the same

Semiconductor reaction chamber with plasma capabilities

Method of fabricating a nonvolatile charge trap memory device

Process for producing silicon and oxide films from organoaminosilan...

Low temperature deposition of silicon-containing films

Method for manufacturing semiconductor device and substrate process...

Thin film semiconductor device having silicon nitride film

Semiconductor device and method for manufacturing the same

Plasma enhanced cyclic chemical vapor deposition of silicon-contain...

Method for manufacturing semiconductor device using a microwave pla...

Dielectrics containing at least one of a refractory metal or a non-...

Methods and apparatus for incorporating nitrogen in oxide films

Oxide-nitride-oxide stack having multiple oxynitride layers

Semiconductor device and method for manufacturing the same

Method for manufacturing semiconductor device and substrate process...

Method of manufacturing a semiconductor device

Dielectrics containing at least one of a refractory metal or a non-...

Method for manufacturing a semiconductor device

Process for producing silicon and oxide films from organoaminosilan...

Manufacturing method of semiconductor substrate and substrate proce...

Tantalum silicon oxynitride high-K dielectrics and metal gates

Formation of gate dielectrics with uniform nitrogen distribution

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...

OXIDE-NITRIDE-OXIDE STACK HAVING MULTIPLE OXYNITRIDE LAYERS

Semiconductor Device and Method for Manufacturing the Same

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...

DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...

Process for Producing Silicon and Oxide Films from Organoaminosilan...

Low Temperature Deposition of Silicon-Containing Films

METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS

DEVICES AND METHODS TO IMPROVE CARRIER MOBILITY

HIGH k GATE STACK ON III-V COMPOUND SEMICONDUCTORS

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

TANTALUM SILICON OXYNITRIDE HIGH-K DIELECTRICS AND METAL GATES

Semiconductor Device and Method for Manufacturing the Same

Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon- Contai...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

FORMATION OF GATE DIELECTRICS WITH UNIFORM NITROGEN DISTRIBUTION

DIELECTRICS CONTAINING AT LEAST ONE OF A REFRACTORY METAL OR A NON-...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...

Semiconductor device and method for manufacturing the same

Process for Producing Silicon and Oxide Films from Organoaminosilan...

THIN FILMS

Oxide-Nitride-Oxide Stack Having Multiple Oxynitride Layers

SILICON OXIDE FILM, METHOD FOR FORMING SILICON OXIDE FILM, AND PLAS...

SILICON OXYNITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTE...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE...

METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS

METHOD AND APPARATUS OF PLASMA TREATMENT

SILICON NITRIDE FILM, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFA...