Handling of masks or wafers

Industry

CPC
G03F7/70691

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70691Handling of masks or wafers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Arrangement apparatus and arrangement method
- Patent number 12,112,962
- Issue date Oct 8, 2024
- Shinkawa Ltd.
- Kohei Seyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support, lithographic apparatus and loading method
- Patent number 12,032,301
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system, method of clamping and wafer table
- Patent number RE49488
- Issue date Apr 11, 2023
- ASML Netherlands B.V.
- Guido De Boer
Information Patent Grant
Substrate support, lithographic apparatus and loading method
- Patent number 11,556,063
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for variable etch depths
- Patent number 11,456,205
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Morgan Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 11,422,476
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a position of a feature
- Patent number 11,392,044
- Issue date Jul 19, 2022
- ASML Netherlands B.V.
- Ralph Timotheus Huijgen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system and method for measuring diagonal diffraction-base...
- Patent number 11,353,321
- Issue date Jun 7, 2022
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Method for molding substrate storing container, mold, and substrate...
- Patent number 11,335,576
- Issue date May 17, 2022
- Miraial Co., Ltd.
- Chiaki Matsutori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle container
- Patent number 11,237,477
- Issue date Feb 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method, exposure apparatus, method of manufacturing articl...
- Patent number 11,194,257
- Issue date Dec 7, 2021
- Canon Kabushiki Kaisha
- Masaki Tai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,086,055
- Issue date Aug 10, 2021
- Carl Zeiss SMT GmbH
- Peter Huber
- G02 - OPTICS
Information Patent Grant
Critical dimension uniformity
- Patent number 11,022,878
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Co. LTD
- Xi-Zong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,908,506
- Issue date Feb 2, 2021
- Samsung Electronics Co., Ltd.
- Jang-Sun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 10,866,527
- Issue date Dec 15, 2020
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus, substrate processing method and sto...
- Patent number 10,840,079
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Yasushi Takiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lift pin assembly, substrate support apparatus and substrate proces...
- Patent number 10,770,337
- Issue date Sep 8, 2020
- Samsung Electronics Co., Ltd.
- Ja-Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer flatness control using backside compensation structure
- Patent number 10,763,099
- Issue date Sep 1, 2020
- Yangtze Memory Technologies Co., Ltd.
- Xiaowang Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet (EUV) exposure apparatus and method of manufact...
- Patent number 10,754,254
- Issue date Aug 25, 2020
- Samsung Electronics Co., Ltd.
- Keunhee Bai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting the position of a mask holder on a measuring t...
- Patent number 10,656,537
- Issue date May 19, 2020
- Carl Zeiss SMT GmbH
- Hans-Michael Solowan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and methods for nanoimprint lithography
- Patent number 10,654,216
- Issue date May 19, 2020
- Canon Kabushiki Kaisha
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method of determining a position of a feature
- Patent number 10,578,980
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Ralph Timotheus Huijgen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Critical dimension uniformity
- Patent number 10,495,970
- Issue date Dec 3, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Xi-Zong Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus and measuring devic...
- Patent number 10,345,710
- Issue date Jul 9, 2019
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography tool and method for compensating for surface defor...
- Patent number 10,345,720
- Issue date Jul 9, 2019
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Yinlei Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conveyance hand, conveyance apparatus, lithography apparatus, manuf...
- Patent number 10,319,623
- Issue date Jun 11, 2019
- Canon Kabushiki Kaisha
- Yasunao Matsuhira
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,241,426
- Issue date Mar 26, 2019
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement method, position control method, measurement m...
- Patent number 10,222,708
- Issue date Mar 5, 2019
- Nikon Corporation
- Masahiko Yasuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and stage control device using the same
- Patent number 10,139,249
- Issue date Nov 27, 2018
- Samsung Electronics Co., Ltd.
- Hong Won Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Piezoelectric positioning device and positioning method by means of...
- Patent number 10,128,429
- Issue date Nov 13, 2018
- Carl Zeiss SMT GmbH
- Christian Kempter
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HEATING UNIT, APPARATUS AND FACILITY FOR PROCESSING SUBSTRATES WITH...
