gate conductors with different gate conductor materials or different gate conductor implants

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H01L21/82345

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/82345gate conductors with different gate conductor materials or different gate conductor implants

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device with silicide gate fill structure
- Patent number 12,183,787
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ formation of metal gate modulators
- Patent number 12,183,638
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor and method of forming the same
- Patent number 12,183,637
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with silicide gate fill structure
- Patent number 12,176,392
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming oxide semiconductor film, semiconductor device,...
- Patent number 12,170,339
- Issue date Dec 17, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and a method for fabricating the same
- Patent number 12,166,038
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shun-Jang Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuits with recessed gate electrodes
- Patent number 12,165,928
- Issue date Dec 10, 2024
- Intel Corporation
- Srijit Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,154,962
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 12,154,984
- Issue date Nov 26, 2024
- DB HiTek, Co., Ltd.
- Jun Hee Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage transistor structures
- Patent number 12,148,752
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Work function design to increase density of nanosheet devices
- Patent number 12,148,750
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Mao-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a gate structure with different lengths...
- Patent number 12,142,666
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Yu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,142,530
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Chiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming the same
- Patent number 12,125,851
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Wei Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming oxide semiconductor film, semiconductor device,...
- Patent number 12,119,408
- Issue date Oct 15, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate electrode having a work-function layer including materials wit...
- Patent number 12,113,120
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ru-Shang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strained gate semiconductor device having an interlayer dielectric...
- Patent number 12,100,767
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of three-dimensional semiconductor device
- Patent number 12,094,781
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Makoto Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 12,094,782
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Yao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,087,637
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Chiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 12,080,712
- Issue date Sep 3, 2024
- Samsung Electronics Co., Ltd.
- Byounghoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite work function layer formation using same work function ma...
- Patent number 12,080,777
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 12,068,321
- Issue date Aug 20, 2024
- Samsung Electronics Co., Ltd.
- Sungmin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,068,388
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming an undoped region under a source/drain
- Patent number 12,068,395
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Meng-Ku Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming oxide semiconductor film, semiconductor device,...
- Patent number 12,062,724
- Issue date Aug 13, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 12,062,706
- Issue date Aug 13, 2024
- Samsung Electronics Co., Ltd.
- Jae-Jung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-volatile memory device with reduced area
- Patent number 12,052,859
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Meng-Sheng Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device structure with dielectric layer
- Patent number 12,051,746
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 12,046,650
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Juyoun Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED CIRCUIT DEVICE WITH MULTI-LENGTH GATE ELECTRODE
- Publication number 20240421002
- Publication date Dec 19, 2024
- Intel Corporation
- Hwichan Jun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240387276
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Chiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE DEVICE
- Publication number 20240387284
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE
- Publication number 20240387679
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ching Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAP FOR GATE STACK OF MULTIGATE DEVICE
- Publication number 20240387688
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERALLY ETCHED SPACERS FOR SEMICONDUCTOR DEVICE
- Publication number 20240387692
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Yu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSHEET STRUCTURES WITH TUNABLE CHANNELS AND INNER SIDEWALL SPACERS
- Publication number 20240387668
- Publication date Nov 21, 2024
- GLOBALFOUNDRIES U.S. Inc.
- Hong Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHECKERBOARD DUMMY DESIGN FOR EPITAXIAL OPEN RATIO
- Publication number 20240379664
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chang Jong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU FORMATION OF METAL GATE MODULATORS
- Publication number 20240379448
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE TRANSISTOR STRUCTURES
- Publication number 20240379671
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Han LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN-END GATE STRUCTURES AND METHOD FORMING SAME
- Publication number 20240379821
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240379677
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jhon Jhy Liaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240371702
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Yao LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor structure and manufacturing method thereof
- Publication number 20240371699
- Publication date Nov 7, 2024
- UNITED MICROELECTRONICS CORP.
- Ching-Ling Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240363424
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Chiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE WORK FUNCTION LAYER FORMATION USING SAME WORK FUNCTION MA...
- Publication number 20240363718
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING AN UNDOPED REGION UNDER A SOURCE/DRAIN
- Publication number 20240363729
- Publication date Oct 31, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.
- Meng-Ku Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
P-Type FiNFET as a Radio-Frequency Device and Method Forming Same
- Publication number 20240363734
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ru-Shang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240363719
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-VOLATILE MEMORY DEVICE WITH REDUCED AREA
- Publication number 20240357804
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- MENG-SHENG CHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240347387
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Yao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUITS WITH RECESSED GATE ELECTRODES
- Publication number 20240347394
- Publication date Oct 17, 2024
- Intel Corporation
- Srijit MUKHERJEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact for Semiconductor Device and Method of Forming Thereof
- Publication number 20240339539
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Huei-Shan Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20240339514
- Publication date Oct 10, 2024
- Samsung Electronics Co., Ltd.
- Juyoun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATION OF CHIP PERFORMANCE BY CONTROLLING TRANSISTOR GATE PROFILE
- Publication number 20240332088
- Publication date Oct 3, 2024
- Intel Corporation
- Reza Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE
- Publication number 20240321644
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HAO CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICES
- Publication number 20240321873
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Doohyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH ACTIVE PATTERN INCLUDING A TRANSITION PAT...
- Publication number 20240321876
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Seong-Ho SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-THRESHOLD VOLTAGE DEVICES AND ASSOCIATED TECHNIQUES AND CONFI...
- Publication number 20240322037
- Publication date Sep 26, 2024
- SONY GROUP CORPORATION
- Joseph M. Steigerwald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjusting Work Function Through Adjusting Deposition Temperature
- Publication number 20240297080
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

