gate conductors with different gate conductor materials or different gate conductor implants

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H01L21/82345

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/82345gate conductors with different gate conductor materials or different gate conductor implants

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for forming oxide semiconductor film, semiconductor device,...
- Patent number 11,967,648
- Issue date Apr 23, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, method of manufacturing a semiconductor devic...
- Patent number 11,961,865
- Issue date Apr 16, 2024
- Sony Group Corporation
- Hideaki Togashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of forming the same
- Patent number 11,955,525
- Issue date Apr 9, 2024
- Samsung Electronics Co., Ltd.
- Junghwan Huh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 11,948,994
- Issue date Apr 2, 2024
- Samsung Electronics Co., Ltd.
- Byounghoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage transistor structure
- Patent number 11,942,475
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Geometry for threshold voltage tuning on semiconductor device
- Patent number 11,935,957
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Chiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor and method of forming the same
- Patent number 11,923,428
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chi Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistance fill metal layer material as stressor in metal gates
- Patent number 11,923,367
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Mrunal A Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 11,916,078
- Issue date Feb 27, 2024
- Samsung Electronics Co., Ltd.
- Sohyeon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,915,981
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement gate methods that include treating spacers to widen gate
- Patent number 11,908,695
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Han Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,908,858
- Issue date Feb 20, 2024
- Samsung Electronics Co., Ltd.
- Sung Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making gate structure of a semiconductor device
- Patent number 11,894,443
- Issue date Feb 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and method of manufacturing the same
- Patent number 11,894,379
- Issue date Feb 6, 2024
- Samsung Electronics Co., Ltd.
- Jung-Gil Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method of forming semiconductor structure
- Patent number 11,881,480
- Issue date Jan 23, 2024
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 11,869,811
- Issue date Jan 9, 2024
- Samsung Electronics Co., Ltd.
- Wonhyuk Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,869,887
- Issue date Jan 9, 2024
- Danfeng Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 11,862,632
- Issue date Jan 2, 2024
- Samsung Electronics Co, Ltd.
- Kyong-Sik Yeom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Work function design to increase density of nanosheet devices
- Patent number 11,862,633
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Mao-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image pickup device and method of tracking subject thereof
- Patent number 11,860,511
- Issue date Jan 2, 2024
- MAXELL, LTD.
- Hiroshi Shimizu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Contacts for semiconductor devices and methods of forming the same
- Patent number 11,855,162
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having metal gate and poly gate
- Patent number 11,854,828
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Alexander Kalnitsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of long gate devices
- Patent number 11,855,175
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask removal method
- Patent number 11,854,821
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure including forksheet transistors and...
- Patent number 11,855,078
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Guan-Lin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device with a recessed gate electrode that has high thickness unifo...
- Patent number 11,846,871
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Shu Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterning method and structures resulting therefrom
- Patent number 11,848,239
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chieh-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistors with different threshold voltages
- Patent number 11,848,368
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Lung-Kun Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ formation of metal gate modulators
- Patent number 11,842,928
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices including stacked nanosheet transistors
- Patent number 11,843,001
- Issue date Dec 12, 2023
- Samsung Electronics Co., Ltd.
- Byounghak Hong
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Replacement Gate Methods That Include Treating Spacers to Widen Gate
- Publication number 20240145250
- Publication date May 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu-Han Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240136230
- Publication date Apr 25, 2024
- Samsung Electronics Co., Ltd.
- Keetae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20240128265
- Publication date Apr 18, 2024
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jian CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHO...
- Publication number 20240120334
- Publication date Apr 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Chih KAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH STOP LAYER FOR METAL GATE CUT
- Publication number 20240113106
- Publication date Apr 4, 2024
- Intel Corporation
- Sukru Yemenicioglu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240113188
- Publication date Apr 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Li CHIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hard Mask Removal Method
- Publication number 20240105460
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Che-Hao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING METAL GATE AND POLY GATE
- Publication number 20240096643
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Alexander KALNITSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240096878
- Publication date Mar 21, 2024
- INNOSCIENCE (SUZHOU) TECHNOLOGY CO., LTD.
- Danfeng MAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORK FUNCTION DESIGN TO INCREASE DENSITY OF NANOSHEET DEVICES
- Publication number 20240096880
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Mao-Lin HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240096879
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Kyu Man HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contacts for Semiconductor Devices and Methods of Forming the Same
- Publication number 20240088244
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES INCLUDING STACKED NANOSHEET TRANSISTORS
- Publication number 20240072060
- Publication date Feb 29, 2024
- Samsung Electronics Co., Ltd.
- BYOUNGHAK HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GUARD RING STRUCTURE AND METHOD FORMING SAME
- Publication number 20240072049
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Shan Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE PICKUP DEVICE AND METHOD OF TRACKING SUBJECT THEREOF
- Publication number 20240069412
- Publication date Feb 29, 2024
- Maxell, Ltd.
- Hiroshi SHIMIZU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20240071829
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Wei WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM
- Publication number 20240063060
- Publication date Feb 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE WITH A RECESSED GATE ELECTRODE THAT HAS HIGH THICKNESS UNIFO...
- Publication number 20240061320
- Publication date Feb 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Shu Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IN-SITU FORMATION OF METAL GATE MODULATORS
- Publication number 20240063061
- Publication date Feb 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-PLANAR I/O AND LOGIC SEMICONDUCTOR DEVICES HAVING DIFFERENT WOR...
- Publication number 20240038592
- Publication date Feb 1, 2024
- Intel Corporation
- ROMAN W. OLAC-VAW
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING OXIDE SEMICONDUCTOR FILM, SEMICONDUCTOR DEVICE,...
- Publication number 20230420568
- Publication date Dec 28, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING OXIDE SEMICONDUCTOR FILM, SEMICONDUCTOR DEVICE,...
- Publication number 20230420569
- Publication date Dec 28, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF INTEGRATED STRUCTURE OF SEMICONDUCTOR DEVIC...
- Publication number 20230402327
- Publication date Dec 14, 2023
- RICHTEK TECHNOLOGY CORPORATION
- Chin-Chin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20230395597
- Publication date Dec 7, 2023
- Micron Technology, Inc.
- Takuya Imamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATION THEREOF
- Publication number 20230395677
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Yu KAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING HIGH VOLTAGE TRANSISTOR AND STRUCTURE RESULTING T...
- Publication number 20230387107
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- YUAN-CHENG YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20230386926
- Publication date Nov 30, 2023
- Chia-Ching Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interconnect Features With Sharp Corners and Method Forming Same
- Publication number 20230387231
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tze-Liang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Local Gate Height Tuning by CMP and Dummy Gate Design
- Publication number 20230386927
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Ming-Chang Wen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming a Stacked Transistor Device
- Publication number 20230386928
- Publication date Nov 30, 2023
- IMEC vzw
- Boon Teik CHAN
- H01 - BASIC ELECTRIC ELEMENTS