- Publication number 20240103388
- Publication date Mar 28, 2024
- SEMES CO., LTD.
- Jong Seok SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD
- Publication number 20230134837
- Publication date May 4, 2023
- ASML NETHERLANDS B.V.
- Johannes ONVLEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARRANGEMENT APPARATUS AND ARRANGEMENT METHOD
- Publication number 20220319885
- Publication date Oct 6, 2022
- SHINKAWA LTD.
- Kohei SEYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220199440
- Publication date Jun 23, 2022
- Samsung Electronics Co., Ltd.
- Seohyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE CONTAINER
- Publication number 20220155676
- Publication date May 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR VARIABLE ETCH DEPTHS
- Publication number 20210351069
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Morgan Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, DEVICE AND METHOD FOR RECONDITIONING A SUBSTRATE SUPPORT
- Publication number 20210053177
- Publication date Feb 25, 2021
- ASML NETHERLANDS B.V.
- Bert Dirk SCHOLTEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...
- Publication number 20210018847
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MOLDING SUBSTRATE STORING CONTAINER, MOLD, AND SUBSTRATE...
- Publication number 20210013073
- Publication date Jan 14, 2021
- MIRAIAL CO., LTD.
- Chiaki MATSUTORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20200233312
- Publication date Jul 23, 2020
- Samsung Electronics Co., Ltd.
- Jang-sun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A POSITION OF A FEATURE
- Publication number 20200150547
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Ralph Timotheus HUIJGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER FLATNESS CONTROL USING BACKSIDE COMPENSATION STRUCTURE
- Publication number 20200058486
- Publication date Feb 20, 2020
- Yangtze Memory Technologies Co., Ltd.
- Xiaowang Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CRITICAL DIMENSION UNIFORMITY
- Publication number 20200050103
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- XI-ZONG CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...
- Publication number 20200004164
- Publication date Jan 2, 2020
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE APPARATUS, METHOD OF MANUFACTURING ARTICL...
- Publication number 20190377269
- Publication date Dec 12, 2019
- Canon Kabushiki Kaisha
- Masaki Tai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A POSITION OF A FEATURE
- Publication number 20190339211
- Publication date Nov 7, 2019
- Ralph Timotheus HUIJGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CRITICAL DIMENSION UNIFORMITY
- Publication number 20190146336
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- XI-ZONG CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE CONTAINER
- Publication number 20190101821
- Publication date Apr 4, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONVEYANCE HAND, CONVEYANCE APPARATUS, LITHOGRAPHY APPARATUS, MANUF...
- Publication number 20180350652
- Publication date Dec 6, 2018
- Canon Kabushiki Kaisha
- Yasunao Matsuhira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY TOOL AND METHOD FOR COMPENSATING FOR SURFACE DEFOR...
- Publication number 20180246412
- Publication date Aug 30, 2018
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Yinlei WEI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180231900
- Publication date Aug 16, 2018
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate Processing Apparatus, Substrate Processing Method and Sto...
- Publication number 20180151343
- Publication date May 31, 2018
- TOKYO ELECTRON LIMITED
- Yasushi TAKIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITION MEASUREMENT METHOD, POSITION CONTROL METHOD, MEASUREMENT M...
- Publication number 20180081283
- Publication date Mar 22, 2018
- Nikon Corporation
- Masahiko YASUDA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METH...
- Publication number 20180081284
- Publication date Mar 22, 2018
- ASML NETHERLANDS B.V.
- Raymond Wilhelmus Louis LAFARRE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DISPLAY DEVICE
- Publication number 20170363966
- Publication date Dec 21, 2017
- Japan Display Inc.
- Keita SASANUMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170352573
- Publication date Dec 7, 2017
- EBARA CORPORATION
- Zhongxin WEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Piezoelectric positioning device and positioning method by means of...
- Publication number 20170263843
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Christian KEMPTER
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD AND COMPUTER...
- Publication number 20160372346
- Publication date Dec 22, 2016
- TOKYO ELECTRON LIMITED
- Masahiro NAKAHARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRINTING APPARATUS
- Publication number 20160293904
- Publication date Oct 6, 2016
- SAMSUNG DISPLAY CO., LTD.
- Eui-Gyu Kim
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
CONVEYING HAND AND LITHOGRAPHY APPARATUS
- Publication number 20160243707
- Publication date Aug 25, 2016
- Canon Kabushiki Kaisha
- Yasunao Matsuhira
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS

