having cover layers or intermediate layers

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/11having cover layers or intermediate layers

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Patents Grantslast 30 patents

Information Patent Grant
Composition containing a heterocyclic compound having a dicyanostyr...
- Patent number 12,366,804
- Issue date Jul 22, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilized interfaces of inorganic radiation patterning composition...
- Patent number 12,360,454
- Issue date Jul 15, 2025
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing composition and method of producing semiconducto...
- Patent number 12,353,133
- Issue date Jul 8, 2025
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming underlayer film, resist pattern forming met...
- Patent number 12,346,026
- Issue date Jul 1, 2025
- FUJIFILM Corporation
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical solution-resistant protective film forming composition con...
- Patent number 12,344,758
- Issue date Jul 1, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern fidelity enhancement
- Patent number 12,334,342
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Tien Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 12,332,565
- Issue date Jun 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,332,566
- Issue date Jun 17, 2025
- NISSAN CHEMICAL CORPORATION
- Hiroto Ogata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film,...
- Patent number 12,332,567
- Issue date Jun 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke Niida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Diffractive backlight fabrication method
- Patent number 12,321,006
- Issue date Jun 3, 2025
- LEIA SPV LLC
- Thomas Hoekman
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method of removing photoresist, laminate, method of forming metalli...
- Patent number 12,321,097
- Issue date Jun 3, 2025
- ECHEM SOLUTIONS CORP.
- Tz-Jin Yang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coated underlayer for overcoated photoresist
- Patent number 12,313,971
- Issue date May 27, 2025
- DuPont Electronic Materials International, LLC
- Anton Chavez
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,313,972
- Issue date May 27, 2025
- NISSAN CHEMICAL CORPORATION
- Hiroto Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating layer for multilayer printed circuit board, multilayer p...
- Patent number 12,313,973
- Issue date May 27, 2025
- LG Chem, Ltd.
- Jeong Wook Mun
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 12,313,974
- Issue date May 27, 2025
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin patterning materials with ligands having silicon/germaniu...
- Patent number 12,298,666
- Issue date May 13, 2025
- Inpria Corporation
- Robert E. Jilek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesion layer for multi-layer photoresist
- Patent number 12,292,684
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer compositions and patterning methods
- Patent number 12,287,576
- Issue date Apr 29, 2025
- DuPont Electronic Materials International, LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and treatment method
- Patent number 12,276,915
- Issue date Apr 15, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,271,113
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition, resist underlayer film, method of forming resist under...
- Patent number 12,265,333
- Issue date Apr 1, 2025
- JSR Corporation
- Shin-ya Nakafuji
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,259,654
- Issue date Mar 25, 2025
- Sumitomo Electric Industries, Ltd.
- Tadashi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive dry film, and printed wiring board with photosensiti...
- Patent number 12,259,652
- Issue date Mar 25, 2025
- Tamura Corporation
- Ryoya Takashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate
- Publication number 20250237947
- Publication date Jul 24, 2025
- HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD
- Li YUAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...
- Publication number 20250237957
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Adhesive Film And Patterning Process
- Publication number 20250237955
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250231489
- Publication date Jul 17, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ANTI-REFLECTIVE COATING COMPOSITION
- Publication number 20250231488
- Publication date Jul 17, 2025
- TAN KAH KEE INNOVATION LABORATORY
- Aiqiang Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231487
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACK...
- Publication number 20250224672
- Publication date Jul 10, 2025
- Resonac Corporation
- Ryo YUKIOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE DEPOSITION ON METAL-CONTAINING MASK USING PROMOTER
- Publication number 20250224677
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20250226221
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- NANCY FUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250224676
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuki YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLLOIDAL PARTICLE INK COMPOSITION, METHOD OF FORMING COLLOIDAL PAR...
- Publication number 20250228116
- Publication date Jul 10, 2025
- UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Bong Soo KIM
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTORESIST AND METHOD OF FORMATION AND USE
- Publication number 20250224673
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20250224679
- Publication date Jul 10, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKING PROCESS USING SWITCHABLE POLYMER
- Publication number 20250216782
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...
- Publication number 20250216763
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208506
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208512
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250199409
- Publication date Jun 19, 2025
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION
- Publication number 20250201559
- Publication date Jun 19, 2025
- International Business Machines Corporation
- Dario Goldfarb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING PLATED ARTICLE
- Publication number 20250189895
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMATION COMPOSITION
- Publication number 20250189896
- Publication date Jun 12, 2025
- NISSAN CHEMICAL CORPORATION
- Yuki MITSUTAKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR REDUCING ENVIRONMENT...
- Publication number 20250180993
- Publication date Jun 5, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEPOSITION OF RESIST UNDERLAYER FOR ENHANCING PHOTORESIST PERFORMANCE
- Publication number 20250180992
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Guangyan ZHONG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF SMOOTHENING PROFILE OF PHOTORESIST
- Publication number 20250183034
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REVERSIBLE OVERCOAT COMPOSITIONS
- Publication number 20250172877
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Charlotte Cutler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE FILM FORMING COMPOSITION
- Publication number 20250155813
- Publication date May 15, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...
- Publication number 20250149335
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE-FILM FORMING COMPOSITION
- Publication number 20250136734
- Publication date May 1, 2025
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Lithography Process and Material for Negative Tone Development
- Publication number 20250138428
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250129203
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS

having cover layers or intermediate layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Composition containing a heterocyclic compound having a dicyanostyr...

Stabilized interfaces of inorganic radiation patterning composition...

Resist underlayer film-forming composition

Silicon-containing composition and method of producing semiconducto...

Composition for forming underlayer film, resist pattern forming met...

Chemical solution-resistant protective film forming composition con...

Pattern fidelity enhancement

Thermosetting iodine- and silicon-containing material, composition...

Resist underlayer film-forming composition

Composition for forming silicon-containing resist underlayer film,...

Diffractive backlight fabrication method

Method of removing photoresist, laminate, method of forming metalli...

Coated underlayer for overcoated photoresist

Resist underlayer film-forming composition

Insulating layer for multilayer printed circuit board, multilayer p...

Resist underlayer composition, and method of forming patterns using...

Treatment liquid and pattern forming method

Organotin patterning materials with ligands having silicon/germaniu...

Adhesion layer for multi-layer photoresist

Photoresist and method of formation and use

Underlayer compositions and patterning methods

Selective deposition of carbon on photoresist layer for lithography...

Liquid chemical, method for producing liquid chemical, and method f...

Treatment liquid and treatment method

Method of manufacturing a semiconductor device

Radiation-sensitive resin composition and method for forming resist...

Composition, resist underlayer film, method of forming resist under...

Method for manufacturing semiconductor device

Photosensitive dry film, and printed wiring board with photosensiti...

Silicon-containing resist underlayer film-forming composition inclu...

Patents Applicationslast 30 patents

Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate

LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...

Composition For Forming Adhesive Film And Patterning Process

RESIST UNDERLAYER FILM-FORMING COMPOSITION

ANTI-REFLECTIVE COATING COMPOSITION

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACK...

SELECTIVE DEPOSITION ON METAL-CONTAINING MASK USING PROMOTER

SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...

FILM FORMING METHOD AND FILM FORMING APPARATUS

COLLOIDAL PARTICLE INK COMPOSITION, METHOD OF FORMING COLLOIDAL PAR...

PHOTORESIST AND METHOD OF FORMATION AND USE

RESIST PATTERN FORMATION METHOD

MASKING PROCESS USING SWITCHABLE POLYMER

ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION

METHOD OF MANUFACTURING PLATED ARTICLE

RESIST UNDERLAYER FILM FORMATION COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR REDUCING ENVIRONMENT...

DEPOSITION OF RESIST UNDERLAYER FOR ENHANCING PHOTORESIST PERFORMANCE

METHOD OF SMOOTHENING PROFILE OF PHOTORESIST

REVERSIBLE OVERCOAT COMPOSITIONS

PROTECTIVE FILM FORMING COMPOSITION

METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...

PROTECTIVE-FILM FORMING COMPOSITION

Lithography Process and Material for Negative Tone Development

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...