gate conductors with different gate conductor materials or different gate conductor implants

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for forming oxide semiconductor film, semiconductor device,...

Semiconductor device, method of manufacturing a semiconductor devic...

Semiconductor device and method of forming the same

Semiconductor device and method of fabricating the same

High voltage transistor structure

Geometry for threshold voltage tuning on semiconductor device

Fin field-effect transistor and method of forming the same

Low resistance fill metal layer material as stressor in metal gates

Semiconductor devices

Semiconductor device and manufacturing method thereof

Replacement gate methods that include treating spacers to widen gate

Semiconductor device

Method of making gate structure of a semiconductor device

Semiconductor devices and method of manufacturing the same

Semiconductor structure and method of forming semiconductor structure

Semiconductor device and method of manufacturing the same

Semiconductor device and manufacturing method thereof

Semiconductor device and method of fabricating the same

Work function design to increase density of nanosheet devices

Image pickup device and method of tracking subject thereof

Contacts for semiconductor devices and methods of forming the same

Semiconductor device having metal gate and poly gate

Fabrication of long gate devices

Hard mask removal method

Semiconductor device structure including forksheet transistors and...

Device with a recessed gate electrode that has high thickness unifo...

Patterning method and structures resulting therefrom

Transistors with different threshold voltages

In-situ formation of metal gate modulators

Devices including stacked nanosheet transistors

Patents Applicationslast 30 patents

Replacement Gate Methods That Include Treating Spacers to Widen Gate

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE

SEMICONDUCTOR DEVICE STRUCTURE WITH GATE DIELECTRIC LAYER AND METHO...

ETCH STOP LAYER FOR METAL GATE CUT

INTEGRATED CIRCUIT STRUCTURE AND METHOD FOR FABRICATING THE SAME

Hard Mask Removal Method

SEMICONDUCTOR DEVICE HAVING METAL GATE AND POLY GATE

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

WORK FUNCTION DESIGN TO INCREASE DENSITY OF NANOSHEET DEVICES

SEMICONDUCTOR DEVICE

Contacts for Semiconductor Devices and Methods of Forming the Same

DEVICES INCLUDING STACKED NANOSHEET TRANSISTORS

GUARD RING STRUCTURE AND METHOD FORMING SAME

IMAGE PICKUP DEVICE AND METHOD OF TRACKING SUBJECT THEREOF

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM

DEVICE WITH A RECESSED GATE ELECTRODE THAT HAS HIGH THICKNESS UNIFO...

IN-SITU FORMATION OF METAL GATE MODULATORS

NON-PLANAR I/O AND LOGIC SEMICONDUCTOR DEVICES HAVING DIFFERENT WOR...

METHOD FOR FORMING OXIDE SEMICONDUCTOR FILM, SEMICONDUCTOR DEVICE,...

METHOD FOR FORMING OXIDE SEMICONDUCTOR FILM, SEMICONDUCTOR DEVICE,...

MANUFACTURING METHOD OF INTEGRATED STRUCTURE OF SEMICONDUCTOR DEVIC...

SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATION THEREOF

METHOD OF FORMING HIGH VOLTAGE TRANSISTOR AND STRUCTURE RESULTING T...

Semiconductor Device and Method of Manufacture

Interconnect Features With Sharp Corners and Method Forming Same

Local Gate Height Tuning by CMP and Dummy Gate Design

Method for Forming a Stacked Transistor Device