Handling of masks or wafers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Arrangement apparatus and arrangement method

Substrate support, lithographic apparatus and loading method

Lithography system, method of clamping and wafer table

Substrate support, lithographic apparatus and loading method

Methods for variable etch depths

Methods and apparatus for monitoring a lithographic manufacturing p...

Method of determining a position of a feature

Metrology system and method for measuring diagonal diffraction-base...

Method for molding substrate storing container, mold, and substrate...

Reticle container

Exposure method, exposure apparatus, method of manufacturing articl...

Mirror, in particular for a microlithographic projection exposure a...

Critical dimension uniformity

Method of manufacturing semiconductor device

Methods and apparatus for monitoring a lithographic manufacturing p...

Substrate processing apparatus, substrate processing method and sto...

Lift pin assembly, substrate support apparatus and substrate proces...

Wafer flatness control using backside compensation structure

Extreme ultraviolet (EUV) exposure apparatus and method of manufact...

Method for detecting the position of a mask holder on a measuring t...

System and methods for nanoimprint lithography

Method of determining a position of a feature

Critical dimension uniformity

Microlithographic projection exposure apparatus and measuring devic...

Photolithography tool and method for compensating for surface defor...

Conveyance hand, conveyance apparatus, lithography apparatus, manuf...

Lithographic apparatus and device manufacturing method

Position measurement method, position control method, measurement m...

Metrology system and stage control device using the same

Piezoelectric positioning device and positioning method by means of...

Patents Applicationslast 30 patents

HEATING UNIT, APPARATUS AND FACILITY FOR PROCESSING SUBSTRATES WITH...

SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD

ARRANGEMENT APPARATUS AND ARRANGEMENT METHOD

APPARATUS FOR PROCESSING A SUBSTRATE

RETICLE CONTAINER

METHODS FOR VARIABLE ETCH DEPTHS

SYSTEM, DEVICE AND METHOD FOR RECONDITIONING A SUBSTRATE SUPPORT

METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...

METHOD FOR MOLDING SUBSTRATE STORING CONTAINER, MOLD, AND SUBSTRATE...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF DETERMINING A POSITION OF A FEATURE

WAFER FLATNESS CONTROL USING BACKSIDE COMPENSATION STRUCTURE

CRITICAL DIMENSION UNIFORMITY

METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...

EXPOSURE METHOD, EXPOSURE APPARATUS, METHOD OF MANUFACTURING ARTICL...

METHOD OF DETERMINING A POSITION OF A FEATURE

CRITICAL DIMENSION UNIFORMITY

RETICLE CONTAINER

CONVEYANCE HAND, CONVEYANCE APPARATUS, LITHOGRAPHY APPARATUS, MANUF...

PHOTOLITHOGRAPHY TOOL AND METHOD FOR COMPENSATING FOR SURFACE DEFOR...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Substrate Processing Apparatus, Substrate Processing Method and Sto...

POSITION MEASUREMENT METHOD, POSITION CONTROL METHOD, MEASUREMENT M...

SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METH...

DISPLAY DEVICE

SUBSTRATE PROCESSING APPARATUS

Piezoelectric positioning device and positioning method by means of...

SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD AND COMPUTER...

PRINTING APPARATUS

CONVEYING HAND AND LITHOGRAPHY APPARATUS