having cover layers or intermediate layers

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/11having cover layers or intermediate layers

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Patents Grantslast 30 patents

Information Patent Grant
Diffractive backlight fabrication method
- Patent number 12,321,006
- Issue date Jun 3, 2025
- LEIA SPV LLC
- Thomas Hoekman
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method of removing photoresist, laminate, method of forming metalli...
- Patent number 12,321,097
- Issue date Jun 3, 2025
- ECHEM SOLUTIONS CORP.
- Tz-Jin Yang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coated underlayer for overcoated photoresist
- Patent number 12,313,971
- Issue date May 27, 2025
- DuPont Electronic Materials International, LLC
- Anton Chavez
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,313,972
- Issue date May 27, 2025
- NISSAN CHEMICAL CORPORATION
- Hiroto Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 12,313,974
- Issue date May 27, 2025
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Insulating layer for multilayer printed circuit board, multilayer p...
- Patent number 12,313,973
- Issue date May 27, 2025
- LG Chem, Ltd.
- Jeong Wook Mun
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin patterning materials with ligands having silicon/germaniu...
- Patent number 12,298,666
- Issue date May 13, 2025
- Inpria Corporation
- Robert E. Jilek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesion layer for multi-layer photoresist
- Patent number 12,292,684
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer compositions and patterning methods
- Patent number 12,287,576
- Issue date Apr 29, 2025
- DuPont Electronic Materials International, LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and treatment method
- Patent number 12,276,915
- Issue date Apr 15, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,271,113
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition, resist underlayer film, method of forming resist under...
- Patent number 12,265,333
- Issue date Apr 1, 2025
- JSR Corporation
- Shin-ya Nakafuji
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,259,654
- Issue date Mar 25, 2025
- Sumitomo Electric Industries, Ltd.
- Tadashi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive dry film, and printed wiring board with photosensiti...
- Patent number 12,259,652
- Issue date Mar 25, 2025
- Tamura Corporation
- Ryoya Takashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 12,242,196
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 12,242,193
- Issue date Mar 4, 2025
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Eui-Hyun Ryu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing cured film and use of the same
- Patent number 12,242,195
- Issue date Mar 4, 2025
- Merck Patent GmbH
- Takashi Sekito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing a lithography coating film forming-composition
- Patent number 12,235,580
- Issue date Feb 25, 2025
- NISSAN CHEMICAL CORPORATION
- Takumi Oya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 12,234,369
- Issue date Feb 25, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, polymer, pattern forming material, pattern forming method...
- Patent number 12,228,860
- Issue date Feb 18, 2025
- Kioxia Corporation
- Norikatsu Sasao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition having a disulfide struc...
- Patent number 12,222,651
- Issue date Feb 11, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR REDUCING ENVIRONMENT...
- Publication number 20250180993
- Publication date Jun 5, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEPOSITION OF RESIST UNDERLAYER FOR ENHANCING PHOTORESIST PERFORMANCE
- Publication number 20250180992
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Guangyan ZHONG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF SMOOTHENING PROFILE OF PHOTORESIST
- Publication number 20250183034
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REVERSIBLE OVERCOAT COMPOSITIONS
- Publication number 20250172877
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Charlotte Cutler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE FILM FORMING COMPOSITION
- Publication number 20250155813
- Publication date May 15, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...
- Publication number 20250149335
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE-FILM FORMING COMPOSITION
- Publication number 20250136734
- Publication date May 1, 2025
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Lithography Process and Material for Negative Tone Development
- Publication number 20250138428
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250129203
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVING HARDNESS OF BAKED PRODUCT
- Publication number 20250130497
- Publication date Apr 24, 2025
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER COMPOSITION
- Publication number 20250130499
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Yu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composite Article and Method for Manufacturing a Composite Article
- Publication number 20250123556
- Publication date Apr 17, 2025
- Morphotonics Holding B.V.
- Jan Matthijs Ter Meulen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250115736
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING HYDROXYCI...
- Publication number 20250109242
- Publication date Apr 3, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL...
- Publication number 20250110409
- Publication date Apr 3, 2025
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
- Publication number 20250110408
- Publication date Apr 3, 2025
- Intel Corporation
- Robert JORDAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME
- Publication number 20250102917
- Publication date Mar 27, 2025
- Merck Patent GmbH
- Takashi SEKITO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250093774
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WATER SOLUBLE PROTECTIVE COATINGS FOR ENGINEERED OPTICAL DEVICES
- Publication number 20250093780
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Amit Kumar ROY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250085636
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Iwamori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20250076764
- Publication date Mar 6, 2025
- Samsung SDI Co., Ltd.
- Hyeon PARK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20250076765
- Publication date Mar 6, 2025
- Samsung SDI Co., Ltd.
- Daeseok SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPLATE, MANUFACTURING METHOD FOR TEMPLATE, AND MANUFACTURING METH...
- Publication number 20250073983
- Publication date Mar 6, 2025
- KIOXIA Corporation
- Daisuke KOMATSU
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250068076
- Publication date Feb 27, 2025
- Samsung SDI Co., Ltd.
- Seongjin KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLEC...
- Publication number 20250068077
- Publication date Feb 27, 2025
- Brewer Science, Inc.
- Daniel Patrick Sweat
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250068075
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250060670
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250044685
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Changsoo WOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