gate conductors with different gate conductor materials or different gate conductor implants

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device with silicide gate fill structure

In-situ formation of metal gate modulators

Fin field-effect transistor and method of forming the same

Semiconductor device with silicide gate fill structure

Method for forming oxide semiconductor film, semiconductor device,...

Semiconductor device and a method for fabricating the same

Integrated circuits with recessed gate electrodes

Semiconductor device and manufacturing method thereof

Semiconductor device and method for manufacturing same

High voltage transistor structures

Work function design to increase density of nanosheet devices

Semiconductor device having a gate structure with different lengths...

Semiconductor device and method of manufacture

FinFET device and method of forming the same

Method for forming oxide semiconductor film, semiconductor device,...

Gate electrode having a work-function layer including materials wit...

Strained gate semiconductor device having an interlayer dielectric...

Manufacturing method of three-dimensional semiconductor device

Semiconductor devices and methods of manufacturing thereof

Semiconductor device and method of manufacture

Semiconductor device

Composite work function layer formation using same work function ma...

Semiconductor devices

Semiconductor device and method of manufacture

Method for forming an undoped region under a source/drain

Method for forming oxide semiconductor film, semiconductor device,...

Semiconductor device

Non-volatile memory device with reduced area

Semiconductor device structure with dielectric layer

Semiconductor devices

Patents Applicationslast 30 patents

INTEGRATED CIRCUIT DEVICE WITH MULTI-LENGTH GATE ELECTRODE

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

HIGH VOLTAGE DEVICE

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE

CAP FOR GATE STACK OF MULTIGATE DEVICE

LATERALLY ETCHED SPACERS FOR SEMICONDUCTOR DEVICE

NANOSHEET STRUCTURES WITH TUNABLE CHANNELS AND INNER SIDEWALL SPACERS

CHECKERBOARD DUMMY DESIGN FOR EPITAXIAL OPEN RATIO

IN-SITU FORMATION OF METAL GATE MODULATORS

HIGH VOLTAGE TRANSISTOR STRUCTURES

FIN-END GATE STRUCTURES AND METHOD FORMING SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

Semiconductor structure and manufacturing method thereof

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

COMPOSITE WORK FUNCTION LAYER FORMATION USING SAME WORK FUNCTION MA...

METHOD FOR FORMING AN UNDOPED REGION UNDER A SOURCE/DRAIN

P-Type FiNFET as a Radio-Frequency Device and Method Forming Same

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

NON-VOLATILE MEMORY DEVICE WITH REDUCED AREA

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

INTEGRATED CIRCUITS WITH RECESSED GATE ELECTRODES

Contact for Semiconductor Device and Method of Forming Thereof

SEMICONDUCTOR DEVICES

MODULATION OF CHIP PERFORMANCE BY CONTROLLING TRANSISTOR GATE PROFILE

SEMICONDUCTOR STRUCTURE

INTEGRATED CIRCUIT DEVICES

SEMICONDUCTOR DEVICE WITH ACTIVE PATTERN INCLUDING A TRANSITION PAT...

MULTI-THRESHOLD VOLTAGE DEVICES AND ASSOCIATED TECHNIQUES AND CONFI...

Adjusting Work Function Through Adjusting Deposition Temperature