having cover layers or intermediate layers

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/11having cover layers or intermediate layers

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Patents Grantslast 30 patents

Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 12,242,196
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 12,242,193
- Issue date Mar 4, 2025
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Eui-Hyun Ryu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing cured film and use of the same
- Patent number 12,242,195
- Issue date Mar 4, 2025
- Merck Patent GmbH
- Takashi Sekito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing a lithography coating film forming-composition
- Patent number 12,235,580
- Issue date Feb 25, 2025
- NISSAN CHEMICAL CORPORATION
- Takumi Oya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 12,234,369
- Issue date Feb 25, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, polymer, pattern forming material, pattern forming method...
- Patent number 12,228,860
- Issue date Feb 18, 2025
- Kioxia Corporation
- Norikatsu Sasao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition having a disulfide struc...
- Patent number 12,222,651
- Issue date Feb 11, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 12,215,221
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Primers with improved reflective and thermally insulative propertie...
- Patent number 12,210,282
- Issue date Jan 28, 2025
- POLAROID IP B.V.
- Rong-Chang Liang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithography measurement machine and operating method thereof
- Patent number 12,197,124
- Issue date Jan 14, 2025
- Hon Hai Precision Industry Co., Ltd.
- Kuo-Kuei Fu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate treatment method and substrate treatment system
- Patent number 12,197,129
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Satoru Shimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition having diol structure
- Patent number 12,189,294
- Issue date Jan 7, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi Kamibayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography process and material for negative tone development
- Patent number 12,189,296
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epoxy formulations and processes for fabrication of relief patterns...
- Patent number 12,189,291
- Issue date Jan 7, 2025
- KAYAKU ADVANCED MATERIALS, INC.
- Daniel J. Nawrocki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 12,165,870
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
On-press development type lithographic printing plate precursor, me...
- Patent number 12,157,296
- Issue date Dec 3, 2024
- FUJIFILM Corporation
- Natsumi Yokokawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method for producing coating film-forming composition for lithography
- Patent number 12,153,348
- Issue date Nov 26, 2024
- NISSAN CHEMICAL CORPORATION
- Tomoya Ohashi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, resin, composition, resist pattern formation method, circ...
- Patent number 12,134,596
- Issue date Nov 5, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate precursor, method for preparing lithogr...
- Patent number 12,122,177
- Issue date Oct 22, 2024
- FUJIFILM Corporation
- Yusuke Namba
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250085636
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Iwamori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20250076764
- Publication date Mar 6, 2025
- Samsung SDI Co., Ltd.
- Hyeon PARK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20250076765
- Publication date Mar 6, 2025
- Samsung SDI Co., Ltd.
- Daeseok SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPLATE, MANUFACTURING METHOD FOR TEMPLATE, AND MANUFACTURING METH...
- Publication number 20250073983
- Publication date Mar 6, 2025
- KIOXIA Corporation
- Daisuke KOMATSU
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250068076
- Publication date Feb 27, 2025
- Samsung SDI Co., Ltd.
- Seongjin KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLEC...
- Publication number 20250068077
- Publication date Feb 27, 2025
- Brewer Science, Inc.
- Daniel Patrick Sweat
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250068075
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250060670
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250044685
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Changsoo WOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...
- Publication number 20250044697
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...
- Publication number 20250044695
- Publication date Feb 6, 2025
- Merck Patent GmbH
- Tomotsugu YANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250044696
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Taeho KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...
- Publication number 20250034427
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition For Forming Resist Underlayer Film, Patterning Process,...
- Publication number 20250028246
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Kenta ISHIWATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION
- Publication number 20250011507
- Publication date Jan 9, 2025
- NISSAN CHEMICAL CORPORATION
- Takahiro KISHIOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PREVENTING PATTERN COLLAPSE
- Publication number 20250013153
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Lior HULI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFOR...
- Publication number 20250013154
- Publication date Jan 9, 2025
- YCCHEM CO., LTD.
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250011623
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Forming Method
- Publication number 20250004378
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINATED PO...
- Publication number 20240427246
- Publication date Dec 26, 2024
- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE...
- Publication number 20240427248
- Publication date Dec 26, 2024
- Samsung SDI Co., Ltd.
- Kyoungjin HA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240427247
- Publication date Dec 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...
- Publication number 20240419074
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Michael Murphy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS
- Publication number 20240419068
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Daniele Piumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20240411227
- Publication date Dec 12, 2024
- Korea Advanced Institute of Science and Technology
- Sung Gap Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Resist Underlayer Film And Patterning Process
- Publication number 20240402606
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20240393692
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Hyeon PARK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...
- Publication number 20240393693
- Publication date Nov 28, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

having cover layers or intermediate layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Silicon-containing resist underlayer film-forming composition inclu...

Resist underlayer film-forming composition containing indolocarbazo...

Resist underlayer film-forming composition comprising epoxy adduct...

Coating compositions for use with an overcoated photoresist

Method for manufacturing cured film and use of the same

Method for producing a lithography coating film forming-composition

Photoresist topcoat compositions and methods of processing photores...

Pattern formation methods

Compound, polymer, pattern forming material, pattern forming method...

Coating composition for forming resist underlayer film for EUV lith...

Resist underlayer film forming composition having a disulfide struc...

Material for forming organic film, method for forming organic film,...

Primers with improved reflective and thermally insulative propertie...

Metal oxide resist patterning with electrical field guided post-exp...

Lithography measurement machine and operating method thereof

Substrate treatment method and substrate treatment system

Positive photosensitive resin composition, positive photosensitive...

Resist underlayer film-forming composition having diol structure

Lithography process and material for negative tone development

Epoxy formulations and processes for fabrication of relief patterns...

Method of manufacturing a semiconductor device

Composition for forming silicon-containing resist underlayer film a...

Chemical amplification methods and techniques for developable botto...

On-press development type lithographic printing plate precursor, me...

Method for producing coating film-forming composition for lithography

Resist underlayer film material, patterning process, and method for...

Photocurable composition and method for producing semiconductor device

Compound, resin, composition, resist pattern formation method, circ...

Composition for resist underlayer, and pattern forming method using...

Lithographic printing plate precursor, method for preparing lithogr...

Patents Applicationslast 30 patents

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS

Compound For Forming Metal-Containing Film, Composition For Forming...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

TEMPLATE, MANUFACTURING METHOD FOR TEMPLATE, AND MANUFACTURING METH...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLEC...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Method For Forming Resist Underlayer Film And Patterning Process

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...

METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...

Composition For Forming Resist Underlayer Film, Patterning Process,...

POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION

METHOD OF PREVENTING PATTERN COLLAPSE

SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFOR...

Composition For Forming Organic Film, Method For Forming Organic Fi...

Pattern Forming Method

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINATED PO...

RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE...

Compound For Forming Metal-Containing Film, Composition For Forming...

FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...

STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

Composition For Forming Resist Underlayer Film And Patterning Process

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...