having cover layers or intermediate layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Diffractive backlight fabrication method

Method of removing photoresist, laminate, method of forming metalli...

Coated underlayer for overcoated photoresist

Resist underlayer film-forming composition

Resist underlayer composition, and method of forming patterns using...

Insulating layer for multilayer printed circuit board, multilayer p...

Treatment liquid and pattern forming method

Organotin patterning materials with ligands having silicon/germaniu...

Adhesion layer for multi-layer photoresist

Photoresist and method of formation and use

Underlayer compositions and patterning methods

Selective deposition of carbon on photoresist layer for lithography...

Liquid chemical, method for producing liquid chemical, and method f...

Treatment liquid and treatment method

Method of manufacturing a semiconductor device

Radiation-sensitive resin composition and method for forming resist...

Composition, resist underlayer film, method of forming resist under...

Method for manufacturing semiconductor device

Photosensitive dry film, and printed wiring board with photosensiti...

Silicon-containing resist underlayer film-forming composition inclu...

Resist underlayer film-forming composition containing indolocarbazo...

Coating compositions for use with an overcoated photoresist

Resist underlayer film-forming composition comprising epoxy adduct...

Method for manufacturing cured film and use of the same

Method for producing a lithography coating film forming-composition

Photoresist topcoat compositions and methods of processing photores...

Pattern formation methods

Compound, polymer, pattern forming material, pattern forming method...

Coating composition for forming resist underlayer film for EUV lith...

Resist underlayer film forming composition having a disulfide struc...

Patents Applicationslast 30 patents

RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR REDUCING ENVIRONMENT...

DEPOSITION OF RESIST UNDERLAYER FOR ENHANCING PHOTORESIST PERFORMANCE

METHOD OF SMOOTHENING PROFILE OF PHOTORESIST

REVERSIBLE OVERCOAT COMPOSITIONS

PROTECTIVE FILM FORMING COMPOSITION

METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...

PROTECTIVE-FILM FORMING COMPOSITION

Lithography Process and Material for Negative Tone Development

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

METHOD FOR IMPROVING HARDNESS OF BAKED PRODUCT

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

RESIST UNDERLAYER COMPOSITION

Composite Article and Method for Manufacturing a Composite Article

Composition For Forming Metal-Containing Film And Patterning Process

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING HYDROXYCI...

SPIN-ON ADHESION PROMOTER COMPOSITION AND METHOD FOR HIGH NUMERICAL...

SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY

METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME

RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS

WATER SOLUBLE PROTECTIVE COATINGS FOR ENGINEERED OPTICAL DEVICES

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS

Compound For Forming Metal-Containing Film, Composition For Forming...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

TEMPLATE, MANUFACTURING METHOD FOR TEMPLATE, AND MANUFACTURING METH...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLEC...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Method For Forming Resist Underlayer Film And Patterning Process

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...